Conference

In the field of atomically precise fabrication, hydrogen depassivation lithography has established through several decades of development a robust and repeatable method for atomically precise patterning on silicon surfaces. This approach has enabled important results in nanoelectronics and quantum devices. Extending atomic precision to a broader set of fabrication operations such as controlled addition, modification, and sequencing of atomic building steps, remains however an important challenge for the field.

In this invited talk, we present a general fabrication enabling technology based on mechanosynthesis where atomic precision and product selectivity is achieved through the deterministic three‑dimensional positioning of reactants.

Rather than relying on stochastic adsorption or fixed precursor chemistry, the mechanosynthesis platform presented here treats atomic fabrication as a programmable process: build‑site structure, probe termination, molecular tool design, and reaction trajectories are all tunable parameters. We will outline how the architecture enables repeatable, site‑specific atomic modifications and how changing the build site and feedstock chemistry expands the accessible reaction space. Together, these results position mechanosynthesis as a flexible and extensible enabling technology for fabrication that complements existing surface based methods and enables new modes of atom by atom construction.