Supriya Jaiswal S.L. Jaiswal, Astrileux Corporation
To manufacture affordable next-generation technology in high volumes, chipmakers will need single-exposure extreme ultraviolet (EUV) lithography using light at 13.5 nm. EUV tools use high power light sources. However, there is a critical need to deploy energy-efficient lithography tools that produce more photons to create affordable, sustainable electronics.