{"id":328,"date":"2009-11-29T03:31:25","date_gmt":"2009-11-29T08:31:25","guid":{"rendered":"http:\/\/eipbn.org\/2010\/?page_id=328"},"modified":"2010-03-26T13:23:23","modified_gmt":"2010-03-26T18:23:23","slug":"invited-speakers","status":"publish","type":"page","link":"http:\/\/localhost:8888\/2010\/eipbn-2010\/program\/invited-speakers\/","title":{"rendered":"Invited Presentations"},"content":{"rendered":"\n\n\n
<\/td>\n<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Directed Assembly<\/strong><\/h2>\n\n\n\n
Biomolecular Architectures and Systems for Nanoscience Engineering<\/em><\/p>\n

Jennifer Cha<\/strong>
\n<\/strong>Univ. California San Diego<\/td>\n

Multiscale Modeling of Block Copolymer Directed Assembly and its Application to Sub-Lithographic Patterning<\/em><\/p>\n

Juan de Pablo<\/strong>
\nUniv. of Wisconsin \u2013 Madison<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Electron Beams
\n<\/span><\/strong><\/h2>\n\n\n\n
Electron beam lithography, the first fifty years, and prospects for the future<\/em><\/p>\n

Timothy Groves<\/strong>
\nState Univ. New York – Albany<\/td>\n

REBL: A maskless ebeam direct write lithography approach using the Reflective Electron Beam Lithography concept<\/em><\/p>\n

Paul Petric<\/strong>
\nKLA-Tencor<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n\n\n\n
High Current electron optical design for
\nREBL direct write lithography
\n<\/em>Mark McCord<\/strong>
\nKLA-Tencor<\/td>\n		<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Emerging Technology<\/strong><\/h2>\n\n\n\n
Self-aligned Epitaxial Graphene MOSFETs with a record field-effect mobility of 6000 cm2\/Vs on 50 mm wafers<\/em><\/p>\n

J.S. Moon<\/strong>
\nHRL<\/td>\n

Shrink-Induced Nanofabrication
\n<\/em><\/p>\n

Michelle Khine<\/strong>
\nUniv. California Irvine<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n\n\n\n
Application specific CVD growth of carbon nanotubes<\/em><\/p>\n

Dieter Kern<\/strong>
\nUniversity of T\u00fcbingen, Germany<\/td>\n


\n<\/em><\/p>\n

<\/strong><\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

EUV Lithography<\/strong><\/h2>\n\n\n\n
Wavelength Specific Reflections–A Decade of EUV Mask Inspection Research<\/em><\/p>\n

Kenneth Goldberg<\/strong>
\nLawrence Berkeley Nat’l Lab<\/td>\n

<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Focused Ion Beams
\n<\/span><\/strong><\/h2>\n\n\n\n
Focused ion beam nanofabrication – new possibilities<\/em><\/p>\n

John Melngallis<\/strong>
\nUniv. of Maryland<\/td>\n

High Brightness Plasma Ion Source Developments for Next Generation FIB and Surface Analysis<\/em><\/p>\n

Noel Smith<\/strong>
\nOregon Physics<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Masks & Maskless<\/strong><\/h2>\n\n\n\n
Electron-Beam Templating of Capillary-Force-Induced Nanocollapse<\/em><\/p>\n

Karl Berggren<\/strong>
\nMassachusetts Inst. of Technology<\/td>\n

Analog Lithography with Phase Masks in Projection Exposure Tools<\/em><\/p>\n

Eric Johnson<\/strong>
\nUniv. of North Carolina at Charlotte<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Metrology<\/strong><\/h2>\n\n\n\n
Positioning and Measuring at the Nanometric Level Over Macroscopic Distances<\/em><\/p>\n

Robert Hocken<\/strong>
\nUniv. North Carolina – Charlotte<\/td>\n

<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Microfluidics<\/strong><\/h2>\n\n\n\n
A Microfluidic Toolbox for Lab on a Chip Devices<\/em><\/p>\n

Bruce Gale<\/strong>
\nUniv. of Utah<\/td>\n

<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Modeling<\/strong><\/h2>\n\n\n\n
Mask topography induced phase effects and wave aberrations in optical and EUV lithography<\/em><\/p>\n

Andreas Erdmann<\/strong>
\nFraunhofer IISB, Germany<\/td>\n

<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Nanobiology<\/strong><\/h2>\n\n\n\n
From cells-on-chip towards lab-in-a-cell<\/em><\/p>\n

Severine Le Gac<\/strong>
\nUniv. of Twente, Netherlands<\/td>\n

<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Nanoelectronics<\/strong><\/h2>\n\n\n\n
Scaling in Carbon Electronics<\/em><\/p>\n

Zhihong Chen<\/strong>
\nIBM Research<\/td>\n

<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Nanoimprint<\/strong><\/h2>\n\n\n\n
Convenience of T-NIL with combined processing\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0\u00a0 .
\n<\/em><\/p>\n

Hella-Christin Scheer<\/strong>
\nUniv. of Wuppertal, Germany<\/td>\n

Defect Inspection for High Volume Patterned Media<\/em><\/p>\n

Doug Resnick<\/strong>
\nMolecular Imprints<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n\n\n\n
Research and Development on Process Science and
\nCD Control in High-Throughput UV Nanoimprint<\/em><\/p>\n

Shinji Matsui<\/strong>
\nUniv. of Hyogo, Japan<\/td>\n

Molecularly selective nanopatterns using nanoimprint lithography: a label-free sensor architecture<\/em><\/p>\n

Lars Montelius<\/strong>
\nLund University, Sweden<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Nanophotonics<\/strong><\/h2>\n\n\n\n
Silicon Photonics in High Performance Computing<\/em><\/p>\n

Michael Watts<\/strong>
\nSandia Nat’l Labs<\/td>\n

Three Dimensional Silicon-on-Insulator based Optical Phased Array for Agile and Large Angle Laser Beam Steering Systems<\/em><\/p>\n

Ray Chen<\/strong>
\nUniv. of Texas – Austin<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n\n\n\n
Large-Area Linear and Nonlinear Nanophotonics<\/em><\/p>\n

Steven Brueck<\/strong>
\nUniv. of New Mexico<\/td>\n

<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Nanostructures<\/strong><\/h2>\n\n\n\n
Focused Ion Beam (FIB), E-beam lithography, and in-situ Microscopy in Investigating Mechanical Properties of Nano-Scale Materials.<\/em><\/p>\n

Julia Greer<\/strong>
\nCalifornia Inst. of Technology<\/td>\n

Biomolecular-Scale Engineering<\/em><\/p>\n


\n<\/em><\/p>\n

Shalom Wind<\/strong>
\nColumbia University<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n\n\n\n
Mode-Locked Nanomechanical Electron Shuttles for Phase Coherent Frequency Conversion<\/em><\/p>\n

Robert Blick<\/strong>
\nUniv. of Wisconsin – Madison<\/td>\n

High performance lithographically defined back-gated Si-nanowire MOSFETs with sub-5 nm channel width<\/em><\/p>\n

Walter Hu<\/strong>
\nUniv. of Texas – Dallas<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Novel Optical Imaging<\/strong><\/h2>\n\n\n\n
A 1D Gridded Design Style for Hybrid Optical and e-Beam Patterning<\/em><\/p>\n

Michael Smayling<\/strong>
\nTela Innovations, Inc.<\/td>\n

Reinventing the SEM – Electrons, Protons, and Ions
\n<\/em><\/p>\n

David Joy<\/strong>
\nUniv. of Tennessee<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Patterned Media<\/strong><\/h2>\n\n\n\n
Patterned Media: Pushing the Limits of Lithography
\nin Manufacturing<\/em><\/p>\n

Elizabeth Dobisz<\/strong>
\nHitachi Global Storage Technologies<\/td>\n

<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Resists<\/strong><\/h2>\n\n\n\n
RLS Performance Trade-offs for a Polymer Bound PAG
\nEUV Resist<\/em><\/p>\n

Roel Gronheld<\/strong>
\nIMEC, Belgium<\/td>\n

<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

\ufeff<\/p>\n","protected":false},"excerpt":{"rendered":"

Directed Assembly Biomolecular Architectures and Systems for Nanoscience Engineering Jennifer Cha Univ. California San Diego Multiscale Modeling of Block Copolymer Directed Assembly and its Application to Sub-Lithographic Patterning Juan de Pablo Univ. of Wisconsin \u2013 Madison Electron Beams Electron beam lithography, the first fifty years, and prospects for the future Timothy Groves State Univ. New […]<\/p>\n","protected":false},"author":2,"featured_media":0,"parent":43,"menu_order":0,"comment_status":"open","ping_status":"open","template":"","meta":[],"_links":{"self":[{"href":"http:\/\/localhost:8888\/2010\/wp-json\/wp\/v2\/pages\/328"}],"collection":[{"href":"http:\/\/localhost:8888\/2010\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"http:\/\/localhost:8888\/2010\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"http:\/\/localhost:8888\/2010\/wp-json\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"http:\/\/localhost:8888\/2010\/wp-json\/wp\/v2\/comments?post=328"}],"version-history":[{"count":19,"href":"http:\/\/localhost:8888\/2010\/wp-json\/wp\/v2\/pages\/328\/revisions"}],"predecessor-version":[{"id":330,"href":"http:\/\/localhost:8888\/2010\/wp-json\/wp\/v2\/pages\/328\/revisions\/330"}],"up":[{"embeddable":true,"href":"http:\/\/localhost:8888\/2010\/wp-json\/wp\/v2\/pages\/43"}],"wp:attachment":[{"href":"http:\/\/localhost:8888\/2010\/wp-json\/wp\/v2\/media?parent=328"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}