Dear Colleagues:

Welcome to the 61st International Conference on Electron, Ion, and Photon Beam Technologies and Nanofabrication (EIPBN). We would like to thank you for your continued support of and involvement in the conference. Your participation continues to help make “3-Beams” the leading meeting for emerging nanoscale lithography and nanofabrication research. We have three outstanding plenary speakers, a range of exceptional invited presentations, and an exciting array of contributed papers that should make for a terrific conference. The EIPBN community is clearly keeping nanofabrication research vibrant worldwide and continues to impact a remarkable variety of application areas.

I would like to express my gratitude to Dr. Stefano Cabrini from Lawrence Berkeley National Laboratory, this year’s Program Chair, for organizing an outstanding conference program again this year. Dr. Cabrini’s enthusiasm for the many different disciplines and research areas reflected at the conference and his commitment to technical excellence has laid an excellent foundation for what I hope you will agree is a very successful conference. I would also like to thank Dr. Aaron Stein from Brookhaven National Lab for taking charge of organizing the commercial session. We greatly appreciate all of the organizations who are exhibiting and who facilitate our research with their innovative products and services. I should also mention and say thank you to Larry Muray who has organized and is hosting the student mentoring lunch event. Many of you will enjoy the poster sessions throughout the conference, and we should take time to thank Dr. Shida Tan from Intel and Dr. Regina Luttge from the University of Twente for chairing the poster events and also for serving as the award chairs for the conference. I would also like to extend a very large thank you to all of our session chair volunteers who are the ones who really help the conference operate smoothly during the week, we greatly appreciate your continued service to the conference and to our community. Again this year, EIPBN is also offering a short course in State-ofthe-Art Nanofabrication on the opening day of the meeting. I would like to thank Dr. Aaron Stein from Brookhaven National Lab and Dr. Erika Penzo from Lawrence Berkeley National Lab for co-chairing the event and also thank the additional short course instructors, Dr. Philip Rack, Dr. Adam Schwartzberg, Dr. Wei Wu, Dr. Shalom Wind, and Dr. Greg Doerk, for their hard work in making the short course possible. Thanks also goes out to Dr. John Randall from Zyvex for organizing the annual micrograph contest again this year. It is one of the enduring and beloved traditions of the conference.

EIPBN received generous support for conference activities from our many sponsors including: Carl Zeiss Microscopy, LLC, GenISys GmbH, Intel, JEOL USA, INC., NuFlare Technology Inc., Raith America, Inc., STS-Elionix, and the Department of Energy. We cannot thank these organizations enough for their consistent support and for making much of what we do possible. I would like to thank Shida Tan (Intel) for again organizing this year’s Women in Nanotechnology (WIN) luncheon. We are once again endorsed by the American Vacuum Society (AVS), the American Physical Society (APS) and the Optical Society of America (OSA), and we thank them for their continuing commitment to the meeting.

Many others have contributed to the success of EIPBN 2017. I would like to thank all of the EIPBN Organizing Committee members for their input and assistance in putting together the conference, and in particular I would like to thank former conference chairs Theodore Fedynyshyn, John Harley, and Todd Hastings along with upcoming chair Larry Muray for all of their advice and assistance with various aspects of the meeting. I would also like to thank our long serving Financial Trustee Dr. Don Tennant for all of his assistance with financial matters associated with the conference. He has given many years of outstanding service to EIPBN behind the scenes and is looking to retire from the position this year. If you happen to see Don, be sure to pass along a thank you for all the wonderful years of service he has given our community. I would also like to thank Nicki Davis (Nicki Davis Art) who has updated and maintained our conference website and Finley Hartley who provided the original artwork on which the 2017 conference logo is based. I would express my gratitude to the staff at the Walt Disney World Resort, particularly Daniel Lewis and Dianne Vig, who have been a pleasure to work with in planning the conference. Finally, thank you to Melissa Widerkehr and others at Widerkehr and Associates who have helped us to plan and execute almost all aspects of this EIPBN conference. They have been part of the 3-Beams team for many years and are essential to its success.

This is the first time that EIPBN has been to the Walt Disney World resort and we hope you enjoy both the conference and all that resort has to offer. Have a great meeting and we hope you plan to join us again next year for EIPBN 2018.

Sincerely,

Dr. Clifford L. Henderson

EIPBN 2017 Conference Chair

Greetings Attendees,

Welcome to the 61st Electron, Ion, Photon Beam and Nanofabrication Conference. I thoroughly enjoyed serving as Program Chair for this conference representing such a vibrant and productive community of “nanofabrication”.

EIPBN has been in existence for 60 years; our membership ranges from young students at the beginning of their career, to members who have been in this conference for 50 years.

This conference is organized every year to create a place to present our most recent results and, more importantly, we can openly share our ideas with colleagues from all over the world.

Our community is based on three components: Academia, Industry and Research Center. This conference brings together different approaches from various cultures and makes this a special event. For that reason we get the chance to explore basic science, apply science, technical development and final product: we can pursue our greatest dreams and challenges.

Starting with the plenary speakers (one from each of disciplines: academia, industry and national lab) they will present three different missions stemming from the same passion: controlling the matter at nano-dimension level.

The rest of the program is based on the fundamental aspect of EIPB and nanofabrication. Two full sessions on electron beam, two on focused ion beam and one on optical lithography, with two non-beam lithography technologies (Nanoimprinting and Tip-based lithography) all are the core of our program.

A second big part of it includes the correlated disciplines of: resist, pattern transfer, directed assembly, charge particle optics and atomic Layer processes. In addition this year we also have a strong representation of the beam induced deposition and the 3D fabrication that complete the nanofabrication processes.

The third big part of the program is dedicated to the applications that give us the reason for developing this science and technology: nanoelectronics, nanophotonic, NEMS, quantum devices, nanobiology and nanomedicine. These sessions will show how these fields can be improved with the help of better knowledge of the nanofabrication.

Making objects is as important as being able to see to create a deeper understand of their functionalities. Two more sessions are dedicated to the new imaging and characterization.

There are scientist attending this conference that have opened start-up companies; in order to maintain a contact with these emerging companies, during the poster session a special “Startup Showcase” session will allow them the chance to display their activities in a poster. A “Best EIPBN 2017 Start-up Award” will be judged and awarded.

We think it is also important to cultivate the young generation of scientists and for the third year in a row we will offer our Short courses: State-of-the-art Nanofabrication, Fundamentals and Advanced Applications”: This program started by Dr Deirdre Olynick of Lawrence Berkeley National Laboratory is chaired this year by Dr Aaron Stein from BNL and Dr Erika Penzo from LBNL. Topics include reviews of nanoimprinting, nanobiology, DSA, ALD and Beam Induced Processes.

This is an honor to be “your” Program Chair and to have had the opportunity to be part of this incredible program made possible by excellent contribution from all over the world.

I would like to thank past Program Chairs Karl Berggren, Michael Guillorn and Pat Watson for their guidance, and future Program Chairs Regina Luttge and Shida Tan, who, in new roles for steering committee members, are the Poster Session chairs this year. Many thanks too to Cliff Henderson, our conference chair, and Melissa Widerkehr, who turned the abstract concept of the program into something concrete. Members of the Steering Committee, Program Advisory Committee, Program Topic Advisors, and the Program Committee are all listed in the program guide and I cannot thank them enough for their help.

Finally, I would like to emphasize that the EIPBN is run by volunteers. There are traditions, but there are few hard rules. If you have an idea, I urge you to contact (next year’s!) conference and program chairs and make a suggestion. If you want to take the lead on proposing new topic or help in other ways, I am sure you will only find encouragement.

Ciao.

Sincerely,

Stefano Cabrini

2017 EIPBN Program Chair