Dear Colleagues:

Welcome to the 59th International Conference on Electron, Ion, and Photon Beam Technologies and Nanofabrication (EIPBN). Thank you for continuing to make “3‐Beams” the leading meeting for emerging nanoscale lithography and fabrication research. Our participants from industry, academia, and government submitted over 300 papers this year, and the authors hailed from 25 different countries. As a result, we are honored to have three outstanding plenary speakers, a range of exceptional invited presentations, and an exciting array of contributed papers. The EIPBN community is clearly keeping nanofabrication research strong worldwide and impacting a remarkable variety of application areas.

Thank you to Michael Guillorn from IBM Research for organizing our outstanding program. Dr. Guillorn’s enthusiasm and commitment to technical excellence laid the foundation for this successful meeting. I also want to thank Lawrence Muray from Keysight Technologies for chairing the commercial session along with Ulrich Hofmann (GenISys GmbH.) and Guy DeRose (California Institute of Technology) for their invaluable assistance. We greatly appreciate all of the organizations who are exhibiting and who accelerate our research with their innovative products and services. For the first time, EIPBN is offering a short course in State‐of‐the‐Art Nanofabrication on the opening day of the meeting. Thanks to Deirdre Olynick (Lawrence Berkeley National Laboratory) for organizing this session and to the speakers who are contributing their time and expertise.

EIPBN received generous support for conference activities and student attendance from our sponsors: ASML, GenISys, JEOL, IBM, Intel, Mentor Graphics, Nikon, NuFlare, Raith, STS‐ Elionix, Tokyo Electron, Argonne National Laboratory, Oak Ridge National Laboratory, Lawrence Berkeley National Laboratory, the Department of Energy, the National Institute of Standards, and the National Science Foundation. We cannot thank these organizations enough for their consistent support and for making much of what we do possible. I also want to acknowledge Martin Feldman (Louisiana State University) for organizing this year’s Virtual Job Fair for our student attendees. We are once again endorsed by the American Vacuum Society (AVS), the American Physical Society (APS), the Optical Society of America (OSA) and the Institute of Electrical and Electronics Engineers (IEEE), and we thank them for their continuing commitment to the meeting.

Many others have contributed to the success of EIPBN 2015. Former conference chairs Theodore Fedynyshyn, Leonidas Ocola, Reginald Farrow, and Michael Fritze all offered invaluable advice and assistance with various aspects of the meeting. Nicki Davis (Nicki Davis Art) redesigned and maintained the conference website and artwork, while Terah Schaffer and Kayce Robinson (YesEvents) smoothly managed registration. Cassandra Rogers (University of Kentucky) assisted with many administrative and promotional tasks. The staff of the Manchester Grand Hyatt, particularly Caroline Guerrera and Mary Hernandez, have provided an excellent experience at the host hotel. Finally, thank you to Melissa Widerkehr and Wendy Walker of Widerkehr Associates who expertly handle every detail of the EIPBN conference. They have been part of the 3‐Beams team for many years, assist with every aspect of the meeting, and are essential to its success.

EIPBN first came to San Diego in 1993, returned in 2004, and now we find ourselves here in 2015. Have a great meeting, enjoy the beautiful city before and after, and plan to return for EIPBN 2026.

Sincerely,

J. Todd Hastings

EIPBN 2015 Conference Chair

Dear Attendees,

Welcome to San Diego and to the 59th annual International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN). The EIPBN conference is the oldest continuiously running meeting focussed on lithography. While the conference has grown to encompass several application areas the core content of the conference—advances in high resolution patterning—has remained constant over several decades. For this reason, the EIPBN meeting has established itself as the premiere conference for researchers who push the envelop in patterning and nanofabrication.

The 2015 conference features numerous topics that have become staples at EIPBN including strong sessions on electron beam, ion beam and optical lithography. Directed self assembly-based patterning and nanoimprint lithography also continue to produce innovative results that appeal to a large cross section of our attendees. This year we have expanded the content on beam induced deposition and etching. This field has grown steadily in the past decade and has become a vital technique for academic researchers with direct industrial application. Metrology techniques have been presented at EIPBN for several decades. 2015 is the first year where developments in high throughput, parallel beam or multiple beam scanning electron microscopy has warranted its own session. Application areas like nanophotonics, nanobiotechnology and nanoelectronics remain as core areas of interest. In 2015 we have also introduced a focus session on nanofabrication for quantum computing devices. While experimental quantum computing is certainly not a new field, recent advances in this field have ushered in a resurgeance in research on this topic that can greatly benefit from innovations in nanofabrication. Atomic layer deposition (ALD) has become a standard technique in production CMOS and memory device technologies. We have included a session this year that focuses on novel patterning and nanofabrication applications of ALD. Lastly, the nanoscience user centers sponsored by the US Department of Energy and the US Department of Commerce have long been supporters of EIPBN. A session featuring these centers and results from some of their users was included in the program to highlight the resources available to researchers in our field.

Putting together the program required contributions from a great many people. I truly value the contributions of the entire program committee, as well as the EIPBN advisory and steering committees. In particular I would like to thank Philip Rack, Paul Alkemade and Steven Randolph for their help assembling the beam induced deposition and etching sessions. I would also like to thank David Pappas and Lisa Edge for their assitance in coordinating the session on Nanofabrication for Quantum Computing. Stefano Cabrini and Alex Liddle for putting together the nanoscience user facility session and Karl Berggren and Rebecca Cheung for their advice and perspective as former EIPBN program chairs. In addition, Deirdre Olynick did an outstanding job putting together our first attempt at a short course. Lastly, I want to thank the conference chair, Todd Hastings and conference organizer, Melissa Widerkehr for selecting a fantastic venue and coordinating the logistics for the meeting.

The attendees of EIPBN have organically grown into a community of researchers that span the globe. It is remarkable to note that this community took shape without the benefit of membership in an internationally recognized professional society. I believe this is a result of our collevtive commitment to the technical work presented at the meeting. Beyond that bond, EIPBN attendees have strong ties to eachother that are unlike any other conference I have attended. As one of my colleauges put it, “EIPBN is like a small town that gets together for one week a year”. It was an honor to serve as the program chair of this conference. I am not sure what position in the town government that would make me. I am pretty sure that Todd as the conference chair would be the mayor. That would make me the town clerk possibly? Something to think about. In any case, welcome to EIPBN 2015. I hope you find the conference stimulating and enjoyable. Thank you for attending.

Sincerely,

Michael A. Guillorn

Program Chair, EIPBN 2015