Plenary Speaker

Tony leads a global organization that works on identifying mid- and long-term technological directions in semiconductors and accompanying patterning solutions in close collaboration with other organizations within ASML, imec, and universities. Prior to joining ASML, he was with TSMC where he led the development of its lithography processes and the development of EUV lithography, including its mask technology, for high-volume manufacturing.

Tony received his BSEE degree from Purdue University and his SM, EE, PhD, and MBA degrees from MIT. He is a Fellow of the IEEE and a Distinguished Lecturer of the IEEE Electron Devices Society, a Fellow of SPIE and a recipient of its Frits Zernike Award for Microlithography, and a recipient of the Outstanding Electrical and Computer Engineer Award from Purdue where he co-leads its Semiconductor Degrees Leadership Board.