Invited Speaker
Christopher Ober
Cornell University
Evolving Approaches to EUV Photoresists: Polyacetals and Polypeptoids Offer New Options
Authors: Jingyuan Deng, Florian Kaefer, Zoey Meng, Rachel Segalman and Christopher Ober
Low stochastics, high sensitivity photoresists remain a goal for EUV lithography. Here we present studies of two polymer systems (poly(phthalaldehydes and polypeptoids) to adjust EUV resist characteristics using two different chemical approaches. We report the results of exposure of these materials to EUV radiation and the chemical changes that occur.
Invited Speakers
Adam Steele
Ion Microscopy, Machining, and Elemental Analysis with the Cesium Low Temperature Ion Source (LoTIS)
View Abstract
Samuel M. Stavis
Boring Beads or Surprising Standards? A Lateral Nanoflow Assay Reveals Flummoxing Fluorescence
View Abstract