![](https://eipbn.org/2022/wp-content/uploads/2021/07/MASK_2022-175.png)
![EIPBN 2022](https://eipbn.org/2022/wp-content/uploads/2021/08/MASK_2022-100.png)
Invited Speaker
Ricardo Ruiz
Lawrence Berkeley National Laboratory
Soft-Matter Hierarchical Assemblies for Nanopatterning Applications
Authors: Boyce Chang, Whitney Loo, Beihang Yu, Scott Dhuey and Ricardo Ruiz
Macromolecular self-assembly with hierarchical order has evolved to become an important and valuable tool for bottom-up patterning and fabrication at the nanometer scale. In the current lithography landscape where precision is gaining relevance over resolution, the high degree of uniformity and functionality of self-assembling hierarchical materials offers new valuable options.
![Ricardo Ruiz](https://eipbn.org/2022/wp-content/uploads/2022/05/RicardoRuiz.jpg)
Soft-Matter Hierarchical Assemblies for Nanopatterning Applications
Session 5A-1: Advanced Lithography and Processing II
Date: Thursday, June 2
Time: 1:40 pm
Location: Napoleon B
Date: Thursday, June 2
Time: 1:40 pm
Location: Napoleon B
Invited Speakers
Leonidas Ocola
Trilayer Process for T-gate and Gamma-gate Lithography Using Ternary Developer and Proximity Effect Correction Superposition
View Abstract