Dear Colleagues:

On behalf of the entire conference organization, welcome to the 51st EIPBN Conference and to the Mile High City of Denver. We hope that you will find time to explore this unique city and all it has to offer.

Program Chair Greg Wallraff has put together an outstanding set of plenary and invited talks this year. We have also received a record number of contributed papers, demonstrating the continuing importance of patterning science and the worldwide nature of our industry. I extend my thanks to you, the participants, for all of the time, effort and expense you devoted to EIPBN this year.

The Steering Committee makes a special effort to help young researchers to attend the conference. The financial contributions from Alcatel-Lucent, ASML, Crestec, DARPA/ONR, IBM, JEOL, KLA-Tencor, Maskless Lithography, Molecular Imprints Inc., Nanonex, Raith, Vistec and Zeiss helped make it possible to hold down costs at this conference and to assist students with travel expenses. Further assistance from the National Science Foundation, the American Vacuum Society, the IEEE and the Optical Society of America is also gratefully acknowledged.

On behalf of the Steering Committee, I want to extend very special thanks to Maryann Shaw of JEM Meetings, who is retiring after being our meeting planner for the last 20 years, and to wish her the very best for the future. Thanks also go to Melissa Widerkehr and Wendy Walker of Widerkehr and Associates for their help with meeting registration. Michael Rooks (Web and Systems Operations) and Michael Guillorn (our Commercial Session Chair) from IBM are gratefully acknowledged for their multiple contributions to the conference. Deep appreciation goes to John Randall for again organizing and running the EIPBN Micrograph Contest and to Don Tennant of Cornell University for acting as the EIPBN Financial Trustee. Finally, I would like to thank the staff of the Denver Adam’s Mark Hotel and Zack Strober of The Arrangers DMC for their work in making the conference a success.

Greg and I welcome you to a very exciting week in Denver at EIPBN 2007!

Sincerely,

J. Alexander Liddle

EIPBN 2007 Conference Chair

Dear EIPBN Attendees,

Welcome to Denver and to the 51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication. We have come together from industry, academia, and government from all over the world to discuss issues at the forefront of patterning science and nanofabrication technology.

As we begin the second fifty years of EIPBN we can continue to watch the development of tools and techniques for patterning and fabricating structures and devices with dimensions approaching the molecular scale. In recent years we’ve seen how “top down” lithography technologies developed for the semiconductor industry have been applied to new areas such as biology, medicine and energy. We have also observed the evolution of “bottom up” self assembly techniques and seen how they have been applied in a variety of new nanofabrication techniques. This years program reflects these new directions in technology with sessions on photonics, nanodevices, optical lithography, nanobiology, nanoimprint lithography and special talks on solar energy, “post-CMOS” technology and block copolymer assembly among others.

Assembling the technical program for this conference would have been impossible without the hard work and dedication of many people. Great thanks go to members of the Steering and Advisory Committees, as well as the Section Heads and others who made invaluable suggestions for topics and invited speakers. Special thanks as well to those of you who participated in the critical abstract review process. Many of you will be called upon shortly to review manuscripts for the conference proceedings, which will be published in the Journal of Vacuum Science and Technology. This year we switched to web based online abstract and manuscript handling software and we would like to thank Rich Gerber at softconf.com for his help in customizing the software for to meet EIPBN’s requirements. We also thank Melissa Widerkehr and Corin Ford at Widerkehr and Associates for their indispensable assistance in putting the technical program together. Their outstanding work is much appreciated.

Congratulations to Conference Chair Alex Liddle for the marvelous job he has done in arranging EIPBN 2007 Conference.

Alex and I both express our gratitude to you, the attendees, for ultimately making the conference the success it has been. I hope you enjoy this years conference.

Sincerely yours,

Gregory M. Wallraff

Program Chair, EIPBN 2007