{"id":47,"date":"2009-07-22T09:08:47","date_gmt":"2009-07-22T14:08:47","guid":{"rendered":"http:\/\/eipbn.org\/2011\/?page_id=47"},"modified":"2010-12-21T00:04:44","modified_gmt":"2010-12-21T05:04:44","slug":"call-for-papers","status":"publish","type":"page","link":"http:\/\/localhost:8888\/2011\/call-for-papers\/","title":{"rendered":"Call for Papers"},"content":{"rendered":"<h3><a href=\"http:\/\/eipbn.org\/2011\/wp-content\/uploads\/2010\/12\/2011_EIPBN_FINAL_CALL.pdf\" target=\"_blank\"><strong><span style=\"color: #800000;\">Download Final Call for Papers in PDF\u00a0 Form here<\/span><\/strong><strong>.<\/strong><\/a><a href=\"http:\/\/eipbn.org\/2011\/wp-content\/uploads\/2010\/12\/2011_EIPBN_FINAL_CAL\" target=\"_blank\"><strong> <img loading=\"lazy\" class=\"size-thumbnail wp-image-372 alignnone\" title=\"pdffile\" src=\"http:\/\/eipbn.org\/2011\/wp-content\/uploads\/2009\/07\/pdffile-150x150.jpg\" alt=\"pdffile\" width=\"17\" height=\"17\" srcset=\"http:\/\/localhost:8888\/2011\/http:\/\/localhost:8888\/2011\/wp-content\/uploads\/2009\/07\/pdffile-150x150.jpg 150w, http:\/\/localhost:8888\/2011\/http:\/\/localhost:8888\/2011\/wp-content\/uploads\/2009\/07\/pdffile-300x300.jpg 300w, http:\/\/localhost:8888\/2011\/http:\/\/localhost:8888\/2011\/wp-content\/uploads\/2009\/07\/pdffile.jpg 400w\" sizes=\"(max-width: 17px) 100vw, 17px\" \/><\/strong><\/a><\/h3>\n<p>TECHNICAL SCOPE<\/p>\n<p>Abstracts representing high quality original research are desired<br \/>\nfor both poster and oral presentation<br \/>\nin the following areas:<\/p>\n<ul>\n<li>Directed Assembly<\/li>\n<li>Electron Beams<\/li>\n<li>Emerging Technologies<\/li>\n<li>Extreme UV Lithography<\/li>\n<li>Focused Ion Beams<\/li>\n<li>Mask and Maskless Lithography<\/li>\n<li>Metrology and Imaging<\/li>\n<li>Microfluidics<\/li>\n<li>Modeling<\/li>\n<li>Nanobiology<\/li>\n<li>Nanoelectronics<\/li>\n<li>Nanoimprint<\/li>\n<li>Nanomechanics and Nanometrology<\/li>\n<li>Nanophotonics<\/li>\n<li>Nanostructures and Processing<\/li>\n<li>Novel Imaging<\/li>\n<li>Optical Lithography<\/li>\n<li>Patterned Media and Data Storage<\/li>\n<li>Resists<\/li>\n<\/ul>\n<p>Topics in nanostructures and emerging technologies include:<\/p>\n<ul>\n<li>Self assembly<\/li>\n<li>Optical structures<\/li>\n<li>Carbon nanotubes<\/li>\n<li>Tip based processing<\/li>\n<li>Graphene<\/li>\n<\/ul>\n<h2><strong>ABSTRACT SUBMISSION<\/strong><\/h2>\n<p>Abstract submission is available online at the following location:<a href=\"http:\/\/eipbn.org\/2011\/eipbn-2010\/call-for-papers\/abstract-submission\/\"><br \/>\n<\/a><\/p>\n<h3><span style=\"color: #800000;\"><strong><a href=\"http:\/\/www.softconf.com\/b\/eipbn2011\"><span style=\"color: #800000;\">www.softconf.com\/b\/eipbn201<\/span><span style=\"color: #800000;\">1<\/span><\/a><\/strong><\/span><\/h3>\n<p>The quality of the abstracts will form the basis for selection of papers for the conference<br \/>\nand will be peer reviewed according to the following criteria:<\/p>\n<ul>\n<li>Originality of work<\/li>\n<li>Specific results achieved and described<\/li>\n<li>Potential impact and interest to the attendees<\/li>\n<\/ul>\n<h2>Abstract deadline: January 10, 2011.<span style=\"text-decoration: line-through;\"><br \/>\n<\/span><\/h2>\n<p>Abstracts are limited to one page of text (12 point or larger type)<br \/>\nand a second, optional page with up to four figures.<\/p>\n<h2><span style=\"color: #000000;\">To download an example of a formatted abstract, <\/span><a href=\"http:\/\/eipbn.org\/2011\/wp-content\/uploads\/2010\/01\/Sample-Abstract.doc\"><span style=\"color: #ff0000;\">click here<\/span><\/a><span style=\"color: #000000;\">.<\/span><\/h2>\n<p>Late submissions may be considered but only if they report truly outstanding results.<br \/>\nPlease prepare abstracts carefully and describe accomplishments specifically.<br \/>\nAuthors will be notified of acceptance <strong>by April 12, 2011<\/strong>.<br \/>\nEarlier notification will be provided to those authors providing an e-mail address.<\/p>\n<p><strong>MICROGRAPH CONTEST<\/strong><\/p>\n<p>On a less technical level, EIPBN offers the opportunity to immortalize your favorite micrograph(s).<br \/>\nCategories and previous winners are described in more detail at the<a href=\"http:\/\/eipbn.org\/2011\/micrograph-contest\/\"> Micrograph Contest page<\/a>.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>Download Final Call for Papers in PDF\u00a0 Form here. TECHNICAL SCOPE Abstracts representing high quality original research are desired for both poster and oral presentation in the following areas: Directed Assembly Electron Beams Emerging Technologies Extreme UV Lithography Focused Ion Beams Mask and Maskless Lithography Metrology and Imaging Microfluidics Modeling Nanobiology Nanoelectronics Nanoimprint Nanomechanics and [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"parent":0,"menu_order":6,"comment_status":"open","ping_status":"open","template":"","meta":[],"_links":{"self":[{"href":"http:\/\/localhost:8888\/2011\/wp-json\/wp\/v2\/pages\/47"}],"collection":[{"href":"http:\/\/localhost:8888\/2011\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"http:\/\/localhost:8888\/2011\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"http:\/\/localhost:8888\/2011\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"http:\/\/localhost:8888\/2011\/wp-json\/wp\/v2\/comments?post=47"}],"version-history":[{"count":59,"href":"http:\/\/localhost:8888\/2011\/wp-json\/wp\/v2\/pages\/47\/revisions"}],"predecessor-version":[{"id":259,"href":"http:\/\/localhost:8888\/2011\/wp-json\/wp\/v2\/pages\/47\/revisions\/259"}],"wp:attachment":[{"href":"http:\/\/localhost:8888\/2011\/wp-json\/wp\/v2\/media?parent=47"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}