John Randall J.N. Randall, J.H.G. Owen, E. Fuchs, J. Lake, Zyvex Labs
For decades Electron-Beam Lithography (EBL) has been the highest-resolution patterning tool of choice for commercial and research uses. Recent research has demonstrated EBL imitations in the single nm regime. Hydrogen Depassivation Lithography is a different type EBL with sub-nm resolution and precision, and should become the leader in ultra-high- resolution lithography.