Invited Speaker
Sourabh Saha
Georgia Institute of Technology
High-Throughput Patterning of Sub-Diffraction 3D Structures Through Projection of Femtosecond Light
Author: Sourabh Saha
High-throughput fabrication of 3D structures with sub-diffraction nanoscale features is highly desirable but is challenging. Although two-photon lithography (TPL) can create nanoscale 3D features, commercial systems are too slow. Here, we present a technique based on parallelization of TPL that increases the printing rate by more than a thousand times.
High-Throughput Patterning of Sub-Diffraction 3D Structures Through Projection of Femtosecond Light
Session 3C-1: Advanced Lithography and Processing I
Date: Thursday, June 2
Time: 8:00 am
Location: Napoleon A
Date: Thursday, June 2
Time: 8:00 am
Location: Napoleon A
Invited Speakers
Leeya Engel
Micropatterning of Electron Microscopy Grids for Improved Cellular Cryo-electron Tomography Throughput
View Abstract