Dear Colleagues:

Welcome to the 60th! International Conference on Electron, Ion, and Photon Beam Technologies and Nanofabrication (EIPBN). Thank you for continuing to make “3-Beams” the leading meeting for emerging nanoscale lithography and fabrication research. Our participants from industry, academia, and government submitted 243 papers this year, and the authors hailed from 24 different countries. As a result, we are honored to have three outstanding plenary speakers, a range of exceptional invited presentations, and an exciting array of contributed papers. The EIPBN community is clearly keeping nanofabrication research strong worldwide and impacting a remarkable variety of application areas.

Thank you to Pat Watson from Princeton University for organizing our outstanding program. Dr. Watson’s enthusiasm and commitment to technical excellence laid the foundation for this successful meeting. I also want to thank Cliff Henderson from Georgia Tech and Lawrence Muray from Keysight Technologies for chairing the commercial session. We greatly appreciate all of the organizations who are exhibiting and who accelerate our research with their innovative products and services. For the second year in a row, EIPBN is offering a short course in State-of-the-Art Nanofabrication on the opening day of the meeting. Thanks to Deirdre Olynick (Lawrence Berkeley National Laboratory) for organizing this session and to the speakers who are contributing their time and expertise. This year, in conjunction with the American Vacuum Society we are also able to offer a course on the Fundamentals of Vacuum Technology and Pumping.

EIPBN received generous support for conference activities and student attendance from our sponsors: ASML, GenISys, JEOL, IBM, Intel, Nikon, NuFlare, Raith, STS-Elionix, and the Department of Energy. We cannot thank these organizations enough for their consistent support and for making much of what we do possible. I also want to acknowledge Martin Feldman (Louisiana State University) for organizing this year’s Virtual Job Fair for our student attendees. I would like to thank Shida Tan (Intel) for organizing our 4th Women in Nanotechnology (WIN) luncheon. We are once again endorsed by the American Vacuum Society (AVS), the American Physical Society (APS) and the Optical Society of America (OSA), and we thank them for their continuing commitment to the meeting.

Many others have contributed to the success of EIPBN 2016. Former conference chairs Theodore Fedynyshyn, Leonidas Ocola, Reginald Farrow, and Todd Hastings all offered invaluable advice and assistance with various aspects of the meeting. Nicki Davis (Nicki Davis Art) updated and maintained the conference website. Finley Hartley provided the 2016 artwork, while Terah Schaffer and Nichole Ballard (YesEvents) smoothly managed registration. NuFlare Technology America, Inc. generously contributed the many working hours that a chair needs to manage a conference. The staff of the Wyndham Grand Downtown Pittsburgh, particularly Tanya McKee, have provided an excellent experience at the host hotel. Finally, thank you to Melissa Widerkehr and Wendy Walker of Widerkehr Associates who expertly handle every detail of the EIPBN conference. They have been part of the 3-Beams team for many years, assist with every aspect of the meeting, and are essential to its success.

This is the first time that EIPBN has been to Pittsburgh, an industrial town that has been rising in the ranks of conference and tourism destinations. Have a great meeting, enjoy the many attractions and fine restaurants this beautiful city has to offer, and plan to return for EIPBN 2016.

Sincerely,

John Hartley

EIPBN 2016 Conference Chair

Greetings Attendees,

Welcome to the 60th Electron, Ion, Photon Beam and Nanofabrication Conference. The program consists of our foundation topics electron, ion, and photon beam lithography, as well as new emphases on areas connected to our roots. We have expanded our pattern transfer topic to 2 sessions, with talks and posters on metal assisted chemical etching, atomic layer etching, and cryo-etching. The two non-beam lithographic technologies tip-based lithography, and of course nanoimprint lithography, are strongly represented.

In order to celebrate the 60th conference, we invited Mark Schattenburg and Steven Chou to present talks in a special session on the history of EIPBN. In conjunction with these talks, conference proceedings dating back to 1959 have been digitized and can be viewed on our eipbn.org website.

Thanks to Chris Horowitz of the Western Pennsylvania Chapter of AVS, we will for the first time be offering a short course on Vacuum Fundamentals and Pumping.

Applications drive these fabrication technologies; presentations on the intersection of biological research and nanofabrication continues to grow along with “traditional” applications in photonics and electronics. Mike Guillorn, the 2015 program chair, created a session on nanofabrication and quantum computing last year; this year we have another solid session on this important topic.

This year we continue another innovation from last year’s program. Deirdre Olynick of Lawrence Berkeley National Laboratory began an all-day nanofabrication short course and it was a great success; she has formed another exciting one this year with the help of Stefano Cabrini. Topics include a review of fabrication techniques relevant to quantum computing, given by one of our invited speakers, Malcolm Carroll of Sandia.

I would like to thank past Program Chairs Karl Berggren and Michael Guillorn for their guidance, and future Program Chairs Stefano Cabrini and Shida Tan, who, in new roles for steering committee members, are the Poster Session chairs this year. Many thanks too to John Hartley, our conference chair, and Melissa Widerkehr, who turned the abstract concept of the program into something concrete.

The program is only exciting if many provide ideas from their areas of expertise. Members of the Steering Committee, Program Advisory Committee, Program Topic Advisors, and the Program Committee are all listed in the program guide and I cannot thank them enough for their help.

Finally, I would like to emphasize that the EIPBN is run by volunteers. There are traditions, but there are few hard rules. If you have an idea, I urge you to contact (next year’s!) conference and program chairs and make a suggestion. If you want to take the lead on growing a new topic or help in other ways, I am sure you will only find encouragement.

Ciao.

Sincerely,

George Patrick Watson

2016 EIPBN Program Chair