Ming Lu Abstract:
Pattern transfer, in terms of micro/nanofabrication, refers to the process which transfer the patterns generated from lithography processes to substrate or other materials. This introductory course will provide an overview of both subtractive and additive pattern transfer techniques, including dry etch, wet etch, lift-off and electrochemical deposition. The focus will be on those working in the sub-100-nm critical dimension region. I will use x-ray zone plate fabrication in the case study to compare all these techniques.
Bio:
Ming Lu is a staff scientist in the Center for Functional Nanomaterials of Brookhaven National Laboratory, a U.S. Department of Energy user facility. His research focuses on the exploration of new methods and new materials for nanofabrication, especially for photonics and x-ray microscopy applications. He received his B. S. and M. S. in Physics and Condensed Matter Physics, respectively, from Fudan University, China and Ph.D. in Physics from Stony Brook University, and was an adjunct assistant professor in the department of mechanical engineering of Stony Brook University.