Dear Colleagues:
On behalf of the entire conference organization, I welcome you to the 56th EIPBN Conference.
This is the first time that the conference has been held in Hawaii and I want to thank the gracious staff at the Hilton Waikoloa Village for their support in making it possible. Thanks for your contributions. This year over 400 abstracts were submitted to the EIPBN Conference from 27 countries. From these 366 have been accepted either for poster or oral presentation. These papers cover a wide range of topics; not only our traditional Electron, Ion and Photon beam patterning and technology talks, but also sessions on Nano-imprint technology, Nano-photonics, Directed Assembly, MEMS/NEMS, Nano-biology and on Micro-fluidics. I want to highlight three special sessions on 3DICs, Graphene and Grating Lithography, which have many invited speakers and are not to be missed. We also have a great poster session planned for the middle of the first day.
I would like to thank Prof. Michael Fritze of the Information Sciences Institute at USC, the Program Chair for EIPBN 2012, for putting together such a great series of sessions that are relevant to the technologies that will impact future nanomanufacturing. Mike deserves great applause for the wonderful job he did with this year’s program.
Because of its great success last year we are again offering the Entrepreneurs Challenge for students, post-docs and research associates. I expect this year’s presentations from the finalists to generate very spirited discussions from the panel and audience.
I want to remind you of the importance of the participation of students in our conference. Mainly because of the conference location, we have provided the largest travel support for students this year. We have received major support for student travel from DARPA through the Office of Naval Research and the DOE Office of Science. We especially like to thank Raith USA, ASML and Nikon USA for the grants and financial contributions that help make this possible, Jason Sanabia (Raith USA), Michael Pullen (ASML) and Shane Palmer (Nikon USA) for facilitating this support.
I’d also like to thank the sponsors of the conference and conference-related events for their support: JEOL USA, KLA-Tencor, Raith USA, Tokyo Electron, Vistec, and especially Zyvex Labs for their sponsorship of the Micrograph Contest. We are also grateful to the AVS, IEEE and OSA for their institutional support of the conference.
I’d like to thank Ted Fedynishan of MIT Lincoln Labs for his help planning the Exhibit/Commercial Session. I am also grateful to Philippe Alexis, Anish Blon, and Kris Loew (NoDiamonds Web Services) for their help in the EIPBN 2012 Website redesign, to Jeff Devins of the Hilton Waikoloa for the design of his excellent conference logo, and to Frank Schellenberg for his support of our broadcast e-mail presence.
It is not be possible to express how much the logistical support of Melissa Widerkehr and her associates makes EIPBN 2012 happen. Melissa has been a positive force in every aspect of this conference from the initial hotel selection to the menus and the program. It would be hard to thank her enough, but I suggest that we all try.
Finally, Hawaii is the only place that I have visited where people pull off the road (wherever they are) to watch the sunset. I hope that you surrender to the Aloha spirit and relax and enjoy your stay. Mahalo.
Sincerely,
Reggie Farrow
EIPBN 2012 Conference ChairDear EIPBN12 Attendees,
Welcome to the 56th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, held in beautiful Waikoloa Hawaii! We represent industry, academia, and government organizations from all over the world, and we will be reporting the latest advances in electron-, ionand/or photon-beam technologies and nanofabrication. The conference has come a long way from its modest beginnings serving as the communications forum for important new nanolithography & nanofabrication advances. The conference was an early home for the exciting developments in Nanoimprint for example and continues to have a robust NIL presence today. Traditional strength areas including novel nanolithography, nanofabrication, E-beam& NIL technologies and are well represented. Important newer areas including directed self-assembly, nanophotonics, nanobiology and nanomaterials (like carbon) are coming on strong. This year’s conference includes several special sessions chocked full of invited speakers. The topics covered in these special sessions include 3DIC, Graphene, Solar Cells, Grating-based litho & design and unconventional e-beam & ion sources. The regular sessions are also anchored by a good number of stimulating invited speakers and posters.
The conference is healthy with over 400 submissions again this year. To contain this within 3 days of sessions and only 3 parallel sessions is no easy task. We’ve done this first of all with a large and outstanding poster session. The poster session will be divided into two parts, with lunch served between them and we have given this session prominence by running it immediately following the Plenary Session on Wednesday May 30. There are also a fair number of very high quality invited posters. The posters will remain up throughout the conference. I have done my best to align all the sessions exactly in time but this was not possible to accomplish due to the special sessions with a higher number of Invited speakers than usual. I hope you will bear with me on this.
The high quality technical program for this conference would not have been possible without the hard work and dedication of many people. Special thanks go to the members of the Steering and Advisory Committees, to the Section Heads, and to the Reviewers. They have been helpful throughout, guiding the course of the program, helping select invited speakers, and generating over 1700 reviews for the contributed submissions. Thanks also to Reggie Farrow, the Conference Chair, for sending out countless announcements and working the Website, Rich Gerber for his invaluable help in the computer analysis of the conference papers, Melissa Widerkehr for her help with the technical program, Leili Baghaei-Rad for coordinating the Entrepreneurs’ Challenge, John Randall for working the Micrograph contest and of course to Reggie again for making the conference happen and selecting such a wonderful location.
Most of all, I thank you, the attendees, who ultimately are the conference. Enjoy yourselves, learn a lot, and spread the good word about the conference to your colleagues and collaborators.
Sincerely,
Michael Fritze
Program Chair, EIPBN 2012