A |
| Abe, H. |
Contrast Reversal Effect In SEM Due To Charging |
| Abe, Kazuki |
Hydrogen Radical Cleaning Of Carbon Contamination On EUV Mask |
| Abramson, Justin |
Fabrication Of Nanoscale Bioarrays For The Study Of Cytoskeletal Protein Binding Interactions Using Nano-Imprint Lithography |
| Adam, Konstantinos |
Pattern Specific Optical Models |
| Adesida, Ilesanmi |
The Effects Of Molecular Weight On Resist Evaluation Parameters In Poly(Methylmethacrylate) Developed At Sub-Zero Temperatures |
| Afzali, Ali |
(Invited) Chemical Functionalization For The Selective Placement Of Single-Walled Carbon Nanotubes |
| Ahn, Minseung |
Fabrication Of 200 Nm Period Blazed Transmission Gratings On Silicon-On-Insulator Wafers |
| Akasaka, Satoshi |
Integration Of Electron Beam Lithography With Block Copolymer Self-Assembly For 10nm Scale Nanofabrication |
| Akhadov, E. A. |
Design And Fabrication Of Vertical Nanowire Device Arrays |
| Aktary, M. |
High Density Nanostructure Fabrication by Electron Beam Lithography, Zs. Szabo |
| Albrecht, Tom |
Patterned Magnetic Recording Media |
| Aldana, Rafael |
The Prospects Of Free Electron Analog To Digital Technology |
| Alducin, Juan |
Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities |
| Alkaisi, Maan |
UV Curable Nanoimprint Lithography For Replicating Three Dimensional Structures |
| Alpha, Christopher |
Chip-Based Microfabricated Electrospinning Nozzles |
| Alvaro, Virginie Maffini |
Hybrid High Resolution Lithography (E-Beam/DUV) And Etch Process For Achieving Stacked Nanowire MOSFETs |
| Alvine, Kyle |
Polyhedral Oligomeric Silsesquioxane (POSS) Functional Patterns Directly Fabricated By Nanoimprint Lithography |
| Amatya, Reja |
Fabrication Strategies For Filter Banks Based On Microring Resonators |
| Anazawa, Toshihisa |
Hydrogen Radical Cleaning Of Carbon Contamination On EUV Mask |
| Ancona, Mario G. |
(Invited) Electron-Transparent Cantilevers For TEM Visualization Of Nanodevices |
| Anderson, Christopher |
Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool
Impact Of Base And PAG Loading On Intrinsic Resolution In EUV Resists |
| Anderson, Erik |
Actinic Euv Mask Inspection Beyond 0.25 NA
50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser
Ultra Compact Interferometric Lithography System Realized With A Desk-Top Extreme Ultraviolet Laser |
| Ando, Manabu |
Low Energy Ion Beam Machining Of Si Layer Deposited On An ULE Substrate For EUVL Optics - Evaluation Of Surface Roughness |
| Anikeeva, Polina |
Templated Self-Assembly Of Sub-10nm Quantum Dots |
| Aoki, Nobutada |
Development Of The Compact Low-Energy Soft X-Ray CT Equipment For The Soft Material Structural Analysis |
| Arai, Yoshihiro |
(Invited) Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained From High Resolution Transmission Electron Microscopy |
| Aramaki, Fumio |
Application Of Vector Scanning In FIB Photomask Repair System
Image Quality Improvement In Fib Photomask Repair System |
| Arcamone, Julien |
Dynamic Stencil Lithography On Full Wafer Scale |
| Argitis, Panagiotis |
Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists |
| Argyrakis, Petros |
Plastic Deformation Magnetic Assembly Of Out Of Plane Structures Using Hydrofluoric Acid Vapour Release |
| Artioukov, Igor |
50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser |
| Aryal, Mukti |
Imprinted Large-Scale High Density Polymer Nanopillars For Various Applications
Stability Of HSQ Nano-Lines Defined By E-Beam Lithography |
| Ashkenasy, N. |
Formation Of Nano Holes By An Electron Beam- Induced Etching Process |
| Astolfi, David |
Contributions Of Resist Polymers To Innate Material Roughness |
| Attwood, David |
50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser |
| Auth, Nicole |
(Invited) Applications Of Focused Electron Beam Processing |
| Ay, Feridun |
Reducing Optical Losses In Focused-Ion-Beam Etched Silicon |
| Azpiroz, Jaione Tirapu |
(Invited) The Role Of Computational Modeling In Semiconductor Lithography:Progressing Towards The Virtual Fab |
B |
| Babin, S. |
Contrast Reversal Effect In SEM Due To Charging
Modeling Of Charge And Discharge In Scanning Electron Microscopy |
| Baets, Roel |
Reducing Optical Losses In Focused-Ion-Beam Etched Silicon
Focused-Ion-Beam Lithography For Prototyping Of Silicon Photonic Components |
| Bahm, A. S. |
Range Of Validity Of Field Emission Equations |
| Bai, Shufeng |
Fabrication Of Wafer-Scale Nano-Split-Ring Metamaterials By Nanoimprint Without Direct-Write In Mold Making |
| Baldi, Antoni |
Impedimetric Biosensing With Interdigitated Arrays Of Nano Electrodes Fabricated By Nanoimprint Lithography |
| Banine, Vadim |
Extreme Ultraviolet Lithography: Status And Prospects |
| Bao, Tianming |
Enabling Nanometrology For High Aspect Ratio Structures With Carbon Nanotube AFM Probes |
| Baranov, Leonid |
A Modeling Approach For Shot Noise Effect On Feature Roughness |
| Barbastathis, George |
Carbon Nanotube-Based Magnetic Actuation Of Origami Membranes |
| Barwicz, Tymon |
(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices |
| Basnar, B. |
Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates |
| Baudemprez, Bart |
Experimental Validation Of Full-Field Extreme Ultraviolet Lithography Flare And Shadowing Corrections |
| Bawendi, Moungi |
Templated Self-Assembly Of Sub-10nm Quantum Dots |
| Bazin, Arnaud |
Impact Of Plasma Etching Processes On 193 nm Photoresist: Etch Resistance And Line Width Roughness |
| Bean, Jeffrey |
Thermal Infrared Detection Using Antenna-Coupled Metal-Oxide-Metal Diode Detectors |
| Belau, Leonid |
The Effects Of Wet And Dry Cleaning Methods On The Chemical Composition And Morphology Of The Ru Capping Layer Of The Extreme Ultraviolet (EUV) Mask Blanks |
| Bellan, Leon |
Chip-Based Microfabricated Electrospinning Nozzles |
| Benschop, Jos |
Extreme Ultraviolet Lithography: Status And Prospects |
| Berger, Ruediger |
Guided Phase Separation Of Polymer Blends For Patterns Varying From Micron To Nanometer Length Scales |
| Berggren, K. K |
Sub-15 Nm Half-Pitch Nanoimprint Molds Using High Resolution Negative Tone Resist And Reactive Ion Etching |
| Berggren, Karl |
Optimum Exposure Parameters For High-Resolution Scanning Electron Beam Lithography
Hydrogen Silsesquioxane Nano-Posts As Decoys For Guiding The Self-Assembly Of Block Copolymers
Templated Self-Assembly Of Sub-10nm Quantum Dots |
| Berghe, Gerard ten |
(Invited) MAPPER: High Throughput Maskless Lithography |
| Bernstein, Gary |
Thermal Infrared Detection Using Antenna-Coupled Metal-Oxide-Metal Diode Detectors |
| Bertagnolli, Emmerich |
Effect of Microstructures on Growth of Human Epithelial Layers
Effect Of Gaseous Additives On Electron Beam Induced Deposition |
| Berton, Kevin |
Capillary Forces Assembly In Microfluidic Cell: Faster Assembly By Accelerating The Particles Convective Flux And Integration Into Complex Pattern |
| Biasis, Nicolas |
Fabrication Of Elastometer Pillar Arrays With Modulated Stiffness For Cellular Force Measurements |
| Bita, Ion |
Hydrogen Silsesquioxane Nano-Posts As Decoys For Guiding The Self-Assembly Of Block Copolymers |
| Blaikie, Richard |
(Invited) Silver Superlenses For Near-Field Optical Nanolithography
UV Curable Nanoimprint Lithography For Replicating Three Dimensional Structures |
| Bogdanski, Nicolas |
Contact Angles In A Thermal Imprint Process
Quality Assessment Of Anti-Sticking Layers For T-NIL |
| Bokor, Jeff |
Patterned Epitaxial Nanomagnets For Novel Logic Devices
(Invited) DNA Directed Assembly Of Nanoparticles Linear Structure For Nanophotonics |
| Bokor, Jeffrey |
Capacitive Characterization Of The Schottky Contact Between Metal And Semiconducting Carbon Nanotube
Spin-Dependent Scattering Off Neutral Donors In Silicon Field-Effect Transistors |
| Bollepalli, Srinivas |
(Invited) Advanced Imaging Via Pixelated Phase Masks And Inverse Lithography
Effect Of Microstructure On Deprotection Kinetics In Photoresist |
| Boolchand, Punit |
Relief And Trench Formation On Chalcogenide Thin-Films Using Electron Beams |
| Borisov, S. |
Contrast Reversal Effect In SEM Due To Charging
Modeling Of Charge And Discharge In Scanning Electron Microscopy |
| Borodovsky, Yan |
(Invited) Advanced Imaging Via Pixelated Phase Masks And Inverse Lithography |
| Borrisé, Xavier |
Impedimetric Biosensing With Interdigitated Arrays Of Nano Electrodes Fabricated By Nanoimprint Lithography |
| Botman, Aurelien |
Focused Electron-Beam-Induced Deposition Of Platinum At Very Low Landing Energies
Investigation Of Morphological Changes In Platinum Nano-Structures Created By Focused Electron-Beam-Induced Deposition |
| Bourov, Anatoly |
Aluminum Oxides As Metamaterials For Enhancement Of 193nm Lithography |
| Boussey, Jumana |
Epoxy Silsesquioxane Resists For UV Nanoimprint Lithography
Comparison Of Monomer And Polymer Resists In Thermal Nanoimprint Lithography |
| Bozano, Luisa |
Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces |
| Brainard, Robert |
Impact Of Base And PAG Loading On Intrinsic Resolution In EUV Resists |
| Bratkovski, Alexandre |
Tunable Optical Gain For Negative Index Materials By Integration Of Near-Infrared Emitting Nanocrystals |
| Bratkovsky, Alexander |
Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies |
| Braun, Paul |
Inorganic Photoresist Materials For Direct Fabrication Of 3D Photonic Crystals Using Phase Mask Lithography |
| Brewer, Courtney |
50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser |
| Brianceau, Pierre |
Improvement Of High Resolution Lithography Capabilities By Using Amorphous Carbon Hard Masks
Hybrid High Resolution Lithography (E-Beam/DUV) And Etch Process For Achieving Stacked Nanowire MOSFETs |
| Bristol, Robert |
Impact Of Trench Width Roughness On The Directed Self-Assembly Of Block Copolymers On Topographic Substrates |
| Brizuela, Fernando |
50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser |
| Bronsgeest, Merijn |
Effect Of The Electric Field On The Decay Of A Schottky Electron Emitter Tip End: A Step Flow Model |
| Brooks, Cynthia |
Patterned Media Using Step And Flash Imprint Lithography |
| Brown, Devin |
Direct Patterning Of Plasma Enhanced Chemical Deposition Silicon Dioxide By Electron Beam Lithography |
| Brueck, Steven |
Fabrication Of Porous Nanochannels Using Nanoparticles And Application To The Transport Of DNA Molecules |
| Bruenger, Wilhelm |
Guided Phase Separation Of Polymer Blends For Patterns Varying From Micron To Nanometer Length Scales |
| Brugger, Juergen |
Dynamic Stencil Lithography On Full Wafer Scale |
| Budach, Michael |
(Invited) Applications Of Focused Electron Beam Processing |
| Bulovic, Vladimir |
(Invited) Nanostructured Optoelectronics
Templated Self-Assembly Of Sub-10nm Quantum Dots |
| Bunk, Oliver |
In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS |
| Burghard, Marko |
(Invited) Catalyst Patterning For Carbon Nanotube Growth On Elevating Posts By Self-Aligned Double-Layer Electron Beam Lithography |
| Burr, Geoffrey W. |
(Invited) Storage Class Memory |
| Butschke, J. |
Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates |
| Buyukserin, Fatih |
Imprinted Large-Scale High Density Polymer Nanopillars For Various Applications |
C |
| Cabrini, Stefano |
An Alternative Electron Beam Exposure Mechanism For Hydrogen Silsesquioxane – A Raman And FTIR Study
Quasi-Zero Average Refractive Index Photonic Crystals Metamaterials Collimating Infrared Light Over Large Scale
(Invited) DNA Directed Assembly Of Nanoparticles Linear Structure For Nanophotonics |
| Cahill, David |
Inorganic Photoresist Materials For Direct Fabrication Of 3D Photonic Crystals Using Phase Mask Lithography |
| Cann, Susan |
Contributions Of Resist Polymers To Innate Material Roughness |
| Cao, Heidi |
Impact Of Trench Width Roughness On The Directed Self-Assembly Of Block Copolymers On Topographic Substrates |
| Cardozo, B. L. |
Fabrication Of Organic Light Emitting Diode Arrays By Reversal Imprint Lithography
Control of DNA Motion in Microchannels Integrated with Dual Electrodes |
| Carlton, David |
Patterned Epitaxial Nanomagnets For Novel Logic Devices |
| Castaldo, Vincenzo |
Sputtering Limits Versus Signal To Noise Limits In The Observation Of Sn Balls In A Ga Ions Microscope |
| Ceperley, Daniel |
Quantitatively Engineering Surface Plasmon Coupling Through Computer Simulation |
| Cerrina, Franco |
40 Nm Pitch Extreme Ultraviolet Interferometric Lithography |
| Cha, Jennifer |
Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces |
| Chandhok, Manish |
Improvement In Line Width Roughness (LWR) By Post-Processing |
| Chang, Allan |
Quasi-Zero Average Refractive Index Photonic Crystals Metamaterials Collimating Infrared Light Over Large Scale |
| Chang, Chih-Hao |
Spatial-Frequency Multiplication With Multilayer Interference Lithography |
| Chang, Chih-hung |
Biofunctionalization For Enhanced Photoluminescence Of Nanopatterned Silica From The Diatom Cyclotella Sp. |
| Chang, S.H. |
Diffusers With Both Surface-Relief And Particle-Diffusing Functions Fabricated Using Hybrid Extrusion Roller Embossing |
| Chang, Wen-Huei |
3D Mask Topographic Effects In EUV Lithography |
| Chao, Liang-Chiun |
ZnO Nanowires Grown On Cone-Shaped Zinc Nanostructures By Thermal Oxidation |
| Chao, Weilun |
50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser |
| Chaturvedi, Pratik |
λ/12 Sub-wavelength Optical Lithography With A Smooth Superlens |
| Chau, K. |
(Invited) Nanophotonics Lab-On-A-Chip Sculpted By Focused-Ion-Beam Milling: Direct Characterization Of Negative-Index Metamaterials Operating In The Visible |
| Chen, Charlie Chung-ping |
Abbe-SVD: Compact Abbe’s Kernel Generation For Microlithography Aerial Image Simulation Using Singular- Value Decomposition Method |
| Chen, Chun-Chi |
Protein-Induced Electrical Variation On Gold-Silicide Embedded Nanowires
Hybridization Sensing By Electrical Enhancement With Nanoparticles In Nano-Gap |
| Chen, H. L. |
Using Colloidal Lithography To Fabricate Semitransparent Metal Anodes In Organic Solar Cells
Using Reversal Imprint Lithography To Pattern Textured Metal Fims For Surface Plasmonic Device Applications |
| Chen, Hsuen-Li |
3D Mask Topographic Effects In EUV Lithography |
| Chen, S. H. |
Using Reversal Imprint Lithography To Pattern Textured Metal Fims For Surface Plasmonic Device Applications |
| Chen, T. H. |
Using Reversal Imprint Lithography To Pattern Textured Metal Fims For Surface Plasmonic Device Applications |
| Chen, Yifang |
Electron Beam Lithography For Distributed Bragg Reflectors In SU-8 |
| Cheng, Joy |
Polymer Self-Assembly For Nanopatterning |
| Cheng, Mosong |
Superfocusing Of Light Using A Metallic/Dielectric Nano-Optic Lens
Focusing Of Plasmonic Micro Zone Plate-Based Metallic Structures Covered By A Dielectric Layer |
| Cheng, Sulin |
Interdigitated Electrode Structures For Osteoblast Growth Studies |
| Cheng, Xing |
(Invited) Stability Of Self-Assembled Monolayer Surfactant Coating In Thermal Nanoimprint
Improving Organic Thin-Film Transistor Performance By Nanoimprint-Induced Chain Ordering
Microfluidic MDM Structure As A Tunable Optical Filter
Optical Antennas: A Boost For Infrared Detection
Solvent-Etching And Dewetting Techniques For Residual Layer Removal In Thermal Nanoimprint |
| Cheng, Yang-Chun (Jeff) |
40 Nm Pitch Extreme Ultraviolet Interferometric Lithography |
| Cheung, Rebecca |
Electrothermal Actuation Studies On Silicon Carbide Resonators
Plastic Deformation Magnetic Assembly Of Out Of Plane Structures Using Hydrofluoric Acid Vapour Release |
| Chiang, Jerry |
Abbe-SVD: Compact Abbe’s Kernel Generation For Microlithography Aerial Image Simulation Using Singular- Value Decomposition Method |
| Chiu, Jerrin |
Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool |
| Chiu, T-W. |
Protein-Induced Electrical Variation On Gold-Silicide Embedded Nanowires |
| Cho, Han Ku |
Resist Charging Effect In Photomask: Its Impact On Pattern Placement Error And Critical Dimension |
| Cho, Han-Ku |
Effects Of Mask Absorber Structures On The EUV Lithography
Coherent Euv Scattering Microscopy |
| Choi, Jin |
Resist Charging Effect In Photomask: Its Impact On Pattern Placement Error And Critical Dimension |
| Choi, Kai |
(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status |
| Choi, Kang-Hoon |
Detailed Characterization Of HSQ For E-Beam Application In DRAM Pilot Line Environment |
| Choi, S. G. |
Design And Fabrication Of Vertical Nanowire Device Arrays |
| Choi, Sookyung |
The Effects Of Molecular Weight On Resist Evaluation Parameters In Poly(Methylmethacrylate) Developed At Sub-Zero Temperatures |
| Chou, Stephen |
Fabrication Of Wafer-Scale Nano-Split-Ring Metamaterials By Nanoimprint Without Direct-Write In Mold Making
Graphene Transistors Fabricated Via Transfer-Printing In Device Active-Areas On Large Wafer
(Invited) Quantized-Patterning Using Nanoimprinted-Blanks
Buried Silicon Dioxide Nanochannels Fabricated By Nanoimprint, Etching And Self-Sealing, Self-Limited Thermal Oxidation
Fabrication And Measurement Of Solar-Blind Aluminum Nano-Grid UV Filters By Nanoimprint Lithography And Edge Patterning
A Novel Method For Fabricating Sub-16 Nm Footprint T-Gate Nanoimprint Molds |
| Chouiki, Mustapha |
Epoxy Silsesquioxane Resists For UV Nanoimprint Lithography |
| Chow, Edmond |
Efficient Nanoscale Pattern Transfer Process For Porous Silicon |
| Chu, Tieh-Chi |
Hybridization Sensing By Electrical Enhancement With Nanoparticles In Nano-Gap |
| Chuang, S. Y. |
Using Colloidal Lithography To Fabricate Semitransparent Metal Anodes In Organic Solar Cells
Using Reversal Imprint Lithography To Pattern Textured Metal Fims For Surface Plasmonic Device Applications |
| Chuang, V.P. |
(Invited) Si-Containing Block Copolymers For Self-Assembled Nanolithography Applications |
| Chun, Ik-Su |
Efficient Nanoscale Pattern Transfer Process For Porous Silicon |
| Ciou, J.R. |
Diffusers With Both Surface-Relief And Particle-Diffusing Functions Fabricated Using Hybrid Extrusion Roller Embossing |
| Ciou, Tzu-Chien |
Large-Area Microlens Arrays Fabricated By Integrated Gas-Assisted UV-Curing Embossing With UV-LED Array Lamp |
| Comboroure, Corinne |
Improvement Of High Resolution Lithography Capabilities By Using Amorphous Carbon Hard Masks
Hybrid High Resolution Lithography (E-Beam/DUV) And Etch Process For Achieving Stacked Nanowire MOSFETs |
| Cord, Bryan |
Optimum Exposure Parameters For High-Resolution Scanning Electron Beam Lithography
Templated Self-Assembly Of Sub-10nm Quantum Dots |
| Corso, Tom |
Chip-Based Microfabricated Electrospinning Nozzles |
| Couladouros, Elias |
Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists |
| Coyne , Edward |
Superzone Blazed Phase Solid Immersion Diffractive Optics For Enhanced Near-Infrared Scanning Laser Microscopy |
| Craighead, Harold |
Chip-Based Microfabricated Electrospinning Nozzles
Optical Excitation Of In-Plane Modes Of Nanoelectromechanical Oscillators For Selective Detachment Of Microspheres |
| Craver, Barry |
An Atom Beam Lithography Tool For Fabricating Dense Nanostructure Arrays |
| Crnogorac, Filip |
Low Temperature Limits For Nano-Graphoepitaxy Of Semiconductors
Preferential Orientation Effects In Partial Melt Laser Crystallization Of Silicon |
| Crozier, P.A. |
(Invited) 1 nm Patterning |
| Cui, Dehu |
Improving Organic Thin-Film Transistor Performance By Nanoimprint-Induced Chain Ordering |
| Cunge, Gilles |
Impact Of Plasma Etching Processes On 193 nm Photoresist: Etch Resistance And Line Width Roughness |
| Curri, Lucia |
Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities |
D |
| Dahlem, Marcus |
(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices
Fabrication Strategies For Filter Banks Based On Microring Resonators |
| Dai, Ding |
X-Ray Diffraction Microscopy: Reconstruction With Partial Magnitude And Spatial A Priori Information |
| Dalby, M. |
(Invited) Controlling Cell Behaviour Using Nanopatterned Surfaces |
| Dardano, Principia |
Quasi-Zero Average Refractive Index Photonic Crystals Metamaterials Collimating Infrared Light Over Large Scale |
| David, Christian |
Fabrication Of Fresnel Zone Plates By Holography In The Extreme Ultraviolet Region |
| Davis, Ronald W. |
Impedance Modulation In Coaxial Nanoneedle Biosensor
Multicriteria Optimization In Sensor Design And Fabrication For DNA Thermosequencing Platform |
| de Boer, Guido
| (Invited) MAPPER: High Throughput Maskless Lithography |
| De Girolamo, Julia |
Epoxy Silsesquioxane Resists For UV Nanoimprint Lithography |
| De La Rue, Richard |
Optical Characterisation Of An HSQ Lithography Process |
| de Pablo, Juan |
In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS |
| De Ridder, Rene. M. |
Reducing Optical Losses In Focused-Ion-Beam Etched Silicon |
| de Winter, Matthijs |
Focused Electron-Beam-Induced Deposition Of Platinum At Very Low Landing Energies |
| Dean, Kim |
Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool
Impact Of Base And PAG Loading On Intrinsic Resolution In EUV Resists |
| Denham, Paul |
Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool |
| DeRose, Guy |
Diffractive Optical Element Fabrication By Electron Beam Lithography |
| Dew, S.K. |
High Density Nanostructure Fabrication by Electron Beam Lithography, Zs. Szabo |
| Dhawan, Anuj |
FIB Fabrication Of Metallic Nanostructures On End-Faces Of Cleaved Optical Fibers For Chemical Sensing Applications |
| Dhuey, Scott |
Quasi-Zero Average Refractive Index Photonic Crystals Metamaterials Collimating Infrared Light Over Large Scale |
| Diebold, Ulrike |
Model Studies Of The Photocatalytic Removal Of Carbon From Titanium Dioxide |
| Dietzel, Andreas |
Guided Phase Separation Of Polymer Blends For Patterns Varying From Micron To Nanometer Length Scales |
| Ding, Baoquan |
(Invited) DNA Directed Assembly Of Nanoparticles Linear Structure For Nanophotonics |
| Ding, Yifu |
Continuous Patterns With Height Gradients By Nanoimprint Lithography And Thermal Gradient Annealing
Polyhedral Oligomeric Silsesquioxane (POSS) Functional Patterns Directly Fabricated By Nanoimprint Lithography |
| Dionne, J. |
(Invited) Nanophotonics Lab-On-A-Chip Sculpted By Focused-Ion-Beam Milling: Direct Characterization Of Negative-Index Metamaterials Operating In The Visible |
| Dobberstein, Harald |
(Invited) Applications Of Focused Electron Beam Processing |
| Dobisz, Elizabeth |
Integration Of Electron Beam Lithography With Block Copolymer Self-Assembly For 10nm Scale Nanofabrication |
| Dobisz, Elizabeth |
65mm Disk Patterning At 500 Gb/In2 With Full Surface Area Coverage From Diblock Copolymer Templates |
| Doi, Toshio |
Application Of Vector Scanning In FIB Photomask Repair System
Image Quality Improvement In Fib Photomask Repair System |
| Dokania, Anand |
Transformation Of Polycrystalline Tungsten To Monocrystalline Tungsten W(100) And Its Potential Application In Schottky Emitters |
| Doktycz, Mitchel |
Development Of Nanoporous Picoliter Reaction Vessels For The Characterization Of Biochemical Systems |
| Downes, Ian |
X-Ray Diffraction Microscopy: Reconstruction With Partial Magnitude And Spatial A Priori Information |
| Doyle, Hugh |
Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities |
| Dresden, Qimonda |
Detailed Characterization Of HSQ For E-Beam Application In DRAM Pilot Line Environment |
| Dresden, TU |
Detailed Characterization Of HSQ For E-Beam Application In DRAM Pilot Line Environment |
| Drezner, Yariv |
E-Beam Nano-Machining For Circuit Edit: An Invasiveness Study |
| Dror, Raphi |
Inorganic Photoresist Materials For Direct Fabrication Of 3D Photonic Crystals Using Phase Mask Lithography |
| Drygiannakis, Dimitrios |
Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists |
| Dupre, Cecilia |
Hybrid High Resolution Lithography (E-Beam/DUV) And Etch Process For Achieving Stacked Nanowire MOSFETs |
E |
| Ebm, Christof |
Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates |
| Economou, Nicholas |
(Invited) Elemental Analysis With The Helium Ion Microscope |
| Eder-Kapl, Stefan |
Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates |
| Edinger, Klaus |
(Invited) Applications Of Focused Electron Beam Processing |
| Efremov, Mikhail |
40 Nm Pitch Extreme Ultraviolet Interferometric Lithography |
| Elata, David |
Mask-Less Wet Etching Using Laser Induced Local Heating |
| Emley, Nathan |
Patterned Epitaxial Nanomagnets For Novel Logic Devices |
| Ercole, Mario |
Enabling Nanometrology For High Aspect Ratio Structures With Carbon Nanotube AFM Probes |
| Ernst, Thomas |
Hybrid High Resolution Lithography (E-Beam/DUV) And Etch Process For Achieving Stacked Nanowire MOSFETs |
| Ersani, Charles Rettner, M. |
Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces |
| Esfandyarpour, Hesaam |
Impedance Modulation In Coaxial Nanoneedle Biosensor
Multicriteria Optimization In Sensor Design And Fabrication For DNA Thermosequencing Platform |
| Estroff, Andrew |
Aluminum Oxides As Metamaterials For Enhancement Of 193nm Lithography |
| Estroff, Andrew |
Photomask Image Enhancement Using Grating Generated Surface Waves |
F |
| Fang, Nicholas |
λ/12 Sub-wavelength Optical Lithography With A Smooth Superlens |
| Farrar, Nigel |
Improving Lithography Pattern Fidelity And Line-Edge Roughness By Reducing Laser Speckle |
| Farrow, Reginald |
Self-Assembly Of Individual Vertically Aligned Carbon Nanotubes |
| Fay, Patrick |
Thermal Infrared Detection Using Antenna-Coupled Metal-Oxide-Metal Diode Detectors |
| Faynot, Olivier |
Improvement Of High Resolution Lithography Capabilities By Using Amorphous Carbon Hard Masks |
| Fazio, Teresa |
(Invited) Nanoscale “Curtain Rods” For The Study Of Protein-DNA Interactions |
| Fedynyshyn, Theodore |
Contributions Of Resist Polymers To Innate Material Roughness |
| Fernandez-Cuesta, Irene |
Impedimetric Biosensing With Interdigitated Arrays Of Nano Electrodes Fabricated By Nanoimprint Lithography |
| Fernández-Sánchez, César |
Impedimetric Biosensing With Interdigitated Arrays Of Nano Electrodes Fabricated By Nanoimprint Lithography |
| Fetter, Linus |
Self-Assembly Of Individual Vertically Aligned Carbon Nanotubes |
| Fink, Marion |
Design Of Polymers For Thermal Nanoimprint Lithography Based On Rheological Investigations |
| Fleischer, Monika |
(Invited) Catalyst Patterning For Carbon Nanotube Growth On Elevating Posts By Self-Aligned Double-Layer Electron Beam Lithography |
| Fokkema, Emile |
Brightness Measurements Of A Gallium Liquid Metal Ion Source |
| Foos, Edward E. |
(Invited) Electron-Transparent Cantilevers For TEM Visualization Of Nanodevices |
| Fornof, Ann |
Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces |
| Fotowat, Haleh |
A Multi-Electrode Cuff For Neuronal Sensing In The Locust |
| Fowlkes, Jason |
Development Of Nanoporous Picoliter Reaction Vessels For The Characterization Of Biochemical Systems
(Invited) Maskless Nanolithography Approaches Utilizing Electron-Beam-Induced Deposition
Mass–Transport And Reaction-Rate Limited Growth Modes During Electron–Beam Induced Deposition |
| Frankel, Robert |
Aluminum Oxides As Metamaterials For Enhancement Of 193nm Lithography |
| Frasure, Kent |
Improvement In Line Width Roughness (LWR) By Post-Processing |
| Frendberg, Eric |
(Invited) Advanced Imaging Via Pixelated Phase Masks And Inverse Lithography |
| Friedli, Vinzenz |
Optimization Of Nozzle-Based Gas Injection Systems For Focused Electron- And Ion- Beam Induced Processing
Stiffness, Density And Quality Of High Aspect Ratio Cu/C Nanostructures Produced By Focused Electron-Beam Induced Deposition |
| Frommer, Jane |
Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces |
| Fryer, David |
Effect Of Microstructure On Deprotection Kinetics In Photoresist |
| Fu, Peng-Fei |
Structure-Property Relationship Of Photocurable Silsesquioxane Resists For Nanoimprint Lithography |
| Fu, Tsu-Yi |
Gas Field Ion Source From An Ir/W<111> Single-Atom Tip |
| Fu, Zengli |
Graphene Transistors Fabricated Via Transfer-Printing In Device Active-Areas On Large Wafer |
| Fujii, Toshiaki |
(Invited) Transmission Electron Microscopy Sample Preparation Employing A "Triple" Beam Instrument |
| Fujita, Jun-ichi |
Multilevel Visualization Of The Local Electric Field At A Sharp Probe Apex By Scanning Electron Microscopy |
G |
| Gabbiani, Fabrizio |
A Multi-Electrode Cuff For Neuronal Sensing In The Locust |
| Gabor, Nathaniel |
(Invited) Speed and Spin-Orbit: New Results in Carbon Nanotubes |
| Gadegaard, Nicolaj |
(Invited) Controlling Cell Behaviour Using Nanopatterned Surfaces |
| Gaeta, Alexander |
(Invited) Speed and Spin-Orbit: New Results in Carbon Nanotubes |
| Gale, Debra |
Biofunctionalization For Enhanced Photoluminescence Of Nanopatterned Silica From The Diatom Cyclotella Sp. |
| Gallatin, Gregg |
Impact Of Base And PAG Loading On Intrinsic Resolution In EUV Resists |
| Gamble, Thomas |
Fabrication Of Porous Nanochannels Using Nanoparticles And Application To The Transport Of DNA Molecules |
| Gan, Fuwan |
(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices |
| Gao, Jinming |
Imprinted Large-Scale High Density Polymer Nanopillars For Various Applications |
| García, Jesús |
Impedimetric Biosensing With Interdigitated Arrays Of Nano Electrodes Fabricated By Nanoimprint Lithography |
| Gautam, D.R. |
Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists |
| Gauzner, Gene |
Patterned Media Using Step And Flash Imprint Lithography
Challenges In 1 Teradot/In.2 Dot Nanoimprint Lithography For Bit-Patterned Media |
| Geiss, Reinhard |
Fabrication Of Large-Area Negative-Index Metamaterial By Electron-Beam-Lithography |
| George, Matthew |
Inorganic Photoresist Materials For Direct Fabrication Of 3D Photonic Crystals Using Phase Mask Lithography |
| Gerhold, Michael |
FIB Fabrication Of Metallic Nanostructures On End-Faces Of Cleaved Optical Fibers For Chemical Sensing Applications |
| Ghassemi, Saba |
Fabrication Of Elastometer Pillar Arrays With Modulated Stiffness For Cellular Force Measurements |
| Ghatnekar-Nilsson, Sara |
Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography |
| Gil, Dario |
(Invited) The Role Of Computational Modeling In Semiconductor Lithography:Progressing Towards The Virtual Fab |
| Gleeson, James |
FIB Fabrication Of Metallic Nanostructures On End-Faces Of Cleaved Optical Fibers For Chemical Sensing Applications |
| Gnan, Marco |
Optical Characterisation Of An HSQ Lithography Process |
| Goethals, Mieke |
Experimental Validation Of Full-Field Extreme Ultraviolet Lithography Flare And Shadowing Corrections |
| Gogolides, Evangelos |
(Invited) High-Aspect-Ratio Plasma-Induced Nanotexturing Of Polymers (PDMS PMMA, PEEK, ...) For Protein Adsorption Applications
Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists |
| Goldberg, Kenneth |
Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool
Actinic Euv Mask Inspection Beyond 0.25 NA |
| Goldner, A. |
Formation Of Nano Holes By An Electron Beam- Induced Etching Process |
| Gonsalves, Kenneth |
Understanding The Effects Of Photoacid Distribution Homogeneity And Diffusivity On Lithography Performance In Polymer-Bound PAG Photoresists |
| Goodman, Russell |
Contributions Of Resist Polymers To Innate Material Roughness |
| Gopalakrishnan, Kailash |
(Invited) Storage Class Memory |
| Gotkis, Yehiel |
(Invited) Interfacial Mesoscopic Structuring As A Highly Probable Origin Of The Mysterious “LER Fundamental 5nm Limit“ |
| Gourgon, Cecile |
NIL Processes And Material Characterization On Transparent Substrates For Optical Applications, Nicolas Chaix |
| Gourgon, Cécile |
Comparison Of Monomer And Polymer Resists In Thermal Nanoimprint Lithography |
| Goyal, Amit |
Self-Assembly Of Individual Vertically Aligned Carbon Nanotubes |
| Graczyk, Mariusz |
Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography |
| Gray, Stephen |
Fabrication Of Metallic Nano-Slit Waveguides With Sharp Bends |
| Greene, Eric |
(Invited) Nanoscale “Curtain Rods” For The Study Of Protein-DNA Interactions |
| Greenzweig, Yuval |
E-Beam Nano-Machining For Circuit Edit: An Invasiveness Study |
| Gross, Gerard |
(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status |
| Gross, Gerhard |
(Invited) Projection Mask-Less Patterning (PMLP) For Nanotechnology Applications |
| Groves, Jay |
(Invited) Deconstructing Receptor Signaling With Nanopatterned Supported Membranes |
| Gruetzner, Gabi |
Design Of Polymers For Thermal Nanoimprint Lithography Based On Rheological Investigations |
| Guan, Yingfeng |
(Invited) Maskless Nanolithography Approaches Utilizing Electron-Beam-Induced Deposition |
| Gunther, Norman |
Fabrication Of Carbon Nanotube Field Emission Guns For Potential Maskless Lithography |
| Guo, Hongjie |
An Atom Beam Lithography Tool For Fabricating Dense Nanostructure Arrays |
| Guo, L. Jay |
Metal Transfer Assisted Nanolithography On Flexible Substrate
Plasma-Etch Fabrication Of High Aspect Ratio Freestanding Silicon Nanogratings As Deep UV Filters
Structure-Property Relationship Of Photocurable Silsesquioxane Resists For Nanoimprint Lithography |
| Gutu, Timothy |
Biofunctionalization For Enhanced Photoluminescence Of Nanopatterned Silica From The Diatom Cyclotella Sp. |
H |
| Hadad, Benyimin |
Formation Of Nano Holes By An Electron Beam- Induced Etching Process |
| Häffner, Michael |
(Invited) Catalyst Patterning For Carbon Nanotube Growth On Elevating Posts By Self-Aligned Double-Layer Electron Beam Lithography |
| Hagen, C.W. |
(Invited) 1 nm Patterning |
| Hagen, Cornelis W. |
Brightness Measurements Of A Gallium Liquid Metal Ion Source |
| Hagiwara, Ryoji |
Application Of Vector Scanning In FIB Photomask Repair System
Image Quality Improvement In Fib Photomask Repair System |
| Hamaguchi, A. |
Contrast Reversal Effect In SEM Due To Charging |
| Hamakubo, Takao |
Development Of The Compact Low-Energy Soft X-Ray CT Equipment For The Soft Material Structural Analysis |
| Hamamoto, Kazuhiro |
Coherent Euv Scattering Microscopy |
| Han, Hakseung |
Actinic Euv Mask Inspection Beyond 0.25 NA |
| Han, Woosun |
Study Of Machine To Machine Overlay Error For Sub-60-Nm Memory Devices |
| Hannon, James |
(Invited) Chemical Functionalization For The Selective Placement Of Single-Walled Carbon Nanotubes |
| Hanssen, James |
A Novel, High Brightness Ion Source Based On Laser Cooled Atoms |
| Harteneck, Bruce |
Quasi-Zero Average Refractive Index Photonic Crystals Metamaterials Collimating Infrared Light Over Large Scale |
| Hartley, J |
Tools For Resist Heating Analysis And Compensation For Electron Beam Tools |
| Hartley, John |
Charging And Error Budgets In Electron Beam Lithography Tools
Optical Wafer Height And Tilt Sensor For Electron Beam Lithography System |
| Hasegawa, Hirokazu |
Integration Of Electron Beam Lithography With Block Copolymer Self-Assembly For 10nm Scale Nanofabrication |
| Hassanein, Elsayed |
Impact Of Base And PAG Loading On Intrinsic Resolution In EUV Resists |
| Hastings, J. Todd |
Self-Assembled Monolayer Fiduical Grids For Spatial-Phase-Locked Electron-Beam Lithography |
| Hastings, Jeffrey Todd |
The Effect Of Thin Metal Over-Layers On The Electron Beam Exposure Of Poly-Methyl Methacrylate |
| Hastings, Todd |
FPGA Implementation Of Real-Time Spatial-Phase Locking For Electron Beam Lithography
Optical Properties Of Sputtered Fluorinated Ethylene Propylene |
| Hayashi, Kunito |
Potential Of Rotary Stage Electron Beam Mastering System For Fabricating Patterned Magnetic Media |
| He, Jianhua |
Spin-Dependent Scattering Off Neutral Donors In Silicon Field-Effect Transistors |
| Hedhili, M. N. |
Carbon Film Growth And Mitigation On Model Electron-Irradiated EUVL Mirror Capping Layers: TiO2 And Ru |
| Heeren, Andreas |
(Invited) Catalyst Patterning For Carbon Nanotube Growth On Elevating Posts By Self-Aligned Double-Layer Electron Beam Lithography |
| Heilmann, Ralf |
Spatial-Frequency Multiplication With Multilayer Interference Lithography
Fabrication Of 200 Nm Period Blazed Transmission Gratings On Silicon-On-Insulator Wafers |
| Helgert, Christian |
Fabrication Of Large-Area Negative-Index Metamaterial By Electron-Beam-Lithography |
| Henderson, Clifford |
Single Component Molecular Resists With Covalently Bound Photoacids
Next Generation Chemically Amplified Molecular Resists For E-Beam Lithography Based On Epoxide Cross-Linking
Understanding The Effects Of Photoacid Distribution Homogeneity And Diffusivity On Lithography Performance In Polymer-Bound PAG Photoresists |
| Henion, Jack |
Chip-Based Microfabricated Electrospinning Nozzles |
| Hermans, Jan |
Experimental Validation Of Full-Field Extreme Ultraviolet Lithography Flare And Shadowing Corrections |
| Herrero, Fred A. |
Plasma-Etch Fabrication Of High Aspect Ratio Freestanding Silicon Nanogratings As Deep UV Filters |
| Hersam, Mark |
(Invited) Probing The Structure And Properties Of Individual Molecules On Silicon Surfaces |
| Hesselberth, Marcel |
Investigation Of Morphological Changes In Platinum Nano-Structures Created By Focused Electron-Beam-Induced Deposition |
| Hessman, Dan |
Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography |
| Hill, David |
Ultra Compact Interferometric Lithography System Realized With A Desk-Top Extreme Ultraviolet Laser |
| Hill, Shannon |
A Novel, High Brightness Ion Source Based On Laser Cooled Atoms |
| Hinsberg, William |
Polymer Self-Assembly For Nanopatterning |
| Hirai, Yoshihiko |
Experimental And Theoretical Study On The Demolding Mechanics Experimental And Theoretical Study On The Demolding Mechanics In Imprint Process
Experimental And Numerical Analysis On Recovery Of Polymer Deformation After Demolding In Hot-Embossing Process |
| Hochleitner, Gottfried |
Effect Of Gaseous Additives On Electron Beam Induced Deposition |
| Hoef, Brian |
Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool |
| Hoffman, Galen |
Relief And Trench Formation On Chalcogenide Thin-Films Using Electron Beams |
| Hofmann, Thorsten |
(Invited) Applications Of Focused Electron Beam Processing |
| Hofsäss, Hans |
Self-Aligned Graphitic Nanowires In Diamond-Like Carbon |
| Hohle, Christoph |
(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status
Detailed Characterization Of HSQ For E-Beam Application In DRAM Pilot Line Environment |
| Holzwarth, Charles |
(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices
Fabrication Strategies For Filter Banks Based On Microring Resonators |
| Hon, Min-Hsiung |
Polyimide Hierarchical Structures Via Imprinting And Dewetting |
| Hone, James |
Fabrication Of Nanoscale Bioarrays For The Study Of Cytoskeletal Protein Binding Interactions Using Nano-Imprint Lithography
Fabrication Of Elastometer Pillar Arrays With Modulated Stiffness For Cellular Force Measurements |
| Hong-Shi, Kuo |
Investigation of Single-Walled Carbon Nanotubes With LEEPS Microscope, Chang Che-Cheng |
| Hopman, Wico C.L. |
Reducing Optical Losses In Focused-Ion-Beam Etched Silicon |
| Horsley, David |
Light Modulation With A Nano-Patterned Diffraction Grating And MEMS Pixel |
| Hoshino, Hiromi |
Process Variation-Aware 3-Dimensional Proximity Effect Correction For Electron Beam Direct Writing At 45 Nm Node And Beyond |
| Houkes, Annemarie |
(Invited) MAPPER: High Throughput Maskless Lithography |
| Howe, Roger |
Mask-Less Wet Etching Using Laser Induced Local Heating |
| Hu, Walter |
Imprinted Large-Scale High Density Polymer Nanopillars For Various Applications
Stability Of HSQ Nano-Lines Defined By E-Beam Lithography |
| Hua, Jui- Ming |
FDTD Study Of Near Field Phase-Shifting Lithography For High-Precision Fabrication Of Nano-Image Profiles |
| Huan, Po-Hsun |
Diffusers With Both Surface-Relief And Particle-Diffusing Functions Fabricated Using Hybrid Extrusion Roller Embossing |
| Huang, Po-Hsun |
Large-Area Microlens Arrays Fabricated By Integrated Gas-Assisted UV-Curing Embossing With UV-LED Array Lamp |
| Huang, Tzu-Chien |
Diffusers With Both Surface-Relief And Particle-Diffusing Functions Fabricated Using Hybrid Extrusion Roller Embossing |
| Huang, Xiaoxia |
Estimation Of Remaining Resist Profile Without Exposure And Development Simulations In E-Beam Lithography |
| Huh, Sungmin |
Effects Of Mask Absorber Structures On The EUV Lithography |
| Hung, A. |
Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces |
| Huq, Ejaz |
Electron Beam Lithography For Distributed Bragg Reflectors In SU-8 |
| Hwang, Ing-Shouh |
Gas Field Ion Source From An Ir/W<111> Single-Atom Tip |
| Hwang, Sung Ho |
Full Field Imprint Masks Using Variable Shape Beam Pattern Generators |
| Hwangbo, Chang Kwon |
Absorber Stack With Transparent Conductive Compound Material For EUV Lithography Mask |
I |
| Icard, Beatrice |
(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status |
| Ichihashi, Toshinari |
Resisitivity Change Of The Diamond-Like Carbon |
| Ikeda, Yuta |
Multilevel Visualization Of The Local Electric Field At A Sharp Probe Apex By Scanning Electron Microscopy |
| Ilani, S. |
(Invited) Speed and Spin-Orbit: New Results in Carbon Nanotubes |
| Ilic, Rob |
Optical Excitation Of In-Plane Modes Of Nanoelectromechanical Oscillators For Selective Detachment Of Microspheres |
| Ilievski, F. |
(Invited) Si-Containing Block Copolymers For Self-Assembled Nanolithography Applications |
| Imprints, Molecular |
Full Field Imprint Masks Using Variable Shape Beam Pattern Generators
Patterned Media Using Step And Flash Imprint Lithography |
| Imre, Alexandra |
Espacer Protective Surface Coat For Cutting-Edge Ion-Beam Lithography |
| In, Hyun Jin |
Carbon Nanotube-Based Magnetic Actuation Of Origami Membranes |
| Ing-Shouh, Hwang |
Investigation of Single-Walled Carbon Nanotubes With LEEPS Microscope, Chang Che-Cheng |
| Ippen, Eric |
Fabrication Strategies For Filter Banks Based On Microring Resonators |
| Ippen, Erich |
(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices |
| Iqbal, Zafar |
Self-Assembly Of Individual Vertically Aligned Carbon Nanotubes |
| Iriye, Yasuroh |
Experimental And Numerical Analysis On Recovery Of Polymer Deformation After Demolding In Hot-Embossing Process |
| Irmscher, M. |
Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates |
| Irmscher, Mathias |
(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status |
| Ishihara, Jyunya |
Experimental And Theoretical Study On The Demolding Mechanics Experimental And Theoretical Study On The Demolding Mechanics In Imprint Process |
| Ishihara, Sunao |
Resisitivity Change Of The Diamond-Like Carbon |
| Ishikawa, Kiyoshi |
Fabrication Of The Nanoimprint Mold Using Inorganic Electron Beam Resist With Post Exposure Bake |
| Islam, Saif |
λ/12 Sub-wavelength Optical Lithography With A Smooth Superlens |
| Isoyan, Artak |
40 Nm Pitch Extreme Ultraviolet Interferometric Lithography |
| Israel, Intel |
E-Beam Nano-Machining For Circuit Edit: An Invasiveness Study |
| Itani, Toshiro |
(Invited) Latent Image Formation In Chemically Amplified Extreme Ultraviolet Resists With Low Activation Energy For Deprotection Reaction
Novel Negative-Tone Molecular Resist For EUV Lithography
Dissolution Characteristics Of Chemically Amplified EUV Resist |
| Ivanchikov, A. |
Modeling Of Charge And Discharge In Scanning Electron Microscopy |
| Iwasaki, Koji |
(Invited) Transmission Electron Microscopy Sample Preparation Employing A "Triple" Beam Instrument |
| Iwasaki, Takuya |
Experimental And Numerical Analysis On Recovery Of Polymer Deformation After Demolding In Hot-Embossing Process |
| Izumi, Akira |
Hydrogen Radical Cleaning Of Carbon Contamination On EUV Mask |
J |
| Jacobson, Peter |
Model Studies Of The Photocatalytic Removal Of Carbon From Titanium Dioxide |
| Jager, Remco |
(Invited) MAPPER: High Throughput Maskless Lithography |
| Jahnes, Christopher |
(Invited) Fluorinated Diamond-Like Carbon Templates For High Resolution Nanoimprint Lithography |
| Jarrahi, Mona |
High-Speed Optical Beam-Steering Based On Phase-Arrayed Waveguides |
| Javey, Ali |
Roll Printing Of Synthetic Nanowires For Novel Sensor And Electronic Applications |
| Jiang, Fan |
40 Nm Pitch Extreme Ultraviolet Interferometric Lithography |
| Jiao, Jun |
Biofunctionalization For Enhanced Photoluminescence Of Nanopatterned Silica From The Diatom Cyclotella Sp. |
| Jiménez, Sonia Fernández |
50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser |
| Joest, Michael |
(Invited) Applications Of Focused Electron Beam Processing |
| Johann, Bartha W. |
Detailed Characterization Of HSQ For E-Beam Application In DRAM Pilot Line Environment |
| Jonckheere, Rik |
Experimental Validation Of Full-Field Extreme Ultraviolet Lithography Flare And Shadowing Corrections |
| Jones, Gideon |
Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool |
| Jones, Robert |
Direct Write Electron Beam Patterning Of DNA:Complex Thin Films |
| Joshi, Vishwanath |
Controlled Chemical Mechanical Polishing Of Polysilicon And Silicon-Dioxide For Si Based Single-Electron Device With Oxide Tunnel Barriers |
| Joubert, Olivier |
Impact Of Plasma Etching Processes On 193 nm Photoresist: Etch Resistance And Line Width Roughness |
| Juarros, A. |
Refined Coarse-Grain Modeling Of Stamp Deformation In Nanoimprint Lithography |
| Jung, Y.S. |
(Invited) Si-Containing Block Copolymers For Self-Assembled Nanolithography Applications |
| Jung, Yeon Sik |
Hydrogen Silsesquioxane Nano-Posts As Decoys For Guiding The Self-Assembly Of Block Copolymers |
K |
| Kaertner, Franz |
(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices
Fabrication Strategies For Filter Banks Based On Microring Resonators |
| Kaito, Takashi |
Resisitivity Change Of The Diamond-Like Carbon |
| Kakabakos, Sotirios |
(Invited) High-Aspect-Ratio Plasma-Induced Nanotexturing Of Polymers (PDMS PMMA, PEEK, ...) For Protein Adsorption Applications |
| Kakutani, Yukinobu |
Protection And Reduction Of Surface Oxidation Of Mo/Si Multilayers For EUVL Projection Optics By Control Of Hydrocarbon Gas Atmosphere |
| Kampherbeek, Bert Jan |
(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status
(Invited) MAPPER: High Throughput Maskless Lithography |
| Kanda, Kazuhiro |
Resisitivity Change Of The Diamond-Like Carbon |
| Kaneyama, Koji |
Dissolution Characteristics Of Chemically Amplified EUV Resist |
| Kang, Hee Young |
Absorber Stack With Transparent Conductive Compound Material For EUV Lithography Mask |
| Kang, Huiman |
Directed Assembly Of Asymmetric Ternary Block Copolymer-Homopolymer Blends Thin Films Into Checkerboard Trimming Chemical Pattern |
| Kang, Myung-Gyu |
Metal Transfer Assisted Nanolithography On Flexible Substrate |
| Kang, Shuhui |
(Invited) Advances In Neutron Research Methods For Photoresists Fundamentals |
| Kanje, M. |
(Invited) Neurite Outgrowth on Nanomodified Surfaces |
| Karade, Yogesh |
Guided Phase Separation Of Polymer Blends For Patterns Varying From Micron To Nanometer Length Scales |
| Kawata, Hiroaki |
Experimental And Theoretical Study On The Demolding Mechanics Experimental And Theoretical Study On The Demolding Mechanics In Imprint Process |
| Kayama, Masayo |
Experimental And Theoretical Study On The Demolding Mechanics Experimental And Theoretical Study On The Demolding Mechanics In Imprint Process |
| Keathley, Phillip |
Optical Properties Of Sputtered Fluorinated Ethylene Propylene |
| Kehagias, Nikolaos |
Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities |
| Keil, Katja |
(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status
Detailed Characterization Of HSQ For E-Beam Application In DRAM Pilot Line Environment |
| Kemp, Charles |
Actinic Euv Mask Inspection Beyond 0.25 NA |
| Kercher, Dan |
Integration Of Electron Beam Lithography With Block Copolymer Self-Assembly For 10nm Scale Nanofabrication |
| Kercher, Dan |
65mm Disk Patterning At 500 Gb/In2 With Full Surface Area Coverage From Diblock Copolymer Templates |
| Kern, Dieter Paul |
(Invited) Catalyst Patterning For Carbon Nanotube Growth On Elevating Posts By Self-Aligned Double-Layer Electron Beam Lithography |
| Kershner, Ryan |
Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces |
| Kewell, Adrian |
Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography |
| Khan, Maroof H. |
Reducing Mode-Transition Loss In Silicon-On-Insulator Strip Waveguide Bends |
| Khilo, Anatoly |
Fabrication Strategies For Filter Banks Based On Microring Resonators |
| Khusnatdinov, Niyaz |
Patterned Media Using Step And Flash Imprint Lithography |
| Kim, Philip |
Toward Carbon Based Electronics: Graphene, a New Opportunity |
| Kim, Byung Gook |
Resist Charging Effect In Photomask: Its Impact On Pattern Placement Error And Critical Dimension |
| Kim, Byung-Sung |
(Invited) Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained From High Resolution Transmission Electron Microscopy |
| Kim, Dongwan |
Effects Of Mask Absorber Structures On The EUV Lithography |
| Kim, Evgenia |
Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies |
| Kim, Ho-Cheol |
Polymer Self-Assembly For Nanopatterning |
| Kim, Hochul |
Study Of Machine To Machine Overlay Error For Sub-60-Nm Memory Devices |
| Kim, Hoon |
Effects Of Mask Absorber Structures On The EUV Lithography |
| Kim, Hoyeon |
Full Field Imprint Masks Using Variable Shape Beam Pattern Generators |
| Kim, Hyun Chul |
Superfocusing Of Light Using A Metallic/Dielectric Nano-Optic Lens
Focusing Of Plasmonic Micro Zone Plate-Based Metallic Structures Covered By A Dielectric Layer |
| Kim, Hyun-Mi |
Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application
(Invited) Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained From High Resolution Transmission Electron Microscopy
The Modification Of Aperture System For Atomic Image Projection Electron-Beam Lithography (AIPEL)
Two-Step Development Method Of Hydrogen Silsesquioxane Resist For High-Density Electron Beam Nanopatterning |
| Kim, Insung |
Experimental Validation Of Full-Field Extreme Ultraviolet Lithography Flare And Shadowing Corrections |
| Kim, Ki-Bum |
Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application
(Invited) Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained From High Resolution Transmission Electron Microscopy
The Modification Of Aperture System For Atomic Image Projection Electron-Beam Lithography (AIPEL)
Two-Step Development Method Of Hydrogen Silsesquioxane Resist For High-Density Electron Beam Nanopatterning |
| Kim, S. -J. |
Fabrication Of 3-D Micro- And Nano- Structures By Focused-Ion-Beam (FIB) Machining Systems |
| Kim, Sang-Gook |
Carbon Nanotube-Based Magnetic Actuation Of Origami Membranes |
| Kim, Seong-Sue |
Effects Of Mask Absorber Structures On The EUV Lithography
Coherent Euv Scattering Microscopy |
| Kim, Sungwon |
Self-Aligned Asymmetric Recess Technique With E-Beam Lithography |
| Kinion, Doug |
Nanoscale To Millimeter Scale Milling With A Focused Ion Beam Instrument |
| Kinoshita, Hiroo |
Coherent Euv Scattering Microscopy |
| Kishimoto, Junki |
Coherent Euv Scattering Microscopy |
| Klein, Christof |
(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status |
| Klein, Edwin J. |
Reducing Optical Losses In Focused-Ion-Beam Etched Silicon |
| Kley, Ernst-Bernhard |
Fabrication Of Large-Area Negative-Index Metamaterial By Electron-Beam-Lithography |
| Knowles, Ralph |
Nanofabrication By Ultra-High Resolution Environmental Scanning Electron Microscopy |
| Ko, Fu-Hsiang |
3D Mask Topographic Effects In EUV Lithography
Protein-Induced Electrical Variation On Gold-Silicide Embedded Nanowires
Hybridization Sensing By Electrical Enhancement With Nanoparticles In Nano-Gap |
| Ko, Hyungduk |
Superfocusing Of Light Using A Metallic/Dielectric Nano-Optic Lens
Focusing Of Plasmonic Micro Zone Plate-Based Metallic Structures Covered By A Dielectric Layer |
| Kobayashi, Kazuhiko |
Potential Of Rotary Stage Electron Beam Mastering System For Fabricating Patterned Magnetic Media |
| Kodama, Tatsuhiko |
Development Of The Compact Low-Energy Soft X-Ray CT Equipment For The Soft Material Structural Analysis |
| Koh, Yumin |
Self-Aligned Asymmetric Recess Technique With E-Beam Lithography |
| Koida, Keigo |
Protection And Reduction Of Surface Oxidation Of Mo/Si Multilayers For EUVL Projection Optics By Control Of Hydrocarbon Gas Atmosphere |
| Koishikawa, Atsushi |
Development Of The Compact Low-Energy Soft X-Ray CT Equipment For The Soft Material Structural Analysis |
| Kojima, Akira |
Sub-50nm Resolution Surface Electron Emission Lithography Using Nano-Si Ballistic Electron Emitter |
| Kometani, Reo |
Resisitivity Change Of The Diamond-Like Carbon |
| Kondr, Viktor |
50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser |
| Kondratovich, Marianna |
Optical Excitation Of In-Plane Modes Of Nanoelectromechanical Oscillators For Selective Detachment Of Microspheres |
| Koshida, Nobuyoshi |
Sub-50nm Resolution Surface Electron Emission Lithography Using Nano-Si Ballistic Electron Emitter |
| Kozakai, Tomokazu |
Application Of Vector Scanning In FIB Photomask Repair System
Image Quality Improvement In Fib Photomask Repair System |
| Kozawa, Takahiro |
(Invited) Latent Image Formation In Chemically Amplified Extreme Ultraviolet Resists With Low Activation Energy For Deprotection Reaction
Multispur In Chemically Amplified Electron Beam Resists
Dissolution Characteristics Of Chemically Amplified EUV Resist |
| Krauser, Johann |
Self-Aligned Graphitic Nanowires In Diamond-Like Carbon |
| Kretz, Johannes |
(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status
Detailed Characterization Of HSQ For E-Beam Application In DRAM Pilot Line Environment |
| Kritsun, Oleg |
Improving Lithography Pattern Fidelity And Line-Edge Roughness By Reducing Laser Speckle |
| Krug, David |
Polyhedral Oligomeric Silsesquioxane (POSS) Functional Patterns Directly Fabricated By Nanoimprint Lithography |
| Krüger, Jan |
Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography |
| Kruit, P. |
(Invited) 1 nm Patterning |
| Kruit, Pieter |
Brightness Measurements Of A Gallium Liquid Metal Ion Source
Sputtering Limits Versus Signal To Noise Limits In The Observation Of Sn Balls In A Ga Ions Microscope
Transformation Of Polycrystalline Tungsten To Monocrystalline Tungsten W(100) And Its Potential Application In Schottky Emitters
Experiments Towards A High Brightness 100-Electron-Beam Source
Effect Of The Electric Field On The Decay Of A Schottky Electron Emitter Tip End: A Step Flow Model |
| Kruppa, Walter |
(Invited) Electron-Transparent Cantilevers For TEM Visualization Of Nanodevices |
| Krylov, Slava |
Optical Excitation Of In-Plane Modes Of Nanoelectromechanical Oscillators For Selective Detachment Of Microspheres |
| Kuba, Yukio |
Potential Of Rotary Stage Electron Beam Mastering System For Fabricating Patterned Magnetic Media |
| Kuemmeth, F. |
(Invited) Speed and Spin-Orbit: New Results in Carbon Nanotubes |
| Kumise, Takaaki |
Novel Negative-Tone Molecular Resist For EUV Lithography |
| Kuo, David |
Patterned Media Using Step And Flash Imprint Lithography
Challenges In 1 Teradot/In.2 Dot Nanoimprint Lithography For Bit-Patterned Media |
| Kuo, Hong-Shi |
Gas Field Ion Source From An Ir/W<111> Single-Atom Tip |
| Kuo, S. S. |
Using Reversal Imprint Lithography To Pattern Textured Metal Fims For Surface Plasmonic Device Applications |
| Kurashima, Yuichi |
Low Energy Ion Beam Machining Of Si Layer Deposited On An ULE Substrate For EUVL Optics - Evaluation Of Surface Roughness |
| Kurdi, Bulent N. |
(Invited) Storage Class Memory |
| Kutchoukov, Vladimir |
Experiments Towards A High Brightness 100-Electron-Beam Source |
| Kwok, Wai |
(Invited) Advanced Imaging Via Pixelated Phase Masks And Inverse Lithography |
| Kye, Jongwook |
Line Edge Roughness Impacts On Overlay |
L |
| La Fontaine, Bruno |
Improving Lithography Pattern Fidelity And Line-Edge Roughness By Reducing Laser Speckle
Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool |
| LaBrake, Dwayne |
Patterned Media Using Step And Flash Imprint Lithography |
| Lafferty, Neal |
Aluminum Oxides As Metamaterials For Enhancement Of 193nm Lithography
Photomask Image Enhancement Using Grating Generated Surface Waves |
| Lai, Fu-Der |
FDTD Study Of Near Field Phase-Shifting Lithography For High-Precision Fabrication Of Nano-Image Profiles |
| Laine, Richard |
Polyhedral Oligomeric Silsesquioxane (POSS) Functional Patterns Directly Fabricated By Nanoimprint Lithography |
| Laitinen, Mikko |
Interdigitated Electrode Structures For Osteoblast Growth Studies |
| Lalovic, Ivan |
Improving Lithography Pattern Fidelity And Line-Edge Roughness By Reducing Laser Speckle |
| Lam, Michael |
Pattern Specific Optical Models |
| Lambertini, Vito |
NIL Processes And Material Characterization On Transparent Substrates For Optical Applications, Nicolas Chaix |
| Landis, Stefan |
NIL Processes And Material Characterization On Transparent Substrates For Optical Applications, Nicolas Chaix |
| Lassiter, Matthew |
Nanoscale Electron Beam Induced Etching (EBIE) |
| Lavery, Kristopher |
(Invited) Advances In Neutron Research Methods For Photoresists Fundamentals |
| Lawson, Richard |
Single Component Molecular Resists With Covalently Bound Photoacids
Next Generation Chemically Amplified Molecular Resists For E-Beam Lithography Based On Epoxide Cross-Linking
Understanding The Effects Of Photoacid Distribution Homogeneity And Diffusivity On Lithography Performance In Polymer-Bound PAG Photoresists |
| Lecarme, Olivier |
Capillary Forces Assembly In Microfluidic Cell: Faster Assembly By Accelerating The Particles Convective Flux And Integration Into Complex Pattern |
| Lee, Cheng-Tsung |
Single Component Molecular Resists With Covalently Bound Photoacids
Next Generation Chemically Amplified Molecular Resists For E-Beam Lithography Based On Epoxide Cross-Linking
Understanding The Effects Of Photoacid Distribution Homogeneity And Diffusivity On Lithography Performance In Polymer-Bound PAG Photoresists |
| Lee, Dong Gun |
Effects Of Mask Absorber Structures On The EUV Lithography
Coherent Euv Scattering Microscopy |
| Lee, Hyo-Sung |
Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application
(Invited) Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained From High Resolution Transmission Electron Microscopy
The Modification Of Aperture System For Atomic Image Projection Electron-Beam Lithography (AIPEL)
Two-Step Development Method Of Hydrogen Silsesquioxane Resist For High-Density Electron Beam Nanopatterning |
| Lee, Hyung Woo |
Carbon Nanotube-Based Magnetic Actuation Of Origami Membranes |
| Lee, J.M. |
High Density Nanostructure Fabrication by Electron Beam Lithography, Zs. Szabo |
| Lee, Jae Jong |
Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application |
| Lee, Jun-Wei |
ZnO Nanowires Grown On Cone-Shaped Zinc Nanostructures By Thermal Oxidation |
| Lee, Junghyeon |
Study Of Machine To Machine Overlay Error For Sub-60-Nm Memory Devices |
| Lee, Kim |
Patterned Media Using Step And Flash Imprint Lithography
Challenges In 1 Teradot/In.2 Dot Nanoimprint Lithography For Bit-Patterned Media |
| Lee, Sihyeung |
Study Of Machine To Machine Overlay Error For Sub-60-Nm Memory Devices |
| Lee, Soo-Young |
Estimation Of Remaining Resist Profile Without Exposure And Development Simulations In E-Beam Lithography |
| Lee, Thomas H. |
High-Speed Optical Beam-Steering Based On Phase-Arrayed Waveguides |
| Lee, W. H. |
Using Colloidal Lithography To Fabricate Semitransparent Metal Anodes In Organic Solar Cells
Using Reversal Imprint Lithography To Pattern Textured Metal Fims For Surface Plasmonic Device Applications |
| Letzkus, F. |
Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates |
| Leu, Ing-Chi |
Polyimide Hierarchical Structures Via Imprinting And Dewetting |
| Leu, Joshua |
Templated Self-Assembly Of Sub-10nm Quantum Dots |
| Levinson, Harry |
Improving Lithography Pattern Fidelity And Line-Edge Roughness By Reducing Laser Speckle
Line Edge Roughness Impacts On Overlay |
| Lezec, Henri |
(Invited) Nanophotonics Lab-On-A-Chip Sculpted By Focused-Ion-Beam Milling: Direct Characterization Of Negative-Index Metamaterials Operating In The Visible |
| Li, Huifeng |
Improving Organic Thin-Film Transistor Performance By Nanoimprint-Induced Chain Ordering
Microfluidic MDM Structure As A Tunable Optical Filter
Optical Antennas: A Boost For Infrared Detection |
| Li, Jianliang |
Resist Bias Measured From Iso-Focal Structure |
| Li, K-L |
Protein-Induced Electrical Variation On Gold-Silicide Embedded Nanowires |
| Li, W. |
Direct Write Electron Beam Patterning Of DNA:Complex Thin Films |
| Li, Wen-Di |
Fabrication Of Wafer-Scale Nano-Split-Ring Metamaterials By Nanoimprint Without Direct-Write In Mold Making
(Invited) Quantized-Patterning Using Nanoimprinted-Blanks
Fabrication And Measurement Of Solar-Blind Aluminum Nano-Grid UV Filters By Nanoimprint Lithography And Edge Patterning |
| Li, Xiuling |
Efficient Nanoscale Pattern Transfer Process For Porous Silicon |
| Li, Xuema |
Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies
Fabrication Of Amorphous Metallic Nanowires For IC Interconnects By Nanoimprint Lithography |
| Liang, Ted |
The Effects Of Wet And Dry Cleaning Methods On The Chemical Composition And Morphology Of The Ru Capping Layer Of The Extreme Ultraviolet (EUV) Mask Blanks |
| Liang, Xiaogan |
Graphene Transistors Fabricated Via Transfer-Printing In Device Active-Areas On Large Wafer
(Invited) Quantized-Patterning Using Nanoimprinted-Blanks
Buried Silicon Dioxide Nanochannels Fabricated By Nanoimprint, Etching And Self-Sealing, Self-Limited Thermal Oxidation
A Novel Method For Fabricating Sub-16 Nm Footprint T-Gate Nanoimprint Molds |
| Liau, Chung-Chi |
ZnO Nanowires Grown On Cone-Shaped Zinc Nanostructures By Thermal Oxidation |
| Lim, Ki-Phil |
Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application |
| Lin-Gibson, Sheng |
Continuous Patterns With Height Gradients By Nanoimprint Lithography And Thermal Gradient Annealing |
| Lin, C. H. |
Using Colloidal Lithography To Fabricate Semitransparent Metal Anodes In Organic Solar Cells |
| Lin, Chun-Hung |
3D Mask Topographic Effects In EUV Lithography |
| Lin, Chun-Yueh |
Gas Field Ion Source From An Ir/W<111> Single-Atom Tip |
| Lin, Eric |
(Invited) Advances In Neutron Research Methods For Photoresists Fundamentals |
| Lin, Nancy |
Continuous Patterns With Height Gradients By Nanoimprint Lithography And Thermal Gradient Annealing |
| Lin, Y. H. |
Using Colloidal Lithography To Fabricate Semitransparent Metal Anodes In Organic Solar Cells |
| Liu, Chi-Chun |
In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS |
| Liu, Guoliang |
In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS |
| Liu, Haoning |
Aberration Correction For Electron Beam Inspection, Metrology And Lithography |
| Liu, Ran |
Electron Beam Lithography For Distributed Bragg Reflectors In SU-8 |
| Liu, Sheng |
Self-Assembly Of Individual Vertically Aligned Carbon Nanotubes |
| Liu, Wenchao |
Relief And Trench Formation On Chalcogenide Thin-Films Using Electron Beams |
| Liu, Xuefeng |
Evaluation Of Electron Energy Spread In Csbr Based Photocathodes |
| Liu, Zhi |
Evaluation Of Electron Energy Spread In Csbr Based Photocathodes |
| Livengood, Richard H. |
E-Beam Nano-Machining For Circuit Edit: An Invasiveness Study |
| Lo, Cheuk Chi |
Spin-Dependent Scattering Off Neutral Donors In Silicon Field-Effect Transistors |
| Lobo, Charlene |
Nanofabrication By Ultra-High Resolution Environmental Scanning Electron Microscopy
Direct Writing Of High Resolution, Radially-Symmetric Nanostructures By Simultaneous Electron Beam Induced Deposition And Etching |
| Loeschner, Hans |
(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status
(Invited) Projection Mask-Less Patterning (PMLP) For Nanotechnology Applications
Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates |
| Loeser, John G. |
Large-Area Microlens Arrays Fabricated By Integrated Gas-Assisted UV-Curing Embossing With UV-LED Array Lamp
Diffusers With Both Surface-Relief And Particle-Diffusing Functions Fabricated Using Hybrid Extrusion Roller Embossing |
| Logeeswaran, VJ |
λ/12 Sub-wavelength Optical Lithography With A Smooth Superlens |
| Lok, Sjoerd |
Extreme Ultraviolet Lithography: Status And Prospects |
| Loopstra, Erik |
Extreme Ultraviolet Lithography: Status And Prospects |
| Lopez, Gabriel |
Fabrication Of Porous Nanochannels Using Nanoparticles And Application To The Transport Of DNA Molecules |
| Lorusso, Gian |
Experimental Validation Of Full-Field Extreme Ultraviolet Lithography Flare And Shadowing Corrections |
| Lozano, Paulo |
The Use Of Ionic Liquid Ion Sources (ILIS) In FIB Applications |
| Lu, Ming |
Fabrication Of Metallic Nano-Slit Waveguides With Sharp Bends |
| Lu, Yi-Hsien |
Gas Field Ion Source From An Ir/W<111> Single-Atom Tip |
| Lui, Nicki |
Mask-Less Wet Etching Using Laser Induced Local Heating |
| Lunsford, Patrick |
(Invited) Stability Of Self-Assembled Monolayer Surfactant Coating In Thermal Nanoimprint |
| Luo, Gang |
Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography |
| Lyon, Steve |
Spin-Dependent Scattering Off Neutral Donors In Silicon Field-Effect Transistors |
| Lysaght, Michael |
Nanofabrication By Ultra-High Resolution Environmental Scanning Electron Microscopy
Direct Writing Of High Resolution, Radially-Symmetric Nanostructures By Simultaneous Electron Beam Induced Deposition And Etching |
M |
| Ma, Yuansheng |
Line Edge Roughness Impacts On Overlay |
| Machida, Yasuhide |
Process Variation-Aware 3-Dimensional Proximity Effect Correction For Electron Beam Direct Writing At 45 Nm Node And Beyond |
| Macintyre, Douglas |
Optical Characterisation Of An HSQ Lithography Process |
| Mack, Chris |
Stochastic Approach To Modeling Line Edge Roughness In Photolithography |
| Madey, Theodore E. |
Carbon Film Growth And Mitigation On Model Electron-Irradiated EUVL Mirror Capping Layers: TiO2 And Ru |
| Maeda, Ryutaro |
Experimental And Numerical Analysis On Recovery Of Polymer Deformation After Demolding In Hot-Embossing Process |
| Mahmood, Fahad |
Mask-Less Wet Etching Using Laser Induced Local Heating |
| Makarewicz, Joseph |
Fabrication Of Carbon Nanotube Field Emission Guns For Potential Maskless Lithography |
| Maldonado, Juan R. |
Evaluation Of Electron Energy Spread In Csbr Based Photocathodes |
| Mallast, Siomone |
Quality Assessment Of Anti-Sticking Layers For T-NIL |
| Manakli, Serdar |
(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status |
| Manandhar, Pradeep |
Design And Fabrication Of Vertical Nanowire Device Arrays |
| Maniura, Katharina |
Fabrication Of Elastometer Pillar Arrays With Modulated Stiffness For Cellular Force Measurements |
| Mansfield, Scott |
(Invited) The Role Of Computational Modeling In Semiconductor Lithography:Progressing Towards The Virtual Fab |
| Marconi, Mario |
50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser
Ultra Compact Interferometric Lithography System Realized With A Desk-Top Extreme Ultraviolet Laser |
| Martin, Mickael |
Impact Of Plasma Etching Processes On 193 nm Photoresist: Etch Resistance And Line Width Roughness |
| Martin, Noel |
Nanoscale To Millimeter Scale Milling With A Focused Ion Beam Instrument |
| Martinez, Jose |
Novel SU8 Optical Waveguide Microgripper For Simultaneous Micromanipulation And Optical Detection |
| Martz, Dale |
50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser |
| Masbou, Marc |
Mask-Less Wet Etching Using Laser Induced Local Heating |
| Mastropaolo, Enrico |
Electrothermal Actuation Studies On Silicon Carbide Resonators |
| Materials |
Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application |
| Matsuda, Osamu |
Application Of Vector Scanning In FIB Photomask Repair System
Image Quality Improvement In Fib Photomask Repair System |
| Matsui, Shinji |
Resisitivity Change Of The Diamond-Like Carbon
Fabrication Of High Aspect Si Pillers By Deep Reactive Ion Etching Using Nanoimprinted HSQ Masks |
| Maximov, Ivan |
Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography |
| Mayergoyz, Isaak |
(Invited) Eigen Mode Analysis Of Plasmon Resonances In Nanoparticles |
| McClelland, Jabez |
A Novel, High Brightness Ion Source Based On Laser Cooled Atoms |
| McCord, Mark |
(Invited) Electron Beam Inspection Of In-Process Semiconductor Wafers: How, Why, And What’s Next? |
| McEuen, Paul |
(Invited) Speed and Spin-Orbit: New Results in Carbon Nanotubes |
| Mecerreyes, David |
Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities |
| Melvin, Lawrence S. III |
Abbe-SVD: Compact Abbe’s Kernel Generation For Microlithography Aerial Image Simulation Using Singular- Value Decomposition Method |
| Melvin, Lawrence |
Resist Bias Measured From Iso-Focal Structure
An Exploration Of Etch Step Interactions In The Dual Patterning Process For Process Modeling |
| Menguelti, Kevin |
Impact Of Plasma Etching Processes On 193 nm Photoresist: Etch Resistance And Line Width Roughness |
| Menon, Rajesh |
A Prototype Commercial System For Massively-Parallel Maskless Zone-Plate-Array Lithography (ZPAL) |
| Menoni, Carmen |
50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser
Ultra Compact Interferometric Lithography System Realized With A Desk-Top Extreme Ultraviolet Laser |
| Merino, S. |
Refined Coarse-Grain Modeling Of Stamp Deformation In Nanoimprint Lithography |
| Micheel, Christine |
Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces |
| Michler, Johann |
Optimization Of Nozzle-Based Gas Injection Systems For Focused Electron- And Ion- Beam Induced Processing
Stiffness, Density And Quality Of High Aspect Ratio Cu/C Nanostructures Produced By Focused Electron-Beam Induced Deposition |
| Miller, David A. B. |
High-Speed Optical Beam-Steering Based On Phase-Arrayed Waveguides |
| Miller, Mike |
Patterned Media Using Step And Flash Imprint Lithography |
| Miyamoto, Iwao |
Low Energy Ion Beam Machining Of Si Layer Deposited On An ULE Substrate For EUVL Optics - Evaluation Of Surface Roughness |
| Miyano, Y. |
Contrast Reversal Effect In SEM Due To Charging |
| Miyazaki, Takeshi |
Potential Of Rotary Stage Electron Beam Mastering System For Fabricating Patterned Magnetic Media |
| Miyoshi, Motosuke |
Development Of The Compact Low-Energy Soft X-Ray CT Equipment For The Soft Material Structural Analysis |
| Mocella, Vito |
Quasi-Zero Average Refractive Index Photonic Crystals Metamaterials Collimating Infrared Light Over Large Scale |
| Mochiji, Kozo |
Property Of In-Vacuum Direct Photo-Etching Of PTFE Brought By High Energy Synchrotron Radiation Irradiation |
| Mohamed, Khairudin |
UV Curable Nanoimprint Lithography For Replicating Three Dimensional Structures |
| Mohammad, M.A. |
High Density Nanostructure Fabrication by Electron Beam Lithography, Zs. Szabo |
| Möllenbeck, Saskia |
Contact Angles In A Thermal Imprint Process
Quality Assessment Of Anti-Sticking Layers For T-NIL |
| Montelius, Lars |
Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography |
| Moon, Euclid E. |
Nanometer-Level Alignment And Global Positioning To A Substrate-Embedded Coordinate System |
| Morecroft, D. |
Sub-15 Nm Half-Pitch Nanoimprint Molds Using High Resolution Negative Tone Resist And Reactive Ion Etching |
| Morgan, Ray |
(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status |
| Morris, Christopher J. |
(Invited) Micro-Scale Self-Assembly Via Capillary Forces |
| Morton, Keith |
Buried Silicon Dioxide Nanochannels Fabricated By Nanoimprint, Etching And Self-Sealing, Self-Limited Thermal Oxidation |
| Mountfield, Keith |
Electron Beam Lithography For Fabricating Heat Assisted Magnetic Recording Heads |
| Mouri, Yuriko |
Low Energy Ion Beam Machining Of Si Layer Deposited On An ULE Substrate For EUVL Optics - Evaluation Of Surface Roughness |
| Mukherjee, Pran |
Plasma-Etch Fabrication Of High Aspect Ratio Freestanding Silicon Nanogratings As Deep UV Filters |
| Mulders, Hans |
Focused Electron-Beam-Induced Deposition Of Platinum At Very Low Landing Energies
Investigation Of Morphological Changes In Platinum Nano-Structures Created By Focused Electron-Beam-Induced Deposition |
| Munro, Eric |
Aberration Correction For Electron Beam Inspection, Metrology And Lithography |
| Murali, Raghunath |
Mitigation Of Microloading Effect In Nanoimprint Mask Fabrication |
| Muramatsu, Masashi |
Application Of Vector Scanning In FIB Photomask Repair System
Image Quality Improvement In Fib Photomask Repair System |
| Murano-Perez, Fransesc |
Dynamic Stencil Lithography On Full Wafer Scale |
| Myers, Alan |
Experimental Validation Of Full-Field Extreme Ultraviolet Lithography Flare And Shadowing Corrections |
N |
| Naburgh, E.P. |
Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates |
| Nair, Pradeep |
(Invited) Deconstructing Receptor Signaling With Nanopatterned Supported Membranes |
| Nakamae, Koji |
Application Of Vector Scanning In FIB Photomask Repair System
Image Quality Improvement In Fib Photomask Repair System |
| Nakamatsu, Ken-ichiro |
Fabrication Of High Aspect Si Pillers By Deep Reactive Ion Etching Using Nanoimprinted HSQ Masks |
| Nam, Dong Seok |
Resist Charging Effect In Photomask: Its Impact On Pattern Placement Error And Critical Dimension |
| Nam, Sung-Wook |
Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application
(Invited) Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained From High Resolution Transmission Electron Microscopy
The Modification Of Aperture System For Atomic Image Projection Electron-Beam Lithography (AIPEL)
Two-Step Development Method Of Hydrogen Silsesquioxane Resist For High-Density Electron Beam Nanopatterning |
| Naulleau, Patrick |
Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool
Impact Of Base And PAG Loading On Intrinsic Resolution In EUV Resists |
| Nealey, Paul F. |
Directed Assembly Of Asymmetric Ternary Block Copolymer-Homopolymer Blends Thin Films Into Checkerboard Trimming Chemical Pattern
Impact Of Trench Width Roughness On The Directed Self-Assembly Of Block Copolymers On Topographic Substrates |
| Nealey, Paul |
In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS
40 Nm Pitch Extreme Ultraviolet Interferometric Lithography |
| Nelson, Erik |
Inorganic Photoresist Materials For Direct Fabrication Of 3D Photonic Crystals Using Phase Mask Lithography |
| Nemoto, Yoshimi |
Fabrication Of Anti-Reflection Structures And Carbon Nanofibers Using Only Ion Beam Irradiation To Glassy Carbon |
| Neureuther, Andrew |
Quantitatively Engineering Surface Plasmon Coupling Through Computer Simulation |
| Nguyen, Cattien |
Fabrication Of Carbon Nanotube Field Emission Guns For Potential Maskless Lithography |
| Nguyen, Kim |
Fabrication Of Nanoscale Bioarrays For The Study Of Cytoskeletal Protein Binding Interactions Using Nano-Imprint Lithography |
| Niakoula, Dimitra |
Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool
Impact Of Base And PAG Loading On Intrinsic Resolution In EUV Resists
Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists |
| Nichol, Anthony |
Carbon Nanotube-Based Magnetic Actuation Of Origami Membranes |
| Niemann, Darrell |
Fabrication Of Carbon Nanotube Field Emission Guns For Potential Maskless Lithography |
| Niibe, Masahito |
Protection And Reduction Of Surface Oxidation Of Mo/Si Multilayers For EUVL Projection Optics By Control Of Hydrocarbon Gas Atmosphere |
| Niihara, Koichi |
Resisitivity Change Of The Diamond-Like Carbon |
| Nishiyama, Iwao |
Hydrogen Radical Cleaning Of Carbon Contamination On EUV Mask |
| Nishiyama, Yasushi |
Hydrogen Radical Cleaning Of Carbon Contamination On EUV Mask |
| Nix, Anne-Katrin |
Self-Aligned Graphitic Nanowires In Diamond-Like Carbon |
| Notte, John |
(Invited) Elemental Analysis With The Helium Ion Microscope |
| Nounu, Hatem |
An Atom Beam Lithography Tool For Fabricating Dense Nanostructure Arrays |
| Nozik, Arthur J. |
Third Generation Solar Photon Conversion Based on Multiple Exciton Generation in Semiconductor Quantum Dots |
| Numata, Atsushi |
Low Energy Ion Beam Machining Of Si Layer Deposited On An ULE Substrate For EUVL Optics - Evaluation Of Surface Roughness |
| Nygard, Kim |
In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS |
O |
| O'Reilly, Thomas B. |
Linewidth Uniformity In Lloyd’s Mirror Interference Lithography Systems |
| Ocola, Leonidas E. |
Espacer Protective Surface Coat For Cutting-Edge Ion-Beam Lithography |
| Ocola, Leonidas |
An Atom Beam Lithography Tool For Fabricating Dense Nanostructure Arrays
Fabrication Of Metallic Nano-Slit Waveguides With Sharp Bends
Nanofabrication Of Super High-Aspect Ratio Structures In HSQ From Direct-Write E-Beam Lithography And Hot Development |
| Ogino, Kozo |
Process Variation-Aware 3-Dimensional Proximity Effect Correction For Electron Beam Direct Writing At 45 Nm Node And Beyond |
| Ohlberg, Doug |
Fabrication Of Amorphous Metallic Nanowires For IC Interconnects By Nanoimprint Lithography |
| Ohyi, Hideyuki |
Potential Of Rotary Stage Electron Beam Mastering System For Fabricating Patterned Magnetic Media
Sub-50nm Resolution Surface Electron Emission Lithography Using Nano-Si Ballistic Electron Emitter |
| Oizumi, Hiroaki |
Hydrogen Radical Cleaning Of Carbon Contamination On EUV Mask |
| Oizumi, Hiroaki |
Novel Negative-Tone Molecular Resist For EUV Lithography |
| Okamoto, Kazumasa |
Multispur In Chemically Amplified Electron Beam Resists |
| Olynick, Deirdre |
An Alternative Electron Beam Exposure Mechanism For Hydrogen Silsesquioxane – A Raman And FTIR Study
Quasi-Zero Average Refractive Index Photonic Crystals Metamaterials Collimating Infrared Light Over Large Scale |
| Onishi, Yuki |
Experimental And Numerical Analysis On Recovery Of Polymer Deformation After Demolding In Hot-Embossing Process |
| Orloff, Jon |
A Novel, High Brightness Ion Source Based On Laser Cooled Atoms |
| Orlov, Alexei |
Controlled Chemical Mechanical Polishing Of Polysilicon And Silicon-Dioxide For Si Based Single-Electron Device With Oxide Tunnel Barriers |
| Orozco, Jahir |
Impedimetric Biosensing With Interdigitated Arrays Of Nano Electrodes Fabricated By Nanoimprint Lithography |
| Oster, Jens |
(Invited) Applications Of Focused Electron Beam Processing |
| Ozkan, Mihri |
(Invited) Nanopatterning And Assembly Of Electronics |
P |
| Pai, I-Ting |
Polyimide Hierarchical Structures Via Imprinting And Dewetting |
| Pain, Laurent |
(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status |
| Panepucci, Roberto |
Novel SU8 Optical Waveguide Microgripper For Simultaneous Micromanipulation And Optical Detection |
| Pang, S. W. |
Fabrication Of Organic Light Emitting Diode Arrays By Reversal Imprint Lithography
Control of DNA Motion in Microchannels Integrated with Dual Electrodes |
| Panniello, A. |
Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities |
| Pargon, Erwine |
Impact Of Plasma Etching Processes On 193 nm Photoresist: Etch Resistance And Line Width Roughness |
| Parikh, Dhara |
A Multi-Electrode Cuff For Neuronal Sensing In The Locust |
| Park, Doewon |
(Invited) Electron-Transparent Cantilevers For TEM Visualization Of Nanodevices |
| Park, Hyunsoo |
Improving Organic Thin-Film Transistor Performance By Nanoimprint-Induced Chain Ordering
Microfluidic MDM Structure As A Tunable Optical Filter
Solvent-Etching And Dewetting Techniques For Residual Layer Removal In Thermal Nanoimprint |
| Park, Jeong |
The Effects Of Wet And Dry Cleaning Methods On The Chemical Composition And Morphology Of The Ru Capping Layer Of The Extreme Ultraviolet (EUV) Mask Blanks |
| Park, Su Yeon |
Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application |
| Parkin, Stuart |
(Invited) Race Track Memory! |
| Partlo, Bill |
Improving Lithography Pattern Fidelity And Line-Edge Roughness By Reducing Laser Speckle |
| Patsis, George |
Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists |
| Pauliac-Vaujour, Sebastien |
Improvement Of High Resolution Lithography Capabilities By Using Amorphous Carbon Hard Masks
Hybrid High Resolution Lithography (E-Beam/DUV) And Etch Process For Achieving Stacked Nanowire MOSFETs |
| Pease, Fabian |
Preferential Orientation Effects In Partial Melt Laser Crystallization Of Silicon
The Prospects Of Free Electron Analog To Digital Technology
Mask-Less Wet Etching Using Laser Induced Local Heating
Evaluation Of Electron Energy Spread In Csbr Based Photocathodes |
| Pease, R. F. W. |
Low Temperature Limits For Nano-Graphoepitaxy Of Semiconductors |
| Pease, R. Fabian W. |
High-Speed Optical Beam-Steering Based On Phase-Arrayed Waveguides
Impedance Modulation In Coaxial Nanoneedle Biosensor
Multicriteria Optimization In Sensor Design And Fabrication For DNA Thermosequencing Platform |
| Pease, R. Fabian |
X-Ray Diffraction Microscopy: Reconstruction With Partial Magnitude And Spatial A Priori Information |
| Peijster, Jerry |
(Invited) MAPPER: High Throughput Maskless Lithography |
| Peng, Can |
Fabrication Of Wafer-Scale Nano-Split-Ring Metamaterials By Nanoimprint Without Direct-Write In Mold Making
A Novel Method For Fabricating Sub-16 Nm Footprint T-Gate Nanoimprint Molds |
| Pérez-Murano, Francesc |
Impedimetric Biosensing With Interdigitated Arrays Of Nano Electrodes Fabricated By Nanoimprint Lithography |
| Perret, Corine |
NIL Processes And Material Characterization On Transparent Substrates For Optical Applications, Nicolas Chaix |
| Pertsch, Thomas |
Fabrication Of Large-Area Negative-Index Metamaterial By Electron-Beam-Lithography |
| Petford-Long, Amanda |
Espacer Protective Surface Coat For Cutting-Edge Ion-Beam Lithography |
| Petric, Paul |
(Invited) Reflective Electron Beam Lithography (REBL), A Novel Approach To High Speed Maskless Ebeam Direct Write Lithography |
| Petrou, Panagiota |
(Invited) High-Aspect-Ratio Plasma-Induced Nanotexturing Of Polymers (PDMS PMMA, PEEK, ...) For Protein Adsorption Applications |
| Peyrade, David |
Capillary Forces Assembly In Microfluidic Cell: Faster Assembly By Accelerating The Particles Convective Flux And Integration Into Complex Pattern |
| Pianetta, Piero |
X-Ray Diffraction Microscopy: Reconstruction With Partial Magnitude And Spatial A Priori Information
Evaluation Of Electron Energy Spread In Csbr Based Photocathodes |
| Pickard, Dan |
Preferential Orientation Effects In Partial Melt Laser Crystallization Of Silicon |
| Picraux, S. T. |
Design And Fabrication Of Vertical Nanowire Device Arrays |
| Pina-Hernandez, Carlos |
Structure-Property Relationship Of Photocurable Silsesquioxane Resists For Nanoimprint Lithography |
| Pinedo, Tatiana |
Capillary Forces Assembly In Microfluidic Cell: Faster Assembly By Accelerating The Particles Convective Flux And Integration Into Complex Pattern |
| Placido, T. |
Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities |
| Platzgummer, Elmar |
(Invited) Projection Mask-Less Patterning (PMLP) For Nanotechnology Applications
Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates |
| Platzgummer, Elmat |
(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status |
| Ponizovskaya, Ekaterina |
Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies
Tunable Optical Gain For Negative Index Materials By Integration Of Near-Infrared Emitting Nanocrystals |
| Ponomareko, Alexander |
50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser |
| Popova, Vera |
Polyhedral Oligomeric Silsesquioxane (POSS) Functional Patterns Directly Fabricated By Nanoimprint Lithography |
| Popovic, Milos |
(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices |
| Porod, Wolfgang |
Thermal Infrared Detection Using Antenna-Coupled Metal-Oxide-Metal Diode Detectors |
| Prabhu, Vivek |
(Invited) Advances In Neutron Research Methods For Photoresists Fundamentals |
| Provine, J |
Mask-Less Wet Etching Using Laser Induced Local Heating |
| Pshenay-Severin, Ekaterina |
Fabrication Of Large-Area Negative-Index Metamaterial By Electron-Beam-Lithography |
| Putkonen, Matti |
Interdigitated Electrode Structures For Osteoblast Growth Studies |
| Putna, Steve |
Improvement In Line Width Roughness (LWR) By Post-Processing |
Q |
| Qi, Minghao |
Generating Manhattan Patterns Via Cutting And Stitching Of Gratings |
| Qi, Minghao |
Reducing Mode-Transition Loss In Silicon-On-Insulator Strip Waveguide Bends |
| Qu, XinPing |
Electron Beam Lithography For Distributed Bragg Reflectors In SU-8 |
| Quimonda |
(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status |
R |
| Rachmady, Willy |
Improvement In Line Width Roughness (LWR) By Post-Processing |
| Rack, Philip |
(Invited) Maskless Nanolithography Approaches Utilizing Electron-Beam-Induced Deposition
Mass–Transport And Reaction-Rate Limited Growth Modes During Electron–Beam Induced Deposition
Nanoscale Electron Beam Induced Etching (EBIE) |
| Rad, Leili Baghaei |
X-Ray Diffraction Microscopy: Reconstruction With Partial Magnitude And Spatial A Priori Information |
| Raghunathan, S |
Tools For Resist Heating Analysis And Compensation For Electron Beam Tools |
| Rahkila, Paavo |
Interdigitated Electrode Structures For Osteoblast Growth Studies |
| Rahman, Mahmud |
Fabrication Of Carbon Nanotube Field Emission Guns For Potential Maskless Lithography |
| Rajashekar, Ananda Sagari Arcot |
Interdigitated Electrode Structures For Osteoblast Growth Studies |
| Rakich, Peter |
(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices |
| Ralph, D.C. |
(Invited) Speed and Spin-Orbit: New Results in Carbon Nanotubes |
| Ram, Rajeev |
(Invited) The Challenge Of CMOS Photonics And Electronics For Enhanced Microprocessor Performance
Fabrication Strategies For Filter Banks Based On Microring Resonators |
| Ramos, Raphael |
Impact Of Plasma Etching Processes On 193 nm Photoresist: Etch Resistance And Line Width Roughness |
| Rangelow, Ivo |
(Invited) Scanning Proximal Probes For Parallel Imaging And Lithography |
| Raptis, Ioannis |
Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists |
| Ratnagiri, VenkatSubramanian Kavasseri |
The Effects Of Molecular Weight On Resist Evaluation Parameters In Poly(Methylmethacrylate) Developed At Sub-Zero Temperatures |
| Rauscher, Michael |
(Invited) Transmission Electron Microscopy Sample Preparation Employing A "Triple" Beam Instrument |
| Raveh, Amir |
E-Beam Nano-Machining For Circuit Edit: An Invasiveness Study |
| Reano, Ronald |
Relief And Trench Formation On Chalcogenide Thin-Films Using Electron Beams |
| Reboud, Vincent |
Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities |
| Redmond, Garreth |
Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities |
| Regonda, Suresh |
Stability Of HSQ Nano-Lines Defined By E-Beam Lithography |
| Rekawa, Senajith |
Actinic Euv Mask Inspection Beyond 0.25 NA |
| Rendina, Ivo |
Quasi-Zero Average Refractive Index Photonic Crystals Metamaterials Collimating Infrared Light Over Large Scale |
| Resnick, Douglas |
Full Field Imprint Masks Using Variable Shape Beam Pattern Generators
Patterned Media Using Step And Flash Imprint Lithography |
| Retolaza, A. |
Refined Coarse-Grain Modeling Of Stamp Deformation In Nanoimprint Lithography |
| Retterer, Scott |
Development Of Nanoporous Picoliter Reaction Vessels For The Characterization Of Biochemical Systems
(Invited) Maskless Nanolithography Approaches Utilizing Electron-Beam-Induced Deposition |
| Rettner, Charles T. |
(Invited) Storage Class Memory |
| Rettner, Charles |
Polymer Self-Assembly For Nanopatterning |
| Reuther, Freimut |
Design Of Polymers For Thermal Nanoimprint Lithography Based On Rheological Investigations |
| Reynolds, Jackson |
An Atom Beam Lithography Tool For Fabricating Dense Nanostructure Arrays |
| Ribaya, Bryan |
Fabrication Of Carbon Nanotube Field Emission Guns For Potential Maskless Lithography |
| Riehle, M. |
(Invited) Controlling Cell Behaviour Using Nanopatterned Surfaces |
| Ro, Hyun Wook |
Continuous Patterns With Height Gradients By Nanoimprint Lithography And Thermal Gradient Annealing
Polyhedral Oligomeric Silsesquioxane (POSS) Functional Patterns Directly Fabricated By Nanoimprint Lithography |
| Roberts, Jeanette |
Contributions Of Resist Polymers To Innate Material Roughness |
| Rocca, Jorge |
50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser
Ultra Compact Interferometric Lithography System Realized With A Desk-Top Extreme Ultraviolet Laser |
| Rockward, Willie |
Ultra Compact Interferometric Lithography System Realized With A Desk-Top Extreme Ultraviolet Laser |
| Roelkens, Gunther |
Focused-Ion-Beam Lithography For Prototyping Of Silicon Photonic Components |
| Rogers, John |
Inorganic Photoresist Materials For Direct Fabrication Of 3D Photonic Crystals Using Phase Mask Lithography |
| Rokitski, Slava |
Improving Lithography Pattern Fidelity And Line-Edge Roughness By Reducing Laser Speckle |
| Romero, Iván García |
Design Of Polymers For Thermal Nanoimprint Lithography Based On Rheological Investigations |
| Ronse, Kurt |
Experimental Validation Of Full-Field Extreme Ultraviolet Lithography Flare And Shadowing Corrections |
| Rorrer, Gregory |
Biofunctionalization For Enhanced Photoluminescence Of Nanopatterned Silica From The Diatom Cyclotella Sp. |
| Rosenbluth, Alan |
(Invited) The Role Of Computational Modeling In Semiconductor Lithography:Progressing Towards The Virtual Fab |
| Ross, C.A. |
(Invited) Si-Containing Block Copolymers For Self-Assembled Nanolithography Applications |
| Ross, Caroline |
Hydrogen Silsesquioxane Nano-Posts As Decoys For Guiding The Self-Assembly Of Block Copolymers |
| Rossitto, Emmanuela |
Capillary Forces Assembly In Microfluidic Cell: Faster Assembly By Accelerating The Particles Convective Flux And Integration Into Complex Pattern |
| Rothemund, Paul |
Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces |
| Rottmayer, Robert |
Electron Beam Lithography For Fabricating Heat Assisted Magnetic Recording Heads
Challenges In 1 Teradot/In.2 Dot Nanoimprint Lithography For Bit-Patterned Media |
| Rouse, John |
Aberration Correction For Electron Beam Inspection, Metrology And Lithography |
| Roy, Ananya |
An Atom Beam Lithography Tool For Fabricating Dense Nanostructure Arrays |
| Ruan, Junru |
Optical Wafer Height And Tilt Sensor For Electron Beam Lithography System |
| Ruiz, Ricardo |
65mm Disk Patterning At 500 Gb/In2 With Full Surface Area Coverage From Diblock Copolymer Templates |
| Russell, Phillip |
FIB Fabrication Of Metallic Nanostructures On End-Faces Of Cleaved Optical Fibers For Chemical Sensing Applications |
S |
| Saeki, Akinori |
Multispur In Chemically Amplified Electron Beam Resists |
| Sahoo, Pratap Kumar |
Fabrication Of Fresnel Zone Plates By Holography In The Extreme Ultraviolet Region |
| Sajavaara, Timo |
Interdigitated Electrode Structures For Osteoblast Growth Studies |
| Sakaya, Noriyuki |
Coherent Euv Scattering Microscopy |
| Salaita, Khalid |
(Invited) Deconstructing Receptor Signaling With Nanopatterned Supported Membranes |
| Samantaray, Chandan |
Self-Assembled Monolayer Fiduical Grids For Spatial-Phase-Locked Electron-Beam Lithography
The Effect Of Thin Metal Over-Layers On The Electron Beam Exposure Of Poly-Methyl Methacrylate |
| Samarelli, Antonio |
Optical Characterisation Of An HSQ Lithography Process |
| Sanders, Daniel |
Polymer Self-Assembly For Nanopatterning |
| Sansa, Marc |
Dynamic Stencil Lithography On Full Wafer Scale |
| Santillan, Julius Joseph |
(Invited) Latent Image Formation In Chemically Amplified Extreme Ultraviolet Resists With Low Activation Energy For Deprotection Reaction |
| Sarkar, Sankha Subhra |
Fabrication Of Fresnel Zone Plates By Holography In The Extreme Ultraviolet Region |
| Satapathy, Dillip |
In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS |
| Satija, Sushil |
(Invited) Advances In Neutron Research Methods For Photoresists Fundamentals |
| Savu, Veronica |
Dynamic Stencil Lithography On Full Wafer Scale |
| Schattenburg, Mark |
Spatial-Frequency Multiplication With Multilayer Interference Lithography
Fabrication Of 200 Nm Period Blazed Transmission Gratings On Silicon-On-Insulator Wafers |
| Scheer, Hella-Christin |
Contact Angles In A Thermal Imprint Process
Quality Assessment Of Anti-Sticking Layers For T-NIL |
| Schenkel, Thomas |
(Invited) Single-Atom Doping And Single Atom Device Development
Spin-Dependent Scattering Off Neutral Donors In Silicon Field-Effect Transistors |
| Schenker, Richard |
(Invited) Advanced Imaging Via Pixelated Phase Masks And Inverse Lithography |
| Scherer, Axel |
Diffractive Optical Element Fabrication By Electron Beam Lithography |
| Schift, H. |
Refined Coarse-Grain Modeling Of Stamp Deformation In Nanoimprint Lithography |
| Schipotinin, Andreas |
An Alternative Electron Beam Exposure Mechanism For Hydrogen Silsesquioxane – A Raman And FTIR Study |
| Schmid, Gerard |
Patterned Media Using Step And Flash Imprint Lithography |
| Schrauwen, Jonathan |
Reducing Optical Losses In Focused-Ion-Beam Etched Silicon
Focused-Ion-Beam Lithography For Prototyping Of Silicon Photonic Components |
| Schuck, Jim |
An Alternative Electron Beam Exposure Mechanism For Hydrogen Silsesquioxane – A Raman And FTIR Study |
| Schvartzman, Mark |
Fabrication Of Nanoscale Bioarrays For The Study Of Cytoskeletal Protein Binding Interactions Using Nano-Imprint Lithography
(Invited) Fluorinated Diamond-Like Carbon Templates For High Resolution Nanoimprint Lithography |
| Schwind, G. A. |
Range Of Validity Of Field Emission Equations |
| Selinidis, Kosta |
Full Field Imprint Masks Using Variable Shape Beam Pattern Generators |
| Sensor, Berkeley |
Light Modulation With A Nano-Patterned Diffraction Grating And MEMS Pixel |
| Seo, Hwan-Seok |
Effects Of Mask Absorber Structures On The EUV Lithography |
| Seo, Kwangseok |
Self-Aligned Asymmetric Recess Technique With E-Beam Lithography |
| Sfez, Bruno |
Inorganic Photoresist Materials For Direct Fabrication Of 3D Photonic Crystals Using Phase Mask Lithography |
| Shah, Uday |
Improvement In Line Width Roughness (LWR) By Post-Processing |
| Sharping, Jay |
(Invited) Speed and Spin-Orbit: New Results in Carbon Nanotubes |
| Sheetz, Michael |
Fabrication Of Nanoscale Bioarrays For The Study Of Cytoskeletal Protein Binding Interactions Using Nano-Imprint Lithography
Fabrication Of Elastometer Pillar Arrays With Modulated Stiffness For Cellular Force Measurements |
| Shell, Melissa |
Improvement In Line Width Roughness (LWR) By Post-Processing |
| Shen, Hao |
Reducing Mode-Transition Loss In Silicon-On-Insulator Strip Waveguide Bends |
| Shen, Ron |
Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies |
| Shenoy, Rohit S. |
(Invited) Storage Class Memory |
| Shibata, Mayumi |
Experimental And Theoretical Study On The Demolding Mechanics Experimental And Theoretical Study On The Demolding Mechanics In Imprint Process |
| Shin, Jangho |
Study Of Machine To Machine Overlay Error For Sub-60-Nm Memory Devices |
| Shizuno, Miyako |
Fabrication Of The Nanoimprint Mold Using Inorganic Electron Beam Resist With Post Exposure Bake |
| Shu, Zhen |
Electron Beam Lithography For Distributed Bragg Reflectors In SU-8 |
| Sidorkin, Vadim |
Influence Of Resist Temperature During Exposure On Ultra-High Resolution Electron Beam Lithography Using HSQ Resist |
| Sidorov, Oleg |
E-Beam Nano-Machining For Circuit Edit: An Invasiveness Study |
| Sijbrandij, Sybren |
(Invited) Elemental Analysis With The Helium Ion Microscope |
| Simmons, Michelle |
Engineered Materials for Single Atom Architectures for Computation |
| Simpson, Michael |
Development Of Nanoporous Picoliter Reaction Vessels For The Characterization Of Biochemical Systems
(Invited) Maskless Nanolithography Approaches Utilizing Electron-Beam-Induced Deposition
Mass–Transport And Reaction-Rate Limited Growth Modes During Electron–Beam Induced Deposition |
| Singh, Vivek |
Effect Of Microstructure On Deprotection Kinetics In Photoresist |
| Sirotkin, V. |
Refined Coarse-Grain Modeling Of Stamp Deformation In Nanoimprint Lithography |
| Sirotkin, Vadim |
Optimization Of Droplet Volume For UV-NIL |
| Siuti, Piro |
Development Of Nanoporous Picoliter Reaction Vessels For The Characterization Of Biochemical Systems |
| Skinner, Jack |
Light Modulation With A Nano-Patterned Diffraction Grating And MEMS Pixel |
| Slot, Erwin |
(Invited) MAPPER: High Throughput Maskless Lithography |
| Smith, Bruce |
Enhancement Of Hyper-NA Imaging Through Selective TM Polarization
Aluminum Oxides As Metamaterials For Enhancement Of 193nm Lithography
Photomask Image Enhancement Using Grating Generated Surface Waves |
| Smith, Henry I. |
Nanometer-Level Alignment And Global Positioning To A Substrate-Embedded Coordinate System
Linewidth Uniformity In Lloyd’s Mirror Interference Lithography Systems
A Prototype Commercial System For Massively-Parallel Maskless Zone-Plate-Array Lithography (ZPAL) |
| Smith, Henry |
(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices
Fabrication Strategies For Filter Banks Based On Microring Resonators |
| Smith, Noel |
Nanoscale To Millimeter Scale Milling With A Focused Ion Beam Instrument |
| Snider, Gregory |
Controlled Chemical Mechanical Polishing Of Polysilicon And Silicon-Dioxide For Si Based Single-Electron Device With Oxide Tunnel Barriers |
| Snow, Arthur W. |
(Invited) Electron-Transparent Cantilevers For TEM Visualization Of Nanodevices |
| Solak, Harun H. |
Fabrication Of Fresnel Zone Plates By Holography In The Extreme Ultraviolet Region |
| Solak, Harun |
In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS |
| Soles, Christopher |
Continuous Patterns With Height Gradients By Nanoimprint Lithography And Thermal Gradient Annealing
Polyhedral Oligomeric Silsesquioxane (POSS) Functional Patterns Directly Fabricated By Nanoimprint Lithography |
| Somorjai, Gabor |
The Effects Of Wet And Dry Cleaning Methods On The Chemical Composition And Morphology Of The Ru Capping Layer Of The Extreme Ultraviolet (EUV) Mask Blanks |
| Sooryakumar, R |
Relief And Trench Formation On Chalcogenide Thin-Films Using Electron Beams |
| Sorel, Marc |
Optical Characterisation Of An HSQ Lithography Process |
| Spaeth, Hans |
Direct Write Electron Beam Patterning Of DNA:Complex Thin Films |
| Sreenivasan, S.V. |
Full Field Imprint Masks Using Variable Shape Beam Pattern Generators
Patterned Media Using Step And Flash Imprint Lithography |
| Stacey, Nick |
Full Field Imprint Masks Using Variable Shape Beam Pattern Generators |
| Standiford, Keith |
A Modeling Approach For Shot Noise Effect On Feature Roughness |
| Stebler, Camille |
(Invited) Transmission Electron Microscopy Sample Preparation Employing A "Triple" Beam Instrument |
| Steckl, Andrew |
Direct Write Electron Beam Patterning Of DNA:Complex Thin Films |
| Steenbrink, Stijn |
(Invited) MAPPER: High Throughput Maskless Lithography |
| Stepanova, M. |
High Density Nanostructure Fabrication by Electron Beam Lithography, Zs. Szabo |
| Stojanovic, Vladimir |
(Invited) The Challenge Of CMOS Photonics And Electronics For Enhanced Microprocessor Performance |
| Strain, Michael |
Optical Characterisation Of An HSQ Lithography Process |
| Striccoli, Marinella |
Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities |
| Stuen, Karl |
In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS |
| Suga, Osamu |
Hydrogen Radical Cleaning Of Carbon Contamination On EUV Mask |
| Sugatani, Shinji |
(Invited) Application And Technology Of EBDW (Electron Beam Direct Writing):The Impact On Its Business Circumstances |
| Sugiyama, Yasuhiko |
Application Of Vector Scanning In FIB Photomask Repair System
Image Quality Improvement In Fib Photomask Repair System |
| Sun, Jirun |
Continuous Patterns With Height Gradients By Nanoimprint Lithography And Thermal Gradient Annealing |
| Sun, Steven |
Evaluation Of Electron Energy Spread In Csbr Based Photocathodes |
| Sun, Yi-Ting |
Large-Area Microlens Arrays Fabricated By Integrated Gas-Assisted UV-Curing Embossing With UV-LED Array Lamp |
| Sundberg, Linda |
Polymer Self-Assembly For Nanopatterning |
| Suzuki, Hidekazu |
(Invited) Transmission Electron Microscopy Sample Preparation Employing A "Triple" Beam Instrument |
| Suzuki, Ikumi |
Multilevel Visualization Of The Local Electric Field At A Sharp Probe Apex By Scanning Electron Microscopy |
| Suzuki, Tsuneo |
Resisitivity Change Of The Diamond-Like Carbon |
| Svintsov, A. |
Refined Coarse-Grain Modeling Of Stamp Deformation In Nanoimprint Lithography |
| Svintsov, Alexander |
Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates
Optimization Of Droplet Volume For UV-NIL |
| Swanson, L. W. |
Range Of Validity Of Field Emission Equations |
| Szikszai, Laszlo |
Detailed Characterization Of HSQ For E-Beam Application In DRAM Pilot Line Environment |
T |
| Tada, Yasuhiko |
Integration Of Electron Beam Lithography With Block Copolymer Self-Assembly For 10nm Scale Nanofabrication |
| Tagawa, Seiichi |
(Invited) Latent Image Formation In Chemically Amplified Extreme Ultraviolet Resists With Low Activation Energy For Deprotection Reaction
Multispur In Chemically Amplified Electron Beam Resists
Dissolution Characteristics Of Chemically Amplified EUV Resist |
| Takagi, Hideki |
Experimental And Numerical Analysis On Recovery Of Polymer Deformation After Demolding In Hot-Embossing Process |
| Takahashi, Haruo |
(Invited) Transmission Electron Microscopy Sample Preparation Employing A "Triple" Beam Instrument |
| Takahashi, Masaharu |
Experimental And Numerical Analysis On Recovery Of Polymer Deformation After Demolding In Hot-Embossing Process |
| Takaoka, Osamu |
Application Of Vector Scanning In FIB Photomask Repair System
Image Quality Improvement In Fib Photomask Repair System |
| Takenaka, Mikihito |
Integration Of Electron Beam Lithography With Block Copolymer Self-Assembly For 10nm Scale Nanofabrication |
| Talin, A. Alec |
Light Modulation With A Nano-Patterned Diffraction Grating And MEMS Pixel |
| Tanase, Mihaela |
Espacer Protective Surface Coat For Cutting-Edge Ion-Beam Lithography |
| Tang, Jing |
Tunable Optical Gain For Negative Index Materials By Integration Of Near-Infrared Emitting Nanocrystals |
| Taniguchi, Jun |
Fabrication Of The Nanoimprint Mold Using Inorganic Electron Beam Resist With Post Exposure Bake
Fabrication Of Anti-Reflection Structures And Carbon Nanofibers Using Only Ion Beam Irradiation To Glassy Carbon |
| Tanimoto, Sayaka |
Evaluation Of Electron Energy Spread In Csbr Based Photocathodes |
| Teepen, Tijs |
(Invited) MAPPER: High Throughput Maskless Lithography |
| Tejnil, Edita |
Pattern Specific Optical Models |
| Tekniker, Fundacion |
Refined Coarse-Grain Modeling Of Stamp Deformation In Nanoimprint Lithography |
| Tesch, Paul |
Nanoscale To Millimeter Scale Milling With A Focused Ion Beam Instrument |
| Thiault, Jerome |
Impact Of Plasma Etching Processes On 193 nm Photoresist: Etch Resistance And Line Width Roughness |
| Thiel, Bradley |
Direct Writing Of High Resolution, Radially-Symmetric Nanostructures By Simultaneous Electron Beam Induced Deposition And Etching |
| Thomas, Darrell |
Development Of Nanoporous Picoliter Reaction Vessels For The Characterization Of Biochemical Systems |
| Thomas, Edwin |
Hydrogen Silsesquioxane Nano-Posts As Decoys For Guiding The Self-Assembly Of Block Copolymers |
| Thoms, Stephen |
Optical Characterisation Of An HSQ Lithography Process |
| Thrum, Frank |
(Invited) The European “MAGIC” Initiative On Massively Parallel Electron Beam Lithography - Resist Technology Status |
| Tirumala, Vijay |
Nanofabrication Of Super High-Aspect Ratio Structures In HSQ From Direct-Write E-Beam Lithography And Hot Development |
| Tiwari, Badri |
Thermal Infrared Detection Using Antenna-Coupled Metal-Oxide-Metal Diode Detectors |
| Tolbert, Laren |
Single Component Molecular Resists With Covalently Bound Photoacids
Next Generation Chemically Amplified Molecular Resists For E-Beam Lithography Based On Epoxide Cross-Linking |
| Torres, Clivia M. Sotomayor |
Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities |
| Tortai, Jean-Hervé |
Epoxy Silsesquioxane Resists For UV Nanoimprint Lithography |
| Toth, Milos |
Nanofabrication By Ultra-High Resolution Environmental Scanning Electron Microscopy
Direct Writing Of High Resolution, Radially-Symmetric Nanostructures By Simultaneous Electron Beam Induced Deposition And Etching |
| Trautmann, Christina |
Self-Aligned Graphitic Nanowires In Diamond-Like Carbon |
| Tseng, Yu-Chih |
Capacitive Characterization Of The Schottky Contact Between Metal And Semiconducting Carbon Nanotube |
| Tserepi, Angeliki |
(Invited) High-Aspect-Ratio Plasma-Induced Nanotexturing Of Polymers (PDMS PMMA, PEEK, ...) For Protein Adsorption Applications |
| Tsong, Tien T. |
Gas Field Ion Source From An Ir/W<111> Single-Atom Tip |
| Tsougeni, Katerina |
(Invited) High-Aspect-Ratio Plasma-Induced Nanotexturing Of Polymers (PDMS PMMA, PEEK, ...) For Protein Adsorption Applications |
| Tsuchiya, Masatoshi |
Development Of The Compact Low-Energy Soft X-Ray CT Equipment For The Soft Material Structural Analysis |
| Tuchfeld, Eduard |
Patterned Epitaxial Nanomagnets For Novel Logic Devices |
| Tulevski, George |
(Invited) Chemical Functionalization For The Selective Placement Of Single-Walled Carbon Nanotubes |
| Tünnermann, Andreas |
Fabrication Of Large-Area Negative-Index Metamaterial By Electron-Beam-Lithography |
| Twigg, Mark E. |
(Invited) Electron-Transparent Cantilevers For TEM Visualization Of Nanodevices |
| Tyryshkin, Alexei |
Spin-Dependent Scattering Off Neutral Donors In Silicon Field-Effect Transistors |
| Tzou, Tsong Tien |
Investigation of Single-Walled Carbon Nanotubes With LEEPS Microscope, Chang Che-Cheng |
U |
| Ukita, Yoshiaki |
Property Of In-Vacuum Direct Photo-Etching Of PTFE Brought By High Energy Synchrotron Radiation Irradiation |
| Ukraintsev, Vladimir |
Enabling Nanometrology For High Aspect Ratio Structures With Carbon Nanotube AFM Probes |
| Unno, Noriyuki |
Fabrication Of The Nanoimprint Mold Using Inorganic Electron Beam Resist With Post Exposure Bake |
| Utke, Ivo |
Optimization Of Nozzle-Based Gas Injection Systems For Focused Electron- And Ion- Beam Induced Processing
Stiffness, Density And Quality Of High Aspect Ratio Cu/C Nanostructures Produced By Focused Electron-Beam Induced Deposition |
| Utsumi, Yuichi |
Property Of In-Vacuum Direct Photo-Etching Of PTFE Brought By High Energy Synchrotron Radiation Irradiation |
v |
| van Dalfsen, K. |
High Density Nanostructure Fabrication by Electron Beam Lithography, Zs. Szabo |
| van de Peut, Ton |
(Invited) MAPPER: High Throughput Maskless Lithography |
| van Delft, F.C.M.J.M. |
Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates |
| van den Boogaart, Marc A. F. |
Dynamic Stencil Lithography On Full Wafer Scale |
| van der Drift, Emile |
Influence Of Resist Temperature During Exposure On Ultra-High Resolution Electron Beam Lithography Using HSQ Resist |
| van der Veen, Friso |
In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS |
| van der Veen, Johannes Friso |
Fabrication Of Fresnel Zone Plates By Holography In The Extreme Ultraviolet Region |
| van Dorp, W.F. |
(Invited) 1 nm Patterning |
| Van Thourhout, Dries |
Reducing Optical Losses In Focused-Ion-Beam Etched Silicon
Focused-Ion-Beam Lithography For Prototyping Of Silicon Photonic Components |
| van Veen, Alexander |
(Invited) MAPPER: High Throughput Maskless Lithography |
| Vidali, Veroniki |
Dissolution Optimization Of Highly Etch-Resistant, Anthracene-Based Molecular Resists |
| Vinogradov, Alexander |
50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser |
| Visnapuu, Mari-Liis |
(Invited) Nanoscale “Curtain Rods” For The Study Of Protein-DNA Interactions |
| Vivas, Javier Romero |
Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities |
| Vizioz, Christian |
Hybrid High Resolution Lithography (E-Beam/DUV) And Etch Process For Achieving Stacked Nanowire MOSFETs |
| Vlachopoulou, Maria-Elena |
(Invited) High-Aspect-Ratio Plasma-Induced Nanotexturing Of Polymers (PDMS PMMA, PEEK, ...) For Protein Adsorption Applications |
| Vo-Dinh, Tuan |
FIB Fabrication Of Metallic Nanostructures On End-Faces Of Cleaved Optical Fibers For Chemical Sensing Applications |
| Volker |
(Invited) Applications Of Focused Electron Beam Processing |
W |
| Wachulak, Przemyslaw |
50 Nm Resolution Extreme Ultraviolet Imaging With A Desktop-Size Laser
Ultra Compact Interferometric Lithography System Realized With A Desk-Top Extreme Ultraviolet Laser |
| Wagner, Raymond |
Direct Writing Of High Resolution, Radially-Symmetric Nanostructures By Simultaneous Electron Beam Induced Deposition And Etching |
| Wallace, John |
40 Nm Pitch Extreme Ultraviolet Interferometric Lithography |
| Wallow, Tom |
Latest Results From The SEMATECH Berkeley Extreme Ultraviolet Microfield Exposure Tool |
| Wallraff, Gregory |
Self-Assembly Of DNA Origami Nanostructures On Lithographically Patterned Surfaces |
| Walsh, Michael |
A Prototype Commercial System For Massively-Parallel Maskless Zone-Plate-Array Lithography (ZPAL) |
| Wang, Chuandao |
Model Studies Of The Photocatalytic Removal Of Carbon From Titanium Dioxide |
| Wang, Chuqing |
Resist Bias Measured From Iso-Focal Structure |
| Wang, Liping |
Aberration Correction For Electron Beam Inspection, Metrology And Lithography |
| Wang, Mingxing |
Understanding The Effects Of Photoacid Distribution Homogeneity And Diffusivity On Lithography Performance In Polymer-Bound PAG Photoresists |
| Wang, S-Y |
λ/12 Sub-wavelength Optical Lithography With A Smooth Superlens |
| Wang, Shih-Yuan |
Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies
Tunable Optical Gain For Negative Index Materials By Integration Of Near-Infrared Emitting Nanocrystals |
| Wang, Ying |
(Invited) Quantized-Patterning Using Nanoimprinted-Blanks |
| Wanzenboeck, Heinz |
Effect of Microstructures on Growth of Human Epithelial Layers
Effect Of Gaseous Additives On Electron Beam Induced Deposition |
| Ward, Bill |
(Invited) Elemental Analysis With The Helium Ion Microscope |
| Watanabe, Takeo |
Coherent Euv Scattering Microscopy |
| Watts, Michael |
(Invited) Challenges In Nanofabrication Of Strong-Confinement Photonic Devices |
| Welander, Adam M. |
Impact Of Trench Width Roughness On The Directed Self-Assembly Of Block Copolymers On Topographic Substrates |
| Welander, Adam |
In Situ Characterization Of Block Copolymer Ordering On Chemically Nanopatterned Surfaces By Time-Resolved SAXS |
| Weller, Dieter |
Patterned Media Using Step And Flash Imprint Lithography |
| Whitlow, Harry James |
Interdigitated Electrode Structures For Osteoblast Growth Studies |
| Wi, Jung-Sub |
Fabrication Of Si Nano-Pillar Array With An Areal Density Of 1012/In2 And Its Nanoimprint Lithography Application
(Invited) Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained From High Resolution Transmission Electron Microscopy
The Modification Of Aperture System For Atomic Image Projection Electron-Beam Lithography (AIPEL)
Two-Step Development Method Of Hydrogen Silsesquioxane Resist For High-Density Electron Beam Nanopatterning |
| Wiederrecht, Gary |
Fabrication Of Metallic Nano-Slit Waveguides With Sharp Bends |
| Wieland, Marco |
(Invited) MAPPER: High Throughput Maskless Lithography |
| Wilkinson, C. |
(Invited) Controlling Cell Behaviour Using Nanopatterned Surfaces |
| Williams, R. Stanley |
Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies
Fabrication Of Amorphous Metallic Nanowires For IC Interconnects By Nanoimprint Lithography
Tunable Optical Gain For Negative Index Materials By Integration Of Near-Infrared Emitting Nanocrystals |
| Wind, Shalom |
Fabrication Of Nanoscale Bioarrays For The Study Of Cytoskeletal Protein Binding Interactions Using Nano-Imprint Lithography
(Invited) Fluorinated Diamond-Like Carbon Templates For High Resolution Nanoimprint Lithography
Fabrication Of Elastometer Pillar Arrays With Modulated Stiffness For Cellular Force Measurements
(Invited) Nanoscale “Curtain Rods” For The Study Of Protein-DNA Interactions |
| Wissen, Matthias |
Contact Angles In A Thermal Imprint Process
Quality Assessment Of Anti-Sticking Layers For T-NIL |
| Witte, Daniel |
Low Temperature Limits For Nano-Graphoepitaxy Of Semiconductors
Preferential Orientation Effects In Partial Melt Laser Crystallization Of Silicon
Mask-Less Wet Etching Using Laser Induced Local Heating |
| Wolfe, John |
An Atom Beam Lithography Tool For Fabricating Dense Nanostructure Arrays
A Multi-Electrode Cuff For Neuronal Sensing In The Locust |
| Woo, Sang-Gyun |
Resist Charging Effect In Photomask: Its Impact On Pattern Placement Error And Critical Dimension |
| Wu, Tsai-wei |
65mm Disk Patterning At 500 Gb/In2 With Full Surface Area Coverage From Diblock Copolymer Templates |
| Wu, Wei |
Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies
Fabrication Of Amorphous Metallic Nanowires For IC Interconnects By Nanoimprint Lithography
Tunable Optical Gain For Negative Index Materials By Integration Of Near-Infrared Emitting Nanocrystals
λ/12 Sub-wavelength Optical Lithography With A Smooth Superlens |
| Wu, Wen-li |
(Invited) Advances In Neutron Research Methods For Photoresists Fundamentals |
X |
| Xia, Deying |
Fabrication Of Porous Nanochannels Using Nanoparticles And Application To The Transport Of DNA Molecules |
| Xia, Qiangfei |
Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies
Fabrication Of Amorphous Metallic Nanowires For IC Interconnects By Nanoimprint Lithography
Tunable Optical Gain For Negative Index Materials By Integration Of Near-Infrared Emitting Nanocrystals |
| Xiao, Shijun |
Reducing Mode-Transition Loss In Silicon-On-Insulator Strip Waveguide Bends |
| Xiao, Shuaigang |
Electron Beam Lithography For Fabricating Heat Assisted Magnetic Recording Heads
(Invited) >1 Tdot/In.2 Bit Patterned Media Template Fabrication By Directed Polymer Self-Assembly
Challenges In 1 Teradot/In.2 Dot Nanoimprint Lithography For Bit-Patterned Media |
| Xie, Pen |
Enhancement Of Hyper-NA Imaging Through Selective TM Polarization |
| Xu, Hongqi |
Nanoelectromechanical Mass Sensor Fabricated By Nanoimprint Lithography |
| Xu, Yuan |
Challenges In 1 Teradot/In.2 Dot Nanoimprint Lithography For Bit-Patterned Media |
Y |
| Yakshinskiy, B. V. |
Carbon Film Growth And Mitigation On Model Electron-Irradiated EUVL Mirror Capping Layers: TiO2 And Ru |
| Yamabe, Masaki |
Electron Beams In Individual Column Cells Of Multi Column Cell (MCC) System |
| Yamada, Akio |
Electron Beams In Individual Column Cells Of Multi Column Cell (MCC) System |
| Yamaguchi, Hiroshi |
Three-Dimensional (3D) Alignment With 10-nm Order Accuracy In Electron-Beam Lithography On Rotated Sample for 3D Nanofabrication |
| Yamamoto, Shigeaki |
Property Of In-Vacuum Direct Photo-Etching Of PTFE Brought By High Energy Synchrotron Radiation Irradiation |
| Yamamoto, Yo |
(Invited) Transmission Electron Microscopy Sample Preparation Employing A "Triple" Beam Instrument |
| Yamazaki, Kenji |
Three-Dimensional (3D) Alignment With 10-nm Order Accuracy In Electron-Beam Lithography On Rotated Sample for 3D Nanofabrication |
| Yamazaki, Y. |
Contrast Reversal Effect In SEM Due To Charging |
| Yan, Minjun |
The Effects Of Molecular Weight On Resist Evaluation Parameters In Poly(Methylmethacrylate) Developed At Sub-Zero Temperatures |
| Yan, Qiliang |
Resist Bias Measured From Iso-Focal Structure |
| Yan, Su-Jan |
Hybridization Sensing By Electrical Enhancement With Nanoparticles In Nano-Gap |
| Yang, J. Joshua |
Fabrication Of Amorphous Metallic Nanowires For IC Interconnects By Nanoimprint Lithography |
| Yang, J. K. W |
Sub-15 Nm Half-Pitch Nanoimprint Molds Using High Resolution Negative Tone Resist And Reactive Ion Etching |
| Yang, Joel |
Optimum Exposure Parameters For High-Resolution Scanning Electron Beam Lithography
Hydrogen Silsesquioxane Nano-Posts As Decoys For Guiding The Self-Assembly Of Block Copolymers |
| Yang, Sen-Yeu |
Large-Area Microlens Arrays Fabricated By Integrated Gas-Assisted UV-Curing Embossing With UV-LED Array Lamp
Diffusers With Both Surface-Relief And Particle-Diffusing Functions Fabricated Using Hybrid Extrusion Roller Embossing |
| Yang, XiaoMin |
Electron Beam Lithography For Fabricating Heat Assisted Magnetic Recording Heads
(Invited) >1 Tdot/In.2 Bit Patterned Media Template Fabrication By Directed Polymer Self-Assembly
Challenges In 1 Teradot/In.2 Dot Nanoimprint Lithography For Bit-Patterned Media |
| Yang, Yugu |
FPGA Implementation Of Real-Time Spatial-Phase Locking For Electron Beam Lithography |
| Yasaka, Anto |
Application Of Vector Scanning In FIB Photomask Repair System
Image Quality Improvement In Fib Photomask Repair System |
| Yasuda, Hiroshi |
Electron Beams In Individual Column Cells Of Multi Column Cell (MCC) System |
| Yasuda, Masaaki |
Experimental And Theoretical Study On The Demolding Mechanics Experimental And Theoretical Study On The Demolding Mechanics In Imprint Process |
| Ye, Jun |
X-Ray Diffraction Microscopy: Reconstruction With Partial Magnitude And Spatial A Priori Information |
| Yemini, M. |
Formation Of Nano Holes By An Electron Beam- Induced Etching Process |
| Yeo, Jeongho |
Study Of Machine To Machine Overlay Error For Sub-60-Nm Memory Devices |
| Yoon, Fern |
Stability Of HSQ Nano-Lines Defined By E-Beam Lithography |
| Yoon, Kwang-Sub |
Full Field Imprint Masks Using Variable Shape Beam Pattern Generators |
| Yoshida, Hiroshi |
Integration Of Electron Beam Lithography With Block Copolymer Self-Assembly For 10nm Scale Nanofabrication |
| Younkin, Todd |
Improvement In Line Width Roughness (LWR) By Post-Processing |
| Yu, Zhaoning |
Optical Negative Index Meta-Materials At 1.55 µm Wavelength And Geometry Dependency Studies
λ/12 Sub-wavelength Optical Lithography With A Smooth Superlens
Challenges In 1 Teradot/In.2 Dot Nanoimprint Lithography For Bit-Patterned Media |
| Yueh, Wang |
Improvement In Line Width Roughness (LWR) By Post-Processing
Single Component Molecular Resists With Covalently Bound Photoacids
Next Generation Chemically Amplified Molecular Resists For E-Beam Lithography Based On Epoxide Cross-Linking
Understanding The Effects Of Photoacid Distribution Homogeneity And Diffusivity On Lithography Performance In Polymer-Bound PAG Photoresists |
Z |
| Zaitsev, S. |
Refined Coarse-Grain Modeling Of Stamp Deformation In Nanoimprint Lithography |
| Zaitsev, Sergey |
Optimum Dose Distribution For Argon Ion Multi-Beam Sputtering Of Microlens Array Templates
Optimization Of Droplet Volume For UV-NIL |
| Zalkind, S. |
Carbon Film Growth And Mitigation On Model Electron-Irradiated EUVL Mirror Capping Layers: TiO2 And Ru |
| Zeiss, Carl |
(Invited) Elemental Analysis With The Helium Ion Microscope |
| Zelsmann, Marc |
Epoxy Silsesquioxane Resists For UV Nanoimprint Lithography
Losses Compensation In Metallic Nanocomposite Polymer By Optical Gain: Application To Nanoimprinted Microcavities
Comparison Of Monomer And Polymer Resists In Thermal Nanoimprint Lithography |
| Zhang, Feng |
A Prototype Commercial System For Massively-Parallel Maskless Zone-Plate-Array Lithography (ZPAL) |
| Zhang, L |
Tools For Resist Heating Analysis And Compensation For Electron Beam Tools |
| Zhang, Yanxia |
Experiments Towards A High Brightness 100-Electron-Beam Source |
| Zhao, Lin |
Generating Manhattan Patterns Via Cutting And Stitching Of Gratings |
| Zhao, Wei |
Relief And Trench Formation On Chalcogenide Thin-Films Using Electron Beams |
| Zhao, Xiaomei |
Imprinted Large-Scale High Density Polymer Nanopillars For Various Applications |
| Zhao, Yong |
Spatial-Frequency Multiplication With Multilayer Interference Lithography |
| Zhong, Zhaohui |
(Invited) Speed and Spin-Orbit: New Results in Carbon Nanotubes |
| Zhou, Jianming |
Enhancement Of Hyper-NA Imaging Through Selective TM Polarization |
| Zhou, Jing |
Continuous Patterns With Height Gradients By Nanoimprint Lithography And Thermal Gradient Annealing |
| Zorzos, Anthony |
The Use Of Ionic Liquid Ion Sources (ILIS) In FIB Applications |
| Zuckermann, Ronald |
(Invited) DNA Directed Assembly Of Nanoparticles Linear Structure For Nanophotonics |
| Zurbuchen, Thomas H. |
Plasma-Etch Fabrication Of High Aspect Ratio Freestanding Silicon Nanogratings As Deep UV Filters |
