Gregory Doerk
Brookhaven National Laboratory (BNL)
Enhancing Nanofabrication through Block Copolymer Directed Self-Assembly
Block copolymer directed self-assembly (DSA) is a powerful nanopatterning approach, capable of generating uniform and periodic patterns with pitches from ~5 to 200+ nm, that complements and enhances traditional lithography. However, seamless integration of DSA into high volume manufacturing remains a central challenge. This tutorial course will review the state-of-the-art in DSA, covering topics including: (1) Essential aspects of self-assembly in block copolymers and strategies for directing them; (2) materials and process advances to improve resolution, defect elimination, and pattern transfer fidelity; (3) DSA for extreme ultraviolet (EUV) lithography pattern rectification and other applications beyond device scaling; and (4) autonomous characterization and metrology of DSA patterns.
About Gregory Doerk
Gregory Doerk is a staff scientist at the Center for Functional Nanomaterials (CFN), a Department of Energy (DOE) scientific user facility operated at Brookhaven National Laboratory. Dr. Doerk earned his PhD in Chemical Engineering from the University of California, Berkeley in 2010. Prior to joining the CFN, he performed postdoctoral research at IBM, investigating polymer directed self-assembly for integrated circuit patterning, and then worked as a research staff member at HGST, a Western Digital company. Dr. Doerk is a co-author of 60 publications, a co-inventor of 5 patents, and a recipient of the 2021 DOE Office of Science Early Career Research Program Award. His current research merges polymer self-assembly, new instrumentation and high-throughput methods to produce novel materials for chemical separations, advanced electronics and energy harvesting.
