Elisa Riedo Elisa Riedo

Patterning metal contacts on monolayer MoS2 with vanishing Schottky barriers using thermal nanolithography
SESSION: 2C – Probe-based Lithography
DATE: Wednesday, May 29, 2019
TIME: 3:40 pm
LOCATION: Nicollet D

Patterning metal contacts on monolayer MoS2 with vanishing Schottky barriers using thermal nanolithography

Xiaoriu Zheng, Edoardo Albisetti, Annalisa Calo, Xiangyu Liu, Elisa Riedo, New York University

We report a strategy to fabricate metal contacts on 2D materials with high reproducibility. Our approach is based on a double polymer stack chemical etching/lift off process combined with thermal scanning probe lithography (t-SPL).