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EIPBN 2013 Program

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IDSession NameStart Date & TimeEnd Date & TimeSession TypeSpeakersVenue
01-Plenary 1Breaking through the scaling boundaries, key for a sustainable society5/29/2013 8:30am5/29/2013 9:15amPlenary SessionJo De BoeckTennessee Ballroom
01-Plenary 2Nanotechnology Convergence for IT, ET, and BTs5/29/2013 9:15am5/29/2013 10:00amPlenary SessionJongmin KimTennessee Ballroom
01-Plenary 3Designing Bio-inorganic Nanomaterials for Ultrasensitive Biosensing5/29/2013 10:30am5/29/2013 11:15amPlenary SessionMolly StevensTennessee Ballroom
01-Plenary 4Single Molecule and Single Cell Sensing with Nanomechanical Systems5/29/2013 11:15am5/29/2013 12:00noonPlenary SessionMichael RoukesTennessee Ballroom
1A-1Proof of 50keV Electron Multi-Beam Writing at 0.1nm Address Grid (Invited)5/29/2013 2:30pm5/29/2013 3:00pmSession 1A - Electron Beam 1Hans LoeschnerTennessee Ballroom A/B
1A-2Optically Actuated Nanostructured Electron-Emitter Arrays5/29/2013 3:00pm5/29/2013 3:20pmSession 1A - Electron Beam 1Richard HobbsTennessee Ballroom A/B
1A-3Image distortion in REBL system: the correctable and the residual5/29/2013 3:20pm5/29/2013 3:40pmSession 1A - Electron Beam 1Sameet ShriyanTennessee Ballroom A/B
1A-4Low-Energy Electron Diffractive Imaging Based on a Single-Atom Electron Source5/29/2013 3:40pm5/29/2013 4:00pmSession 1A - Electron Beam 1Ing-Shouh HwangTennessee Ballroom A/B
1A-5Shaped and multiple electron beams from a single thermionic cathode5/29/2013 4:00pm5/29/2013 4:20pmSession 1A - Electron Beam 1Mehran Vahdani MoghaddamTennessee Ballroom A/B
1A-6High throughput scanning electron microscopes with MEMS-based multi-beam optics5/29/2013 4:20pm5/29/2013 4:40pmSession 1A - Electron Beam 1Pieter KruitTennessee Ballroom A/B
1B-1Multifunctional Nanostructured Materials: Blurring the Lines between Optical Interfaces (Invited)5/29/2013 2:30pm5/29/2013 3:00pmSession 1B - Nanophotonics 1Chih-Hao ChangTennessee Ballroom C
1B-2Hydrogen Silsesquioxane As A Resist And Material Of Choice In Fabricating Plasmonic Antennas5/29/2013 3:00pm5/29/2013 3:20pmSession 1B - Nanophotonics 1Joel YangTennessee Ballroom C
1B-3Reaching theoretical resonance quality factor limit in coaxial plasmonic nano resonators fabricated by Helium Ion Microscope5/29/2013 3:20pm5/29/2013 3:40pmSession 1B - Nanophotonics 1Mauro MelliTennessee Ballroom C
1B-4Moving Towards Structural Color Display: Angle Insensitive Structural Colors Based on Metallic Gratings and Color Pixels beyond the Diffraction Limit5/29/2013 3:40pm5/29/2013 4:00pmSession 1B - Nanophotonics 1Cheng ZhangTennessee Ballroom C
1B-5Double External Quantum Efficiency/Light Extraction and Widen Viewing Angle of Organic Light-Emitting Diodes with New Plasmonic Cavity with Subwavelength Hole Array (PlaCSH)5/29/2013 4:00pm5/29/2013 4:20pmSession 1B - Nanophotonics 1Wei DingTennessee Ballroom C
1B-6Direct write and nanoprinting for plasmon resonance color filters (Invited)5/29/2013 4:20pm5/29/2013 4:50pmSession 1B - Nanophotonics 1David CummingTennessee Ballroom C
1C-1NGL for NGL: Next Generation Lithography for Next Generation Logic (Invited), 5/29/2013 2:30pm5/29/2013 3:00pmSession 1C - EUV 1Yan BorodovskyTennessee Ballroom D/E
1C-2Efficient Packaged Zoneplates for EUV Instruments5/29/2013 3:00pm5/29/2013 3:20pmSession 1C - EUV 1Erik AndersonTennessee Ballroom D/E
1C-3Continuous and Stochastic effects for 2D structures in EUV Lithography5/29/2013 3:20pm5/29/2013 3:40pmSession 1C - EUV 1Alessandro Vaglio PretTennessee Ballroom D/E
1C-4Phase Defect Characterization on an EUV Blank Mask using Micro Coherent EUV Scatterometry Microscope5/29/2013 3:40pm5/29/2013 4:00pmSession 1C - EUV 1Tetsuo HaradaTennessee Ballroom D/E
1C-5EUV Bessel beam lithography5/29/2013 4:00pm5/29/2013 4:20pmSession 1C - EUV 1Li WangTennessee Ballroom D/E
1C-6EUV Lithography and 3D IC (Invited)5/29/2013 4:20pm5/29/2013 4:50pmSession 1C - EUV 1Banqiu WuTennessee Ballroom D/E
2A-1Nanofabricated Silicon Devices: From Nanosensors to Medical Implants  (Invited)5/30/2013 8:10am5/30/2013 8:40amSession 2A - Nanostructures 1Axel SchererTennessee Ballroom A/B
2A-2Soft- and near-field lithography on glass hemisphere surface for spherical zone plates5/30/2013 8:40am5/30/2013 9:00amSession 2A - Nanostructures 1Bing-Rui LuTennessee Ballroom A/B
2A-3Fabrication of hierarchical nanostructures using free-standing tri-layer membrane5/30/2013 9:00am5/30/2013 9:20amSession 2A - Nanostructures 1Ke DuTennessee Ballroom A/B
2A-4Out-of-plane nanofabrication using evaporated electron beam resist5/30/2013 9:20am5/30/2013 9:40amSession 2A - Nanostructures 1Sondos AlqarniTennessee Ballroom A/B
2A-5Free-standing nanoscale mechanical and photonic devices fabricated in single-crystal diamond5/30/2013 9:40am5/30/2013 10:00amSession 2A - Nanostructures 1Michael BurekTennessee Ballroom A/B
2B-1HfC(310) high brightness sources for advanced imaging applications (Invited)5/30/2013 8:10am5/30/2013 8:40amSession 2B - Focused Ion Beam or Sources 1Willilam MackieTennessee Ballroom C
2B-2Fabrication and Modification of Carbon Nanomembranes (CNMs) by Helium Ion Lithography5/30/2013 8:40am5/30/2013 9:00amSession 2B - Focused Ion Beam or Sources 1Xianghui ZhangTennessee Ballroom C
2B-3Understanding Nanomachining in Gold Substrates5/30/2013 9:00am5/30/2013 9:20amSession 2B - Focused Ion Beam or Sources 1Kate L. KleinTennessee Ballroom C
2B-4Development of a low energy neutral particle printer for atomically precise patterning of desorption resists5/30/2013 9:20am5/30/2013 9:40amSession 2B - Focused Ion Beam or Sources 1Hong-Jie GuoTennessee Ballroom C
2B-5Visualizing the Interaction Volume of Helium Ions in Hydrogen Silsesquioxane5/30/2013 9:40am5/30/2013 10:00amSession 2B - Focused Ion Beam or Sources 1Jingxuan CaiTennessee Ballroom C
2C-1Non Equilibrium Block Copolymer Directed Self Assembly. Multiblocks, Solvents, and Thick Films (Invited)5/30/2013 8:10am5/30/2013 8:40amSession 2C - ModelingJuan de PabloTennessee Ballroom D/E
2C-2Study of multilayer systems in electron beam lithography5/30/2013 8:40am5/30/2013 9:00amSession 2C - ModelingRobert F. PetersTennessee Ballroom D/E
2C-3Off Axis Modeling and Measurement of Emission Parameters for the Schottky Emitter5/30/2013 9:00am5/30/2013 9:20amSession 2C - ModelingSean KelloggTennessee Ballroom D/E
2C-4Simulation of dose variation and charging due to fogging in electron beam lithography5/30/2013 9:20am5/30/2013 9:40amSession 2C - ModelingSergey BabinTennessee Ballroom D/E
2C-5Simulation Study on Template Releasing Process in Nanoimprint Lithography5/30/2013 9:40am5/30/2013 10:00amSession 2C - ModelingTakahiro ShiotsuTennessee Ballroom D/E
3A-1Infrared nanospectroscopy meets FIB and TEM (Invited)5/30/2013 10:20am5/30/2013 10:50amSession 3A - Novel imaging/metrologyRainer HillenbrandTennessee Ballroom A/B
3A-2Modulus Mapping in High Resolution Patterned Features5/30/2013 10:50am5/30/2013 11:10amSession 3A - Novel imaging/metrologyPrashant K. KulshreshthaTennessee Ballroom A/B
3A-3Combined SIMS-SPM instrument for high sensitivity and high resolution elemental 3D analysis5/30/2013 11:10am5/30/2013 11:30amSession 3A - Novel imaging/metrologyYves FlemingTennessee Ballroom A/B
3A-4Process Monitoring of an Electron Beam Lithography Process for Silicon Photonics in a University Facility5/30/2013 11:30am5/30/2013 11:50amSession 3A - Novel imaging/metrologyRichard BojkoTennessee Ballroom A/B
3A-5Towards SIMS on the Helium Ion Microscope: detection limits and experimental results on the ORION5/30/2013 11:50am5/30/2013 12:10pmSession 3A - Novel imaging/metrologyDavid DowsettTennessee Ballroom A/B
3B-1Nanochemistry in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography (Invited)5/30/2013 10:20am5/30/2013 10:50amSession 3B - ResistsTakahiro KozawaTennessee Ballroom C
3B-2Contamination Mitigation from Salty HSQ Development for Nanoscale CMOS Device Patterning5/30/2013 10:50am5/30/2013 11:10amSession 3B - ResistsMarkus BrinkTennessee Ballroom C
3B-3Methods for Controlled Polymerization in Negative Tone Resists5/30/2013 11:10am5/30/2013 11:30amSession 3B - ResistsRichard A. LawsonTennessee Ballroom C
3B-4Negative-Tone Chemically-Amplified for Sub-20nm Lithography5/30/2013 11:30am5/30/2013 11:50amSession 3B - ResistsPrashant K. KulshreshthaTennessee Ballroom C
3B-5Nanoparticle Photoresists: Highly Sensitive EUV Resists with a New Patterning Mechanism (Invited)5/30/2013 11:50am5/30/2013 12:20pmSession 3B - ResistsMarie KrysakTennessee Ballroom C
3C-1MEMRISTIVE NANODEVICES: MECHANISMS, PROMISES AND CHALLENGES (Invited)5/30/2013 10:20am5/30/2013 10:50amSession 3C - Nanoelectronics 1J. Joshua YangTennessee Ballroom D/E
3C-2Integration of Planar Memristors with CMOS for Hybrid Circuits5/30/2013 10:50am5/30/2013 11:10amSession 3C - Nanoelectronics 1Peng LinTennessee Ballroom D/E
3C-3Fabrication of 18 nm split-gate charge trap memories by hybrid lithography (e-beam/DUV)5/30/2013 11:10am5/30/2013 11:30amSession 3C - Nanoelectronics 1Sebastien Pauliac-VaujourTennessee Ballroom D/E
3C-4Improved Switching Uniformity for TiO2/HfO2 Bi-layer Memristive Devices5/30/2013 11:30am5/30/2013 11:50amSession 3C - Nanoelectronics 1Hao JiangTennessee Ballroom D/E
3C-5Si MOSFET with a Nanoscale Void Channel (Invited)5/30/2013 11:50am5/30/2013 12:20pmSession 3C - Nanoelectronics 1Hong Koo KimTennessee Ballroom D/E
4A-1Substrate Conformal Imprint Lithography for nanophotonics in applications (Invited)5/30/2013 1:30pm5/30/2013 2:00pmSession 4A - Nanoimprint 1Marc VerschuurenTennessee Ballroom A/B
4A-2Fabrication of Plasmonic-enhanced Nanostructured Electron Source (PNE) Using Epitaxial Lift-off and Nanoimprint Lithography5/30/2013 2:00pm5/30/2013 2:20pmSession 4A - Nanoimprint 1Yixing LiangTennessee Ballroom A/B
4A-3Thermally-Modulated Alignment for Nanoimprinting5/30/2013 2:20pm5/30/2013 2:40pmSession 4A - Nanoimprint 1Euclid MoonTennessee Ballroom A/B
4A-4Effects of Fluorosurfactants on Antisticking Layer Resistance in Repeated UV Nanoimprint5/30/2013 2:40pm5/30/2013 3:00pmSession 4A - Nanoimprint 1Shuso IyoshiTennessee Ballroom A/B
4A-5Sub-30 nm Roller Nanoimprint Lithography Using Flexible Hybrid Molds and Applications to Large-Area High-Performance Nanoplasmonic Sensors and Solar Cells5/30/2013 3:00pm5/30/2013 3:20pmSession 4A - Nanoimprint 1Qi ZhangTennessee Ballroom A/B
4B-1Diamond based Micro and Nano Systems (Invited)5/30/2013 1:30pm5/30/2013 2:00pmSession 4B - Carbon-based devices/systemsAnirudha SumantTennessee Ballroom C
4B-2Analog and digital flexible nanoelectronics fabricated from advanced 2D nanomaterials5/30/2013 2:00pm5/30/2013 2:20pmSession 4B - Carbon-based devices/systemsLi TaoTennessee Ballroom C
4B-3Morphological characterization of metallic nano-structures evaporated through stencil on graphene5/30/2013 2:20pm5/30/2013 2:40pmSession 4B - Carbon-based devices/systemsVeronica SavuTennessee Ballroom C
4B-4Graphene Field-Effect Transistors with Gigahertz-Frequency Power Gain on Flexible Substrates5/30/2013 2:40pm5/30/2013 3:00pmSession 4B - Carbon-based devices/systemsNicholas PetroneTennessee Ballroom C
4B-5High-resolution Nanopatterning of Graphene Using Direct Helium Ion Beam Milling5/30/2013 3:00pm5/30/2013 3:20pmSession 4B - Carbon-based devices/systemsAhmad AbbasTennessee Ballroom C
4C-1Chemical Assisted Etching with Ne+ & He+ (GFIS) FIB -A Study of Nanomachining Properties for O2 and XeF2 (Invited)5/30/2013 1:30pm5/30/2013 2:00pmSession 4C - Focused Ion Beam or Sources 2Rick LivengoodTennessee Ballroom D/E
4C-2First focused ion beam images using a novel electron impact gas ion source5/30/2013 2:00pm5/30/2013 2:20pmSession 4C - Focused Ion Beam or Sources 2David JunTennessee Ballroom D/E
4C-3A laser-cooled atomic beam for application in high resolution FIB5/30/2013 2:20pm5/30/2013 2:40pmSession 4C - Focused Ion Beam or Sources 2S. H. W. WoutersTennessee Ballroom D/E
4C-4Progress Report on the Multi-Species Focused Ion Beam Lithography System and Its Applications5/30/2013 2:40pm5/30/2013 3:00pmSession 4C - Focused Ion Beam or Sources 2Sven BauerdickTennessee Ballroom D/E
4C-5Metal Depositions Induced by Helium and Neon Ion Beams5/30/2013 3:00pm5/30/2013 3:20pmSession 4C - Focused Ion Beam or Sources 2Huimeng WuTennessee Ballroom D/E
5A-1Directed Self-Assembling Lithography Process for High-Density Bit Patterned Magnetic Recording Media (Invited)5/30/2013 3:40pm5/30/2013 4:10pmSession 5A - Directed Self Assembly (DSA)/Self Assembly (SA) 1Akira KikitsuTennessee Ballroom A/B
5A-2Rule-Based Directed Self-Assembly of Circuit-Like Block-Copolymer Patterns5/30/2013 4:10pm5/30/2013 4:40pmSession 5A - Directed Self Assembly (DSA)/Self Assembly (SA) 1Jae-Byum ChangTennessee Ballroom A/B
5A-3Directed Self-Assembly of Ternary Blends of Block Copolymer and Homopolymers on Chemical Patterns5/30/2013 4:40pm5/30/2013 5:00pmSession 5A - Directed Self Assembly (DSA)/Self Assembly (SA) 1Ling-Shu WanTennessee Ballroom A/B
5A-4Sacrificial Post Templating Method for Block Copolymer Self-Assembly5/30/2013 5:00pm5/30/2013 5:20pmSession 5A - Directed Self Assembly (DSA)/Self Assembly (SA) 1Amir Tavakkoli K. G.Tennessee Ballroom A/B
5A-5Fabrication of Hierarchical Three-Dimensional Nanostructures Using Template-Directed Assembly of Colloidal Particles5/30/2013 5:20pm5/30/2013 5:40pmSession 5A - Directed Self Assembly (DSA)/Self Assembly (SA) 1Jonathan ElekTennessee Ballroom A/B
5B-1Label-Free Cell Screening  (Invited)5/30/2013 3:40pm5/30/2013 4:10pmSession 5B - Nanobiology/fluidicLydia SohnTennessee Ballroom C
5B-2Fabrication and Demonstration of Ultra-sensitive and Fast Immunoassay Platform With 3D Nanoplasmonic Cavity Antenna and Microfluidics Using Nanoimprint5/30/2013 4:10pm5/30/2013 4:40pmSession 5B - Nanobiology/fluidicRuoming PengTennessee Ballroom C
5B-3Nanowire-Based Electrode for Neural Recordings in the Brain5/30/2013 4:40pm5/30/2013 5:00pmSession 5B - Nanobiology/fluidicDmitry SuyatinTennessee Ballroom C
5B-4Ionic Transportation through DNA-based Nanochannels5/30/2013 5:00pm5/30/2013 5:20pmSession 5B - Nanobiology/fluidicPaul BertaniTennessee Ballroom C
5B-5Targeted nanopatterning for medical applications (Invited)5/30/2013 5:20pm5/30/2013 5:50pmSession 5B - Nanobiology/fluidicNikolaj GadegaardTennessee Ballroom C
5C-1Silicon Carbide Nanoelectromechanical Systems and Nanomechanical Logic (Invited)5/30/2013 3:40pm5/30/2013 4:10pmSession 5C - Microelectromechanical Systems (MEMS) 1Philip FengTennessee Ballroom D/E
5C-2Design and Fabrication of Ultrananocrystalline Diamond Based Nanoelectromechanical Switches5/30/2013 4:10pm5/30/2013 4:40pmSession 5C - Microelectromechanical Systems (MEMS) 1Kenneth Perez QuinteroTennessee Ballroom D/E
5C-3Towards an RF Planar Waveguide Electron LINAC5/30/2013 4:40pm5/30/2013 5:00pmSession 5C - Microelectromechanical Systems (MEMS) 1JuneHo HwangTennessee Ballroom D/E
5C-4Tunability of silicon carbide resonators with electrothermal actuation and piezoelectric readout5/30/2013 5:00pm5/30/2013 5:20pmSession 5C - Microelectromechanical Systems (MEMS) 1Enrico MastropaoloTennessee Ballroom D/E
5C-5Micromachined stylus ion traps through high aspect ratio lithography and electrochemical deposition5/30/2013 5:20pm5/30/2013 5:40pmSession 5C - Microelectromechanical Systems (MEMS) 1Christian ArringtonTennessee Ballroom D/E
6A-1Determining the range and intensity of backscattered electrons from the substrate density and atomic number (Invited)5/31/2013 8:10am5/31/2013 8:40amSession 6A - Electron Beam 2David CzaplewskiTennessee Ballroom A/B
6A-2Design of ring-cathode focused electron beam columns5/31/2013 8:40am5/31/2013 9:00amSession 6A - Electron Beam 2Anjam KhursheedTennessee Ballroom A/B
6A-3Dual Layer Negative Tone Metal Liftoff Electron Beam Lithography process for nanometer scale Plasmonic and Photonic devices5/31/2013 9:00am5/31/2013 9:20amSession 6A - Electron Beam 2Yao-Te ChengTennessee Ballroom A/B
6A-4Fabrication of a rotation corrector for electron multi beam array micro-lenses5/31/2013 9:20am5/31/2013 9:40amSession 6A - Electron Beam 2Aernout Christiaan ZonnevylleTennessee Ballroom A/B
6A-5Liquid-phase electron-beam-induced-deposition on bulk substrates without liquid cells5/31/2013 9:40am5/31/2013 10:00amSession 6A - Electron Beam 2Matthew BresinTennessee Ballroom A/B
6B-1Active Cantilever-free Scanning Probe Lithography (Invited)5/31/2013 8:10am5/31/2013 8:40amSession 6B - Tip-based ProcessingKeith A. BrownTennessee Ballroom C
6B-2Fabricating arbitrary silicon nanostructures using thermal dip pen nanolithography (tDPN)5/31/2013 8:40am5/31/2013 9:00amSession 6B - Tip-based ProcessingHuan HuTennessee Ballroom C
6B-3Mix&Match Electron Beam and Scanning Probe Lithography for sub-5 nm Patterning5/31/2013 9:00am5/31/2013 9:20amSession 6B - Tip-based ProcessingMarcus KaestnerTennessee Ballroom C
6B-4Multi-spot-size vector writing approach to atomically precise H depassivation lithography5/31/2013 9:20am5/31/2013 9:40amSession 6B - Tip-based ProcessingJames OwenTennessee Ballroom C
6B-5Mesoscopic Electronic Devices Fabricated using Atomic Force Lithography5/31/2013 9:40am5/31/2013 10:00amSession 6B - Tip-based ProcessingRudzani NemutudiTennessee Ballroom C
6C-1All-angle Negative Refraction and Active Flat Lensing in the Ultraviolet  (Invited)5/31/2013 8:10am5/31/2013 8:40amSession 6C - Nanophotonics 2Henri LezecTennessee Ballroom D/E
6C-2Ultrathin, High-Efficiency, Broad-Band, Omni-Acceptance Organic Solar Cells Using New Plasmonic Cavity with Subwavelength Hole Array5/31/2013 8:40am5/31/2013 9:00amSession 6C - Nanophotonics 2Stephen ChouTennessee Ballroom D/E
6C-3Freestanding Photonic Crystals in Lithium Niobate5/31/2013 9:00am5/31/2013 9:20amSession 6C - Nanophotonics 2Reinhard GeissTennessee Ballroom D/E
6C-4Optimization of Electron Beam Patterned HSQ Mask Edge Roughness for Low-Loss Silicon Waveguides5/31/2013 9:20am5/31/2013 9:40amSession 6C - Nanophotonics 2Michael WoodTennessee Ballroom D/E
6C-5A lab-on-a-chip with 30 nm nanochannels and plasmonic bowtie nanoantenna5/31/2013 9:40am5/31/2013 10:00amSession 6C - Nanophotonics 2Irene Fernandez-CuestaTennessee Ballroom D/E
7A-1Controlled bottom-up assembly of functional molecules: From wires to networks (Invited)5/31/2013 10:20am5/31/2013 10:50amSession 7A - Emerging TechnologiesChristophe NacciTennessee Ballroom A/B
7A-23 D Nanostructures via Aligned Stacking of Pre-patterned Membranes5/31/2013 10:50am5/31/2013 11:10amSession 7A - Emerging TechnologiesCorey FucetolaTennessee Ballroom A/B
7A-3Nanograting–Mediated Growth of Bismuth Selenide Topological Insulator Nanoribbons5/31/2013 11:10am5/31/2013 11:30amSession 7A - Emerging TechnologiesSungjin WiTennessee Ballroom A/B
7A-4Optoelectronic Devices on-Fiber Enabled by Micro-Assembly Process Using Polydimethylsiloxane Probes5/31/2013 11:30am5/31/2013 11:50amSession 7A - Emerging TechnologiesXiaolong HuTennessee Ballroom A/B
7A-5The nano-optics of plasmonic optical tweezers, SERS substrates and multi-colored silicon nanowires (Invited)5/31/2013 11:50am5/31/2013 12:20pmSession 7A - Emerging TechnologiesKenneth CrozierTennessee Ballroom A/B
7B-1MAPPER progress towards a High Volume Manufacturing EBDW system  (Invited)5/31/2013 10:20am5/31/2013 10:50amSession 7B - Maskless LithographyPieter KruitTennessee Ballroom C
7B-2Nanoengineered charge-drain film for electron-optical MEMS in the REBL E-beam column5/31/2013 10:50am5/31/2013 11:10amSession 7B - Maskless LithographyWilliam TongTennessee Ballroom C
7B-3Patterning via Optical Saturable Transformations via Solubility Rate Difference5/31/2013 11:10am5/31/2013 11:30amSession 7B - Maskless LithographyPrecious CantuTennessee Ballroom C
7B-4Optical patterning of features with spacing below the far-field diffraction limit using absorbance modulation5/31/2013 11:30am5/31/2013 11:50amSession 7B - Maskless LithographyFarhana MasidTennessee Ballroom C
7B-5Direct laser writing: Finer, faster and more flexible5/31/2013 11:50am5/31/2013 12:10pmSession 7B - Maskless LithographyErik WallerTennessee Ballroom C
7C-1Field Effect Transistor Performance of Hydrothermal ZnO Nanowires (Invited)5/31/2013 10:20am5/31/2013 10:50amSession 7C - Nanostructures 2Natalie PlankTennessee Ballroom D/E
7C-2Fabrication of Periodic Hollow-Shell Nano-Volcano Arrays for Particle Trapping5/31/2013 10:50am5/31/2013 11:10amSession 7C - Nanostructures 2Xu ZhangTennessee Ballroom D/E
7C-3Fabrication of single-crystal diamond nano-slabs for photonic applications5/31/2013 11:10am5/31/2013 11:30amSession 7C - Nanostructures 2Luozhou LiTennessee Ballroom D/E
7C-4Nanofabrication of high aspect ratio structures using evaporated polystyrene resist containing metal5/31/2013 11:30am5/31/2013 11:50amSession 7C - Nanostructures 2Celal ConTennessee Ballroom D/E
7C-5Enabling High Performance Detectors and Optics for Astronomy and Planetary Exploration with PEALD (Invited)5/31/2013 11:50am5/31/2013 12:20pmSession 7C - Nanostructures 2April JewellTennessee Ballroom D/E
8A-1Defect Management of EUV Masks: Progress and Outlook (Invited)5/31/2013 1:30pm5/31/2013 2:00pmSession 8A - EUV 2Anthony YenTennessee Ballroom A/B
8A-2Single-digit patterning using EUV light5/31/2013 2:00pm5/31/2013 2:20pmSession 8A - EUV 2Li WangTennessee Ballroom A/B
8A-3Stochastic Exposure Kinetics of EUV Photoresists: A Simulation Study5/31/2013 2:20pm5/31/2013 2:40pmSession 8A - EUV 2Chris MackTennessee Ballroom A/B
8A-4Periodic metallic structures fabricated by coherent Talbot lithography in a table top system5/31/2013 2:40pm5/31/2013 3:00pmSession 8A - EUV 2Wei LiTennessee Ballroom A/B
8A-5Unveiling success rate of defect mitigation by experiment with EUV Actinic Blank Inspection Prototype for 16 nm hp5/31/2013 3:00pm5/31/2013 3:20pmSession 8A - EUV 2Tetsunori MurachiTennessee Ballroom A/B
8B-18” and 12” wafer scale Nano Imprint Lithography: from process control to optical functions (Invited)5/31/2013 1:30pm5/31/2013 2:00pmSession 8B - Nanoimprint 2Stefan LandisTennessee Ballroom C
8B-2Polymer filling behaviors with imprinting velocity in NIL5/31/2013 2:00pm5/31/2013 2:20pmSession 8B - Nanoimprint 2JiHyeong RyuTennessee Ballroom C
8B-3Novel Ordered Hetero Junction Organic Photovoltaics (OHJ-OPV) Novel Ordered Hetero Junction Organic Photovoltaics (OHJ-OPV) by multi-layered direct nanoimprint using buli-in electrode mold5/31/2013 2:20pm5/31/2013 2:40pmSession 8B - Nanoimprint 2Kohei TomohiroTennessee Ballroom C
8B-4Fabrication of Large-area Flexible Roll-to-Roll Nanoimprint Molds with Sub-100nm Features Using Step-and-Repeat Duplication, Bonding and Lift-off5/31/2013 2:40pm5/31/2013 3:00pmSession 8B - Nanoimprint 2Hao ChenTennessee Ballroom C
8B-5Accuracy of Wafer Level Alignment with Substrate Conformal Imprint Lithography5/31/2013 3:00pm5/31/2013 3:20pmSession 8B - Nanoimprint 2Robert FaderTennessee Ballroom C
8C-1Ionic memory and the future of the semiconductor industry (Invited)5/31/2013 1:30pm5/31/2013 2:00pmSession 8C - NanoelectronicsMichael KozickiTennessee Ballroom D/E
8C-2Transfer-Printing of Prepatterned Semiconducting Few-Layer-Molybdenum Disulfide Structures for Electronic Applications5/31/2013 2:00pm5/31/2013 2:20pmSession 8C - NanoelectronicsHongsuk NamTennessee Ballroom D/E
8C-3Voltage Dependent Electroforming of TiO2-based Memristive Devices5/31/2013 2:20pm5/31/2013 2:40pmSession 8C - NanoelectronicsHao JiangTennessee Ballroom D/E
8C-4GaN/AlN Double Barrier Nanowire Resonant Tunneling Diodes5/31/2013 2:40pm5/31/2013 3:00pmSession 8C - NanoelectronicsYe ShaoTennessee Ballroom D/E
8C-5Oxide Nanoelectronics On Demand5/31/2013 3:00pm5/31/2013 3:20pmSession 8C - NanoelectronicsGuanglei ChengTennessee Ballroom D/E
9A-1Extendability of LPP EUV source technology in kW average power and 6.x nm wavelength operation (Invited)5/31/2013 3:40pm5/31/2013 4:10pmSession 9A - Focused Ion Beam or Sources 3Akira EndoTennessee Ballroom A/B
9A-2Monte Carlo Simulations of Helium and Neon Ions Beam Induced Deposition5/31/2013 4:10pm5/31/2013 4:40pmSession 9A - Focused Ion Beam or Sources 3Rajendra TimilsinaTennessee Ballroom A/B
9A-3Patterning Plasmonic Nanostructures - Regimes of the Gallium Focused Ion Beam and Helium Ion Microscope5/31/2013 4:40pm5/31/2013 5:00pmSession 9A - Focused Ion Beam or Sources 3Hangfang HaoTennessee Ballroom A/B
9A-4Advances in Ion Beam micromachining for complex 3D microfluidics5/31/2013 5:00pm5/31/2013 5:20pmSession 9A - Focused Ion Beam or Sources 3Leonidas E. OcolaTennessee Ballroom A/B
9A-5Mechanical characteristics of the ultra-long horizontal free-space-nanowire grown by real-time feedback control on focused-ion-beam chemical vapor deposition5/31/2013 5:20pm5/31/2013 5:40pmSession 9A - Focused Ion Beam or Sources 3Dengji GuoTennessee Ballroom A/B
9B-1Sub-10 nm silicon nano-structures based on block copolymer lithography and high selectivity, cryogenic temperature dry etching (Invited)5/31/2013 3:40pm5/31/2013 4:10pmSession 9B - Directed Self Assembly/Self Assembly 2Deirdre OlynickTennessee Ballroom C
9B-2Thermodynamic origin of placement errors for contact holes created by directed self-assembly5/31/2013 4:10pm5/31/2013 4:40pmSession 9B - Directed Self Assembly/Self Assembly 2Sander WuisterTennessee Ballroom C
9B-3Block Copolymer Directed Self-Assembly Two-Hole Pattern inside Peanut-Shaped Templates5/31/2013 4:40pm5/31/2013 5:00pmSession 9B - Directed Self Assembly/Self Assembly 2He Yi and H.-S. Philip WongTennessee Ballroom C
9B-4DNA Origami: Prospects for Nanomanufacturing5/31/2013 5:00pm5/31/2013 5:20pmSession 9B - Directed Self Assembly/Self Assembly 2James A. LiddleTennessee Ballroom C
9B-5Ordered arrays of carbon nanotube segments by directed assembly5/31/2013 5:20pm5/31/2013 5:40pmSession 9B - Directed Self Assembly/Self Assembly 2Erika PenzoTennessee Ballroom C
9C-1Triboelectric Generators for Self-Powered Electronics (Invited)5/31/2013 3:40pm5/31/2013 4:10pmSession 9C - MEMSGuang ZhuTennessee Ballroom C
9C-2Optomechanical resonator fabrication with the surface plasmon antenna for the wavelength detection5/31/2013 4:10pm5/31/2013 4:40pmSession 9C - MEMSReo KometaniTennessee Ballroom C
9C-3Planar Electronic Picosecond Electron Pulser5/31/2013 4:40pm5/31/2013 5:00pmSession 9C - MEMSJuneHo HwangTennessee Ballroom C
9C-4Fabrication of neural probes for simultaneous in vivo optical stimulation and electrical recording in the brain5/31/2013 5:00pm5/31/2013 5:20pmSession 9C - MEMSMufaddal GheewalaTennessee Ballroom C
9C-5Fabrication of Complex Three-Dimensional Multilevel Silicon Micro- and Nano-Structures using High Energy Ion Irradiation5/31/2013 5:20pm5/31/2013 5:40pmSession 9C - MEMSSara AzimiTennessee Ballroom C
P01-01Plasmonic Nanogap Arrays Fabricated via Moiré Holographic Lithography5/29/2013 12:005/29/2013 14:00P01 - Focused Ion Beam or Maskless LithographyIshan WathuthanthriRyman Exhibit Hall
P01-02Application of Proton Beam Writing to a Direct Etching of PTFE for PDMS Replica Molding5/29/2013 12:005/29/2013 14:00P01 - Focused Ion Beam or Maskless LithographyHiroyuki NishikawaRyman Exhibit Hall
P01-03Ga+ Focused Ion Beam Micromachining of Thermoplastic Polymers5/29/2013 12:005/29/2013 14:00P01 - Focused Ion Beam or Maskless LithographyKa WongRyman Exhibit Hall
P01-04Prototype Active-Matrix Nanocrystalline Silicon Electron Emitter Array for Massively Parallel Direct-Write Electron Beam Lithography5/29/2013 12:005/29/2013 14:00P01 - Focused Ion Beam or Maskless LithographyNaokatsu IkegamiRyman Exhibit Hall
P01-05Advanced Maskless Grayscale Lithography using a new writing strategy to increase the number of grayscale levels5/29/2013 12:005/29/2013 14:00P01 - Focused Ion Beam or Maskless LithographyDominique ColleRyman Exhibit Hall
P01-06Maskless Subwavelength Nanopatterning Using Vortex Phase Plates and Absorbance Modulation5/29/2013 12:005/29/2013 14:00P01 - Focused Ion Beam or Maskless LithographyApratim MajumderRyman Exhibit Hall
P01-07Ion and Electron Beam Lithography in a Multifunctional Tool FIB/SEM with in-situ SPM5/29/2013 12:005/29/2013 14:00P01 - Focused Ion Beam or Maskless LithographyJaroslav JirušeRyman Exhibit Hall
P01-08Direct Ga and Si Ion Beam Lithography for Nanopore Fabrication with High Resolution and Reproducibility5/29/2013 12:005/29/2013 14:00P01 - Focused Ion Beam or Maskless LithographySven BauerdickRyman Exhibit Hall
P01-09Lloyd’s Mirror Interferometer Using a Single-Mode Fiber Spatial Filter5/29/2013 12:005/29/2013 14:00P01 - Focused Ion Beam or Maskless LithographyKuo-Chun TsengRyman Exhibit Hall
P02-01Control of stress in sputtered tantalum films for MEMS applications5/29/2013 12:005/29/2013 14:00P02 - MEMSEnrico MastropaoloRyman Exhibit Hall
P02-02Improvement of Bonding Strength in Room Temperature Wafer Bonding using Surface Smoothing by Ne Beam5/29/2013 12:005/29/2013 14:00P02 - MEMSYuichi KurashimaRyman Exhibit Hall
P02-03Optical microlithography on oblique surfaces via a novel diffractive phase mask5/29/2013 12:005/29/2013 14:00P02 - MEMSPeng WangRyman Exhibit Hall
P03-01A method for dynamic parameterized shape reconstruction. Application to scatterometry5/29/2013 12:005/29/2013 14:00P03 - Novel imagingSébastien SoulanRyman Exhibit Hall
P03-02Investigating effects of aerial image averaging and pupil plane filtering on line edge roughness (LER)5/29/2013 12:005/29/2013 14:00P03 - Novel imagingBurak BaylavRyman Exhibit Hall
P03-03Active-illumination parallel Raman/SERS imaging5/29/2013 12:005/29/2013 14:00P03 - Novel imagingWei-Chuan ShihRyman Exhibit Hall
P04-01Theoretical study of the effects of substrate material refractive index on the optical transmission of nano-hole arrays5/29/2013 12:005/29/2013 14:00P04 - ModelingMehrdad IrannejadRyman Exhibit Hall
P04-02Multi-Source, Complex Beamline Modeling Development in MICHELLE eBEAM5/29/2013 12:005/29/2013 14:00P04 - ModelingSerguei OvtchinnikovRyman Exhibit Hall
P04-03Fluctuation Control of Measurement Interferometers: Application of algorithms to correct for local stage-motion induced pressure surges5/29/2013 12:005/29/2013 14:00P04 - ModelingShane R. PalmerRyman Exhibit Hall
P04-04Detailed Molecular Dynamics Studies of Block Copolymer Directed Self-Assembly: Effect of Guiding Layer Properties on Block Copolymer Directed Self-Assembly5/29/2013 12:005/29/2013 14:00P04 - ModelingAndrew PetersRyman Exhibit Hall
P04-05Pattern-integrated interference lithography: vector modeling of the single-exposure recording of integrated photonic-crystal structures5/29/2013 12:005/29/2013 14:00P04 - ModelingMatthieu C. R. LeiboviciRyman Exhibit Hall
P05-01Parallel Auger Electron Analysis inside Scanning Electron Microscopes5/29/2013 12:005/29/2013 14:00P05 - NanometrologyK. H. CheongRyman Exhibit Hall
P05-02Measuring Field-Stitch Boundary Error of Electron Beam Lithography With X-ray Diffraction5/29/2013 12:005/29/2013 14:00P05 - NanometrologyAaron SteinRyman Exhibit Hall
P05-03CD Matching between CD-SEM and Scatterometry Metrology5/29/2013 12:005/29/2013 14:00P05 - NanometrologyYi SongRyman Exhibit Hall
P05-04Reconstructing Cross-Sectional Profiles from Top-View SEM Images Using Edge Fluctuation Characteristics5/29/2013 12:005/29/2013 14:00P05 - NanometrologyHiroshi FukudaRyman Exhibit Hall
P05-05Liquid-Immersion Lloyd’s Mirror Interference Lithography5/29/2013 12:005/29/2013 14:00P05 - NanometrologyAbhijeet BagalRyman Exhibit Hall
P05-06EUVL Aberration Metrology using Resist Images from a Strong Phase Shifting Mask5/29/2013 12:005/29/2013 14:00P05 - NanometrologyGermain FengerRyman Exhibit Hall
P05-07Defect-tracking For Nanoimprint Lithography Using Optical Surface Analyzer and Scanning Electron Microscope5/29/2013 12:005/29/2013 14:00P05 - NanometrologyZhaoning YuRyman Exhibit Hall
P05-08Abrasion Test for Antisticking Layer by Scanning Probe Microscopy5/29/2013 12:005/29/2013 14:00P05 - NanometrologyMakoto OkadaRyman Exhibit Hall
P05-09Atom-based Pitch and Length Standards5/29/2013 12:005/29/2013 14:00P05 - NanometrologyKai LiRyman Exhibit Hall
P06-01Magnetic domain wall motion in permalloy wires with nanometer-scaled notches5/29/2013 12:005/29/2013 14:00P06 - Patterned mediaT. C. ChenRyman Exhibit Hall
P06-02Magnetic patterning by oxygen reduction using low energy Helium irradiation5/29/2013 12:005/29/2013 14:00P06 - Patterned mediaZhen ZhengRyman Exhibit Hall
P07-01Exploiting extreme coupling to realize a metamaterial perfect absorber (Invited)5/29/2013 12:005/29/2013 14:00P07 - NanophotonicsUwe HuebnerRyman Exhibit Hall
P07-02Pronounced Effects of Anisotropy on Plasmonic Properties of Nanorings Fabricated by Electron Beam Lithography5/29/2013 12:005/29/2013 14:00P07 - NanophotonicsRachel NearRyman Exhibit Hall
P07-03Plasmonic Conductors for Organic Solar Cells5/29/2013 12:005/29/2013 14:00P07 - NanophotonicsFernando E. CaminoRyman Exhibit Hall
P07-04SPR-based Surface-enhanced Raman Scattering for the Detection of Organophosphorus Pesticide5/29/2013 12:005/29/2013 14:00P07 - NanophotonicsJie-Hui LiRyman Exhibit Hall
P07-05Nano-Rough Gold for Enhanced Raman Scattering5/29/2013 12:005/29/2013 14:00P07 - NanophotonicsJeonghwan KimRyman Exhibit Hall
P07-06Surface-enhanced Raman Spectroscopy with monolithic, hierarchical nanoporous gold disk substrates5/29/2013 12:005/29/2013 14:00P07 - NanophotonicsJi QiRyman Exhibit Hall
P07-07Infrared nanophotonics based on indium-tin-oxide nanorod array5/29/2013 12:005/29/2013 14:00P07 - NanophotonicsShi-Qiang LiRyman Exhibit Hall
P07-08Triggering and monitoring plasmon enhanced reactions by optical nanoantennas coupled to photocatalytic beads5/29/2013 12:005/29/2013 14:00P07 - NanophotonicsAdam SchwartzbergRyman Exhibit Hall
P07-092D and 3D Plasmonic Nanostars for Bio-sensing Applications - Single Molecule Detection5/29/2013 12:005/29/2013 14:00P07 - NanophotonicsManohar ChirumamillaRyman Exhibit Hall
P07-10Tapered hyperbolic metamaterials for broadband absorption5/29/2013 12:005/29/2013 14:00P07 - NanophotonicsAlex KaplanRyman Exhibit Hall
P07-11Advances on e-beam fabrication of photonic crystal membranes5/29/2013 12:005/29/2013 14:00P07 - NanophotonicsJon Olav GrepstadRyman Exhibit Hall
P07-12Enhanced up-conversion luminescence in a microtubular optical resonator5/29/2013 12:005/29/2013 14:00P07 - NanophotonicsJing ZhangRyman Exhibit Hall
P07-13A Light-driven Micro-motor Based on Angular Momentum Transfer through Subwavelength Grating Waveplates5/29/2013 12:005/29/2013 14:00P07 - NanophotonicsZhouyang ZhuRyman Exhibit Hall
P08-01Defectivity and uniformity evaluation of block copolymer directed self-assembly for contact hole shrink 300mm-process5/29/2013 12:005/29/2013 14:00P08 - DSA/SAMaxime ArgoudRyman Exhibit Hall
P08-02Patterning of Nanoparticles Using Electric Field Assisted Coffee Ring Effect5/29/2013 12:005/29/2013 14:00P08 - DSA/SAJinhua MuRyman Exhibit Hall
P08-03PS-b-PHEMA: A Promising High ? Polymer for Directed Self-Assembly Lithography5/29/2013 12:005/29/2013 14:00P08 - DSA/SAJing ChengRyman Exhibit Hall
P08-04Controlling the Morphology of Silver Nanoparticle Films formed by Laser-induced Deposition from Liquids5/29/2013 12:005/29/2013 14:00P08 - DSA/SACarlos A. JarroRyman Exhibit Hall
P08-05Pattern Transfer from Directed PS-b-PMMA Films with Sub-25 nm Full Pitch5/29/2013 12:005/29/2013 14:00P08 - DSA/SALei WanRyman Exhibit Hall
P08-06Directly-Photodefinable Guiding Layers: Enabling Simple 3-Step DSA Processes for Lithographic Patterning5/29/2013 12:005/29/2013 14:00P08 - DSA/SAJing ChengRyman Exhibit Hall
P09-01Mm^2 size arrays of metal nano-particles for solar cell applications fabricated by Electron Beam Lithography (EBL)5/29/2013 12:005/29/2013 14:00P09 - Electron BeamsMartin GreveRyman Exhibit Hall
P09-02Print based estimation of probe size distribution in electron beam lithography5/29/2013 12:005/29/2013 14:00P09 - Electron BeamsAnanthan RaghunathanRyman Exhibit Hall
P09-03Low line edge roughness patterning with Character Projection EB Lithography for Photonic Devices5/29/2013 12:005/29/2013 14:00P09 - Electron BeamsMasaki KurokawaRyman Exhibit Hall
P09-04A Multiple electron beam wafer inspection system design using permanent magnetic lens arrays5/29/2013 12:005/29/2013 14:00P09 - Electron BeamsTao LuoRyman Exhibit Hall
P09-05Small-Pitch Electron Diffraction Holograms Patterned on Inorganic Resist with Electron Beam Lithography5/29/2013 12:005/29/2013 14:00P09 - Electron BeamsTyler HarveyRyman Exhibit Hall
P09-06Dependency Analysis of Line Edge Roughness in Electron-beam Lithography5/29/2013 12:005/29/2013 14:00P09 - Electron BeamsXinyu ZhaoRyman Exhibit Hall
P09-07Analytic Model of Line Edge Roughness from Stochastic Exposure Distribution in Electron-beam Lithography5/29/2013 12:005/29/2013 14:00P09 - Electron BeamsRui GuoRyman Exhibit Hall
P09-08Synthesis of metal nanoparticles in polymeric films induced by electron beam5/29/2013 12:005/29/2013 14:00P09 - Electron BeamsHiroki YamamotoRyman Exhibit Hall
P09-09A Fast Path-based Method for 3-D Resist Development Simulation in Electron-beam Lithography5/29/2013 12:005/29/2013 14:00P09 - Electron BeamsQing DaiRyman Exhibit Hall
P09-10Influence of EUV mask structure on electron trajectories5/29/2013 12:005/29/2013 14:00P09 - Electron BeamsSusumu IidaRyman Exhibit Hall
P09-11Fabrication of Gold Bowtie Nano-antenna by E-beam Lithography on Si3N4 Membrane for SERS5/29/2013 12:005/29/2013 14:00P09 - Electron BeamsJian ZhangRyman Exhibit Hall
P09-12Electron beam optimization using self-developing resist for large write-field electron beam lithography5/29/2013 12:005/29/2013 14:00P09 - Electron BeamsRipon Kumar DeyRyman Exhibit Hall
P09-13Write-field alignment optimization using self-developing electron beam resist5/29/2013 12:005/29/2013 14:00P09 - Electron BeamsRipon Kumar DeyRyman Exhibit Hall
P09-14Dot-Matrix Marks for Dynamic Overlay Measurements in Electron Beam Lithography5/29/2013 12:005/29/2013 14:00P09 - Electron BeamsErnst KratschmerRyman Exhibit Hall
P09-15Hexagonal three-dimensional plasmonic nanoantenna arrays 5/29/2013 12:005/29/2013 14:00P09 - Electron BeamsXX XiaRyman Exhibit Hall
P10-01Impact of pattern profile on surface plasmon polaritons in computational lithography5/29/2013 12:005/29/2013 14:00P10 - Emerging TechnologiesSang-Kon KimRyman Exhibit Hall
P10-02Enhanced purity via laser assisted electron beam induced deposition of tungsten5/29/2013 12:005/29/2013 14:00P10 - Emerging TechnologiesNicholas A. RobertsRyman Exhibit Hall
P10-03Forward sputtering of thin films using focused helium ion beam5/29/2013 12:005/29/2013 14:00P10 - Emerging TechnologiesPeiyan YangRyman Exhibit Hall
P10-04In-situ Microfluidics using a Liquid Injector for the Study of Beam Induced and Dynamic Processes5/29/2013 12:005/29/2013 14:00P10 - Emerging TechnologiesAurelien BotmanRyman Exhibit Hall
P10-05Changing to TiOx Based Nanostructured Catalyst Support Materials for PEM Fuel Cells Utilizing ALD and PEALD5/29/2013 12:005/29/2013 14:00P10 - Emerging TechnologiesRichard PhillipsRyman Exhibit Hall
P11-01Analysis and understanding the regrowth of Multi-walled carbon nanotube forests5/29/2013 12:005/29/2013 14:00P11 - Carbon-based devices/systemsDaewoong JungRyman Exhibit Hall
P11-02Effect of thickness of the catalyst film and the hydrogen gas on the spin-capability of a MWCNT forest5/29/2013 12:005/29/2013 14:00P11 - Carbon-based devices/systemsDaewoong JungRyman Exhibit Hall
P11-03Tracking the Movement of Carbon Nanotubes during Dielectrophoretic Deposition5/29/2013 12:005/29/2013 14:00P11 - Carbon-based devices/systemsAli Kashefian NaieniRyman Exhibit Hall
P11-04Correlation between Electron-Irradiation Effect and Stress in Carbon Nanotubes: Molecular Dynamics Study5/29/2013 12:005/29/2013 14:00P11 - Carbon-based devices/systemsYoshinori ChiharaRyman Exhibit Hall
P11-05Control of carbon nanofibers configuration on glassy carbon by two-step ion beam irradiation method5/29/2013 12:005/29/2013 14:00P11 - Carbon-based devices/systemsJun TaniguchiRyman Exhibit Hall
P11-06Laser Induced Structural Damage to Multi-walled Carbon Nanotubes in a Controlled-Pressure Environment5/29/2013 12:005/29/2013 14:00P11 - Carbon-based devices/systemsAmir KhoshamanRyman Exhibit Hall
P11-07Fabrication of hundreds of field effect transistors on a single carbon nanotube for basic studies and molecular devices5/29/2013 12:005/29/2013 14:00P11 - Carbon-based devices/systemsXian ZhangRyman Exhibit Hall
P11-08High Temperature Gradient in a Conductor: Carbon Nanotube Forest under the “Heat Trap” Condition5/29/2013 12:005/29/2013 14:00P11 - Carbon-based devices/systemsMike ChangRyman Exhibit Hall
P11-09Nano-structure Modified Thin-Film Paper Energy Storage Device5/29/2013 12:005/29/2013 14:00P11 - Carbon-based devices/systemsNaga KoriviRyman Exhibit Hall
P11-10Study of optical anisotropy property to rapidly characterize structural qualities of CVD prepared graphene films5/29/2013 12:005/29/2013 14:00P11 - Carbon-based devices/systemsYu-Lun LiuRyman Exhibit Hall
P11-11Graphene-based Broadband THz Modulators 5/29/2013 12:005/29/2013 14:00P11 - Carbon-based devices/systemsHaidong ZhangRyman Exhibit Hall
P11-12High yield fabrication of graphene resonators array with poly-Si sacrificial layer5/29/2013 12:005/29/2013 14:00P11 - Carbon-based devices/systemsTao ChenRyman Exhibit Hall
P11-13A Model for Nano-manufactured Electrodes utilizing Vertical Carbon Nanotubes5/29/2013 12:005/29/2013 14:00P11 - Carbon-based devices/systemsAlokik KanwaRyman Exhibit Hall
P12-01Fabrication of Electronic Fabry-Perot Interferometer in the Quantum Hall Regime5/29/2013 12:005/29/2013 14:00P12 - NanoelectronicsSanghun AnRyman Exhibit Hall
P12-03Fabrication of p-type Silicon Nanowires for 3D FETs Using Focused Ion Beam5/29/2013 12:005/29/2013 14:00P12 - NanoelectronicsMarcos Vinicius Puydinger dos SantosRyman Exhibit Hall
P12-04Crossbar Arrays of Sub-10 nm Memristive Devices Fabricated with Nanoimprint Lithography5/29/2013 12:005/29/2013 14:00P12 - NanoelectronicsShuang PiRyman Exhibit Hall
P12-05Continuous and Scalable Fabrication of Functional films via Vibrational Indentation Patterning and Photo Roll Lithography5/29/2013 12:005/29/2013 14:00P12 - NanoelectronicsJong G. OkRyman Exhibit Hall
P12-06Low Temperature Electrical and Optical Characterization of Lithographically-Defined Au Microchannels on an Elastomeric Substrate5/29/2013 12:005/29/2013 14:00P12 - NanoelectronicsFirouzeh SabriRyman Exhibit Hall
P12-07Electromagnetically Induced Transparency in Au:VO2 Nanoparticles5/29/2013 12:005/29/2013 14:00P12 - NanoelectronicsChristina McGahanRyman Exhibit Hall
P12-08Low-power Resistive Switching in Ultra-smooth Native AlOx Thin Films Fabricated by Template Stripping5/29/2013 12:005/29/2013 14:00P12 - NanoelectronicsHao JiangRyman Exhibit Hall
P12-09Ultralow Voltage Resistive Switching in Ultrathin Silicon Oxide5/29/2013 12:005/29/2013 14:00P12 - NanoelectronicsCan LiRyman Exhibit Hall
P12-10Fabrication of organic MESFET device by dual-layer thermal nanoimprint5/29/2013 12:005/29/2013 14:00P12 - NanoelectronicsYunbum JungRyman Exhibit Hall
P13-01The five whys (and one h) of super hydrophobic surfaces in medicine  (Invited)5/29/2013 12:005/29/2013 14:00P13 - NanobiologyFrancesco GentileRyman Exhibit Hall
P13-02Approach to an on-chip 3D neural-network in a hydrogel based bioreactor5/29/2013 12:005/29/2013 14:00P13 - NanobiologyBart SchurinkRyman Exhibit Hall
P13-03Electro-Active Single Mode Integrated Optical Waveguide Application in Spectroelectrochemistry5/29/2013 12:005/29/2013 14:00P13 - NanobiologyXue HanRyman Exhibit Hall
P13-04Roll-to-Roll Hot Embossing of Micron and Nanoscale Structures for the Fabrication of Plastic Devices5/29/2013 12:005/29/2013 14:00P13 - NanobiologyGerald KreindlRyman Exhibit Hall
P13-05Cryogenic imaging of biological specimens using Helium Ion Microscope5/29/2013 12:005/29/2013 14:00P13 - NanobiologyJing GuRyman Exhibit Hall
P13-06An Innovative EBL Writing Strategy for High Speed and Precision Lithography of Large Circle Arrays for Microfiltration and Photonics in Solar Cells5/29/2013 12:005/29/2013 14:00P13 - NanobiologyKevin E. BurchamRyman Exhibit Hall
P13-07Bifunctional Nanoarrays for Probing the Immune Response at the Single-Molecule Level5/29/2013 12:005/29/2013 14:00P13 - NanobiologyHaogang CaiRyman Exhibit Hall
P13-08Large scale fabrication scheme for all-polymer multilevel nano-microfluidic Lab-on-Chip (LoC) systems: the PolyNano approach5/29/2013 12:005/29/2013 14:00P13 - NanobiologyMarco MatteucciRyman Exhibit Hall
P13-09Influence of Engineered Surface on Cell Motility and Directionality5/29/2013 12:005/29/2013 14:00P13 - NanobiologyQ. Y. TangRyman Exhibit Hall
P13-10Application of EBL fabricated nanostructured substrates for SERS detection of protein A in aqueous solution5/29/2013 12:005/29/2013 14:00P13 - NanobiologyLuis Gutierrez-RiveraRyman Exhibit Hall
P13-11Microfilters with Nanotopography for Isolation of Circulating Tumor Cell from Blood5/29/2013 12:005/29/2013 14:00P13 - NanobiologyOlga MakarovaRyman Exhibit Hall
P14-01Fabrication of Polymer Structures with Undercuts by Reverse Imprint Lithography (Invited)5/29/2013 12:005/29/2013 14:00P14 - NanoimprintAndreas FinnRyman Exhibit Hall
P14-02The Effect of Improved Hardness using Polyurethane Acrylate in Replica Mold for Substrate Conformal Imprint Lithography5/29/2013 12:005/29/2013 14:00P14 - NanoimprintGeehong KimRyman Exhibit Hall
P14-03Evaluation of fluorine additive segregation in UV nanoimprint resin by X-ray photoelectron spectroscopy5/29/2013 12:005/29/2013 14:00P14 - NanoimprintTakahiro OyamaRyman Exhibit Hall
P14-04Replication of NIL Stamps by Metal-Assisted Chemical Etching of Silicon5/29/2013 12:005/29/2013 14:00P14 - NanoimprintMohammad TarequzzamanRyman Exhibit Hall
P14-05Au split-ring resonator arrays responsive to a magnetic field in a visible frequency region fabricated by UV nanoimprint lithography5/29/2013 12:005/29/2013 14:00P14 - NanoimprintTakuya UeharaRyman Exhibit Hall
P14-06Planarized Ag Nanopattern Array for Plasmonic Resonance-driven Electroluminescence Enhancement5/29/2013 12:005/29/2013 14:00P14 - NanoimprintChul-Hyun KimRyman Exhibit Hall
P14-07Polymer filling behaviors with imprinting velocity in NIL5/29/2013 12:005/29/2013 14:00P14 - NanoimprintJiHyeong RyuRyman Exhibit Hall
P14-08High-Throughput Transfer Imprinting for Organic Semiconductor5/29/2013 12:005/29/2013 14:00P14 - NanoimprintGihoon ChooRyman Exhibit Hall
P14-09A novel route for fabricating Printable Photonic Devices with a high refractive index5/29/2013 12:005/29/2013 14:00P14 - NanoimprintCarlos Pina HernandezRyman Exhibit Hall
P14-10Exceptional Thermal Stability of Thermoplastic Polymer Nanostructures Patterned by Nanoimprint5/29/2013 12:005/29/2013 14:00P14 - NanoimprintYouwei JiangRyman Exhibit Hall
P14-11Free-standing filaments in thermal nanoimprint induced by pre-filling5/29/2013 12:005/29/2013 14:00P14 - NanoimprintAndre MayerRyman Exhibit Hall
P14-12Reflow minimization via viscosity control by exposure5/29/2013 12:005/29/2013 14:00P14 - NanoimprintKhalid DhimaRyman Exhibit Hall
P14-13Underestimated impact of instabilities with nanoimprint5/29/2013 12:005/29/2013 14:00P14 - NanoimprintAndre MayerRyman Exhibit Hall
P14-14Selective Patterning of Fluorinated Self-assembled Monolayer by UV Nanoimprinting for Directed Self-Assembly5/29/2013 12:005/29/2013 14:00P14 - NanoimprintHitomi WakabaRyman Exhibit Hall
P14-15Effect of toluene treatment on PDMS molding into nanoholes5/29/2013 12:005/29/2013 14:00P14 - NanoimprintCelal ConRyman Exhibit Hall
P14-16Dual scale controlled surface roughness by wrinkling of polymer imprints5/29/2013 12:005/29/2013 14:00P14 - NanoimprintHyun Wook RoRyman Exhibit Hall
P14-17Selective Edge Lithography for Fabricating Imprint Mold with Nano Size and Large Size Mixed Patterns5/29/2013 12:005/29/2013 14:00P14 - NanoimprintHayato NomaRyman Exhibit Hall
P14-18Nanopatterned micromechanical elements by polymer injection molding with hybrid molds5/29/2013 12:005/29/2013 14:00P14 - NanoimprintHelmut SchiftRyman Exhibit Hall
P14-19Three dimensional hologram-ROM duplication by UV-NIL5/29/2013 12:005/29/2013 14:00P14 - NanoimprintNoriyuki UnnoRyman Exhibit Hall
P14-20Novel nanofabrication method to achieve high aspect ratio metallic patterns by thermal nanoimprint lithography5/29/2013 12:005/29/2013 14:00P14 - NanoimprintNerea AlayoRyman Exhibit Hall
P14-21An investigation into the role of self-assembled monolayers of silane in UV nano-imprint lithography5/29/2013 12:005/29/2013 14:00P14 - NanoimprintAlborz AmirsadeghiRyman Exhibit Hall
P14-22Pre-hardening Ultraviolet nanoimprint lithography using opaque mold5/29/2013 12:005/29/2013 14:00P14 - NanoimprintJun TaniguchiRyman Exhibit Hall
P14-23DWDM laser arrays fabricated using thermal nanoimprint lithography on Indium Phosphide substrates5/29/2013 12:005/29/2013 14:00P14 - NanoimprintKristian SmistrupRyman Exhibit Hall
P14-242D Azobenzene Liquid-crystalline Polymer-based Switchable Photonic Crystals via Nanoimprint5/29/2013 12:005/29/2013 14:00P14 - NanoimprintXinming JiRyman Exhibit Hall
P14-25Durability assessment of mold release agents for ultraviolet nanoimprint lithography5/29/2013 12:005/29/2013 14:00P14 - NanoimprintKota FunakoshiRyman Exhibit Hall
P14-26Novel template releasing process Novel template releasing process by multi-axis controlled systems in nanoimprint lithography5/29/2013 12:005/29/2013 14:00P14 - NanoimprintTomoki NishinoRyman Exhibit Hall
P14-27Nanoimprint-Based Lift-off Process for a Large-Scale Epitaxial Growth of Nanowires5/29/2013 12:005/29/2013 14:00P14 - NanoimprintMariusz GraczykRyman Exhibit Hall
P14-28Reorientation Evaluation of Photoinduced Liquid Crystalline Polymer Pattern Fabricated by Hybrid Nanoimprinting with Linearly Polarized Ultra Violet Irradiation5/29/2013 12:005/29/2013 14:00P14 - NanoimprintMakoto OkadaRyman Exhibit Hall
P14-292D- visualization of imprint-induced flow by means of crystallizing polymers5/29/2013 12:005/29/2013 14:00P14 - NanoimprintSi WangRyman Exhibit Hall
P14-30Sub-10nm nanofabrication by step-and-repeat UV nanoimprint lithography5/29/2013 12:005/29/2013 14:00P14 - NanoimprintScott DhueyRyman Exhibit Hall
P14-31Magnetic field assisted micro contact printing: a new concept of fully automated and calibrated process5/29/2013 12:005/29/2013 14:00P14 - NanoimprintJean-Christophe CauRyman Exhibit Hall
P14-32Functional Nano Patterns realized by Thermal and UV Nano Imprint Lithography5/29/2013 12:005/29/2013 14:00P14 - NanoimprintMario BaumRyman Exhibit Hall
P15-01Contrast curve engineering by using multi-layer polystyrene electron beam resist5/29/2013 12:005/29/2013 14:00P15 - ResistsManal AlhazmiRyman Exhibit Hall
P15-02Line width roughness reduction strategies for resist patterns printed via electron beam lithography5/29/2013 12:005/29/2013 14:00P15 - ResistsJulien JussotRyman Exhibit Hall
P15-03Polycarbonate as an ideal grayscale electron beam resist using diluted cyclopentanone developer5/29/2013 12:005/29/2013 14:00P15 - ResistsArwa ?AbbasRyman Exhibit Hall
P15-04Exposure Strategy: Investigation of the Relationship between Exposure Speed and Ultra High Resolution in electron beam lithography5/29/2013 12:005/29/2013 14:00P15 - ResistsScott LewisRyman Exhibit Hall
P15-05Process Dependence of Line Width Roughness in Electron Beam Resists5/29/2013 12:005/29/2013 14:00P15 - ResistsTomoharu YamazakiRyman Exhibit Hall
P15-07Hard resist masks prepared with sequential infiltration synthesis process for high-resolution deep etch5/29/2013 12:005/29/2013 14:00P15 - ResistsXianghai MengRyman Exhibit Hall
P15-08Investigation into Shot Noise Effects of Direct Write Electron Beam Lithography Using High Energy Electron Beams5/29/2013 12:005/29/2013 14:00P15 - ResistsAlan BrodieRyman Exhibit Hall
P15-09Pattern exposure order dependence in hydrogen silsequioxane5/29/2013 12:005/29/2013 14:00P15 - ResistsDevin BrownRyman Exhibit Hall
P15-10Point-spread function of energy deposition by an electron-beam determined by using energy-filtered TEM5/29/2013 12:005/29/2013 14:00P15 - ResistsVitor ManfrinatoRyman Exhibit Hall
P15-11Chemical Composition and Pattern Development in Inorganic Photoresist Materials Deposited from Aqueous Solution5/29/2013 12:005/29/2013 14:00P15 - ResistsRose RutherRyman Exhibit Hall
P15-12An in situ analysis of EUV resist dissolution characteristics by high speed AFM5/29/2013 12:005/29/2013 14:00P15 - ResistsJulius Joseph SantillanRyman Exhibit Hall
P16-01Sub-10nm Resolution after Lift-Off using HSQ/PMMA Double Layer Resist (Invited)5/29/2013 12:005/29/2013 14:00P16 - Nanostructures and Pattern TransferMarcus RommelRyman Exhibit Hall
P16-02Wafer Scale Fabrication of High-Aspect Ratio Gold Nanostructures using Ar+ - Ion Beam Etching5/29/2013 12:005/29/2013 14:00P16 - Nanostructures and Pattern TransferRichard KasicaRyman Exhibit Hall
P16-03Fabrication of Nano-Bowl Arrays via Simple Holographic Patterning and Lift-Off Process5/29/2013 12:005/29/2013 14:00P16 - Nanostructures and Pattern TransferYuyang LiuRyman Exhibit Hall
P16-04High accuracy dual side overlay with KOH through wafer etching5/29/2013 12:005/29/2013 14:00P16 - Nanostructures and Pattern TransferHenk Van ZeijlRyman Exhibit Hall
P16-05Development of a Mask-less Nanofabrication Process for SnO2 Periodic Nanostructure5/29/2013 12:005/29/2013 14:00P16 - Nanostructures and Pattern TransferDebabrot BorgohainRyman Exhibit Hall
P16-06Inductively Coupled Plasma Etching of Through-Cell Vias in Indium-Bearing III-V Solar Cells Using SiCl4/Ar plasma5/29/2013 12:005/29/2013 14:00P16 - Nanostructures and Pattern TransferYuning ZhaoRyman Exhibit Hall
P16-07Polymeric Sidewall Transfer Lithography5/29/2013 12:005/29/2013 14:00P16 - Nanostructures and Pattern TransferYi-Chen LoRyman Exhibit Hall
P16-08Thermal dewetting of gold particles on a template surface5/29/2013 12:005/29/2013 14:00P16 - Nanostructures and Pattern TransferZhaoqian LiuRyman Exhibit Hall
P16-09Patterning of Light-Extraction Nanostructures on Sapphire Substrates Using Nanoimprint, SiO2 Masking and ICP Dry Etching5/29/2013 12:005/29/2013 14:00P16 - Nanostructures and Pattern TransferHao ChenRyman Exhibit Hall
P16-10KOH Polishing of Nanoscale Deep Reactive-Ion Etched Ultra-High Aspect Ratio Gratings5/29/2013 12:005/29/2013 14:00P16 - Nanostructures and Pattern TransferAlexander BruccoleriRyman Exhibit Hall
P16-11Fabrication of transparent superoleophobic surfaces by multiple shrinking mask etching and layer-by-layer coating5/29/2013 12:005/29/2013 14:00P16 - Nanostructures and Pattern TransferHyungryul ChoiRyman Exhibit Hall
P16-12Dipole-Coupled Nanomagnet Chains Fabricated on Silicon Nitride Membranes for Time-Resolved X-Ray Microscopy Experiments5/29/2013 12:005/29/2013 14:00P16 - Nanostructures and Pattern TransferDavid CarltonRyman Exhibit Hall
P16-13Lithographically-Defined ZnO Nanowire Growth5/29/2013 12:005/29/2013 14:00P16 - Nanostructures and Pattern TransferSamuel NicaiseRyman Exhibit Hall
P16-14Metal-Assisted Etching of Silicon Molds for Electroforming5/29/2013 12:005/29/2013 14:00P16 - Nanostructures and Pattern TransferRalu DivanRyman Exhibit Hall
P16-15Fabrication of Patterned Interference-Based and Absorption-Based Polarizers5/29/2013 12:005/29/2013 14:00P16 - Nanostructures and Pattern TransferWei-Liang HsuRyman Exhibit Hall
P16-16Comparison of Au feature formation using two Au-calixarene resists, electron beam lithography, and low temperature organic removal5/29/2013 12:005/29/2013 14:00P16 - Nanostructures and Pattern TransferPradeep PereraRyman Exhibit Hall

 

Please contact the Program Chair should you have more questions on the details of the program.

TECHNICAL SECTIONS

The various technology sections and the Section heads that are contributing to the Program organization can be found by clicking here.

The EIPBN conference abstracts from the most recent years are available by clicking here.

PROGRAM CHAIR

Professor Karl K. Berggren
Massachusetts Institute of Technology
Department of Electrical Engineering
and Computer Science
77 Massachusetts Ave. M/S 36-219
Cambridge, MA 02139
Phone: 617-324-0272
Fax: 617-253-8509
Email: eipbn2014program@mit.edu  

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