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| Plenary 1 | 2D Materials Nanosculpting in the Transmission Electron Microscope and Bioelectrons Applications, Electron beams constitute powerful tools to shape and modify materials. I will describe experiments pushing device size to atomic scale, while expanding their function and precision and addressing questions about defects and properties. Experiments include fabrication and operation of nanoribbons and field-effect-transistorsfrom two-dimensional materials and nanopores for biomolecule analysis. |
| Plenary 2 | Nanotechnology for a Genomic Revolution, Since the completion of the HGP, numerous efforts have been put forth to increase the accuracy, simplify the process reduce the amount of time and cost associated with measuring the sequence of any organism. This is now the foundation of modern medicine and is on the verge of a changing the way not only healthcare is performed but also revolutionizing agriculture, forensics and pharmaceutical development around the world. Over the years of 2009 through 2014, myself and a team of research scientists at illumina developed a method to sequence a human genome in less than 48 hours at a coverage of 30X and at the cost of $1000. During this talk, I will give an overview of the technologies developed to make this happen as well as set the stage for the next iteration of innovations paving the path to the $100 genome, being enabled by the NovaSeq platform commercialized by illumina this year. |
| Plenary 3 | Xrays, Electrons and Lithography: Fundamental Processes in Molecular Radiation Chemistry, X-ray radiation chemistry in EUV lithography is fundamentally different from both electron-beam and standard lithography. It is difficult to unravel the detailed EUV reaction mechanisms in condensed resist films. We have performed gas-phase synchrotron experiments that directly measured x-ray molecular absorption cross-sections, secondary electron yields and molecular fragmentation products. |
| 1A-1 (Invited) Electron Beam Lithography I | Patterning Materials at the One Nanometer Length Scale with an Electron Beam, Here we show aberration-corrected electron-beam lithography at the one nanometer length scale using widely available resist poly(methyl methacrylate), and we show successful pattern transfer to semiconductor and metallic materials at the sub-5 nanometer scale. |
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1A-2 Electron Beam Lithography I | The Nanolithography Toolbox: Design Solutions for Nanoscale Devices, We have developed a platform-independent software package for designing nanometer scaled device architectures. The Nanolithography Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices. |
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1A-3 Electron Beam Lithography I |
There are increasing numbers of applications which require high resolution patterning of irregularly shaped non-planar substrates. In-situ laser height readings are inadequate and instead require accurate height maps. We show how these maps, created using an external height mapping system, are used to pattern diamond anvils for high pressure experiments. |
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1A-4 Electron Beam Lithography I |
A lithography process which combined a block copolymer self-assembly and electron beam lithography was researched in order to achieve the positional selective fabrication of nanostructures. Local formations of the both of positive- and negative-tone nanopattern by a very simple process were demonstrated. |
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1A-5 Electron Beam Lithography I | Metal Patterning and Grain Boundary Engineering by Template Assisted Dewetting, We introduce strategies to pattern structures with dimensions ranging from 20 nm to 200 nm by template assisted metal dewetting Initial results show that the grain boundary positions can also be controlled by HSQ structures. Engineering grain boundary position could minimize grain-boundary scattering, thus reducing damping of surface plasmon resonances. |
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1B-1 (Invited) Beam Induced Process I | Three-Dimensional Focused Electron Beam Induced Deposition: Design, A design environment specific to focused electron beam induced deposition (FEBID) will be described. The capability is used to deposit three–dimensional FEBID mesh objects. This process will be demonstrated for the deposition of 3D objects as complex as the truncated icosahedron and triangular bipyramid geometries. |
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1B-2 Beam Induced Process I |
In this work we present an effective postgrowth electrical tuning, via oxygen releasing method, to enhance the content of non-noble metals in deposits directly written with gas-assisted focused-electron-beam-induced deposition (FEBID). It represents a novel and reproducible method for improving the electrical transport properties of Co−C deposits. |
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1B-3 Beam Induced Process I | FEBID Based Direct-Write Nano-Printing of 2D and 3D Plasmonic Gold Structures, In this contribution, we demonstrate a direct-write fabrication approach based on focused electron beam induced deposition (FEBID) which allows for the on-demand fabrication of quasi-planar 2D and freestanding 3D nano-architectures composed of pure gold for plasmonic applications. |
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1B-4 Beam Induced Process I | Direct-writing of nanomagnets for logic circuitry, Nanomagnet logic uses the stray field of single-domain nanomagnets for information processing. Magnetic in-plane nanowires and out-of-plane nanopillars were directly written by focused electron beam induced deposition. We report on (i)custom-designed 3-dimensional nanomagnet arrays, (ii) coercitivity design of each nanomagnet and (iii) successful operation of magnetologic "AND" and "OR" gates. |
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1B-5 Beam Induced Process I | 3D-nanoprinting using Electron Beam Induced Deposition, 3D structures were grown using Electron Beam Induced Deposition. We studied single open ended structures, semi-open ended structures and closed mesh-like structures. The structural integrity increases from the first to the latter type of structures. We will present an overview of undesired effects encountered in 3D-EBID and discuss them. |
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1C-1 (Invited) Nanofabrication for Biology | Nanoscale roughened thin film electrodes for neural probe and bio-sensing applications, Electrochemical roughening method was developed for roughening of sputtered thin-film metal electrodes for neural probe devices. Thin-film electrode surface modification 1) enables reductions to interfacial impedance; 2) improves adhesion with subsequent depositions. Compared to common application in roughening of thick metal foils in sulfuric acid media, an optimal pulse frequency for roughening of thin films was found to be about four times lower than that of thick foils. This method allowed an increase in the effective surface area of macro-electrodes by a factor of 21 due to grain boundary dissolution. Even greater increases in surface area without grain boundary dissolution was achieved by roughening in non-adsorbing electrolyte: aqueous solution of perchloric acid. Use of this method increased the effective surface area by a factor of 44 due to re-deposition of Pt crystals (20-30nm in size) on the macro-electrodes. Non-destructive nano-scale roughening of micro-electrodes (up to 20µm in diameter) for biosensors was enabled through surface templating by electrochemical etching after self-assembly of a nano-sized liquid crystal polymer surface template. We demonstrated that the performance of roughened electrodes is enhanced compared to smooth sputtered thin-film metal electrodes for a range of applications, including stimulation, recording and biosensing. Roughened substrates were also found to improve adhesion of Platinum-iridium alloy and PEDOT films electrochemically deposited over micro-electrode array. |
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1C-2 Nanofabrication for Biology | Fabrication of Cellulose Nano-Structures via Focused Electron Beam Induced Conversion, In this contribution, we introduce Focused Electron Beam Induced Conversion (FEBIC), which relies on the highly localized chemical transfer of a thin cellulose precursor film into pure cellulose. By that, FEBIC enables the fabrication of highly complex cellulose features down to the sub-100 nm regime. |
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1C-3 Nanofabrication for Biology | Transition Metal Dichalcogenides as Cell Culture Platforms, Two-dimensional transition metal dichalcogenides (TMDs) are grown via chemical vapor deposition on SiO2 substrates and seeded with human fibroblast cells; morphometric features were computed to illuminate the influence of TMDs on the adhesive interactions of cells, and TMD presence improved the cellular adhesion and viability on the cytotoxic SiO2 substrate. |
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1C-4 Nanofabrication for Biology | Recirculating Microfluidic Device for Efficient Filtration and Enrichment of Circulating Tumor Cells, We present the fabrication and characterization of a highly efficient CTC filtration and enrichment device based on multilayer lateral-flow particle filtration microfluidic device with recirculating setup. |
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1C-5 Nanofabrication for Biology |
Iron-doped apatite nanoparticles (IDANPs) enhance phage killing of bacteria up to 2 times that of controls.Because phage therapy provides an alternative to traditional antibiotics to which bacteria are becoming increasingly resistant, this finding is of medical relevance.Using electrospinning, we aim to create and evaluate a controlled-release IDANP/phage treatment delivery system. |
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2A-1 (Invited) 3D processes | Atom by Atom Sculpting of Materials using Scanning Transmission Electron Microscopy,
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2A-2 3D processes | Novel 3-Dimensional Photo Lithography using Built-in Lens Mask, We firstly demonstrate 3-dimensional photo lithography by built-in lens mask with single shot exposure using proximity exposure system having coherent illumination optics. 3-dimensional pyramidal flame is successfully obtained by single shot exposure without moving substrate or mask. |
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2A-3 3D processes | Photonics On a Fiber For Wavefront Manipulation, Integration of complex 3D photonic structures onto optical fiber enables to manipulate wavefront of the light without complex optical alignment processes. Conventional nanofabrication technologies are not suitable due to their cost and low throughput. We report novel fiber imprint technology to imprint 3D photonic structures directly onto an optical fiber. |
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2A-4 3D processes | Continuous Patterning of Three-Dimensional Periodic Nanostructures using Roll-to-Roll System, A novel assembly and lithography system by employing continuous automated Langmuir-Blodgett assembly for colloidal particles coating and near -field lithography for 3D patterning. |
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2A-5 3D processes |
In this contribution, we apply the 3D nano-printing technology Focused Electron Beam Induced Deposition (FEBID) for the on-demand fabrication of functional nano-probes on pre-structured self-sensing cantilever for atomic force microscopy based electric and thermal nano-probing. |
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2B-1 (Invited) Imaging and Characterization I | Diffractive Electron Mirror in SEM, In this work, we designed and conducted proof-of-principle experiments to characterize a diffractive electron mirror integrated with a tetrode immersion lens. In addition to experimental results (electron reflection imaging), we have presented a series of optimization analysis conducted using ray-tracing software. |
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2B-2 Imaging and Characterization I | High sensitive visualization of localized electric field using low energy electron beam deflection, We demonstrated the visualization of a weakly localized electric field having about 4 V/um generated by 1.7x10^4 of the localized electrons at the tip of CNT forest, using new electron optics combining the low-acceleration electron beam with high sensitive semiconductor STEM Detector. |
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2B-3 Imaging and Characterization I | Low-Voltage Coherent Electron Imaging Based on a Single-Atom Electron Source, Due to high imaging contrast and low radiation damage, it’s a general trend to develop low-voltage electron microscopes. We have been developing low-voltage coherent electron imaging microscopy based on highly coherent single-atom electron sources. Preliminary results showed its potential to achieve atomic resolution of thin two-dimensional materials and biological molecules. |
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2B-4 Imaging and Characterization I |
In this work we present a new sample preparation method for high performance cross-sectional imaging in SEM. Unlike conventional carbon or metal deposition, it was found that a stacked coating of conductive polymer and metal (CPM) greatly enhance contrast between the features and background. |
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2B-5 Imaging and Characterization I | Fast resist-activation dosimetry for extreme ultra-violet lithography, We outline an experimentally verified method that enables a sufficiently accurate and fast assessment of the effect of in-band EUV and OoB V/DUV on a photoresist. Hence, we expect that our method can accelerate the introduction of EUV in IC production by providing fast and accurate full-field resist activation dosimetry. |
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2C-1 (Invited) Nanophotonics I | Switchable and Stackable Color Filters for a Full-color Reflective Display, Blue, green and red reflective color filters are designed and fabricated for a tri-layer display. The filters deliver high brightness and high color saturation, and can be switched via high-index liquid. The filters can also be stacked to construct different colors. |
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2C-2 Nanophotonics I | Direct laser writing of color transmission holograms, We propose and demonstrate a method for wavelength multiplexing of grayscale holograms into color holograms. Direct laser writing is used to fabricate multiplexed transmission phase holograms in a one-step process. Our holograms are conveniently illuminated with a laser pointer and the projections can be viewed by eye without further magnification. |
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2C-3 Nanophotonics I |
A facile and cost-effective fabrication process of flexible SPR sensors on plastic substrates was demonstrated. The fabrication method is a vacuum-free, solution-processed strategy which combines lithography, electrodeposition, and imprint transfer, termed LEIT strategy. Moreover, the sensitivity of our fabricated LSPR sensors was determined to be 435.1 nm RIU-1. |
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2C-4 Nanophotonics I | Three Layer Plasmonic Biosensor with High Sensitivity, We propose a novel three layer plasmonic nanostructure composed of Au nanosquares as top layer, Au asymmetrical nanostructure as middle layer, and Au asymmetric nanoholes as bottom layer. This three layer plasmonic nanostructure show high sensitivity of 346 and 397 nm/RIU for resonant peaks at 584 and 818 nm. |
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2C-5 Nanophotonics I |
Plasmonic metasurfaces are able to transform a plane wave into a spiral wavefront of the vortex beam. But the conversion efficiency is unpractically low. We calculated and designed an optical metasurface to achieve a high conversion efficiency of over 20% within a broad waveband by EBL lithography and metal deposition. |
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3A-1 (Invited) Imaging and Characterization II | Multi-pass transmission electron microscopy, In multi-pass microscopy each probe particle (photon or electron) passes through a sample multiple times. This enhances contrast and allows for low damage imaging. Here we show simulations of multi-pass transmission electron microscopy images of thin proteins. We show that multi-passing allows for an improved dose limited spatial resolution. |
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3A-2 Imaging and Characterization II | Transmission Helium Ion Microscopy, We present the first Transmission He Ion Microscopy (THIM) images obtained using a Si p-i-n diode array camera (Modupix) in a commercially-available He+ ion microscope (Zeiss Nanofab). |
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3A-3 Imaging and Characterization II | Reduction of Metrology Error for Line-Edge Roughness Measurement from Low-Dose SEM Images, Line-edge roughness (LER) greatly influences the performance of semiconductor devices. Low-dose SEM images are attractive for LER measurements but produce high noise-induced biases. We investigate some sources of metrology error through simulated SEM images of noisy flat lines and use this to improve LER measurement estimates. |
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3A-4 Imaging and Characterization II | Monte Carlo Simulation Models for SEM Imaging: Fast versus Accurate, To identify the most important scattering processes to include in a reliable and fast SEM image simulator, we studied the sensitivity of the images to the various model ingredients using an accurate, but slower, simulator based on state-of-the-art electron-scattering models. |
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3A-5 Imaging and Characterization II | Three-dimension tracing on the electron beam in micro-focus and nano-focus X-ray sources, To obtain expected X-ray focal spot size, X-ray intensity and X-ray stability, electrons in micro-focus and nano-foucs sources are traced in three dimensions. 3D electron beam current density distribution is obtained through N-body Monte Carlo method and practical incident electron parameters are achieved. |
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3B-1 (Invited) Resists and Materials | Metal oxide cluster compound photoresists for EUV lithography, EUV lithography is a major focus of next generation patterning. EUV performance targets require the development of entirely new resist platforms and Cornell University has studied metal oxide MOF-like photoresists. In this paper, recent progress in such photoresists will be described. New metal core and mechanistic investigations will be reported. |
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3B-2 Resists and Materials |
We describe a method for the incorporation of low energy electron-resist interactions into Monte Carlo simulations using calculations from experimental electron energy loss spectroscopy (EELS) data. We will demonstrate the improvement in modeling capability and discuss the advancement in simulating EUV and electron beam lithography. |
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3B-3 Resists and Materials |
Chitosan, a natural and abundant biopolymer, is assessed as a high resolution positive tone and water developable resist in order to replace current chemicals used in electron beam lithography (resists, solvents and developers) which are oil-based and harmful. |
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3B-4 Resists and Materials | Micro and nanopatterning of Metal Oxo-Cluster photoresists, Metal Oxo-Cluster (MOC) based photoresists have emerging as a very interesting alternative material platform for the next generations of photolithography. We describe in this study the synthesis, characterization and DUV photolithography of MOC photoresists, based on Zr, Ti, Hf and Zn. |
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3B-5 Resists and Materials | Novel Crosslinked Molecular Resists Based on Acid-Catalyzed Depolymerization, The 100keV e-beam patterning of a series of crosslinked molecular resists will be presented as well as the variables that affect their performance. These materials have shown sub-40nm resolution and are developable in both organic solvent and aqueous base and demonstrate excellent sensitivity and contrast in both e-beam and DUV lithography. |
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3C-1 (Invited) Nanoelectronics I | Intriguing Prospects of 2D Atomic Sheets for Innovative Nanoelectronics, This talk summarizes our recent research progresses in 2D atomic sheets based nanoelectronics. With holistic view of materials, nanofabrication and device integration, we achieved 1) ~100 GHz graphene devices on flexible glass; 2)first experimental silicene transistors proving Dirac band structure and 3)high-mobility phosphorene flexible nanoelectronics with high ON/OFF ratio. |
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3C-2 Nanoelectronics I | Atomically Precise Devices: Enabling Fundamentally New Devices at the Ultimate Atomic Limit, As an initial step toward our goal of fabricating atomically precise devices, we present measurements and characterization of ultra-thin, atomically abrupt, highly doped low-dimensional devices in Si and our flexible strategy for contacting these buried devices. |
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3C-3 Nanoelectronics I |
We develop a facile fabrication technique utilizing vertically aligned carbon nanotube (VACNT) carpets, which enable high-throughput fabrication of flexible supercapacitors. Our unique technique ensures a strong adhesion between VACNT carpets and Polydimethylsiloxane (PDMS), which facilitates a stable charge-discharge under varied strain conditions. |
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3C-4 Nanoelectronics I |
Here, we report the fabrication and electrical measurements of 3D p-Si/SiOx/n-Si memristive crossbar arrays that address both issues. The all silicon based materials offers the best CMOS compatibility. The unique device stack enables built-in diodes at each cell which alleviates the sneak path problem. |
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3C-5 Nanoelectronics I | Fabrication of Multi-Bit Memory Devices Based on Layered Semiconductors via Interlayer Deformation, We report that the nanoimprint-assisted shear exfoliation process can generate interlayer deformation features in exfoliated layered semiconductor (e.g., transition metal dichalcogenides (TMDCs)) structures. Such deformation features can result in charge memory states with long retention times, relatively large extrema spacings, and analog tunability. |
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4A-1 (Invited) Tip-based and Scanning Probe Lithography | Active scanning probes: versatile toolkit for fast imaging and emerging nanofabrication, Our research focuses to further extend the capabilities of active AFM probes. To improve force sensitivity and measurement throughput we are working to increase the ratio of the probe resonance frequency to spring constant for a wide range of novel applications in fast imaging or reproducible nanofabrication |
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4A-2 Tip-based and Scanning Probe Lithography | Batch fabrication of AFM probes with direct positioning capability, We report a straightforward and low-cost method able to batch fabricate AFM probes, with tips located either at the very end of the cantilever or in front of a hole etched through the cantilever, thus the tip location can be precisely determined by the optical microscope in an AFM system. |
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4A-3 Tip-based and Scanning Probe Lithography | High resolution thermal scanning probe lithography for the fabrication of sub-20 nm nanodevices, Thermal scanning probe lithography is a technique enabled to pattern with sub-10 nm resolution, high linear patterning speeds of >10 mm/s and less than 5 nm error for overlay accuracy on buried nanoscale structures. A dedicated resist stack + the corresponding transfer process together with the implementation of mix and match processing with laser writing allow to finish a wide range of nano-devices of different materials such as MoS2 monolayer, InAs NWs-based FETs and SOI quantum devices. |
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4A-4 Tip-based and Scanning Probe Lithography | Tip based nanometrology and nanolithography using high aspect ratio GaN nanowires, In this work we introduce high aspect ratio GaN nanowires as new AFM/STM tip-material for nanometrology and nanolithography. The results confirm that GaN tips can be competitive, if not superior, in nanometrology and nanolithography and give superior image resolution in AFM compared to the commercial tips. |
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4A-5 (Invited) Tip-based and Scanning Probe Lithography | Digital Atomic-Scale Tip Based Nano Fabrication, The World changed dramatically when our computing, communication, and information storage went from analog to digital. Another digital revolution is near. This will happen when our fabrication technology converts from analog (treats matter as if it is infinitely divisible) to a digital approach which employs the quantized nature of matter. Hydrogen Depassivation Lithography is carried out with a Scanning Tunneling Microscope and is being developed by Zyvex Labs as a digital process. This process achieves atomic precision patterning with a sub-nm resolution. Digital nanofabrication processes have significant advantages borrowed from digital IT. Digital Nanofabrication will realize Atomically Precise Manufacturing. |
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4B-1 (Invited) Nanoimprint Lithography I | Roll-to-Roll Nanofabrication Processes for Flexible Electronics and Biomedical Applications, If a reliable and cost-effective R2R nanofabrication capability can be established, there are major potential applications in areas such as photonic devices for displays, and size and shape controlled nanocarriers for targeted drug delivery. This presentation will discuss the performance and cost metrics associated with display photonics and nanocarrier drug delivery applications, our current state-of-the-art in R2R nanofabrication, and technology gap analysis relative to these applications. |
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4B-2 Nanoimprint Lithography I | UV-Curable Nanoimprint Resist with Liquid Volume-Expanding Monomers, Liquid diethyl spirocarbonate monomer which undergoes volume expansion polymerization is used in formulating a new nanoimprint resist with minimal volume change before and after UV curing. We evaluate the mechanical properties of this new UV-curable nanoimprint resist and report its performance in UV nanoimprint. |
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4B-3 Nanoimprint Lithography I |
In this study, we develop a solution-processed fabrication method for nanoscale metallic network that can be electrodeposited using a nanofiber template. The metallic nanofiber networks fabricated in different cycles show promising consistency to each other, proving the feasibility of template-based fabrication by this method. |
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4B-4 Nanoimprint Lithography I | The impact of preparation conditions on the properties of replica stamps, The mechanical characteristics of replica stamps depend on the modulus and the layer thickness, which is often set by the distance between the template and a counter plate. This limits the degree of freedom during crosslinking resulting in a lower modulus differing from literature values. |
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4B-5 (Invited) Nanoimprint Lithography I | Present and Future of Nanoimprint in Large-area Nanomanufacturing, The talk will present examples of nanoimprint in wide ranges of industrial applications (current status and future trend), will address a number of critical technology issues in large area nanoimprint, in particular, the large mold fabrication, and will present several innovative large area nanoimprint mold fabrication technologies developed by author’s group. |
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4C-1 (Invited) Bio-Medical Applications | Nasopharyngeal Carcinoma Cell Migration in Three-Dimensional Platform, Nanoimprint was used to fabricate biomimetic multiple layer platforms for studying nasopharyngeal epithelial (NP460) cell migration. On two-layer platforms, most of the cells were found to migrate at the interface between the two layers and were confined within the unit area formed by the top and bottom layers. |
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4C-2 Bio-Medical Applications | Loading single neurons on a microsieve electrode array by passive pumping, Recent advances in brain on a chip technology has led to the development of modified microelectrode arrays. Here, we study a passive pumping mechanisms for the loading of cells into a microsieve technology platform containing 3D-pores by means of optical particle tracking. |
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4C-3 Bio-Medical Applications | Digital Biosensing of Influenza Virus with Single Serpentine Si Nanowire Field Effect Transistor, We show a digital biosensing methodology based on single virus counting, using Si nanowire field effect transistors with novel serpentine shape defined by e-beam lithography, which leads to better binding dynamics, lower noise, and addresses the problem of signal baseline shifts due to non-specific binding. |
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4C-4 Bio-Medical Applications | AlGaN/GaN BioFET Sensors for Detection of Microcystin-LR and Other Toxins, We present the use of a bio-FET based in an AlGaN/GaN heterojunction semiconductor platform for detection of toxins in water. A sensitivity of pico molar has been demonstrated for detection of microcystin-LR which is a few orders higher than the EPA advisory standard for this most concerning toxin. |
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4C-5 (Invited) Bio-Medical Applications | Cross-linked, bioimprinted casein microdevices as biodegradable cell-culture substrates, Capturing a 3D imprint of cellular morphology into a rigid biodegradable material can improve the application of such materials as cell culture substrates. This work presents a complete replication process of high-resolution bioimprints onto films made of casein and demonstrates the successful culture of C2C12 mouse myoblast cells on these films. |
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5A-1 (Invited) Focused Ion beam Lithography II | Imaging, Modification, and Analysis of Nanostructures with the Helium Ion Microscope, The presentation will contain various examples of HIM imaging and lithography. A particular focus is laid on 2D materials. 1 nm thick carbon nanomembranes (CNMs) are engineered with a controlled thickness, elasticity, conductivity and porosity. HIM images provide valuable information to understand the structure of CNMs and their formation process. The capability of the HIM for nanolithography of 2D materials will be shown by examples of milling CNMs and graphene, where nanopores with diameters down to 1.3 nm were fabricated. HIM imaging of different carbon materials as well as of biological cells will also be discussed. |
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5A-2 Focused Ion beam Lithography II | Large area scanning-helium-ion-beam lithography, Here we study the reduced proximity effect in helium ion beam lithography. We use helium ion beam lithography to pattern large area gratings of high density wihtout proximity corrections. Additionally, we exploit the large depth of field and pattern on tilted surfaces . |
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5A-3 Focused Ion beam Lithography II | Building with Ions in Liquid and Gas on the Helium Ion Microscope,
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5A-4 Focused Ion beam Lithography II | Helium-Ion-Beam Etched Encapsulated Graphene Nanoribbons, We used a focused helium ion beam to etch graphene encapsulated in boron nitride into nanoribbons. Conductance measurements showed that the electrical transport in the nanoribbons is governed by charge hopping. This work is the first demonstration of ion-beam structuring and electrical characterization of encapsulated graphene devices. |
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5A-5 Focused Ion beam Lithography II | Fabricating Nanostructures On Bulk Silicon Substrates Using Helium Ion Microscope, Applying helium ion milling to bulk substrates is difficult due to substrate swelling from ion implantation. We characterized the swelling and identified the threshold dose for silicon swelling. We successfully applied helium ion lithography to fabricate nanofluidic channels on silicon substrates and 14nm nanolines using does below threshold of swelling. |
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5A-6 Focused Ion beam Lithography II | Superconducting Quantum Interference Device Micro Arrays for Biomagnetic Imaging, Very small nanometer-scale Josephson junctions are directly written in a YBa2Cu3O7 high-TC superconductor with a focused helium ion beam to fabricate superconducting quantum interference device arrays. |
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5B-1 (Invited) Nanoimprint Lithography II | Fabrication of high aspect ratio metal gratings for X-ray phase contrast interferometry, The main challenge in grating-based X-ray interferometry is the fabrication of high aspect ratio absorbing gratings (periodic metal microstructures), whose quality strongly affects the X-ray imaging sensitivity. Here, we review the microfabrication strategy with special focus on a novel approach using hot embossing for metal casting into silicon etched trenches. |
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5B-2 Nanoimprint Lithography II |
In this study, we demonstrate an improved technique for fabrication of embedded metal-mesh flexible transparent electrodes (EMTEs) involving reusable template based electrodeposition and thermal imprint transfer. Electrodeposition template shows no noticeable degradation after repetitive use and therefore is a promising candidate for reusable template for large-scale manufacturing of EMTEs. |
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5B-3 Nanoimprint Lithography II | Low reflection Fresnel lenses via double imprint combined with vacuum-UV surface hardening, The microstructures of Fresnel lenses were covered with nanostructures to reduce the overall reflection. Successful preparation of the combined structures requires a tight adjustment of the VUV treatment time between two imprint steps. The potential of this technique is investigated. |
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5B-4 Nanoimprint Lithography II | Nanoimprinted Perovskite Metasurface for Enhanced Photoluminescence, All-dielectric metasurface and semiconductor nanostructures with high-refractive-index has attracted attention due to low-loss and highly-efficient resonance. We report novel organolead halide perovskite metasurfaces, created by cost-effective nanoimprint technology, which demonstrated enhanced emission properties. Such metasurfaces could be used to create distributed feedback lasers and integrate with LEDs for higher efficiency. |
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5B-5 Nanoimprint Lithography II |
Nanoimprint Lithography has the capability to directly replicate 3-dimensional nanostructures. T-shaped nanostructures were fabricated using a laser-patterned phase transition material and a sequence of anisotropic and isotropic dry etching. This 3-dimensional master with undercut features was replicated by nanoimprinting. The industrial relevance and application for structure colours is discussed. |
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5B-6 (Invited) Nanoimprint Lithography II |
It presents a fabrication flow to generate large periodic nanopatterns, such as nanopillars, nanocavities, and high aspect ratio nanowires, with shrunk and widely tunable feature sizes. The process covers a series of well-known technologies and is accomplished in a short cycle and at low cost. |
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5C-1 (Invited) Nanoelectronics II | 3D CMOL Memristor Circuit for Analog/Neuromorphic Computing, Novel 3D memristor circuit implementing CMOL like architecture is designed and experimentally demonstrated with 8 layers of crossbars. The new architecture enable operation of multiple sub-arrays in the 3D circuits simultaneously, opening avenue for 3D convolutional neural network with flexible design. |
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5C-2 Nanoelectronics II | Lateral Field Emission Transistors For Extreme Temperature Operation, We are submitting novel work on in-plane, CMOS compatible field emission transistors that can operate in atmosphere and with turn-on voltages of 10 volts or less. Specifically, we demonstrate the temperature robustness of this system for the application of computing in extreme environments. |
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5C-3 Nanoelectronics II | Fabrication of Pre-Bended Layered Semiconductor Biosensors on Flexible Substrates,
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5C-4 Nanoelectronics II | Electrochemically Exfoliated Large-area Phosphorene Enables Promising Flexible Nanoelectronics, We present the first demonstration of electrochemical exfoliation of large-area uniform phosphorene, e.g black phosphorus, and its promising application in flexible nanoelectronics. Our method addresses current issue in size, thickness and uniformity control, and delivers desired device performance on phosphorene, paving its way for advanced 2D material based flexible nanoelectronics. |
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5C-5 Nanoelectronics II | Fabrication of 2 x 2 nm2 Cross-Point Memristor Array of 3.82 Tbit/inch2 Packing Density, Scaling of memristors below 5 nm is a great challenge. Here we are reporting a novel approach to build 2nm x 2nm cross-point memristor arrays with ultra-high packing density. This experimental work includes 2 nm features’ patterning and interconnection, and method to address challenges in programming/reading of the arrays. |
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5C-6 Nanoelectronics II | Thermal nanoimprint to improve the material properties of MAPbI3, By applying a thermal nanoimprint process the morphology and the electrical performance of MA-perovskites can be substantially improved. The grain size increases, so that e.g. solar cells prepared from such materials feature a substantially enhanced efficiency. We will address the processing window for such improvement. |
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6A-1 (Invited) Focused Ion Beam Lithography I | Fabrication of Single Atom Devices by Direct Write Nanofabrication, We present on the fabrication single atom devices via direct write nanofabrication using the Sandia’s nanoImplanter. This is a multi-species 10-100 kV focused ion beam system with a minimum spot size of 10 nm setup for both mass resolution using an ExB filter and single ion implantation using fast pulsing. |
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6A-2 Focused Ion Beam Lithography I | Atom sieve for nanometer resolution netrual helium microscopy, Here we present work on a new free-standing atom sieve, which can be used to make a helium atom microscope with a resolution of around 20 nm. Work has been done using helium ion beam lithography and electron beam lithography, followed by pattern transfer using reactive ion etching. |
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6A-3 Focused Ion Beam Lithography I | ElectroHydroDynamic emitters developments for improving Focused Ion Beam machines, We summarize our vision on the future of FIB technology based on electrohydrodynamically (EHD) driven emitters operating in the cone-jet mode, both in terms of performances, versatility and on the science frontiers these might help to push. |
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6A-4 Focused Ion Beam Lithography I | Direct-write Method for Machining Fluidic Structures with Helium Ions, Using a focused helium ion beam we have developed a method for direct-write fabrication of small tubes embedded in surfaces, which could be useful in the rapid-prototyping design of fluidic devices to transport nanoliter volumes of fluids. |
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6A-5 Focused Ion Beam Lithography I | Ion Beam Milling and Secondary Electron Emissions: A Monte Carlo Simulation Study, We present a simulation study of the emission of secondary electrons due to ion beam milling. Our new code allows us to simulate emission of secondary electrons in a target dynamically as features are milled. We validate our method against experiments, and consider applications in ion microscopy and etching. |
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6B-1 (Invited) Advanced Pattern Transfer |
We present a lithography technique, where a beam of neutral, metastable helium atoms is used for high resolution lithography based on binary holography masks. We show how different mask generation parameters influence the contrast and intensity of the final pattern through simulations and proof-of-concept experiments based on photolithography. |
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6B-2 Advanced Pattern Transfer | Low-thermal-budget surface preparation for STM Lithography, We are developing a low-temperature Si(001) preparation process to minimize step flow for nanoimprint templates, and nanoelectronic devices. It comprises a Hydrogen anneal, following by an exposure to Si to strip the oxide. Clean, flat Si(001) surfaces can be obtained with a maximum sample temperature of 700°C with appropriate parameters. |
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6B-3 Advanced Pattern Transfer |
Our work compares Silicon and Germanium deep reactive ion etching by highlighting the significant differences in the etch mechanisms which ultimately affect the relative performance of Collimating Channel Array (CCA) x-ray optics. We propose that the respective sidewall passivations are responsible for the differences in etch and x-ray optic performances. |
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6B-4 Advanced Pattern Transfer |
In this work, we use interference lithography to fabricate concentric gradient nanostructures and then adopt nanoimprint lithography (NIL) to replicate the structures for device applications. We also developed a facile fabrication of the NIL template by directly transferring the photoresist pattern into UV-cured high-strength replication molding material. |
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6B-5 Advanced Pattern Transfer | Soft Thermal Nanoimprint Lithography, We introduce a novel concept of soft thermal imprint using Soft-Substrate-Rigid-Feature (SSRF) made of soft substrate with rigid features. The molds were fabricated by mechanical transfer of e-beam patterned HSQ onto PDMS, and were used for sub-100 nm thermal imprint on flat and curved substrates. |
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6C-1 (Invited) N-MEMS | Using MEMS Devices to Build a “Fab on a Chip”, Progress is advancing such that we will soon need single or few atom devices. We discuss the concept of a ³Fab on a Chip² or the technique of directly writing circuits and structures with atomic beams with small numbers of atoms or even single atoms under the control of a MEMS writing device. |
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6C-2 N-MEMS | Chromia – A Novel and Versatile Material for Nanofabrication,
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6C-3 N-MEMS | Field-Driven Splitting of Pure Water based on Deep-sub-Debye-length Nanogap Cells,
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6C-4 N-MEMS | Electrostatically Driven Microbeams for Low Frequency Applications,
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6C-5 N-MEMS | Nonlinear Interactions of Coupled MEMS Cantilevers, Dynamics of strongly-interacting nonlinear systems are highly sensitive to local changes in their environment which makes them an attractive platform for realizing ultra-sensitive chemical, biological, and force sensors. We report experimental observations of parametric electrostatic excitation, synchronization and abrupt transitions between standing wave patterns in the interacting cantilever array systems. |
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7A-1 (Invited) Beam Induced processes II | Focused Electron Beam Induced Deposition of Nanostructures: Insights from Surface Science, Surface science studies reveal that electron stimulated reactions of organometallic precursors used in FEBID proceeds via two sequential steps, (i) ligand desorption, creating a metal-containing intermediate, followed by (ii) ligand decomposition, responsible for organic contamination in FEBID nanostructures. This understanding has enable us to design new precursors specifically for FEBID. |
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7A-2 Beam Induced processes II | Direct-write deposition of pure gold nanostructures - new possibilities and new challenges, Focused electron beam induced deposition of pure gold structures has been achieved using a commercial gold precursor and an additional oxidative booster. We will shine some light on this direct-write deposition mechanism and draw conclusions for other precursor systems. Finally, we will discuss potential applications in nanophotonics and biosensing. |
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7A-3 Beam Induced processes II | Mechanical Properties of 3D Nanostructures Fabricated via Focused Electron Beam Induced Deposition, This contribution focuses on nano-mechanical properties of freestanding 3D nanostructures, fabricated via focused electron beam induced deposition (FEBID), for further application as thermal high-resolution probes in scanning probe microscopy. |
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7A-4 Beam Induced processes II |
In our work, the helium ion microscope (HIM, Carl Zeiss ORION PLUS at AIST SCR station) was carried out to realize nanoscale patterning. For the purpose of detailed study for nanoscale pattering and blistering phenomenon of gold films using HIM, cross-section Z-contrast TEM images were evaluated. |
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7A-5 Beam Induced processes II |
Two different ways to reduce the curtaining effect are shown, namely a hardware and software approach. First, a home-made goniometer stage is installed for moving samples along an additional axis. Second, an image processing method is proposed, that can be applied after the milling procedure on an image stack. |
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7B-1 (Invited) Directed Assembly | Directed Self-Assembly in Lithography: Challenges and Opportunities, Block copolymer self-assembly has been touted as a promising avenue to create sub 10nm features in lithography. However, long range order is not attained in free surfaces, and it is necessary to guide the assembly of such domains using lithographically defined templates. In this talk we will address some of the challenges in the field of directed self-assembly, as well as point out some unique opportunities in which directed self-assembly might be a promising tool. In particular, we will address the effect that template Jitter has on the self-assembled structures. Here we find that the jitter of the E-beam compounded with the template fabrication can have a substantial detrimental effect on structures below 10nm for PS-PDMS systems. We will discuss the origin of the defects that arise and the threshold for the jitter. Afterwards, we will discuss some opportunities in 3D nano manufacturing of mesh structures based on multilayer self-assembly and point to some of the applications in this area. |
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7B-2 Directed Assembly | Directed Assembly of Nanodumbbells via Nano-Lithographic Docking, We introduce, for the first time, the programmed assembly of nanodumbbells onto arrays of functionalized nanodots that serve as docking points. The docking arrays of AuPd nanodots were produced by nanoimprint lithography, followed by angle-evaporation pattern transfer, and functionalized by thiol molecules terminated to bind Au tips of nanodumbbells. |
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7B-3 Directed Assembly | Self-Assembled DNA-Protein Nanostructures with Molecular Precision, Information encoded in a DNA template can be used to direct a two-stage, hierarchical self-assembly process. DNA polymerase creates double-stranded DNA sections on a single-stranded template. Single-stranded DNA sections are folded into a flexible skeleton by the origami method. The DNA skeleton guides the cooperative assembly of RecA protein filaments. |
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7B-4 Directed Assembly |
The potential to combine DSA and SADP approaches was investigated. DSA using 84 nm pitch guiding stripes and a 21 nm L0 BCP gave a density multiplication factor of 4. The following SADP process provided another factor of 2. The final line/space pitch was as small as 10.5 nm. |
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7B-5 Directed Assembly | Ising model based simulation of block copolymer self-assembly in two-dimensional post lattice, We present a simple and fast Ising model based simulation method for block copolymer self-assembly in two-dimensional post lattice template. The simulation results were compared with previously reported tile-based design rules. The minimum Hamiltonian configuration agreed with the experimental result and the self-consistent field theory simulation result. |
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7C-1 (Invited) Micro and Nano fluidics | Microwell Plate Integrated Microfluidics for Cell-Cell Interaction Screening, The system described here integrates a custom microfluidic device onto the bottom of a commercial microwell plate. A four-chamber culture device with a nanoporous barrier between the chambers was integrated to the microwell plate for extended growth and interaction studies of bacteria. |
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7C-2 Micro and Nano fluidics | Topographical Effect on Natural Killer Cell Locomotion in Confined Microenvironment,
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7C-3 Micro and Nano fluidics |
We report the focused ion beam milling and replica molding of complex nanofluidic structures for the size exclusion and analytical separation of biological nanoparticles such as exosomes. Our fabrication process achieves nanometer resolution over a range of hundreds of nanometers and our devices demonstrate the essential functionality of structural integrity. |
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7C-4 Micro and Nano fluidics | THz sensor in microfluidic devices for on line determination and control of ethanol concentration, The paper presents a sub-THz sensor for on line detection of label-free, non-invasive and non-destructive ethanol concentration and controlling in water-ethanol mixtures in microfluidic devices. The sub-terahertz sensor allows for such interrogation in a label-free environment through electromagnetic measurements of small permittivity changes combining into microfluidic devices. |
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7C-5 Micro and Nano fluidics |
Cell traction force was measured in real time during cell migration in three dimensional channels with guiding topography and physical confinement. Cell traction force varied depending on cell contact with top and bottom surfaces inside the channel, which leads to elongated cell shape and faster migration in smaller channels. |
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8A-1 (Invited) Charged Particle Optics | COLDFIB – The new FIB source from laser cooled atoms, New Focused Ion Beam (FIB) column COLDFIB, is coupling two high technologies: atoms laser cooling, and charged particles optic. This very innovative, and industrial solution, will allow realizing ions beam in the unequalled performances, to reach engraving’s sizes of some nanometers. |
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8A-2 Charged Particle Optics | Graphene-Based Cathode Cold-Field Electron Emission Sources, Recently, carbon based field emission sources have become a popular area of study. This paper shall report further results obtained from the graphene ring field emitter (GRC) and its improvements such as the Ni-nanoparticle enriched GRC (Ni-GRC) field emitter, expected to require relatively lower turn-on electric field strength. |
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8A-3 Charged Particle Optics | Focused Ion Beam System Employing a Low Temperature Ion Source, A focused ion beam system employing a low temperature ion source is presented. This system is shown to have a brightness 10 times higher than a gallium liquid metal ion source. Spot sizes of 2 nm at 10 keV are also demonstrated, as are images and mill patterns. |
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8A-4 Charged Particle Optics | Simple add-on to change a single-beam SEM into a multi-beam SEM, A simple add-on is developed to turn a single-beam scanning electron microscope (SEM) into a multi-beam SEM. A single chip-stack including the beam splitting optics and blanker electrodes is inserted in the variable aperture port of an SEM. Preliminary experimental results on multi-beam imaging and deposition are shown. |
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8A-5 Charged Particle Optics | Efficient computation of electromagnetic fields for round lenses in charged particle optics,
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8B-1 (Invited) Atomic Layer Processes |
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8B-2 Atomic Layer Processes |
With the goal of achieving high selectivity FC-based ALE, we study the etching of different materials under different FC chemistry. The cyclic FC/Ar etch has proven to pattern features well, with great potential for significant improvement in overall etch performance. |
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8B-3 Atomic Layer Processes | Fabrication and Characterization of Transparent, Flexible Metallic Nano-Accordions, In this work, we introduce a new fabrication and pattern transfer process, including interference lithography and atomic layer deposition, for large-scale fabrication of flexible transparent metallic conductors, and the characterization of them to demonstrate the advantages from their mechanical, electrical, and optical properties. |
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8B-4 Atomic Layer Processes | Sensors made from infiltrated ZnO nanostructures, In this paper we use an infiltration process named Sequential Infiltration Synthesis (SiS) to fabricate novel UV and gas sensors with high sensitivity (e.g. 5ppm nitrous oxide causes 25-35% change in current). Our results open possibilities of novel sensors using SiS of metal oxides for diverse applications. |
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8B-5 Atomic Layer Processes | Thinning and doping of two-dimensional WSe2 by vapour XeF2, Here, we report a controllable, efficient and uniform thinning of 2D WSe2 with high selectively by vapour XeF2. Meanwhile, a p-doping effect on WSe2 due to XeF2 treatment has been found, which facilitates the fabrication of logical circuits and diodes on the same WSe2 flake. |
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8C-1 (Invited) Nanophotonics II | Strong Light-Matter Interactions for Skin-like Flexible Full-Color Displays, The talk will focus on enhanced light-latter interactions on nanostructured surfaces for plasmonic full-color displays on flexible substrates. The newly developed printing techniques enable large area printing of such nanostructured surfaces for low cost manufacturing |
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8C-2 Nanophotonics II | Bio-inspired Nanostructures for Enhanced Light Management, Roses were found to have micro- and nano-structures and imitating the surface would enable hydrophobic surface formation for self-cleaning and light harvesting for photovoltaic and optoelectronic devices. We report transfer imprint of rose structures to transparent photoresist via polydimethylsiloxane (PDMS) and incorporated in commercial photodiodes which demonstrate improved sensitivity. |
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8C-3 Nanophotonics II | Printed Flat Optical Component: Metasurface for Cylindrical Vector Beam Generation, We demonstrate a cost-effective and highly reproducible method for manufacturing large-area dielectric metasurfaces using nanoimprint lithography. A high-performance silicon based metasurface for generating cylindrical polarized vector beam is demonstrated. |
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8C-4 Nanophotonics II |
Cesium lead halide perovskite nanocrystals are a novel colloidal material displaying remarkably bright photoluminescence. Combining lithographic patterning and self-assembly, they are organized in ordered monolayers and confined in one-dimensional structures, allowing for efficient exciton migration that is studied with super-resolution based optical imaging techniques combined with steady-state and time-resolved spectroscopy. |
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8C-5 Nanophotonics II | The Design and Analysis of Switchable and Stackable Reflective Color Filters, Reflective display with switchable and stackable color filters is a promising solution for reducing the power consumption of portable devices. This requires filters has high brightness, color saturation, contrast ratio and large viewing angle. We meet this challenge by design, fabricate, optimize color filters based on subwavelength dielectric resonant gratings. |
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9A-1 (Invited) Electron Beam Lithography II | Advances in Multi-Beam Mask Writing, In Multi-Beam Mask Writers, the number of shots, and therefore writing time, is independent of the pattern complexity to be printed on 6” mask blanks. After 7 years of development, the first commercially available Multi-Beam Mask Writer tool MBMW-101 has been introduced by IMS Nanofabrication last year. The writer, operated with 262-thousand programmable beams, meets resolution and pattern placement criteria for the 7 nm node at a write time of less than 10 h per mask using a 120 Gbit/s data path and total electron beam current of up to 1 µA. Ongoing developments for Multi-Beam Mask Writing have produced further performance data which shall be presented. |
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9A-2 Electron Beam Lithography II | The Impact of Isofocal Dose-Based Proximity Effect Correction on Effective Process Blur Tolerance, The impact of isofocal dose-based PEC using line-space tower patterns with varying pattern densities is demonstrated. The pattern density dependent isofocal dose acquisition technique of a resist process is described. Using a tunable PEC algorithm, CDs are consistently attainable across all pattern densities despite the beam focus accuracy. |
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9A-3 Electron Beam Lithography II | Novel registration error metrology for multiple electron beam lithography, MAPPER's FLX1200 pre-production platform exposes wafers by writing with up to 13,260 beams, each exposing 2 micrometer-wide stripes. Misalignments can cause stitching errors between these stripes, degrading device performance. This paper presents a fast and novel metrology to quantify these stitching errors individually. |
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9A-4 Electron Beam Lithography II |
Currently the plasmon resonance induced transmissive/reflective structural color palette is based on the precise dimensional definition of the nano hole structures. We demonstrate a new concept of constructing a much wider range of the color depth by the 256 grey scales of RGB colors to obtain 24-bit/16 million true colors. |
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9A-5 (Invited) Electron Beam Lithography II | A Liquid Cell for In Situ TEM: Design and Fabrication Challenges, and Solutions, We have developed a liquid cell for the TEM that enables electrochemical flow control. We use a modular device design and process flow that, together, resolve material and process compatibility issues and allow for rapid customization of the device. |
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9B-1 (Invited) Optical and Extreme UV (EUV) | Towards the ultimate resolution in photolithography, The resolution of photolithography has been steadily improving over the past 50 years. EUV lithography is an exciting candidate to continue the improvement in resolution into the single digit nanometer regime. We demonstrate 7 nm half-pitch features and a wide variety of periodic patterns used in a number of scientific investigations. Further improvements in resolution will necessitate new mask fabrication strategies and better photoresists, while pattern transfer at such high resolution is also a significant challenge. We are currently evaluating smaller wavelengths such as 6.5 nm (beyond EUV)as well as 4.5 and 2.5 nm wavelengths in order to continue to push towards the ultimate resolution in photolithography. |
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9B-2 Optical and Extreme UV (EUV) |
We will demonstrate the impact of the template generation method and variations in the template shape on CDU and pattern placement of DSA holes. Our focus lies on the formation of singlet and doublet structures. First, the surface wetting of the sidewalls and Si bottom substrate were optimized. |
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9B-3 Optical and Extreme UV (EUV) |
To provide the diffraction-limited spatial resolution with the EUV microscope, wave aberrations should be corrected below 1 nm rms. In this paper, we describe detail of the point diffraction interferometer so as to provide high accuracy of 0.1 nm rms. for implementation of the high-magnification objective for diffraction-limited EUV imaging. |
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9B-4 Optical and Extreme UV (EUV) | EUV Tip-to-Tip Variation Mitigation for Beyond 7nm BEOL Layers and Design Rule Analysis, We investigate the print-ability for a variety of T2T features allowed by design rules in metal layers and discover that they cannot be printed simultaneously. The root cause is the competition over ideal locations in the source pupil by different features. We will discuss the optimal pitch and T2T combination. |
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9B-5 (Invited) Optical and Extreme UV (EUV) | Subtracting SEM errors during the measurement of stochastic-induced feature roughness, Measuring stochastic-induced roughness of lithographic features with an SEM produces biased results. Subtracting the effects of SEM image noise, field distortion, and scattering-induced averaging allows the true feature roughness and its frequency response to be recovered. A method for doing so will be presented. |
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9C-1 (Invited) Quantum | Coherent quantum phase slip in superconducting nanowire, Coherent quantum phase slip (CQPS) effect is the exact quantum mechanical conjugate to the Josephson effect. It is a phenomenon involving coherent tunneling of magnetic flux across a thin superconducting wire. By incorporating CQPS wire in a flux qubit configuration, the CQPT phenomenon is revealed in microwave spectroscopy. |
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9C-2 Quantum |
We predict an ion-beam-assisted CMOS-compatible manufacturability of Single Electron Transistors (SET) operating at room temperature, which aims at energy-saving electronics. Ne+ irradiation of a-Si/SiO2/c-Si layer stack with Helium Ion Microscope and Si+ irradiation of nanopillars is used to make tiny volumes of SiOx for Si nanodot formation by phase separation. |
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9C-3 Quantum |
A highly focused Neon ion beam from a Helium Ion Microscope and subsequent thermal treatment is used for the spatially controlled fabrication of single Si nano clusters embedded in a thin buried SiO2 layer. Such nano clusters are ideally suited for low power single electron transistor applications. |
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9C-4 Quantum | Bridging the Gap for High-Coherence Superconducting Qubits, In this work we developed a superconducting air-bridge crossover process that is fully compatible with superconducting qubit fabrication. We demonstrate that the crossovers improved device performance by bridging gaps in the device ground plane to reduce spurious electromagnetic modes and by increasing coupling strength between coupled qubits. |
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9C-5 (Invited) Quantum | Focused Helium Beam Fabricated Superconducting Devices, We present patterning of nanoscale superconducting circuits and Josephson junctions with a focused helium ion beam. The technique works for a diverse group of materials such as Y-Ba-Cu-O, MgB2, and FeAs. We will compare and contrast data from these devices. |
| P01-01 | Conformal Coating of Gold on Nanostructured Surface using Thermal Evaporation, We demonstrate a novel approach to enhance the step coverage of gold metal layers by thermal evaporation process on nanostructured polymer surface using thin ALD-deposited oxide layer. To confirm the improvement on conformality and morphology of our gold layer, the coating was analyzed using SEM, EDS, and electrical conductivity measurement. |
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Shark skin teeth are promising structures for drag reduction applications for ships and aircrafts. In this work, we present a stereolithography technology, which has both better resolution and throughput. Using this technology, micro patterns at the real scale of shark skin are fabricated and drag reduction is studied. |
| P02-02 | Secondary Electron Emission during 3D Nanoscale Focused Electron Beam Induced Deposition, SE surface emission profile for complex 3D objects must be known in order to accurately predict FEBID. Initial results will show simulation can be tuned to simultaneously reproduce the final 3D deposit shape and the sample current time evolution function, and the elements of the SE model required for reproduction. |
| P02-03 | PECVD Synthesis of a Carbon-Based Nanotechnology Catalyst entitled Carbon Nano Spikes (CNS),
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| P02-04 | Chemical Co-Patterning Strategies Using Azlactone-Functionalized Polymers, Interfaces can be modified with azlactone-functionalized polymers in order to manipulate the chemical reactivity of the surface. In this presentation, we detail the development of new polymer co-patterning strategies that generate well-controlled, brush-like structures of reactive azlactone polymers with chemically or biologically inert background chemistries. |
| P03-01 | Large area nanofabrication of dense sub-50 nm structures using ALD-enabled nanoimprint lithography, In this work, large area nano fabrication of dense nanometer scale structures is reported using ALD-assisted nano imprint lithography. The fabrication strategy and process developed were used to generate 50 nm wide gratings on a 150 nm pitch over areas as large as 10 x 10 millimeter. |
| P03-02 | Ruthenium Patterning via Reactive Ion Etching for EUV optics, EUV diffractive optics could deliver diffraction efficiency as high as 30%, when fabricated with materials of strong phase shift and low absorption at the EUV wavelength, such as ruthenium. We have developed a ruthenium patterning process using electron beam lithography and repeatable reactive ion etching pattern transfer. |
| P03-03 | Etching very large features by metal-assisted chemical etching, We show a process that can wet-etch very large structures of hundreds of micrometer size deep into silicon with vertical sidewall profile. We have performed metal-assisted chemical etching on porous substrate pre-structured by low cost maskless electrochemical etching of a bare silicon wafer. |
| P04-01 | Ion Beam Etching : a solution for microsystem device processing, Here, the ion beam milling process is not presented as a simple technological step after lithography and before stripping steps. We will discuss about a complete technological step including lithography, etching and stripping. Some specific cases will be presented with their specifications. Drawback and advantage solutions will be discussed. |
| P04-02 |
Helium ion microscope and automation software were used to fabricate nanopores (less 10nm) in a silicon nitride membrane over a wafer size with a controllable pore size, sufficient accuracy for motion among chips and good repeatability for biomolecule detection applications. |
| P05-01 | Xeon Gas Field Ion Source Emitted from a Single-Atom Tip, Xe ion current emitted from our single-atom tip (SAT) was analyzed from 150K-309K. The maximum ion current was ~150K, its instability is 2.12% and brightness is 2~3 orders larger than that of Gallium liquid metal ion source (Ga-LMIS). Moreover, the sputter yield of Xe ion is higher than Ga-LMIS. |
| P05-02 | Analytical and Numerical Calculation of Multipole Fields of a Wire Lens for an Aberration Corrector, As a multipole lens for the aberration corrector, a setup called a “wire lens,” in which current flows in symmetric parallel lines, was proposed. In this study, multipole-field distributions generated by wire lenses with finite lengths were analyzed in comparison with those generated by ordinary aberration correctors. |
| P05-03 | Emission stability and end-form changes in high brightness HfC electron sources, We continue work on electron sources for high brightness applications. Presently, commercial sources use ZrO/W which is limited to ~1 mA/sr. HfC sources can be operated at high temperatures and high fields without needed surface migration thereby expanding the range of I’; HfC sources have been operated to >60 mA/sr. |
| P05-04 | Cesium ion beam interaction with common microelectronic materials and VLSI devices, We study the interaction of accelerated Cs+ ion interaction with commonly used materials in the microelectronic industry. The motivation of this work is to examine the suitability of cesium as a future ion candidate for focused ion beam (FIB) nano-machining applications, from the beam-surface interaction aspect and device-ion susceptibility. |
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P05-05 (Invited) | A Simple and Inexpensive Permanent Magnet Electron Lens, The Lens comprises 2 circular pieces of low carbon iron, aligned with a brass former and held together with neodymium permanent magnets. With 30KeV electrons we have obtained focal lengths below 10mm and an estimated value of Cs of 15mm. Focusing and stigmation can be achieved mechanically. |
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P06-01 (Invited) | Improved versatility of DSA topographic patterns through the use of UV-exposed grafted layers., This work presents an improvment to conventional graphoepitaxy approach used for the Directed Self-Assembly of block copolymers. Topographic gratings functionalized with a grafted polymer can be tuned into multiple surface affinity combinaison using a single step of UV exposure. The versatility of DSA features available on one wafer is improved. |
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In the present work, we investigated the domain-controlled assembly of polymer-grafted silica particles on physical guide structure. We realized the sub 100 nm narrow-pitch non-close-packed hexagonal dot pattern transfer with the control of ordering direction of the particle mask by the guide structure. |
| P06-03 | Metallic Nanowire Transparent Conductive Electrode Fabricated by Template-guided Assembly, In this study, we demonstrate that a template with regular patterns with wettability and morphology contrast can guide the formation of a conductive nanowire network, also modeled the perclation behavior of template-guided AgNW assembly. |
| P06-04 (Invited) | Block Copolymer Directed Self-Assembly Using Chemoepitaxial Guiding Underlayers with Topography, The directed self assembly (DSA) of block copolymers (BCPs) on guiding underlayers that use a combination of chemoepitaxy and topographic features are explored using a coarse-grained molecular dynamics model. The effect of factors such as topographic height, width of trenches, and slope of sidewalls on defectivity are explored. |
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| P07-02 | Fabrication of hard x-ray zone plates with high aspect ratio using metal-assisted chemical etching, We describe a process for fabricating zone plates with the potential for high absolute efficiency and fine spatial resolution. The process involves electron beam lithography, metal deposition, metal-assisted chemical etching and atomic layer deposition as well as DRIE to thin the silicon substrate to about 15um. |
| P07-03 |
We've developed a novel and feasible method to fabricate Kinoform lens by a grayscale e-beam lithography process. The Kinoform template with the outermost width of 600 nm is obtained. It is believed that this work provides an efficient way to fabricate Kinoform lens with desired heights much beyond 200 um. |
| P07-04 | Performance of a high-resolution negative tone resist, As the technology advances, the lithographic dimensions decrease further and further introducing new challenges in the lithography process. When patterning bellow 20 nm features the limiting factor becomes the pattern collapse occurring upon development. In the work presented here the issue of pattern collapse in electron beam patterns is investigated. |
| P07-05 | Performance of a high-resolution negative tone resist, As the technology advances, the lithographic dimensions decrease further and further introducing new challenges in the lithography process. When patterning bellow 20 nm features the limiting factor becomes the pattern collapse occurring upon development. In the work presented here the issue of pattern collapse in electron beam patterns is investigated. |
| P07-06 |
Previously, a practical approach to modeling the electron-beam lithographic process directly from SEM images was proposed.###In this study, the possibility of improving the model is investigated by taking into account the dependency of exposure on the resist layer, i.e., using a 3-D model. |
| P07-07 | Optimization of Fresnel zone plate layout for high diffraction efficiency by e-beam lithography, This work addresses the optimization of FZP layout with the outermost ring of 100 nm, trying to control the zone width ratio for maximizing the transmission efficiency through the plates. |
| P07-08 | Electron-beam Exposure Dependent and Adjustable Sidewall Slopes of PMMA and ZEP520A in Comparison, In this work, we present the contrary behavior of sidewall slopes of the two positive tone resists PMMA and ZEP520A when a background dose is applied with electron-beam lithography and investigate the adjustability. |
| P07-09 |
We are using a clever layout and automated SEM image analysis based on Hough Transform to investigate proximity effect correction and process effects for the large area dense nano pattern applications. Experiments with different development time at different temperatures will be presented along the 3D resist simulations. |
| P07-10 | From dose statistics to line edge roughness, In this theoretical study, we first create a 3D resist pattern with side wall roughness and then image the pattern with a CD-SEM. Our goal is to get a direct relation between input parameters such as resist properties or illumination profile and output parameters from typical measurements. |
| P07-11 | Datapath Architecture for Aperture Array Based Multibeam Mask Writer Systems, Multibeam mask writers are the next generation of mask writing tools and require throughput improvements. We propose a fast and simple datapath architecture which combines parallel data decompression with the existing deflection plate design for throughput gains in the aperture array based multibeam systems introduced by NuFlare and IMS Nanofabrication. |
| P07-12 | Simulation of Asymmetric Energy Deposition Profiles in E-Beam Lithography on Curved Substrates, In this contribution we study the influence of non-perpendicular electron beam incidence in electron beam lithography. We show that full 3D simulations are necessary to do correct proximity correction on the patterns to ensure that the designed critical dimensions are obtained. We verify this with simulations and experiments. |
| P07-13 | High Q-factor micro-ring resonator fabrication by charge dissipation in electron beam lithography, To reduce a surface roughness of a photonic waveguide, 10 nm of aluminum layer is deposited to dissipate a charge accumulation during e-beam lithography exposure on top of silicon nitride micro-ring resonator platform. |
| P07-14 | Effects of Stochastic Exposure on Critical Dimension in Electron-beam Lithography, The exposure fluctuates (stochastic) due to the random nature of electron scattering and shot noise. The exposure fluctuation makes the actual size of a written feature substantially different from that estimated based on the deterministic exposure. This effect and its dependency on lithographic parameters are investigated. |
| P07-15 | Grafted PMMA mono-layer brush as negative tone e-beam resist, Grafted PMMA mono-layer brush was shown able to behave as negative e-beam resist. To achieve a negative tone, PMMA brush was exposed at very high dose, followed by dry thermal development. This method provided a simple way to fabricate protruding structures on non-flat or irregular substrates. |
| P07-16 | High aspect ratio polystyrene structure fabrication using electron beam lithography, High aspect ratio protruded nano-structures defined in negative resist usually suffer from collapse or detachment because of capillary force. Here we overcame this issue by defining, using low energy exposure, a "ceiling" structure at the top of the protruded structures to hold them together. Significant improvement was demonstrated. |
| P07-17 | Fabrication of Josephson Junction without shadow evaporation, We developed a new method of fabricating Josephson Junction without shadow evaporation. Ebeam lithography is used to pattern the junctions and only direct evaporation is used. Statistics on junction normal resistance and results from transmon qubits made with this method will be presented. |
| P07-18 | Improvement of Silicon Waveguide Transmission by Advanced E-Beam Data Fracturing Strategies, We evaluated a novel method of fracturing pattern data for e-beam lithography, which traces all feature edges with single-line shapes, and found significant improvement in both waveguide loss as well as grating coupler performance. |
| P07-19 | Fabrication of nano-gap using high and low energy electron-beam lithography, We fabricated nano-gap between two large pads by two energy exposure. The high energy defines nano-gap between two thin lines, whereas the low energy defines the two large pads with a large gap such that the middle of the gap received negligible proximity exposure because of the small backscattering range. |
| P07-20 |
Previously, an algebraic expression of LER at a location in a large uniform pattern was derived for electron-beam lithography, to avoid the time-consuming simulation. In this study, based on the previous results, the issue of analytically minimizing the LER (and the CD error) in a L/S pattern is investigated. |
| P08-01 | Smart Nanostructured Films for Sensitive Chemical Detection and Analysis, Nanostructured smart substrates were developed for surface enhanced Raman scattering (SERS) applications. The substrates consist of polymer layers partially embedded with multi-walled carbon nanotubes and coated with a layer of gold. The "smart" aspect is due to tunable SERS enhancement factor, controlled by nanotube content, and thickness of gold. |
| P08-02 |
We report on the structuring of polydimethylsiloxane using natural templates with micro- and nano-texture. These natural surfaces include eggshells, various agricultural products, among others. The fabrication method is simple and inexpensive, and the use of natural templates can potentially allow for the replication of conditions found on the original template. |
| P08-03 | A Study of Pattern Density on Magnetic Coupling for Bit Patterned Media, We fabricate and characterise bit patterned media of various packing arrangement to investigate the impact of pattern density on magnetic coupling. Arrays of magnetic nanodots are patterned by EBL and characterised by MFM . We observe that higher density shows less magnetic coupling and attribute it to less trench material. |
| P08-04 | Stable Field Emitters Using Inverse Opal Structures, Inverse Opals are applied to field emission applications for the first time. There is a need for alternate cold cathodes that are as efficient and poor-vacuum tolerant as carbon nanotubes (CNT), but with improved rigidity. This work demonstrates field emission using inverse opals with enhanced robustness compared to CNT devices. |
| P08-05 |
Flexible free-standing lightweight graphene films containing metal oxide hybrids hold great promise for applications in energy storage devices like supercapacitors and batteries, improving the performance for high specific power and energy density. |
| P08-06 | Graphene Oxide Thickness Effects in Graphene-based Supercapacitors, Graphene-based in-plane interdigital supercapacitors were examined. The supercapacitors employed the reduced graphene oxide (rGO), thermally reduced from graphene oxide (GO), as their electrodes. The thermal reduction process using a laser engraver was studied. The thickness effect of the GO layer on the capacitance was presented in this paper. |
| P08-07 | Coaxial Hybrid Perovskite Fibers: Synthesis and Encapsulation in Situ via electrospinning, A coaxial micro/nano fiber is electrospun, to encapsulate hybrid perovskite photovoltaic material in a protective polystyrene shell. Initial studies have demonstrated the feasibility of this technique, but process development is needed before the coaxial fibers can be integrated into novel, or pre-existing, solar cell devices. |
| P09-01 | FIB Nanofabrication with Sketch & Peel Method: Employing non-Ga Ion Species for Plasmonic Arrays, FIB systems are valuable for R&D nanofabrication, although milling is slower than resist based processes. With a lithographic instrument design and technology for non-Ga ions advanced FIB nanofabrication becomes possible. We report on sketch&peel using Au and Si and discuss effects related to different ion species and large area patterning. |
| P10-01 | A modularized miniature electron beam column array for parallel lithography, This paper presents designs and results of a multiple-electron-beam column array, which uses modularized and miniaturized electron beam columns with permanent-magnet lenses. This column is able to achieve high resolutions of 2nm, high beam current of 1nA, and a large range of landing energies from 0.5keV to 10keV. |
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P11-01 (Invited) | High-aspect-ratio Magnetic Tunable Nanopillar Array, In this work, a simple method of fabrication has been discussed for micro-nano-scale periodic tunable structure. Furthermore, the preliminary test indicates that the nanopillar array is tunable. In the future, the tenability will be enhanced by improving the structure aspect ratio. |
| P11-02 |
The growing interest in magnetic nanowires (NWs) is connected to possibility of employing them for advanced applications in wide technological fields, such as building blocks for data storage and memory, advanced scanning-probes, as well as biotechnological applications. In addition, NWs can be used as sensor for several applications. |
| P12-01 | Nanofluidics and Plasmonics for In-Line DNA Optical Mapping, On-chip DNA optical mapping allows studying intact individual molecules with higher throughput than conventional sequencing techniques. We explore different techniques to create a "fluorescent barcode-like" pattern, and stretch the single-DNA molecules in nanofluidic devices and then read out the signal in real time using a focused-laser and a photon counter. |
| P12-02 | Fabrication and Evaluation of an Active Electromagnetic Mixer for Lab-on-a-Chip Applications, A novel micromixer fabrication process using low-cost materials and fast prototyping applied to microchannel actuation. The integration of active micromixers still being challenge in microlfuidic. The device was fabricated over conventional fabrication techniques, using polydimethylsiloxane membrane thin-film and magnet part and its characterization was done by image analysis. |
| P13-01 |
Thin nano-crystalline diamond foils are critical to the production of neutrons at the Spallation Neutron Source (SNS). Here we describe progress on the scaling and characterization of a diamond foil fabrication process aimed at the production of more reliable and robust suspended foils, comprised of diamond films. |
| P14-01 | Fabrication of Arrays of Electrically-Isolated Nanoscale Organic Thin-Film Transistors, We present a nanofabrication route capable of producing arrays of electrically-isolated P3HT OTFTs with nanoscale channel lengths. The presented fabrication route is based on angled deposition and transfer-printing processes, which are compatible with organic semiconductors. |
| P14-02 | Fabrication of glass sealed x-ray tube with high resolution carbon nanotube cold cathode, We developed glass sealed x-ray tube fabrication technique with novel carbon nanotube (CNT) emitters grown with resist-assisted patterning (RAP) process. We present the field emission properties, x-ray tube and images. |
| P14-03 | Fabrication of high resolution electron beam with one carbon nanotube cold cathode, We developed novel carbon nanotube (CNT) growth techniques, i.e. resist-assisted patterning (RAP) process. This study, we developed electron beam with one CNT emitters and measured its electron emission with spatial resolution characteristics. |
| P14-04 |
Here, we present high sensitive ZnO NCs /multiwalled CNT (MWCNT) heterostructure-based chemi-resistive sensors for the selective detection of different hydrocarbons at RT. The ALD is used to spatially control the growth of MOX on the CNT surface. The sensors operate at RT and show fast and reliable response. |
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P14-05 (Invited) | Physically Unclonable Anti-Counterfeit Labels Using Nanoscale Diffusive Memristor Crossbar Arrays, We present a novel PUF using nanoscale diffusive memristor3 crossbar arrays that can be fabricated with much simpler process and higher fabrication controllability. Our PUF utilizes the random distribution of Ag particles on a SiO2 surface generated during sputtering process, showing high security density and reduced power consumption. |
| P15-01 | A Single Fiber Surface Enhanced Raman Scattering (SERS) Probe, A half millimeter diameter probe is described which couples a spectrometer to a remote subject for Surface Enhanced Raman Scattering measurements. The single fiber design has far greater sensitivity than two fiber probes as well as enabling comparisons between different regions in the subject. Experimental results will be presented. |
| P15-02 | Fabrication pH micro-biosensor for implantable medical devices, A pH-biosensor was fabricated out of biocompatible materials that allow real-time monitoring of pH. The device is comprised of a multi-electrode system modified with a pH sensitive porous conduction polymer PANI electrodeposited onto the electrode, allowing direct in-vivo sensing of pH change after surgery. |
| P15-03 | Neurite growth into artificial microchannels, Artificial microchannels with microelectrodes have been used to provide topographic guidance to neurites in growing neuronal cell cultures. Nanoimprinting into biocompatible polydimethylsiloxane allowed realizing custom-designed microchannels. The small cross-section excludes nerve cell somata but allows growth of neurites (dendrites, axon). This is a key technique for custom-design of neuronal networks. |
| P15-04 | Investigation of TiO2/graphene Nanocomposite for Cancer Photothermal Therapy, In this work, the efficacy of TiO2/graphene nanocomposite as photothermal therapy agent has been investigated. The nanocomposite was prepared by tagging graphene oxide on TiO2 nanoparticles using hydrothermal process. The experiment with cancer cells revealed that TiO2/graphene nanocomposite could kill cancer cells significantly when exposed to a NIR laser. |
| P15-05 | A Novel Fabrication of Isolated Titanium Dioxide Nanotubes, In this work, a novel fabrication of isolated TiO2 nanotubes is presented. TiO2 nanotubes with a uniform size and length were synthesized by anodization. Then, TiO2 nanotubes were peeled off from substrate by sonicating in isopropanol. As a result, isolated TiO2 nanotubes with a perfect tubular shape were successfully fabricated. |
| P15-06 | Geobacter sulfurreducens Attachment and Biofilm Growth on Electrode Materials, Geobacter sulfurreducens, a metal-reducing bacteria, is capable of forming electroactive biofilms, and is commonly used in bio-electrochemical systems (BES). To better understand the interactions and compatibility between Geobacter and electrode surfaces, we characterize Geobacter sulfurreducens growth and biofilm formation on thin-film materials. |
| P15-07 | Zinc oxide nanowires for drug delivery systems, Zinc oxide nanowires (ZnO-NWs) are excellent candidates for highly effective drug delivery systems. ZnO-NWs have been synthesized hydrothermally together with a lipophilic/hydrophobic molecule that acts as a model compound to mimic drug loading/release. The paper investigates the specific synthesis conditions which support maximum drug loading and drug release. |
| P15-08 | High density, multifunctional neural probes for massively parallel read out and control, Electrical and optical high density neural probes are presented, as well as their fabrication process and their integration. These are the next generation of devices to probe neural networks in living animals. |
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P15-09 (Invited) | Microtubules: A Potential Biological Model for Topological Phonon Edge Mode Phenomena, Microtubules are being studied to develop new nanostructured materials that exhibit topological phonon modes. Analogous to topological insulators, the bulk properties of these materials cause phonon propagation along the surface or edge of the material. A characterization method to measure phonon modes in nanostructures is presented here. |
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P16-01 (Start-up Contest) | Site Specific Manipulation Techniques for FIB, The ex situ manipulation of site specific FIB specimens has been extended to the manipulation of fibers, particulates, and more. Micromanipulation is performed using direct Van der Waals forces and/or facilitated with adhesive. Using new grid carriers, samples may be directly analyzed by TEM or FIB milled for other analyses. |
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P16-02 (Start-up Contest) | High Temperature Superconducting Electronics for Biomedical Imaging and Advanced Communications, We present a commercially available high temperature superconducting Josephson junction process that the junction parameters are controllable and reproducible at low cost and can be scaled. The process utilizes a helium ion beam to direct-write junctions. This process allows applications such as biomedical imaging to be widely available. |
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P16-03 (Start-up Contest) | Skin like Plasmonic Full Color Displays, Imagine a flexible, thin, low power, full color display that can wrap around columns, be made into any shape and dynamically show image or video content. We have developed technology enabling this called eskin display, a full color thin film plasmonic display that can replace static paper based and conventional LCD and LED digital signage. |
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P16-04 (Start-up Contest) |
aBeam Technologies develops novel photonics-on-a-fiber devices for a precise and reproducible wavefront manipulation. Devices are made by fiber imprinting, a novel technology suitable for low-cost and high-throughput manufacturing of free-form 3D diffractive optical elements (DOE) directly on a fiber. Unlike other conventional fiber optics, complex 3D photonic structures are fabricated at the end of the fiber to apply optical function, which makes it possible to manipulate the light output with a customizable focal distance of any shape, without relying on free-space optics. Using the fiber imprint technology, material properties of DOEs, for example, refractive index, can be customized to enable novel immersion applications. |
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P16-05 (Start-up Contest) | Innovative Probes for Reliable Underwater Nanoscience, Scuba Probe Technologies produces novel probes for gentle and quantitative imaging in liquids. Overcoming the limitations of high viscous damping, encased cantilevers enable imaging of soft matter with high spatial and temporal resolution. Our electrical probes enable nanoscale observation of electrochemical and catalytic processes happening at liquid solid interfaces. |
| P17-01 | Design, Fabrication, and Initial Characterization of a Multi-Qubit Chip for Quantum Simulation, We present the design, fabrication, and initial characterization of a superconducting circuit featuring up to ten quantum bits. Intended for quantum simulation experiments, this chip features dedicated control lines to facilitate both single-qubit and two-qubit entangling operations. Coherence properties and simultaneous multiplexed readout of multiple qubits will be emphasized. |
| P17-02 | Quantifying Dopant Movement in Si:P Atomic Device Encapsulation, In this study, we systematically investigate locking layer effects to suppress dopant movement during low-temperature encapsulation overgrowth and to optimize dopant confinement, epitaxial quality, and transport properties of the phosphorus-doped 2D layer in Si. |
| P18-01 | Fabrication of copper nanowire using NIL for electroreduction of carbon dioxide, The morphology of metal nanoparticles was hard to be controlled, it could affect the surface area and active sites of catalysis. Now we investigated electroreduction of carbon dioxide by copper nanowire, which was gained by using the nanoimprint lithography (NIL). |
| P18-02 | In-liquid alignment detection by fluorescence moiré fringes for print and imprint method, In UV nanoimprinting, alignment marks are difficult to detect by optical microscopy because of little deference in refractive index between mold and resin materials. This study enabled to visualize alignment marks and to generate the fluorescence moiré interference fringes by fluorescence microscopy with fluorescent liquids in in-liquid alignment. |
| P18-03 | Fabricating Nano-scale Gratings with Multiple Imprinting, In this paper, an improved lithography is introduced to produce sub-100nm gratings by using 300nm gratings mold. |
| P18-04 | FOLED with enhanced external efficiency using corrugated Ag anode, Quasi-periodical corrugated silver anode is adopted in flexible organic light-emitting diodes (FOLED). The fabricating process is based on colloidal lithography and thermal nano-imprint technologies. The efficiency enhancement and the better emission features results from the Bragg diffraction effect of the quasi-periodic nature of the corrugated microcavity. |
| P18-05 |
We demonstrated that position selective deposition of the high-viscosity resin droplets with the mean volume of 0.12 pL in accordance with the shape of a silica mold for fabrication of Au electrodes. |
| P18-06 |
In this work, we investigated surface forces between silica surfaces, exhibiting different hydrophilicity, mediated with an oleophilic diacrylate monomer containing water at different concentrations. We propose that cleaning methods of silica mold surfaces to generate stable water layers in UV-curable resins are important in defect-free sub-15 nm UV nanoimprinting. |
| P18-07 |
Stochastic simulations are performed to study the pattern size and shape effects on UV-curing characteristics of the resist. Simulation results indicate that the conversion ratio of UV resist decreases with decrement of the feature size. The conversion ratio also depends on the pattern shape. |
| P18-08 | Heat Conduction and Polymer Flow in Microstructured Mold for Laser-Assisted Imprinting, We designed a model experiment to define the time schedule of heat conduction in the polymer and the flow of the polymer in Laser-Assisted Imprinting. The process parameters such as pressing pressure, laser power, diameter, and irradiation time corresponding to scan speed can be easily defined by this method. |
| P18-09 | Design of hierarchical surfaces for tuning wetting characteristics,
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| P18-10 | Amphiphobic mushroom-like structures fabricated by direct nanoimprint lithography, Here we show the potential of NIL to fabricate complex overhanging structures. By a novel one-step controlled electroplating process we produced mushroom-like structures with controlled shape. These structures were fabricated using the template-assisted electroplating concept |
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P18-11 (Invited) | Relevance of stamp material for vertical phase separation of block copolymers in nanoimprint, The stamp sidewalls are the key to achieve vertical phase separation of block copolymers with thermal nanoimprint. We will discuss the impact of the cavity width. Furthermore, the choice of the stamp material is crucial, even when the anti-sticking layer seems to provide a similar surface energy. |
| P18-12 |
We report a facile approach to achieve stretchable and conductive substrate with undulating surface structures patterned by imprint lithography and thermal reflow. The strechability and conductivity under various strains are reported. |
| P18-13 | FOLED with enhanced external efficiency using a corrugated Ag anode, We present a simple method to fabricate Ag anode with nano-scaled corrugations on polycarbonate (PC) flexible substrate. The structures are transferred to plastic substrate by thermal nano-imprint lithography (NIL). |
| P18-14 | Novel UV-NIL for opaque mold and substrate by use of UV triggered command cure resin, We propose a novel UV-NIL by use of Si mold and substrate. UV triggered command cure resin is used as a new resist. The resin cure starts after a few minutes passing from an UV exposure. A clear space pattern with 0.18 μm width can be successively fabricated. |
| P18-15 |
Chalcogenide glasses are known for their exceptional ability to transmit infrared light, however still suffer from significant Fresnel reflection losses at the glass-air interface. With thermal nanoimprinting techniques one can imprinting antireflective moth-eye nanostructures on the glass surface and reduce this loss considerably. |
| P18-16 | Electrically switchable structural color using electrowetting on superhydrophobic surface, We successfully achieved droplet moving in centimeter scale, which is much beyond the need for high reflective display in nanoscale. That proved the feasibility of electrically switchable full color reflective display using electrowetting. |
| P19-01 | An experimental study of light absorbance of gold metal nanoparticles in the size range 45 to 200 nm, We have fabricated large arrays of metal nanoparticles using electron beam lithography for investigating their optical properties, with key interest in the light absorption, using an integrating sphere setup. |
| P19-02 |
Scatterometry is a fast, in-line, non-contact, non-destructive nanoscale metrology tool and is widely used in industry manufacturing process for qualify control proposes. In this presentation, we computational simulate the limits of optical angular scatterometry and assure it have the capability to monitor 7 nm node products. |
| P19-03 | Design of Interfacial Antireflection Nanostructures in Multilayers, Refractive index mismatch at the interface between two different materials in a multilayer stack causes Fresnel reflection losses. We utilize rigorous optical design of interfacial nanostructure to enhance transmission and suppress interference effects. The results show that the transmission can approach 1 with fringe contrast as low as 0.01. |
| P19-04 |
We demonstrate centimeter-size, color-stable flexible OLEDs using an ultra-thin Ag electrode. The device shows ~35% enhanced current efficiency compared to the ITO-based counterpart, stable emission colors even at large observation angles, and bending stability over 1000 circles. |
| P19-05 |
In recent works we have proposed and theoretically investigated solutions based on oxide-cladding AlN photonic crystals designed to get more compatibility with CMOS fabrication processes. In this work we report the etching of SiO2 thin films, that is one of the critical points in the fabrication of the proposed devices. |
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P19-06 (Invited) |
We report a scalable process to fabricate electrically tunable, light-emitting photonic structures made of optically-active and electrically-conductive erbium doped zinc oxide. Such structures are expected to produce a dramatic enhancement of the electromagnetic fields due to enhanced light-matter coupling at topologically protected states called Bound States in the Continuum. |
| P19-07 | Investigation of Quantum Tunneling Effects in Gap Plasmon using Collapsible Nano-fingers, We have reported successful fabrication of sub-5 nm gap plasmonic structures with precisely controlled nano-gaps by using collapsible nano-fingers. After realizing well-controlled finger collapse manner and high collapse rate over large area, we successfully tune the tunneling barriers for electrons by using different ALD dielectric material to cover nano-fingers. |
| P20-01 | Ring cathode electron beam projection lithography, Numerical simulations predict better ring width resolution for a ring-shaped pattern imaged directly from a ring cathode with conventional hole-aperture compared to conventional point source with patterned aperture. Ring cathode emitter has potential for ring pattern generation in electron-beam lithography where high spatial resolution is combined with high throughput. |
| P20-02 | A Spirothiopyran based photoresist for large area sub-diffraction nanopatterning, By combining the photochromic switching in Spirothiopyran with thiol-ene click chemistry, we present a low saturation threshold writing system suitable for large area direct writing in 3D with sub-diffraction resolutions. |
| P20-03 |
Here we present in situ techniques for the purification and mechanical characterization of EBID nanostructures. Platinum structures are grown with a purity that results in a 100-fold increase in electrical conductivity. Mechanical strengths are demonstrated to be very high on the order of Gigapascals. |
| P21-01 |
The originality of our work is based on the demonstration of the physical phenomenon of structural breakdown of suspended strained silicon nanowires by exposure during scanning electron microcopy analysis. The analysis shows a relation between the dimensions of the nanowire and the structural breakdown time. |
| P21-02 | Repair of discontinuous interference fringes in electron hologram by using the relaxation method, Electron holography is used to measure electric and magnetic field inside and on the surface of the material. We propose a method to repair discontinuous interference fringes in electron hologram by using the relaxation method, and report results of experimental application. |
| P21-03 | The Mass-filtered Ion Gauge (MFIG), a vacuum-contamination sensor for yield enhancement, This contribution discusses some beam-induced contamination mechanisms in UHV and presents laboratory and field-test data to demonstrate the capabilities of the latest MFIG sensor in continuously and selectively detecting high-mass contaminant molecules in (U)HV vacuum. |
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P21-04 (Invited) | Aberration-Corrected Quantum Electron Microscopy, In this work, we propose and simulate a possible design for the resonant electron cavity of a quantum electron microscope. Moreover, we analyze the effect of spherical aberration on the resonance stability in such a scheme and we design and simulate two possible modifications in order to address this issue. |
| P21-05 | Biofilm Structure of Geobacter sulfurreducens by Helium Ion Microscopy, Geobacter sulfurreducens forms unique, electrically conductive biofilms, a property that can be exploited in production and design of microbial fuel cells. In this work, we examine biofilm formation, and biofilm properties of Geobacter sulfurreducens using a Scanning Electron Microscope (SEM) as well as a Helium Ion Microscope (HIM). |
| P22-01 |
Two state-of-the-art non-chemically amplified resists, originally devised for electron beam, have been evaluated and compared using both electron beam and optical lithography at the extreme ultraviolet wavelength. Their sensitivity and submicrometric patterning performance are discussed in view of applications as hard masks, pattern transfer, device fabrication and greyscale lithography. |
| P22-02 | Impact of Multilayer Imperfections on EUV OPC and Patterning, Imperfections in the multilayer EUV reflector stack pose a difficult problem for the generation of models for use in Optical Proximity Correction. This study will investigate the impact of the model of the interface region and multilayer stack in general on the final wafer CD through OPC. |
| P22-03 | Direct testing of primary photo-electron energy generated by extreme ultraviolet (EUV) at 13.5 nm, Direct test of photoelectron generation mechanism of EUV photoresist pattern development model will be tested using both photons and electrons. This experiment will help validate the photoelectron model proposed in literature. |
| P23-01 | Evaluation of RE-800 as a negative tone chemically amplified resist for electron beam lithography, In this paper, we report our evaluation work on a newly developed negative tone electron beam resist, RE-800. |
| P23-02 | Polycarbonate as a dual-tone resist for electron-beam lithography, We found polycarbonate can behave as both positive and negative tone resists in EBL. The molecular change of PC in EBL is studied by Raman spectroscopy. PC nanostructures patterned by EBL are used to produce sub-10 nm structures by controlled thermal reflow. |
| P23-03 | Chromium oxide as a hard mask material better than metallic chromium, One major issue in patterning Cr etching mask is low selectivity to resist because of O2 addition to Cl2 for Cr etching. We show Cr2O3 is a better mask material because it is etched 4 times faster than Cr using Cl2/O2, and is equally resistant to etching using F-based gas. |
| P23-04 |
Here, we synthesize and characterize the BCP poly(4-tertbutylstyrene)-b-poly(propyl methacrylate) as a useful block copolymer for 248 nm lithography. The χ for PtBS-b-PPMA is expected to be lower than that of PS-b-PMMA, leading to a BCP that permits less kinetically trapped defects, makeing annealing of large features easier than for PS-b-PMMA. |
| P23-05 | Crosslinkable Photoacid Generators for Ultrahigh Loading in Epoxide Functionalized Molecular Resists, Photoacid generators (PAGs) functionalized with polymerizable groups are reported for use in ultra-high PAG loading crosslinking resists. PAGs functionalized with combinations of phenols and epoxides have been studied in epoxide functionalized negative tone molecular resists. |
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P24-01 (Invited) | Focused Helium Ion Beam Irradiated Josephson Junctions and Arrays, We will present high temperature superconducting Josephson junctions and arrays with various widths irradiated with a focused helium ion beam. These devices show the sensitivity and large dynamic range that are suitable for wide band advanced communications. |
| P25-01 | Oxidation sharpening of silicon tips in 'air' environment, The essential oxidation sharpening for AFM probe is usually carried out in dedicated furnace, applicable only for wafer of tips. Here we demonstrate that oxidation sharpening can also be attained using generic box furnace oxidation in air, and can be utilized to regenerate sharp tips out of worn out tips. |
| P25-02 |
Combining massively parallel scanning probe nanolithography, microfluidics, and brush-polymer chemistry, we have achieved 4D micromanufacturing, where the four dimensions are the Cartesian coordinates (x,y,z) and the chemical composition of each spot in an array. This manufacturing approach could pave the way towards materials with the complexity common to biological interfaces. |