Ricardo Ruiz
Staff Scientist at Lawrence Berkeley National Laboratory
Navigating Stochastic Challenges in EUV Lithography: Innovations in Materials and Metrology
We examine innovative material platforms and characterization techniques to probe and eventually control sources of chemical stochastics in EUV lithography. Material platforms include polypeptoids and molecular layer deposition, alongside bottom-up strategies to enhance uniformity. Innovations in multimodal characterization of EUV and secondary electron-driven patterning will also be discussed.
About Ricardo Ruiz
Ricardo Ruiz is a staff scientist at The Molecular Foundry at Lawrence Berkeley National Laboratory. Additionally, he serves as the Director of the Center for High Precision Patterning Science (CHiPPS), a DOE-BES funded Energy Frontier Research Center dedicated to advancing patterning science in the Extreme Ultraviolet lithography era for semiconductor manufacturing. Dr. Ruiz specializes in nanofabrication, lithographic patterning, and self-assembly. From 2006 to 2019, he held various appointments at Hitachi GST/HGST/Western Digital, where he made significant contributions to magnetic bit patterned media and non-volatile memories, and managed a research group focused on block copolymer and nanoparticle lithography. Dr. Ruiz is a fellow of the American Physical Society. He earned his PhD in Physics from Vanderbilt University in 2003 and completed postdoctoral fellowships at Cornell University and IBM T.J. Watson.
Steven Randolph
Mooseok Jang
