Invited Speaker

Christopher Ober

Cornell University

Evolving Approaches to EUV Photoresists: Polyacetals and Polypeptoids Offer New Options

Authors: Jingyuan Deng, Florian Kaefer, Zoey Meng, Rachel Segalman and Christopher Ober

Low stochastics, high sensitivity photoresists remain a goal for EUV lithography. Here we present studies of two polymer systems (poly(phthalaldehydes and polypeptoids) to adjust EUV resist characteristics using two different chemical approaches. We report the results of exposure of these materials to EUV radiation and the chemical changes that occur.

Evolving Approaches to EUV Photoresists: Polyacetals and Polypeptoids Offer New Options

Session 3B-1: Lithographic Materials and Processing
Date: Thursday, June 2
Time: 8:00 am
Location: Bayside

Invited Speakers

Michael Cullinan

Microscale Additive Manufacturing of Metal Interconnects Using Microscale Selective Laser Sintering

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Lars Thorben Neustock

Lars Thorben Neustock Stanford University Shape Optimization of Electrostatic Ion Beam Systems with a 3D Adjoint Boundary Element Method Authors: Lars Thorben Neustock and Lambertus ...

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Nikolai N. Klimov

Real-time Fast Reconfigurable Grating for Neutron and X-ray Interferometry

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