Don Tennant Abstract:
Electron Beam Lithography is an enabling technology for both prototyping of nanostructures and the commercial production of photomasks. This lecture will provide an overview of the instruments, the technologies that have allowed them to progress, the processes and methods employed by practitioners, and the applications that have been made possible. The course should help you understand the difference between SEM based lithography and that performed with a dedicated EBL system and how to exploit its enabling capabilities.
Bio:
Don Tennant serves as Director of Operations of the Cornell NanoScale Science and Technology Facility (CNF) after long career at Bell Labs where he was a Distinguished Member of Technical Staff and managed the Advanced Lithography Group. His work in the nanofabrication field has had significant impact on a wide range of disciplines, including: soft x-ray imaging, high precision grating production for optical network components, extreme ultraviolet lithography (EUVL), and gate technologies for high performance devices and circuits. He has authored or co-authored over 200 articles in these fields, organized major conferences and has been awarded 11 U.S. patents. Don currently serves on the Advisory Committee for the International Conference of Electron, Ion, and Photon Beams and Nanotechnology (EIPBN). He is a past chairman of the Nanoscale Science and Technology Division of the AVS and was named a Fellow of the Society in 2010.