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| Topic | Poster Title | Author(s) |
|---|---|---|
| 2D Materials | Design and Application of Titanium Dioxide Thin Films Guided Mode Resonance Filter | He Zhang, YiChen Ping and Yanli Li |
| 2D Materials | First-Principles Study of Graphene/Blue Phosphorus/Graphitic-ZnO van der Waals Heterostructures: Optoelectronic Enhancement and Mn Doping Effects | Hao Zhang |
| 3D nano & micro fabrication | Rapid and Scalable Fabrication of Si Microfunnel Arrays Using Nanosecond UV-Laser and Selective HNA Etching | Ashif Chowdhury, Donggeon Kim and Heayoung Yoon |
| 3D nano & micro fabrication | Laser-Assisted Fabrication and Multimodal Characterization of Si Microfunnel Structures | Jaidan Malloy, Ashif Chowdhury, Taehoon Kim, Jason Smith and Heayoung Yoon |
| Advanced micro/nanolithography | Refining the Fabrication of Grayscale Lithography Annealed Resin Engineering | Gavin C. Gee |
| AI for nanofabrication & Nanofabrication for AI | A Machine Learning Process for Flexible Inline Critical Dimensions Measurement from Micrographs | Jiahua Fan, Ziyu Wang, Pawan Vedanti and Gyuseok Kim |
| Applications of Nanofabrication | An Electron Beam-Based Micro-LED Inspection Method | Yao Liu, Yanli Li, Huibin Zhao and Li Han |
| Applications of Nanofabrication | Tailoring HfOâ‚“ ReRAM Switching Through Ti Interfacial Engineering | Zhijie Kong, Tsotne Gamsakhurdashvili, Daniel Sabrsula, Ana Cohen, David Barth, Goran Karapetrov and Lucas Barreto |
| Electron Beam Lithography | Quantitative Evaluation of Patterning Resolution Capability Using Partially Resolved Regions. | aki Mukai |
| Electron Beam Lithography | Accelerated Curvilinear Mask Process Correction via Direct Energy-based Modulation | Chun-Hung Liu, Yu-Lin Chung, Nian-Ting Wu, Sheng-Kai Wong, Ze-An Ding and Meng Gu Tsai |
| Electron Beam Lithography | A Hybrid Curvilinear Mask Process Correction Method Integrating Shape and Dose Modifications | Chun-Hung Liu, Nian-Ting Wu, Yu-Lin Chung, Sheng-Kai Wong, Ze-An Ding, Yen-Hua Tu, Huang Ting-Chun, Yu-Tang Sun, Meng Gu Tsai and Yu-Jun Zhong |
| Electron Beam Lithography | Energy-based Iterative Calibration of Parametric Point Spread Functions for Curvilinear Pattern Prediction | Chun-Hung Liu, Meng Gu Tsai, Yu-Lin Chung, Ze-An Ding, Sheng-Kai Wong and Nian-Ting Wu |
| Electron Beam Lithography | A Fragment-based Pattern Prediction Method for Accelerating Large-Scale Mask Simulation | Ze-An Ding, Chun-Hung Liu, Yen-Hua Tu, Yu-Lin Chung, Yu Hsi Liu, Meng Gu Tsai and Nian-Ting Wu |
| Electron Beam Lithography | Application-Specific Fast Multipole Methods for Enhancing Computational Efficiency in Curvilinear Mask Pattern Prediction | Chun-Hung Liu, HSUN-MAO KUO, Ze-An Ding, Yen-Hua Tu, Huang Ting-Chun and Meng Gu Tsai |
| Electron Beam Lithography | Fabrication of Near-UV Multilevel Diffractive Lenses Using Grayscale E-Beam Lithography and TASTE | Cecilia R. Fasano, Chi C. Cheung and Marc Christopherson |
| Electron Beam Lithography | Apparent Resist Sensitivity of a Pattern of Multiple Features in Electron Beam Lithography | Soo-Young Lee |
| Electron/Ion Sources and Optics | Ion Implantation into Semiconductors using Ionic Liquid Ion Sources | Shaun Boodram, Alex Storey, Aydin Sabouri and Carla Perez Martinez |
| Ion Beam Lithography | Characterizing Environmental Vibration Impacts on Electron-Beam Lithography Using Exposure-Induced Pattern Signatures | Huang Jingyu |
| Metamaterials, metasurfaces & flat optics | Enabling Rapid Nanofabrication of Large-Area Metasurfaces by Innovative Algorithmic EBL Patterning | Frank Nouvertne, Michael Kahl and Volker Boegli |
| Metrology, Microscopy | Aberration Measurement Using Imaging with Electron Beam Landing-Angle Sweeping | Zhaohui Cheng, Shunya Tanaka, Keiichiro HItomi, Hiroki Takayanagi, Takayasu Iwatsuka, Ryo Kadoi, Hideto Doi, Masanori Mita and Hirokatsu Tanabe |
| Metrology, Microscopy | Prediction of Critical Dimensions of 3D Structures in CD SEM Metrology Based on LSTM Neural Network | Zheng Luo, Sa Liu, Delong Chen and Zhuming Liu |
| Nanoelectronics | Optimization of Zirconium doped Hafnia-Based Ferroelectric Capacitive Memories via Thermal Annealing | Ziyi Wang |
| Nanofabrication for biology, nanomedicine & implantable devices | Cost-Effective Antimicrobial Surfaces Patterned by Interference and Nanoimprint Lithography | Samuel D. Triepke, Luke J. Suttey, Jessica Andriolo, Jack Skinner and Bruce Burckel |
| Nanofabrication for quantum | Nanofiber Gamma Ray Sensors via Lead-Based Perovskite Quantum Dots | Chase R. Benner |
| Nanoimprint Lithography | Infiltration behaviors of trimethoxysilane derivatives into spin-on-carbon thin films analyzed by TOF SIMS | Masaru Nakagawa, Kyoko Tsuchiya, Rie Shishido, Tomoko Hasegawa, Akiko Onuma, Shintaro Itoh, Kenichi Fukuzawa, Ryohei Suzuki and Jun-ichi Seki |
| Nanoimprint Lithography | Fluorescence-intensity histogram characterizing uniformity of imprint resist patterns with different pattern-density distributions | Daisuke Tojima, Narumi Ono, Akiko Onuma and Masaru Nakagawa |
| Nanoimprint Lithography | Silicon Mold Improvement by Hydrogen Annealing for Low-loss PIC Fabrication Utilizing Nanoimprint Lithography | Lianyi Chen, Hui Wang and Wen-Di Li |
| Nanophotonics, Micro-optics, plasmonics. | Challenges and optimization in using HSQ as etch mask for on-chip AlN waveguides fabrication for photonic devices | Bernadeta R. Srijanto, Bogdan Dryzhakov, Dayrl P. Briggs, Steven J. Randolph and Kyle P. Kelley |

