Hiroshi Matsumoto H. Matsumoto, H. Kimura, R. Ueba, K. Yasui, N. Nakayamada, NuFlare Technology
MBM-1000 is a multi-beam mask writer based on the writing system with a blanking aperture array. It is designed to write complex OPC patterns with high throughput with fidelity. It has the pixel level dose correction (PLDC) to correct and enhance dose profile by which small patterns were printed better.