The EIPBN Conference is recognized as the foremost international meeting dedicated to lithographic science and technology and its application to micro and nanofabrication techniques. The conference brings together engineers and scientists from industries and universities from all over the world to discuss recent progress and future trends.

Abstracts representing high quality original research are invited in the following areas:

  • DUV, immersion, EUV and X-ray lithography
  • Electron and ion beam lithography
  • Sub-half wavelength "super resolution" optical lithography
  • Photon- and charged-particle optics
  • Metrology and alignment
  • Resists and resist processing
  • Plasma etching and deposition
  • Nano-fabrication techniques
  • Maskless Lithography

Topics in nanofabrication and emerging technologies include:

  • Nanoelectronics
  • Nanomagnetic devices
  • Novel ultrahigh density data storage devices
  • Nanoparticle synthesis and assembly
  • Nanofabrication for energy sources
  • Atomic and Molecular manipulation
  • Optical tweezers
  • Simulation and computer aided design for the Nanoscale Era
  • Nanometer scale photonic devices
  • Molecular and low-dimensional nano-electronics
  • Bio-nanotechnology & hybrid bio/solid state devices
  • Micro and nano-scaled MEMS
  • Nano-particle, synthesis and assembly
  • Self-assembly and directed self-assembly
  • Nanoimprint lithography, embossing and soft lithography
  • Nanofabrication for energy sources

Meeting Format

The conference opens on Tuesday afternoon with a special commercial session which features vendors of materials and equipment relevant to this conference. The plenary session is on Wednesday morning. The rest of the conference has two parallel sessions. The length of presentation is 30 minutes for invited papers and 20 minutes for contributed papers, discussion time included. A special feature of the technical program is the poster session that includes invited and contributed papers. There is only one poster session, but posters will be displayed for informal viewing throughout the entire conference. No distinction is made between the importance of poster and oral presentations.
Look here for the current list of invited speakers.

History of EIPBN

We are pleased to feature the following paper on the history of the EIPBN conference:
Click here for paper in .PDF Format History of the "Three Beams" Conference, the Birth of the Information Age and the Era of Lithography Wars Mark L. Schattenburg Space Nanotechnology Laboratory, Massachusetts Institute of Technology

Another item of historical interest is Richard Feynman's 1959 lecture
"There's Plenty of Room at the Bottom"

For a brief history of EIPBN and a listing of all previous conference loactions, look here.

Conference Chair: Stephen Chou Joseph C. Elgin Professor of Engineering
B412 Engineering Quad Princeton University Princeton, NJ 08544 609-258-4416 chou@princeton.edu

Program Chair: Elizabeth Dobisz Hitachi San Jose Research 3403 Yerba Buena Rd. San Jose, CA 95135 Phone: 408-717-5492 Fax: 408-717-9066 e.dobisz@gmail.com

Meeting arrangements: Melissa Widerkehr and Associates 19803 Laurel Valley Place Montgomery Village, MD 20886 Phone: 301-527-0900 x101 Fax: 301-527-0994 melissaw@widerkehr.com

Shipping

Please refer to our "travel" page for shipping instructions.

Related Conferences

Conferences of similar interest are held in the Fall in Europe (MNE) and in Japan (MNC). Check out our "sister conferences" with these links:

MNE 2009
International Microprocess and Nanotechnology Conference, Japan
Gordon Research Conferences
Lithography Workshop

Student Support

Limited funds are available to support student travel. The Conference Chair must receive a request for support from the student's advisor by May 1. Decisions about student support will be returned by about May 15.