Rimjhim Chaudhary Rimjhim Chaudhary

Sidewall Channel Fabrication Using Membrane Projection Lithography and Metal Assisted Chemical Etching

SESSION: Poster P1-33
LOCATION: Exhibit Hall

Sidewall Channel Fabrication Using Membrane Projection Lithography and Metal Assisted Chemical Etching

R. Chaudhary, H. Yamamoto, G. P. Watson*, University of Pennsylvania

Horizontal, enclosed nanochannels have interesting potential applications in nanofluidics, nanobiotechnology, DNA sensing, photonic crystals, and optical waveguides. Membrane projection lithography and metal assisted chemical etching are combined to fabricate 100 to 400 nm nanochannels in the sidewalls of patterned Si substrates.