Dear Colleagues:
On behalf of the entire conference organization, I welcome you to the 55th EIPBN Conference.
Thanks to your contributions, EIPBN Conference this year received close to 409 abstracts – of which 372 have been accepted either for poster or oral presentation. These papers cover a wide range of topics; not only our traditional Electron, Ion and Photon beam patterning and technology talks, but also sessions on Nano-imprint technology, Nanophotonics, Directed Assembly, MEMS/NEMS, Nano-biology and on Micro-fluidics.
For this excellent program, we must thank Prof. Richard Blaikie of University Canterbury, New Zealand, the EIPBN 2011 Program Chair. His dedication not only to selecting excellent papers, but also aligning sessions to minimize the potential conflicts between overlapping disciplines has been a tremendous amount of work. I think we will all appreciate the results this week.
New to EIPBN will be the Entrepreneurs Challenge for students, post-docs and research associates. This is in response to the overwhelming interest by students in start-ups. Your feedback on this event help keeps the conference fresh with new ideas. Last year the conference experimented with the poster session by moving it front and center to the middle of the first day. Due to the positive feedback for this change we will continue this for EIPBN 2011.
Students are the life blood of our future conferences, and so we have made a special effort to make students welcome, by providing financial discounts on registration, and by giving travel support. We especially like to thank Raith USA, ASML and KLA-Tencor for the grants and financial contributions that help make this possible, Brian Whitehead (Raith USA), Jim Wiley (ASML) and Alan D. Brodie (KLA-Tencor) for facilitating this support.
It is unfortunate that because of budget politics in the US Government our traditional funding organizations have not been able to support the conference at the time of writing this letter.
I’d also like to thank the sponsors of the conference and conference-related events for their support: JEOL USA, KLA-Tencor, Raith USA, Cambridge NanoTech, SEMATECH, Tescan, Vistec, and especially Zyvex Labs for their sponsorship of the Micrograph Contest. We are also grateful to the AVS, IEEE and OSA for their institutional support of the conference.
I’d like to thank Brian Whitehead (Raith USA), Leonidas Ocola (ANL), Reginald Farrow (NJIT), and Rob Ilic (Cornell Univ.) for their help planning the Exhibit/Commercial Session. I am also grateful to Philippe Alexis and Kris Loew (NoDiamonds Web Services) for their help in the EIPBN 2011 Website redesign, to Alan Rowe (Mindful Planet) for the design of his excellent conference logo, and to Frank Schellenberg for his ongoing support of our web and broadcast e-mail presence.
Finally, this conference would not be possible without the logistical support of Melissa Widerkehr and her associate, Corin Ford (Widerkehr and Associates). They have worked very hard to plan the room layouts, AV support, and the meal arrangements you will all now enjoy. This meeting could not happen without them, and we appreciate their time, effort and hard work.
We hope you will find this a memorable conference, and will also take the time while “in the neighborhood” to enjoy the many exciting places Las Vegas and its surrounding areas has to offer.
Sincerely,
Alan D. Brodie, Ph.D.
EIPBN 2011 Conference ChairDear EIPBN11 Attendees,
Welcome to the 55th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, held in sunny Las Vegas! We represent industry, academia, and government organizations from all over the world, and we will be reporting the latest advances in electron-, ion- and/or photonbeam technologies and nanofabrication. This year the electron microscope is 80 years old, it is 15 years since the first reports of nano-imprint lithography at our conference, and it is 1000 years since Ibn alHaytham began writing The Book of Optics. We are celebrating these and other achievements, including new developments such as the helium ion microscope, at the conference this year, as well as looking forward to the potential for semiconductor manufacturing at 15 nm and beyond. It should be exciting and stimulating!
The conference is continuing to grow, with well over 400 submissions again this year. To contain this within 3 days of sessions and only 3 parallel sessions is no easy task. We’ve done this first of all with a large and outstanding poster session. The poster session will be divided into two parts, with lunch served between them and we have given this session prominence by running it immediately following the Plenary Session on Wednesday 1 June. The posters will remain up throughout the conference.
The high quality technical program for this conference would not have been possible without the hard work and dedication of many people. Special thanks go to the members of the Steering and Advisory Committees, to the Section Heads, and to the Reviewers. They have been helpful throughout, guiding the course of the program, selecting invited speakers, and generating over 1500 reviews for the contributed submissions. Thanks also to Alan Brodie, the Conference Chair, and past-chair Frank Schellenberg for sending out countless announcements, Rich Gerber for his help in the computer analysis of the conference papers, Melissa Widerkehr and Corin Ford for their help with the technical program, Leili Baghaei for coordinating the Entrepreneurs’ Challenge and of course to Alan again for making the conference hpen and selecting such a wonderful location.
Most of all, I thank you, the attendees, who ultimately are the conference. Enjoy yourselves, learn a lot, and spread the good word about the conference to your colleagues and collaborators.
Sincerely,
Richard Blaikie
Program Chair, EIPBN 2011