Dear EIPBN Community:

Welcome to the 68th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication (EIPBN). Savannah is a new venue for EIPBN, chosen for its historical character. We have 282 attendees from 20 countries, including 78 first time attendees, and over 40 students.

I first attended EIPBN in 2011 in Las Vegas, having moved from Geneva to Zyvex Labs in Dallas 7 months earlier. It was clear that Zyvex Labs attended because of the strong 3-Beams community as much as for the technical value of the conference. John Randall appeared to have been attending since lithography really meant ‘writing in stone’ and of course Zyvex runs the EIPBN Micrograph Contest every year. As we attended over the years, I was also drawn into the community, until at some point, I wanted to serve that same community, by becoming Conference Chair.

The dynamic interactions between attendees, exhibitors, and sponsors, between the academic and the industrial, help define the community feel of EIPBN that makes this conference special. Relationships established in exhibit halls and networking events continue for years and even decades. Thank you to our Platinum Sponsor, KLA; Gold Sponsors AllResist and STS-Elionix; Silver Sponsors Heidelberg Instruments, GenISys and Raith; our Bronze Sponsor, JEOL; and all our exhibitors and sponsors: Amuneal, Beamfox, Cornell NanoScale Science and Technology Facility, Crestec, Dischem, Eulitha, EVG, Fabublox, Ionoptika, Jenoptik, Lab14, MAEBL, Microlight 3D, Nanoscribe, Nuflare, Oregon Physics, SAES, Secure Foundry, TECH-X, Tescan, Tetramem, Tokyo Electron, Tousimis, Trion, Valutek, Vanguard Automation, Vistec Electron Beam, and Zyvex Labs. I also thank our government and society sponsors: AVS, and IEEE Nano. There is also an opportunity for academic nanofabs to sponsor students and highlight their facilities; thank you to the Montana Tech nanotechnology laboratory. Note that contributions to and/or sponsorship of any event does not constitute departmental or institutional endorsement of the specific program, speakers, or views presented.

Program Chair Rick Silver has developed a program with sessions over a broad range of topics. There are several special invited sessions, with leaders in their topics from Ion Beam technology to Bionanotechnology. The program will be kicked off by true giants in our field: Professor Joris Keizer (UNSW/SQC), Professor Deji Akinwande (UT Austin) and Professor Mark Eriksson (U. Wisconsin- Madison). On Thursday morning, we will hold a second plenary session, with Professor Stephen Chou (Princeton) and Anthony Yen (ASML) discussing different approaches to lithography. This will be followed up by a Panel Discussion Thursday afternoon, where we will explore the future of nanolithography.

EIPBN is a run by a dedicated group of volunteer steering committee members working year-round to ensure a successful conference. I am grateful for the dedication by the 2025 steering committee and volunteers: Qiangfei Xia, Chih-Hao Chang, Aimee Price, Wei Wu, Gerald Lopez (Student Lunch & Ops Trustee), Jack Skinner (Commercial Session), Rajesh Menon, Gina Adam, Jack Skinner, and Ming Lu (Short Course). Thank you to our behind-the-scenes team working tirelessly on our behalf: Financial Trustee John Randall; Conference Coordinator Jonni Adams; Nichole Ballard and Yes Events (Registrar); Photographer Mike Huson; and Nicki Davis who manages our website and Guidebook App. I appreciate the efforts of the program committee, abstract reviewers, and volunteers including Regina Luttge, Martha Sanchez and Emine Cagin (WIN); Vishva Ray and Guy DeRose (Commercial Session). Thank you also to our wonderful Advisory Committee for their continued service to the conference and community. Finally thank you to all members of the EIPBN Community for joining us in historic Savannah. Enjoy the conference.

James Owen, DPhil
EIPBN 2025 Conference Chair
Zyvex Labs

Dear EIPBN Community,

I am very excited to welcome you to EIPBN 2025. I have attended many EIPBN conferences since graduate school and consider EIPBN to be the premier forum for the advancement of nanolithography and related methods. It is with great honor that I serve as your Program Chair, and I am dedicated to make this conference both enjoyable and meaningful for all. I hope you enjoy the venue and charm of Savannah and that we have a technologically stimulating and memorable gathering as we work together to advance and evolve the field of nanolithography.

This year’s conference has an increased focus on quantum computing, two-dimensional materials and nanoelectronics. We are also celebrating the 30-year anniversary of nanoimprint with invited speaker sessions, a panel, and a plenary speaker highlighting achievements over the last three decades. We have several exciting focused sessions featuring invited speakers from around the world including advances in the fields of Metasurfaces, EUV, Emerging AI, Nanobiology, and Ion Beam Sources. As scaling and Moore’s Law run into challenges, new methods are needed to continue progress in advanced computing and its applications. What role does EIPBN have and how do we continue to contribute and advance the field of nanolithography and atom-scale fabrication with the increase in heterogeneous packaging. We have sessions on emerging computation architectures such as quantum devices, neuromorphic hardware, and nanoelectronics. We will hear about advances at the forefront of nanolithography using electrons, ions, photons, imprint, and scanning probes. Researchers will present work on emerging applications in nanophotonics, plasmonics, atomically precise fabrication, MEMS/NEMS, and biomedical devices. This year we are having two plenary sessions. We are honored to have five founders and leaders in the fields nanoimprint, EUV lithography, quantum computing and two-dimensional materials. Deji Akinwande, Mark Eriksson, Joris Keiser, Stephen Chou, and Anthony Yen will share their perspectives on the state of the art and future opportunities in quantum information, leading edge lithography using EUV and nanoimprint, and the impact and challenge of materials at the nano or atomic scale.

In addition to our full technical program, EIPBN 2025 will feature several special events that reflect both current trends and our community’s interests. This year, we acknowledge the growing impact of artificial intelligence and the industrial commitment to quantum computing. These trends will reshape our daily lives for years to come and present opportunities and challenges to the nanofabrication sectors. To address this, we have organized a panel discussion on "The Future of Nanolithography: Enabling AI and Quantum Computing." In addition to invited speaker sessions, other highlights include an Industrial Highlights session, the Women in Nanotechnology (WIN) Luncheon, the Conference Banquet, and the Student Mentor Lunch. These events are designed to foster networking and collaboration among all attendees.

I would like to express my deep appreciation to everyone who has played an essential role in in creating the EIPBN 2025 program. Special thanks to our Conference Chair, James Owen, whose tireless efforts have been instrumental in organizing this event. James has unyielding in his efforts to put together an exceptional event and I am immensely grateful for his support and guidance. Furthermore, my heartfelt thanks go to the steering committee, advisory committee, session chairs, paper reviewers, panelists, plenary and invited speakers, all authors, and, of course, all our attendees. Your collective efforts enrich our conference and strengthen our community, ensuring that EIPBN remains a premier event in our field.

Sincerely,
Richard M. Silver, PhD, EIPBN 2025 Program Chair
National Institute of Standards and Technology