Dear Colleagues:
On behalf of the entire conference organization, I welcome you to the 57th EIPBN Conference. This is the first time that the conference has been held in Nashville and I want to thank the gracious staff, in particular Brad Knapp, at the Gaylord Opryland Resort and Convention Center for their support in making it possible.
Our community represents industry, academia, and government organizations from all over the world reporting on the latest advances in electron‐, ion‐ and/or photon‐beam technologies and nanofabrication. The conference is healthy with over 300 submissions this year from 28 countries. This year’s conference, we are honored to have 4 outstanding plenary speakers and 40 exceptional invited speakers from industry and academia, covering wide‐ranging topics involving nanofabrication. We have also received the endorsement from the American Vacuum Society (AVS), the American Physical Society (APS), the Optical Society of America (OSA) and the Institute of Electrical and Electronics Engineers (IEEE).
I would like to thank Prof. Rebecca Cheung of Scottish Microelectronics Centre, University of Edinburgh, and the Program Chair for EIPBN 2013, for putting together such a great series of sessions that are relevant to the technologies that will impact future nanomanufacturing. Rebecca deserves great applause for the wonderful job she did with this year’s program.
I want to remind you of the importance of the participation of students in our conference. They are the lifeline that has kept this conference relevant for over a half a century. In recognition of our students we have decided to try for the first time a Mentorship Hour where students have the opportunity to talk one‐on‐one with more senior members of our community on career advice. We continue to strive in supporting student travel to our conference. This year we have received major support for student travel from Argonne National Laboratory, NSF, DOE, Raith USA, NuFlare, IBM.
I’d also like to thank the sponsors of the conference and conference‐related events for their support: JEOL USA, Carl Zeiss, Raith USA, SemTech Solutions, GenIsys, ASML, TEL, Vistec, and especially Zyvex Labs for their sponsorship of the Micrograph Contest.
I’d like to thank Todd Hastings of the University of Kentucky for his help planning the Exhibit/Commercial Session. I am also grateful to Philippe Alexis, and Anish Blon (NoDiamonds Web Services) for their help in the EIPBN 2013 Website redesign. A very special thanks to Alan Rowe (Mindful Planet Communications Inc) for the design of his excellent conference logo, and banner; to Katie Moon from the Nashville Convention & Visitors Bureau for making Nashville so welcoming to our conference, to Upma Martin from Gray Line & Nashville Tours for helping organize the after event tour, and the staff from Omnipress for the new EIPBN app, flash drive, and abstract booklet.
In particular I would like to thank the prior EIPBN Chairs Alan Brodie, Reggie Farrow and Frank Schellenberg for their support on different aspects of the conference organization.
It is not possible to properly express my gratitude for the constant support (and good humor) of Melissa Widerkehr and her associates. They truly make EIPBN 2013 happen. Melissa has been a positive force in every aspect of this conference from the initial hotel selection to the menus and the program. Her, her staff along with Brad Knapp and his staff formed a good team that has made this organization of this conference as smooth as can be. It would be hard to thank them enough.
Sincerely,
Leonidas E Ocola, PhD
EIPBN 2013 Conference ChairDear EIPBN13 Attendees,
Welcome to the 57th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication, held in musical Nashville Tennessee! We represent industry, academia, and government organizations from all over the world, and we will be reporting the latest advances in electron-, ionand/or photon-beam technologies and nanofabrication. The conference has come a long way from its modest beginnings serving as the communications forum for important new nanolithography and nanofabrication advances. The conference was an early home for the exciting developments in Nanoimprint Lithography (NIL) for example and continues to have a robust NIL presence today. Traditional strength areas include novel nanolithography, nanofabrication, E-beam and NIL technologies are well represented. Important newer areas such as directed self-assembly, nanophotonics, nanobiology, novel imaging and nanomaterials, like carbon, are coming on strong. This year’s conference, we are honoured to have 4 outstanding plenary speakers from industry and academia, covering wide-ranging topics involving nanofabrication that would have an impact on our future. In addition, there are 40 exceptional invited speakers and posters, covering important areas on unconventional nanoelectronics and nanofabrication, future of EUV, novel imaging, nano-energy, nanobiology as well as carbon-based devices/systems.
The conference is healthy with over 300 submissions this year. To contain all the contributions within 3 days is no mean feat. As well as the 3 parallel oral sessions, there is a large and excellent poster session. The poster session will be divided into two parts – presenters with odd numbers will stand next to their posters in the 1st hour while presenters with even numbers will stand next to their posters in the 2nd hour. The poster session will be run immediately following the Plenary Session on Wednesday May 29. There are also 4 high quality invited posters, following on from tradition, selected from last year’s MNE poster awards. All posters will remain up until 1pm on Thursday. The oral sessions will start on Wednesday afternoon and the parallel sessions have been aligned in time.
The high quality technical program for this conference would not have been possible without the hard work and dedication of many people. Special thanks go to the members of the Steering and Advisory Committees, to the Section Heads, and to the Reviewers. They have been helpful throughout, guiding the course of the program, helping select invited speakers, and generating over 1300 reviews for the contributed submissions. Thanks also to Leo Ocola, the Conference Chair, for sending out countless announcements and working the Website and the App; Rich Gerber for his invaluable help in keeping the software up and running; Melissa Widerkehr for her help with the technical program; Leo Ocola for coordinating the Mentorship hour; John Randall for working the Micrograph contest and of course to Leo again for making the conference happen and selecting such a wonderful location.
Most of all, I thank you, the attendees, who ultimately are the conference. Enjoy yourselves, learn a great deal, and spread the good word about the conference to your colleagues and collaborators.
Sincerely,
Rebecca Cheung
Program Chair, EIPBN 2013