EIPBN 2010
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Technical Section Heads
| Electron Beam Lithography | Alan Brodie, Ernst Kratschmer, Lloyd Harriott, Todd Hastings, Alex Liddle, Stephen Rishton, Michael Rooks, Richard Tiberio |
| EUV Lithography | Kevin Cummings, Kenneth Goldberg, John Hartley |
| Ion Beam Nanofabrication | Nicholas Economou, Hans Loeschner, John Melngailis |
| Optical Lithography | Steve Brueck, Tim Brunner, Mordi Rothschild, Shinju Okazaki |
| Maskless Lithography | David Joy, Juan Maldonado, Rajesh Menon, Dan Pickard |
| Computation Lithography, Modeling, Simulation and CAD | Roxann Engelstad, Marty Peckerar, Frank Schellenberg, Kevin Turner, Larry Melvin |
| Nano-Imprint, Soft Lithography | Steve Chou, Dan Kercher, Minghao Qi, Doug Resnick, Grant Wilson |
| Resists | Robert Brainard, Ted Fedynyshyn, Chris Soles, Greg Wallraff, Frances Houle |
| Masks | Uwe Behringer |
| Metrology, Imaging and Alignment | Eric Anderson, Euclid Moon, Phillip Russell, Ralf Heilmann, Leili Baghaei |
| Atomic, Molecular Scale, and Tip Based Processing | John Randall, Cindy Hanson, Gabriel Zeltzer |
| Nanofabrication: Directed Self Assembly | Joy Cheng, Paul Nealey, Hiroshi Yoshida, Ricardo Ruiz |
| Nanofabrication | Evangelos Gogolides, Mark Horn, Joel Wendt, Deirdre Olynick, Derrick Manchini |
| Nanomaterials: graphene, nanotubes, metamaterials and flexible electronics | Raghunath Murali, Qiangfei Xia, George Malliaras |
| Nano-Photonics Applications | Roberto Panepucci, Richard Blaikie, Steven Brueck, Shanhui Fan, Henry Smith |
| Nano-Biology Applications | Franco Cerrina, Fran Ligler, Chris Wilkinson, Shalom Wind, James Grote |
| Nano-Electronics Applications | Jeff Bokor, John R. A. Cleaver, Karl Berggren |
| Emerging Technologies | Chuck Black, Daniel Herr, David Tanenbaum, Michael Fritz, Shinji Matsui, Fabian Pease |
| Ultrahigh density data storage | Caroline Ross, Kim Lee, Xiao Shuaigang, Solomon Assefa, Christie Marrian |
| Nano-MEMS | Leo Ocola , Julia Greer |
