EIPBN 2010
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Invited Presentations
Directed Assembly
Biomolecular Architectures and Systems for Nanoscience Engineering
Jennifer Cha |
Multiscale Modeling of Block Copolymer Directed Assembly and its Application to Sub-Lithographic Patterning
Juan de Pablo |
Electron Beams
Electron beam lithography, the first fifty years, and prospects for the future
Timothy Groves |
REBL: A maskless ebeam direct write lithography approach using the Reflective Electron Beam Lithography concept
Paul Petric |
High Current electron optical design for REBL direct write lithography Mark McCord KLA-Tencor |
Emerging Technology
Self-aligned Epitaxial Graphene MOSFETs with a record field-effect mobility of 6000 cm2/Vs on 50 mm wafers
J.S. Moon |
Shrink-Induced Nanofabrication Michelle Khine |
Application specific CVD growth of carbon nanotubes
Dieter Kern |
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EUV Lithography
Wavelength Specific Reflections–A Decade of EUV Mask Inspection Research
Kenneth Goldberg |
Focused Ion Beams
Focused ion beam nanofabrication – new possibilities
John Melngallis |
High Brightness Plasma Ion Source Developments for Next Generation FIB and Surface Analysis
Noel Smith |
Masks & Maskless
Electron-Beam Templating of Capillary-Force-Induced Nanocollapse
Karl Berggren |
Analog Lithography with Phase Masks in Projection Exposure Tools
Eric Johnson |
Metrology
Positioning and Measuring at the Nanometric Level Over Macroscopic Distances
Robert Hocken |
Microfluidics
A Microfluidic Toolbox for Lab on a Chip Devices
Bruce Gale |
Modeling
Mask topography induced phase effects and wave aberrations in optical and EUV lithography
Andreas Erdmann |
Nanobiology
From cells-on-chip towards lab-in-a-cell
Severine Le Gac |
Nanoelectronics
Scaling in Carbon Electronics
Zhihong Chen |
Nanoimprint
Convenience of T-NIL with combined processing . Hella-Christin Scheer |
Defect Inspection for High Volume Patterned Media
Doug Resnick |
Research and Development on Process Science and CD Control in High-Throughput UV Nanoimprint Shinji Matsui |
Molecularly selective nanopatterns using nanoimprint lithography: a label-free sensor architecture
Lars Montelius |
Nanophotonics
Silicon Photonics in High Performance Computing
Michael Watts |
Three Dimensional Silicon-on-Insulator based Optical Phased Array for Agile and Large Angle Laser Beam Steering Systems
Ray Chen |
Large-Area Linear and Nonlinear Nanophotonics
Steven Brueck |
Nanostructures
Focused Ion Beam (FIB), E-beam lithography, and in-situ Microscopy in Investigating Mechanical Properties of Nano-Scale Materials.
Julia Greer |
Biomolecular-Scale Engineering
Shalom Wind |
Mode-Locked Nanomechanical Electron Shuttles for Phase Coherent Frequency Conversion
Robert Blick |
High performance lithographically defined back-gated Si-nanowire MOSFETs with sub-5 nm channel width
Walter Hu |
Novel Optical Imaging
A 1D Gridded Design Style for Hybrid Optical and e-Beam Patterning
Michael Smayling |
Reinventing the SEM – Electrons, Protons, and Ions David Joy |
Patterned Media
Patterned Media: Pushing the Limits of Lithography in Manufacturing Elizabeth Dobisz |
Resists
RLS Performance Trade-offs for a Polymer Bound PAG EUV Resist Roel Gronheld |