EIPBN, the “3-Beams”, Conference, is the premier conference on the science and technology of nanopatterning. Traditionally focused on electron, ion, and photon beams, (the 3 beams), the technology of nanofabrication covered in this conference has grown to include nanoimprint and molecular self-assembly as well. This conference is the place to hear the newest techniques and the latest advances in patterning and device fabrication technology.
Registration for the 2015 EIPBN is now open at www.yesevents.com/eipbn.
Hotel reservation is available now at: https://resweb.passkey.com/Resweb.do?mode=welcome_ei_new&eventID=11488836
Early registration and special student rates are available. The early registration deadline is May 1, 2015.
EIPBN will offer a short course this year on State-of-the Art Nanofabrication - Fundamentals and Advanced Applications. This course is intended to bring researchers new to the field of nanofabrication up to speed on the fundamentals of techniques such as thin film deposition and etching, block copolymer and e-beam lithography as well as characterization. A detailed discussion of advanced applications of complex nanofabrication will also be presented. The course will run Tuesday, May 26th from 8:30 a.m. to 3 p.m. with a break for lunch.
Short-course student registration scholarships
Students who are also attending the conference may apply to attend the short-course at no additional charge. To apply, please submit a short description of a challenging nanofabrication project or issue that you are currently addressing and what you hope to accomplish by attending the course (300 words or less). Student scholarship applications should be addressed to Dr. Deirdre Olynick (firstname.lastname@example.org) by March 30, 2015. Notification will be given by April 30, 2015.