Michael Tsapatsis
Bloomberg Distinguished Professor, Department of Chemical and Biomolecular Engineering, John Hopkins University
Metal Imidazolate Films for Lithography Applications
This talk is about a class of amorphous metal organic frameworks (amorphous zeolitic imidazolate frameworks: aZIFs) and their use as resists for electron-beam lithography (EBL), extreme ultraviolet lithography (EUVL: 13.5 nm), as well as for lithography using smaller wavelengths, beyond EUV (BEUV: 6.7 nm).
Julia W.P. Hsu
Texas Instruments Distinguished Chair in Nanoelectronics, Department of Materials Science and Engineering, University of Texas at Dallas
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Lisa McElwee-White
Colonel Allen R. and Margaret G. Crow Professor of Chemistry, University of Florida
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Daniel “Fed” Sunday
Staff Scientist, National Institute of Standards and Technology
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