Michael Tsapatsis
Bloomberg Distinguished Professor, Department of Chemical and Biomolecular Engineering, John Hopkins University
Metal Imidazolate Films for Lithography Applications
This talk is about a class of amorphous metal organic frameworks (amorphous zeolitic imidazolate frameworks: aZIFs) and their use as resists for electron-beam lithography (EBL), extreme ultraviolet lithography (EUVL: 13.5 nm), as well as for lithography using smaller wavelengths, beyond EUV (BEUV: 6.7 nm).
Katja Höflich
Head of the Joint Lab for Photonic Quantum Technologies, Ferdinand-Braun-Institut (FBH) in Berlin, Germany
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