Program
Click here for the complete program (pdf)
Program Summary
| Time | Session / Event | Invited Speakers |
| Tues. May 26, 2009 | ||
| 3:00 - 6:45 | Commercial Session | |
| 7:00-10:00 | Welcome Reception | |
| 9:00 | How not to give a presentation | Fabian Pease, Stanford Univ. |
| Hank Smith, MIT | ||
| Wed. May 27, 2009 | ||
| 8 AM -12:20 PM | Plenary Session | |
| Nanostructure Incorporation in Analytical Systems | Harold Craighead, Cornell Univ. | |
| Nanoscale Chemical Patterning | Paul Weiss, Penn State Univ. | |
| Applying lessons from atom-scale science to develop true single-atom sized electron and ion sources | Robert Wolkow, Univ. of Alberta | |
| Information on a Small Scale: The Power of Nanophotonics | Evelyn Hu, Harvard Univ. | |
| How Will We Manufacture at the Nanoscale? | Tom Theis, IBM Watson | |
| 12:20 - 1:30 | Lunch | |
| 1:30 - 3:30 PM | Oral Sessions | |
| 2A | Directed Block Copolymer Self Assembly | Joy Cheng, IBM Almaden |
| 2B | Nano-imprint Process | William King, Univ. of Ill. |
| 2C | eBeam Tools | |
| 2D | Optical Lithography | Martin Burkhardt, IBM Fishkill |
| 3:30 - 6:45 | Poster Session | |
| Thurs., May 28, 2009 | ||
| 8:00 - 10:10 AM | Oral Sessions | |
| 3A | EUV | |
| 3B | Ion Microscopy | |
| 3C | Nanowires and Nanoelectronics | Lars Samuelson, Lund University |
| 3D | Cell Guidance | Christelle Prinz, Lund University |
| 10:10-10:30 | Coffee Break | |
| 10:30-12:10 | ||
| 4A | Maskless Lithography I | Mathias Irmscher, ims chips |
| Elmar Platzgummer, IMS Nanofabrication | ||
| 4B | Metrology | Pierre Thibault, Paul Scherrer Institut |
| 4C | Graphene | |
| 4D | Resists | |
| 12:10-1:30 | Lunch | |
| 1:30 - 3:10 | ||
| 5A | Imprint Lithography Applications | Dan Kercher, Hitachi GST |
| 5B | FIB Nanofab | |
| 5C | Nanophotonics | Hong Tang, Yale University |
| 5D | Directed Self Assembly and Novel Nanofabrication | |
| 3:10-3:30 | Coffee Break | |
| 3:30 - 5:30 PM | ||
| 6A | Patterned Media | Gerard Schmid, Molecular Imprints |
| 6B | High Resolution e-Beam Lithography | |
| 6C | Photovoltaics | George Malliaras, Cornell Univ. |
| 6D | Microfluidics | |
| 6:00 - 9:00 | EIPBN09 Banquet | |
| Fri., May 29, 2009 | ||
| 8:00 - 10:10 | ||
| 7A | Masks and Zone Plates | Mark Schatttenburg, MIT |
| 7B | Biomedicene | Viola Vogel, ETH Zurich |
| 7C | Nanomechanics | Julia Greer, Caltech |
| 7D | Beam Induced Processing | |
| 10:10-10:30 | Coffee Break | |
| 10:30 - 12:10 | ||
| 8A | Tip Based Processing | Thomas Kenny, DARPA |
| 8B | Plasmonics | Teri Odom, Northwestern Univ. |
| 8C | Nanoelectronics and Molecular Electronics | Yuji Okawa, MANA, NIMS |
| 8D | FIB Tool Development | |
| 12:10-1:30 | Lunch | |
| 1:30 - 3:00 | ||
| 9A | Maskless Lithography (Optical) | |
| 9B | Emerging Technologies | Fritz Prinz, Stanford University |
| 9C | Nano Optical Devices | |
| 3:10-3:30 | Coffee Break | |
| 3:30 - 5:00 | ||
| 10A | Metrology | |
| 10B | NIL Issues | |
| 10C | Electron Beam Lithography | |
INSTRUCTIONS FOR PRESENTATIONS
Poster Presentations:
Poster boards are supplied by EIPBN.
Regular Posters: The allotted space is 4 x 4 ft, onto which EIPBN attaches a title banner to the top, 6 inches high and 36 inches long. Each poster will share a single 8 ft wide board with another poster. Please do not make your poster larger than your allotted space.
Invited posters: The allotted space is an entire 8 x 4 ft board. EIPBN09 attaches a title banner of 6 x 36 inches to the top of the poster board.
Oral Presentations:
Regular Presentations: Each regular presentation is allotted 20 minutes total. The presenter should plan a talk for 17 min. and allow 3 min. for questions.
Invited Presentations: Each invited presentation is allotted 30 min. total. The presenter should plan a talk for 26 min. and allow 4 min. for questions.
Plenary Presentations: Each plenary presentation is allotted 40 min. total. The presenter should plan a talk for 35 min. and allow 5 min. for questions.