Call for Papers
Manuscript Submission

EIPBN 2010

Registration

Call for Papers

Sponsors & Affiliates

About EIPBN

Sister Conferences

Conference Archives

About Nano- Patterning

Micrograph Contest

Contact Us

Invited Presentations

Directed Assembly

Biomolecular Architectures and Systems for Nanoscience Engineering

Jennifer Cha
Univ. California San Diego

Multiscale Modeling of Block Copolymer Directed Assembly and its Application to Sub-Lithographic Patterning

Juan de Pablo
Univ. of Wisconsin – Madison

Electron Beams

Electron beam lithography, the first fifty years, and prospects for the future

Timothy Groves
State Univ. New York – Albany

REBL: A maskless ebeam direct write lithography approach using the Reflective Electron Beam Lithography concept

Paul Petric
KLA-Tencor

High Current electron optical design for
REBL direct write lithography
Mark McCord
KLA-Tencor

Emerging Technology

Self-aligned Epitaxial Graphene MOSFETs with a record field-effect mobility of 6000 cm2/Vs on 50 mm wafers

J.S. Moon
HRL

Shrink-Induced Nanofabrication

Michelle Khine
Univ. California Irvine

Application specific CVD growth of carbon nanotubes

Dieter Kern
University of Tübingen, Germany


EUV Lithography

Wavelength Specific Reflections–A Decade of EUV Mask Inspection Research

Kenneth Goldberg
Lawrence Berkeley Nat’l Lab

Focused Ion Beams

Focused ion beam nanofabrication – new possibilities

John Melngallis
Univ. of Maryland

High Brightness Plasma Ion Source Developments for Next Generation FIB and Surface Analysis

Noel Smith
Oregon Physics

Masks & Maskless

Electron-Beam Templating of Capillary-Force-Induced Nanocollapse

Karl Berggren
Massachusetts Inst. of Technology

Analog Lithography with Phase Masks in Projection Exposure Tools

Eric Johnson
Univ. of North Carolina at Charlotte

Metrology

Positioning and Measuring at the Nanometric Level Over Macroscopic Distances

Robert Hocken
Univ. North Carolina – Charlotte

Microfluidics

A Microfluidic Toolbox for Lab on a Chip Devices

Bruce Gale
Univ. of Utah

Modeling

Mask topography induced phase effects and wave aberrations in optical and EUV lithography

Andreas Erdmann
Fraunhofer IISB, Germany

Nanobiology

From cells-on-chip towards lab-in-a-cell

Severine Le Gac
Univ. of Twente, Netherlands

Nanoelectronics

Scaling in Carbon Electronics

Zhihong Chen
IBM Research

Nanoimprint

Convenience of T-NIL with combined processing                 .

Hella-Christin Scheer
Univ. of Wuppertal, Germany

Defect Inspection for High Volume Patterned Media

Doug Resnick
Molecular Imprints

Research and Development on Process Science and
CD Control in High-Throughput UV Nanoimprint

Shinji Matsui
Univ. of Hyogo, Japan

Molecularly selective nanopatterns using nanoimprint lithography: a label-free sensor architecture

Lars Montelius
Lund University, Sweden

Nanophotonics

Silicon Photonics in High Performance Computing

Michael Watts
Sandia Nat’l Labs

Three Dimensional Silicon-on-Insulator based Optical Phased Array for Agile and Large Angle Laser Beam Steering Systems

Ray Chen
Univ. of Texas – Austin

Large-Area Linear and Nonlinear Nanophotonics

Steven Brueck
Univ. of New Mexico

Nanostructures

Focused Ion Beam (FIB), E-beam lithography, and in-situ Microscopy in Investigating Mechanical Properties of Nano-Scale Materials.

Julia Greer
California Inst. of Technology

Biomolecular-Scale Engineering


Shalom Wind
Columbia University

Mode-Locked Nanomechanical Electron Shuttles for Phase Coherent Frequency Conversion

Robert Blick
Univ. of Wisconsin – Madison

High performance lithographically defined back-gated Si-nanowire MOSFETs with sub-5 nm channel width

Walter Hu
Univ. of Texas – Dallas

Novel Optical Imaging

A 1D Gridded Design Style for Hybrid Optical and e-Beam Patterning

Michael Smayling
Tela Innovations, Inc.

Reinventing the SEM – Electrons, Protons, and Ions

David Joy
Univ. of Tennessee

Patterned Media

Patterned Media: Pushing the Limits of Lithography
in Manufacturing

Elizabeth Dobisz
Hitachi Global Storage Technologies

Resists

RLS Performance Trade-offs for a Polymer Bound PAG
EUV Resist

Roel Gronheld
IMEC, Belgium


Committee Login