Michael Tsapatsis
Bloomberg Distinguished Professor, Department of Chemical and Biomolecular Engineering, John Hopkins University
Metal Imidazolate Films for Lithography Applications
This talk is about a class of amorphous metal organic frameworks (amorphous zeolitic imidazolate frameworks: aZIFs) and their use as resists for electron-beam lithography (EBL), extreme ultraviolet lithography (EUVL: 13.5 nm), as well as for lithography using smaller wavelengths, beyond EUV (BEUV: 6.7 nm).
Lisa McElwee-White
Colonel Allen R. and Margaret G. Crow Professor of Chemistry, University of Florida
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Elena Pinilla Cienfuegos
Researcher, Nanophotonics Technology Center, Universitat Politècnica de València
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George Barbastathis
Ralph E. and Eloise F. Cross Professor in Manufacturing, Professor of Mechanical Engineering, Area Head for Micro and Nanoengineering, MIT
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