Jacques Gierak Co presenting with Sven Bauerdick
Abstract:
In this presentation we will review some fundamentals of the Focused Ion Beam (FIB) technique based on scanning finely focused beams emitted from Electro Hydrodynamic Emitters (EHD) to perform direct writing [1]. It is widely assumed that the spatial extension of the phenomena induced by FIB irradiation represents a severe drawback, presumably limiting the use of this method for the realization of highly localized structures. At the light of advanced experiments and analysis techniques we will review these limitations and thus explore FIB for patterning sensitive devices such as III-V heterostructures, thin magnetic layers, artificial defects fabricated onto graphite or graphene, engraving nanopores into thin Si-based and atomically thin suspended graphene membranes. This includes the aspect of short ion penetration ranges and high localization of ion-deposited energy for localized damage generation showing the ultimate potential of this technique with respect to spatial resolution and ion doses.
We will introduce the principle and mechanism of liquid metal ion source (LMIS) operation and explain achievements for its performance in particular for Ga. Moreover the technology and range of available ion species of alloy sources (LMAIS) are presented and discussed [2]. We will conclude in presenting the instrumental routes we are exploring aiming at higher resolution, better stability and various ion species as well as turning FIB processing “limitations” into decisive advantages. Such new routes for the fabrication of devices or surface functionalities are urgently required in some emerging nanoscience applications and their developing markets.
[1] J. Gierak, R. Jede, and P. Hawkes “Nanolithography with Focused Ion Beams”, in Nanofabrication Handbook S. Cabrini and , S. Kawata ed., 2012 CRC Press
[2] L. Bischoff, P. Mazarov, L. Bruchhaus, J. Gierak “Liquid metal alloy ion sources – An alternative for focused ion beam technology”, Appl. Phys. Rev. 3, 021101 (2016)
Academic History:
Engineer (1996) and Doctor of the Conservatoire National des
Arts et Métiers – Paris (2002)
Joins CNRS in 1984
IRHC – Head – Pole « Instrumentation » at Centre National de Nanosciences et de Nanotechnologies (C2N)
Professional Statement:
My current interests are in inventing, experimentally developing and analytically understanding non-conventional “Focused Ion Beams” solutions capable of pushing the frontiers in nanofabrication and materials science.
I am an experimentalist at heart and in practice. I am passionate about hands-on work – both my own and that of my collaborators and my students. When I approach problems analytically, it is important for me to verify the adequacy of formulations and hypothesis through experimental results.
I have introduced the concept of nanofabrication using Focused Ion Beams with numerous applications in technological and materials science. I hold patents on these technologies and have published pertinent results in journals and conferences.
As an individual with an insatiable curiosity, deep and persistent interest for learning, and a fervent desire to share what I have learnt with others, I will continue to explore new areas – some of which may have no immediate application but which are intellectually appealing to me, challenging and, very importantly, motivating.