Conference

David S. Bergsman

Assistant Professor, Department of Chemical Engineering, University of Washington

Use of High Throughput MLD to Screen Photoresist Chemistries for EUV Lithography

David S. Bergsman
Michael Tsapatsis

Michael Tsapatsis

Bloomberg Distinguished Professor, Department of Chemical and Biomolecular Engineering, John Hopkins University
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Uros Jagodic

Uroš Jagodič

Research Scientist, Jožef Stefan Institute, Slovenia
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Dan Congreve

Dan Congreve

Electrical Engineering, Stanford University
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Julia W. P. Hsu

Julia W.P. Hsu

Texas Instruments Distinguished Chair in Nanoelectronics, Department of Materials Science and Engineering, University of Texas at Dallas
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