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Invited Speakers

 

Speaker  Institution  Title 
Sarunya Bangsaruntip IBM Nanofabrication of gate-all-around silicon nanowire MOSFETs for the 10 nm node and beyond
Sven Bauerdick Raith Ion Column and Source technology employing Gallium and New Ion Species for Advanced FIB Nanofabrication
Roger Bonnacaze University of Texas TBD
Lee Chen Tokyo Electron Plasma Properties for the etching of Fine Lines and High Aspect Ratio holes
Joy Cheng IBM Design and Customization of Directed Self-Assembly Patterns
Suzanne Coley Dow Design Strategy for Improving EUV Contact Hole Resist Performance
James Cybulski Stanford University Design Strategy for Improving EUV Contact Hole Resist Performance
Enzo Di Fabrizio King Abdullah University of Science and Technology Foldscope: Origami-Based Paper Microscope
Marija Drndic University of Pennsylvania Nanosculpting Devices with Electrons in the Transmission Electron Microscope and Applications
Toru Fujimori Fujifilm Negative tone imaging with EUV exposure
Roel Gronheid IMEC Readying Directed Self-Assembly for Patterning in Semi-Conductor Manufacturing
Peter Gnauck Zeiss A Mirror-Corrected Scanning Electron Microscope
Cliff Henderson Georgia Tech TBD
Liangbing Hu University of Maryland Scalable Nanostructures for Energy and Flexible Electronics
Rohit Karnik MIT TBD
Armin W. Knoll IBM Zurich Thermal Probe Nanolithography: What You See is What You Get
Ondrej Krivanek Nion Atom by Atom Analysis and Nanolithography
Michael Lercel SEMATECH Inc The Litho Roadmap: Is it a straight path?
Zhenyu Li George Washington University Co-Fabrication of Liquid-core Micro/Nano Structures in Soft Materials for Stretchable Electronics, Photonics and Microfluidics
Shy-Jay Lin Taiwan Semiconductor Manufacturing Company, TSMC Towards 7-nm node and below technologies by MEBW
Michal Lipson Cornell University Silicon Photonics: The Optical Spice Rack
Marko Loncar Harvard TBD
Jabez McClelland NIST Bright ion beams from laser-cooled atoms
James Murday University of Southern California Challenges to Education Addressing the Nanoscale – K through Gray
Paul Nealey University of Chicago TBD
John Notte Zeiss The High Brightness Neon Beam: From Source to Sample
Laurent Pain French Alternative Energies and Atomic Energy Commission, CEA TBD
Ivo Rangelow Ilmenau University of Technology, Germany Invited: Scanning Probes for Nanomanufacturing
Veronica Savu Morphotonix Microtechnology to Taste – Holographic chocolate for the supermarket
Kartik Srinivasan NIST TBD
J Andres Torres Mentor Graphics Directed Self Assembly: A practical perspective
James Watkins University of Massachusetts, Amherst Electronic and Optical Devices via Additive Driven Self-Assembly and Nanoimprint Lithography: Towards Solution-Based Roll-to-Roll Nanomanufacturing
Shalom Wind Columbia University Directed Biomolecular Assembly of Functional Nanostructures
Gary Zabow NIST Micro- and Nanofabrication for Enhanced Magnetic Resonance Imaging and Sensing

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