Takeo Watanabe
University of Hyogo
Current Status and Prospect for EUV Lithography at Univ. of Hyogo
R&D of EUV lithography has been carried out science 1996 at Himeji Institute (present University of Hyogo. More fundamental researches are required to meet the various kinds of specification related to the EUVL. The research activities of resist, mask, and optical element including metrology will be introduced.
About Takeo Watanabe
Takeo Watanabe, PhD, is Principal Investigator and Project Professor, Next Generation EUVL Research Endowed Chair, Laboratory of Advanced Science and Technology for Industry (LASTI), University of Hyogo.
He has been working on EUVL since 1993, and he is a leading expert on EUV lithography in Japan, including optics, exposure tool, mask and resist related technologies. He world first demonstrate 60 nm L&S pattern utilizing three aspherical imaging optics in a large exposure field of 10 mm x 10 mm in 2001 with synchronizing mask and wafer stage.
During his time as a director of LASTI, University of Hyogo, from 2016 to 2021, he introduced a dedicated new electron-beam injector to NewSUBARU synchrotron light facility which is the largest synchrotron facility operated by the university in Japan.
He has authored over 270 technical papers and many patents.
He is the president of the International Conference of Photopolymer Science and Technology (ICPST). He is also Conference Chair of the International Conference of Photomask Japan (PMJ). And he is a program committee member of the International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN). Furthermore, he is a committee member of lithography of IRDS. And he is a committee member of K-Program of EUVL and Beyond EU project organized by Japanese government.
