Dear Colleagues:

On behalf of the entire conference organization, welcome to the 52nd EIPBN Conference and to Portland, Oregon, North America’s “Best Big City.” We hope that you will find time to explore this unique city and all it has to offer.

Program Chair Cynthia Hanson has put together an outstanding set of plenary and invited talks this year. We have also received a record number of contributed papers, demonstrating the continuing importance of patterning science and the worldwide nature of our industry. I extend my thanks to you, the participants, for all of the time, effort and expense you devoted to EIPBN this year.

The Steering Committee makes a special effort to help young researchers attend the conference. The financial contributions of ACS Publications, AFOSR, ASML, Crestec, Cymer, DARPA, IBM, JEOL, Molecular Imprints, Nanonex, Raith USA, and Vistec Semiconductor Systems helped make it possible to hold down costs at this conference and to assist students with travel expenses. Further assistance from the National Science Foundation, the American Vacuum Society, the IEEE and the Optical Society of America is also gratefully acknowledged.

On behalf of the Steering Committee, I want to extend very special thanks to Melissa Widerkehr and Wendy Walker of Widerkehr and Associates for their invaluable help with all aspects of the meeting. Michael Rooks (IBM) [Web and Systems Operations]; and Frank Schellenberg (Mentor Graphics), Rob Ilic (Cornell University) and Reginald Farrow (New Jersey Institute of Technology) [the Commercial Session Committee] are gratefully acknowledged for their multiple contributions to the conference. Deep appreciation goes to John Randall for again organizing and running the EIPBN Micrograph Contest and to Don Tennant of Cornell University for acting as the EIPBN Financial Trustee. Finally, I would like to thank the staff of the Portland Hilton and Executive Towers for their work in making the conference a success.

Cynthia and I welcome you to a very exciting week in Portland at EIPBN 2008!

Sincerely,

Steve Brueck

EIPBN 2008 Conference Chair

Dear EIPBN Attendees,

Welcome to Portland and to the 52nd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication. We have come together from industry, academia, and government from all over the world to discuss issues at the forefront of patterning science and nanofabrication technology.

This year’s oral program features special sessions on Nano-patterning and Energy, Line Edge Roughness/Resist, Maskless Lithography, Nano-optics, Photon Beam Technology, Cell Pattern Interactions, Patterned Media/Data Storage. Multiple sessions covering Nanoimprint/Soft Lithography, Nano-photonics, Directed Self Assembly, Direct Write/Beam Induced Processing, and Microscopy/Metrology reflect the continued high level of activity and interest in these areas. Rounding out the program is a noteworthy number of invited and contributed papers and posters that have been carefully selected to cover the leading research associated with electron, ion, and photon beams and nanofabrication.

Assembling the technical program for this conference would have been impossible without the hard work and dedication of many people. Great thanks go to members of the Steering and Advisory Committees, as well as the Section Heads and others who made invaluable suggestions for topics and invited speakers. Special thanks as well to those of you who participated in the critical abstract review process. Many of you will be called upon shortly to review manuscripts for the conference proceedings, which will be published in the Journal of Vacuum Science and Technology. This is the second year we are using a web based online abstract and manuscript handling software and we would like again to thank Rich Gerber at softconf.com for his help in customizing the software for to meet EIPBN’s requirements. We also thank Melissa Widerkehr and Corin Ford at Widerkehr and Associates for their indispensable assistance in putting the technical program together. Their outstanding work is much appreciated.

Congratulations to Conference Chair Stephen Brueck for the marvelous job he has done in arranging EIPBN 2008 Conference.

Steve and I both express our gratitude to you, the attendees, for ultimately making the conference the success it has been. I hope you enjoy this year’s conference.

Sincerely yours,

Cynthia Hanson

Program Chair, EIPBN 2008