Marc Verschuuren Marc Verschuuren

Substrate Conformal Imprint Lithography. High volume NIL production with functional resists
SESSION: 4C – Nanoimprint
DATE: Thursday, May 30, 2019
TIME: 10:20 am
LOCATION: Nicollet D

Substrate Conformal Imprint Lithography. High volume NIL production with functional resists

Marc A. Verschuuren, Philips SCIL Nanoimprint Solutions

Substrate Conformal Imprint Lithography solves the limitations of soft-stamp based NIL and allows low-pressure wafer scale contact and sub-10 nm resolution using soft silicone rubber stamps. Our AutoSCIL platform was extended with wafer-scale overlay, reaching ~1 micron. Results of optical fully inorganic resists with refractive index from n=1.15 to n=2.1.