Michael Tsapatsis
Bloomberg Distinguished Professor, Department of Chemical and Biomolecular Engineering, John Hopkins University
Metal Imidazolate Films for Lithography Applications
This talk is about a class of amorphous metal organic frameworks (amorphous zeolitic imidazolate frameworks: aZIFs) and their use as resists for electron-beam lithography (EBL), extreme ultraviolet lithography (EUVL: 13.5 nm), as well as for lithography using smaller wavelengths, beyond EUV (BEUV: 6.7 nm).
Luca Basso
Researcher at the Center for Integrated Nanotechnologies, Sandia National Labs
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David S. Bergsman
Assistant Professor, Department of Chemical Engineering University of Washington
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Elena Pinilla Cienfuegos
Researcher, Nanophotonics Technology Center, Universitat Politècnica de València
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