Call for Papers
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EIPBN 2010

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Call for Papers

Download 1st Call for Papers in PDF  Form here. pdffile

TECHNICAL SCOPE

Abstracts representing high quality original research are desired
for both poster and oral presentation
in the following areas:

  • Directed Assembly
  • Electron Beams
  • Emerging Technologies
  • Extreme UV Lithography
  • Focused Ion Beams
  • Mask and Maskless Lithography
  • Metrology and Imaging
  • Microfluidics
  • Modeling
  • Nanobiology
  • Nanoelectronics
  • Nanoimprint
  • Nanomechanics and Nanometrology
  • Nanophotonics
  • Nanostructures and Processing
  • Novel Imaging
  • Optical Lithography
  • Patterned Media and Data Storage
  • Resists

Topics in nanostructures and emerging technologies include:

  • Self assembly
  • Optical structures
  • Carbon nanotubes
  • Tip based processing
  • Graphene

ABSTRACT SUBMISSION

Abstract submission will be available online in early December at this location:
http://www.eipbn.org/abstract-submission/

The quality of the abstracts will form the basis for selection of papers for the conference
and will be peer reviewed according to the following criteria:

  • Originality of work
  • Specific results achieved and described
  • Potential impact and interest to the attendees

Abstract deadline: January 11, 2010 extended to Jan. 16, 2010.

Abstracts are limited to one page of text (12 point or larger type)
and a second, optional page with up to four figures.

To download an example of a formatted abstract, click here.

Late submissions may be considered but only if they report truly outstanding results.
Please prepare abstracts carefully and describe accomplishments specifically.
Authors will be notified of acceptance by April 12, 2010.
Earlier notification will be provided to those authors providing an e-mail address.

MICROGRAPH CONTEST

On a less technical level, EIPBN offers the opportunity to immortalize your favorite micrograph(s).
Categories and previous winners are described in more detail at the Micrograph Contest page.


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