Dear Colleagues:
On behalf of the entire conference organization, I welcome you to the 58th EIPBN Conference. This is the third time that the conference has been held in Washington, with previous conferences in 1976 (7th ICEIBST) and 2001 (45th ICEIPBTN). I want to thank the gracious staff, in particular Victoria Maltby, at the Omni Shoreham Hotel for their support in making it possible.
Our community represents industry, academia, and government organizations from all over the world reporting on the latest advances in electron‐, ion‐ and/or photon‐beam technologies and nanofabrication. The conference is healthy with over 300 submissions this year from 28 countries. At this year’s conference, we are honored to have 3 outstanding plenary speakers and 33 exceptional invited speakers from industry and academia, covering wide‐ranging nanofabrication topics. We have also received the endorsement from the American Vacuum Society (AVS), the American Physical Society (APS), the Optical Society of America (OSA) and the Institute of Electrical and Electronics Engineers (IEEE).
I would like to thank Professor Karl Berggren of the Massachusetts Institute of Technology, the Program Chair for EIPBN 2014, for putting together such a great series of sessions that are relevant to the technologies that will impact future nanomanufacturing. Karl deserves great applause for the wonderful job he did with this year’s program. Karl and I were colleagues for a while at MIT Lincoln Laboratory and it was a pleasure working with him again, it does provide a certain Lincoln theme to the conference.
I want to remind you of the importance of the participation of students in our conference. They are the lifeline that has kept this conference relevant for over a half a century. Due to its success last year, we are again having a Mentorship Hour where students have the opportunity to talk one‐on‐one with more senior members of our community on career advice. I would like to acknowledge Dr. Leonidas E. Ocola of Argonne National Laboratory for organizing this year’s Mentorship Hour and Professor Martin Feldman of Louisiana State University for organizing this year’s Virtual Job Fair. We continue to strive to support student travel to our conference. This year we have received major support for student travel from Semiconductor Research Corporation, Raith, Elionix, Mentor Graphics, Tokyo Electron (TEL), Argonne National Lab, Oak Ridge National Laboratory, and the Department of Energy. I would also like to thank the sponsors of the conference and conference‐related events for their support: JEOL USA, ASML, STS‐Elionix, and the National Institute of Science and Technology.
Thanks also to Professor John Hartley of the State University of New York at Albany for his help planning the Exhibit/Commercial Session and Professor Todd Hastings and Dr. Michael Guillorn of IBM for assisting in contacting both conference sponsors and exhibitors. In particular I would like to thank the prior EIPBN Chairs Alan Brodie, Reggie Farrow and Leonidas E. Ocola for their support on different aspects of the conference organization. A very special thanks goes to Chester Beals of MIT Lincoln Laboratory for the design of his excellent Lincoln‐themed conference logo.
The conference will step up its banquet this year holding it in the Smithsonian American Art Museum & National Portrait Gallery. The Great Hall, accentuated by late 19th century architectural highlights, was the reception area where President Lincoln and Mrs. Lincoln greeted guests attending the president’s second inaugural ball. I need to acknowledge Chavon Jones of the Smithsonian American Art Museum for all of her help in holding our banquet at this wonderful site and Tracy Toth for catering the event.
It is not possible to properly express my gratitude for the constant support (and good humor) of Melissa Widerkehr and Wendy Walker. They truly make EIPBN 2014 happen. Melissa and Wendy have been a positive force in every aspect of this conference from the initial hotel selection to the menus and the program. Their experience and teamwork have made the organization of this conference as smooth as can be. It would be hard to thank them enough.
I’m looking forward to seeing you at the conference, pack your stovepipe hats and plan to spend some time before and after the conference visiting the wonderful sites and attractions in Washington DC.
Sincerely,
Theodore H. Fedynyshyn, PhD
EIPBN 2014 Conference ChairDear EIPBN14 Attendees,
Welcome to Washington DC and to the 58th annual International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication. This conference is the oldest conference focussed on lithography, but remarkably, its topics remain relevant and indeed the current research climate in the U.S.A. and the world have made the conference program maybe more relevant today than it ever has been.
Over the past few years, nanomanufacturing has become the a focus of research across the U.S. government and the world, and pattern formation—the largest single nanomanufacturing area covered by this conference— is a key part of nanomanufacturing. Whether it be the initial stage of pattern creation (represented here by topics as diverse as electron-beam lithography and three-dimensional nanoprinting by using two-photon processes) or massive high-resolution pattern replication (represented by topics such as EUV lithography and nanoimprint), the conference covers it all.
The field of nanopatterning has grown, however, to encompass topics such as self-assembly, directed-selfassembly, and biomolecular assembly. In each case, modelling, pattern transfer methods, and applications need to be investigated, and these are all reported here.
Importantly, these patterning methods uniquely enable certain applications in nanoelectronics, nanophotonics, medicine, and nano- and micro-mechanics, and these topics are all well-covered in the conference. We also will have a special all-invited session devoted to more unusual and creative applications of nanotechnology, outside of our usual topics. This will include such diverse topics as nanophotonics made from chocolate, and microscopes made out of paper.
There will be close to 300 presentations at the conference this year, covering these diverse topics. The conference will start with 3 plenary talks Wednesday morning, immediately followed by a two-hour-long poster session. Posters will stay up until 1 p.m. on Thursday so that they can be discussed during breaks between sessions. A number of posters were given special status of invited posters—these posters will be eligible for a “best poster” award, to be presented at the conference banquet. The remainder of the conference will be divided into three parallel sessions. Talks have been aligned whenever possible, but unfortunately this was not possible in every case.
Putting a project of this magnitude together requires a lot of effort by a lot of people, and I would like to thank them all. Special thanks go to the members of the Steering and Advisory Committees, to the Associate Program Committee Chairs, J. Alex Liddle, Joel Yang, Deirdre Olynick, Patrick Watson, and Michael Guillorn, and of course to all our reviewers. They have been helpful throughout, guiding the course of the program, helping select invited speakers, and generating over 1000 reviews for the contributed submissions. Thanks also to Ted Fedynyshyn, the Conference Chair, for sending out countless announcements and working the website; Rich Gerber for his invaluable help in keeping the software up and running; Mauro Bortolussi and Melissa Widerkehr for her help with the program; John Randall for working the Micrograph contest and of course to Ted again for making the conference happen and selecting such a wonderful location.
I want to echo the words of last year’s program chair—the attendees are the conference, so please make it a memorable one!
Sincerely,
Karl K. Berggren
Program Chair, EIPBN 2014