Dear Colleagues:
On behalf of the entire conference organization, I welcome you to the 53rd EIPBN Conference and to Marco Island, Florida, “Caribbean in US.” We hope you will enjoy all that the exciting meeting and the beautiful location have to offer.
Thanks to your contributions, EIPBN Conference this year received over 425 abstracts -- the highest in the conference history. Considering the current economic downturn, such high abstract submission demonstrates the continuing importance of nano-patterning to the 21st century science and technology. We thank all of you, the participants, for the time, effort and expense you devoted to EIPBN this year. We also thank Program Chair Elizabeth Dobisz for her efforts in assembling an outstanding set of plenary and invited talks and in managing the abstract review and selection, as well as presentation scheduling.
The conference organization makes a special effort to help young researchers attend the conference. The financial contributions of the Defense Advanced Research Programs Agency (DARPA), the National Science Foundation (NSF), the American Vacuum Society (AVS), as well as IEEE, Synopsys, Raith, GenISys, and JEOL, helped to hold down costs at this conference and to assist students with travel expenses. We greatly appreciate their strong support.
On behalf of the Steering Committee, I extend special thanks to Melissa Widerkehr and Wendy Walker of Widerkehr and Associates for their invaluable help with all aspects of the meeting. Michael Rooks (Yale University) [Web Operations] and Alan Brodie (KLA-Tencor) and Rob Ilic (Cornell University) [the Commercial Session Committee] are gratefully acknowledged for their contributions to the conference. Deep appreciation goes to John Randall for once again organizing the EIPBN Micrograph Contest, to Henry Smith for writing student support proposals to NSF, and to Don Tennant of Cornell University for acting as the EIPBN Financial Trustee. And I thank the management and staff of Marco Island Marriott Beach Resort for helping to make the conference a success.
Finally, I want to thank my administrator at Princeton University, Jessica Johnson, for her enormous efforts and professional perfection in managing and performing many tasks of an EIPBN Conference Chair.
Elizabeth and I welcome you to a very exciting week on Marco Island at EIPBN 2009!
Sincerely,
Stephen Y. Chou
EIPBN 2009 Conference ChairDear EIPBN09 Attendees,
Welcome to Marco Island and to the 53rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication. We have come together from industry, academia, and government from all over the world to discuss issues at the forefront of patterning science and nanofabrication technology. This year is the 50th anniversary of Prof. Richard Feyman’s talk, “There is Plenty of Room at the Bottom.” Fifty years later, as reflected by the program, there is still plenty of room at the bottom.
This year, we had a record number of submissions (over 400). With so many outstanding submissions, the conference has four parallel oral sessions. There are special sessions on lithographically directed self assembly, applications of nanoimprint lithography, applications of both directed self assembly and nanoimprint lithography to data storage, tip based processing, and newly emerging high resolution metrology techniques. There are sessions devoted to applications of newly emerging materials for photovoltaics, energy storage, and carbon nanoelectronics. In addition, the nanofabrication for cell growth, medical devices, and nanomechanics are addressed. There are also many high quality papers in electron beam lithography, beam based processing, and maskless lithographies. Recent progress on EUV lithography, and optical lithography are also presented. There are many well noted invited speakers to address fabrication at the atomic, molecular, and cellar levels, new metrology, and critical technology enabled fields of Si photonics, plasmonics and nanomechanics. The papers and posters for the conference have been carefully selected to cover the leading research associated with electron, ion, and photon beams and nanofabrication.
The high quality technical program for this conference would not have been possible without the hard work and dedication of many people. Special thanks go to members of the Steering and Advisory Committees, as well as the Section Heads and others who made invaluable suggestions for topics and invited speakers. Especially great thanks to those who helped perform over 2500 critical abstract reviews, ensuring that each abstract received at least 6 reviews. Many of you will be called upon shortly to review manuscripts for the conference proceedings, which will be published in the Journal of Vacuum Science and Technology. Thanks, also to Rich Gerber at softconf.com for his help in customizing the abstract submission, review, and selection software for our conference. I would like to thank Mike Rooks for his help in e-mailing the conference notifications and maintaining the conference web site. I also thank Melissa Widerkehr and Corin Ford, at Widerkehr and Associates, for their indispensable assistance in putting the technical program together. Last, but not least, thanks to Conference Chair Stephen Chou for arranging the excellent Conference site and conference facilities.
Most of all, I want to express my sincere gratitude to you, the attendees, for ultimately making the conference a success. I hope you enjoy this year’s conference.
Sincerely yours,
Elizabeth Dobisz
Program Chair, EIPBN 2009