EIPBN
The EIPBN
Conference is recognized as the foremost international meeting
dedicated to lithographic science and technology and its application
to micro and nanofabrication techniques. The conference brings
together engineers and scientists from industries and universities
from all over the world to discuss recent progress and future
trends.
We are
pleased to feature the following paper on the history of the
EIPBN conference:
History
of the "Three Beams" Conference, the Birth of the
Information Age and the Era of Lithography Wars
Mark
L. Schattenburg
Space
Nanotechnology Laboratory, Massachusetts Institute of Technology
Another
item of historical interest is Richard Feynman's 1959 lecture
For
a brief history of EIPBN and a listing of all previous conference
loactions, look here.
Meeting
Format
The
conference opens on Tuesday afternoon with a special commercial
session which features vendors of materials and equipment relevant
to this conference. The plenary session is on Wednesday morning.
The rest of the conference has two parallel sessions. The length
of presentation is 30 minutes for invited papers and 20 minutes
for contributed papers, discussion time included. A special
feature of the technical program is the poster session that
includes invited and contributed papers. There is only one poster
session, but posters will be displayed for informal viewing
throughout the entire conference. No distinction is made between
the importance of poster and oral presentations.
Technical
Scope
Abstracts representing
high quality original research are invited in the following
areas:
DUV, immersion,
EUV and X-ray lithography
Electron and
ion beam lithography
Sub-half wavelength
"super resolution" optical lithography
Photon- and charged-particle
optics
Metrology and
alignment
Resists and resist
processing
Plasma etching
and deposition
Nano-fabrication
techniques
Maskless Lithography
Topics in nanofabrication
and emerging technologies include:
Simulation and
computer aided design for the Nanoscale Era
Nanometer scale
photonic devices
Molecular and
low-dimensional nano-electronics
Bio-nanotechnology
& hybrid bio/solid state devices
Micro and nano-scaled
MEMS
Nano-particle,
synthesis and assembly
Self-assembly
and directed self-assembly
Nanoimprint lithography,
embossing and soft lithography
Nanofabrication for energy sources
Conference
Chair
Stephen
Chou
Princeton University
Program
Chair
Elizabeth Dobisz
Hitachi Global Storage Technology
Meeting
arrangements
Melissa Widerkehr
and Associates
19803 Laurel Valley Place
Montgomery Village, MD 20886
Phone: 301-527-0900 x101
Fax: 301-527-0994
melissaw@widerkehr.com
Shipping
Please
refer to our "travel" page for
shipping instructions.
Related
Conferences
Conferences of similar
interest are held in the Fall in Europe (MNE) and in Japan (MNC).
Check out our "sister conferences" with these links:
MNE
2009
International
Microprocess and Nanotechnology Conference, Japan
Gordon
Research Conferences
Lithography Workshop
Student Support
Limited funds are available to support student travel. The
Conference Chair must receive a request for support from the
student's advisor by May 1. Decisions about student support
will be returned by May 15. Students receiving support must
submit a manuscript, and preference will be given to students
who are both first author and presenter. (At EIPBN there is
no distinction between oral and poster presentations.)
This
web site was developed by M. Rooks at the IBM T.J. Watson Research
Center.
Your feedback
is welcome.
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