Henry I. (Hank) Smith
MIT
Higher-Efficiency Microlenses for Zone-Plate-Array Lithography
Henry Smith, Mark K. Mondol (MIT); Feng Zhang, Timothy Savas, Michael E. Walsh (LumArray, Inc.)
Improvement to Zone-Plate-Array maskless photolithography performance via diffractive-optical simulation and nanofabrication
About Henry I. (Hank) Smith
Henry I. (Hank) Smith began his work in micro and nanofabrication at MIT Lincoln Lab in 1968, and in 1980 moved to the MIT campus as Professor of Electrical Engineering where he held the Kiethley Chair. He and his colleagues developed a number of innovations in nanoscale science and engineering, including: comformable-photomask lithography, x-ray lithography, the phase-shift mask, the attenuating phase shifter, spatial-phase-locked e-beam lithography, achromatic-interference lithography, coherent-diffraction lithography, zone-plate-array lithography, interferometric mask alignment, graphoepitaxy, directed self-assembly and a variety of quantum-effect, short-channel, single-electron, nanomagnetic and microphotonic devices.
Hank has been a participant in EIPBN since 1968 and chaired the conference in Boston in 1978. He’s a member of the National Academy of Engineering and a Fellow of the American Academy of Arts and Sciences, the IEEE, the Optical Society of America, and the National Academy of Inventors. He’s the recipient of a number of awards including the IEEE Robert N. Noyce Medal. He traveled widely to research labs and meetings around the world and in 2013 retired from teaching and graduate-student supervision. He’s continued to be active in research at his spinoff company, LumArray, Inc., and will report on his recent work at this conference where he claims, at age 86, to be EIPBN’s oldest presenter of research results; a claim that he hopes will be surpassed by others.
Prof. Smith’s nonprofessional interests include tennis and yearly trips, in both winter and summer, to the Canadian Arctic, for hiking, photography and fly fishing for salmon and Arctic char. He has 3 children and 7 grandchildren, all of whom he’s very proud.
Higher-Efficiency Microlenses for Zone-Plate-Array Lithography
Date: Friday, June 2
Time: 10:20 am
Location: Continental 5