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Panel Discussion
The 2026 Panel Discussion explored how to maximize the combined strengths of artificial intelligence and human expertise in advancing precision nanomanufacturing and metrology. This conversation brought together a group of distinguished and important panelists, listed below, whose insights are helping shape this emerging field.
The discussion took place on Thursday, May 28 at 4:00 p.m.
2026 Panel Discussion Speakers
Carla Perez Martinez
Associate professor and UKRI Future Leaders Fellow, London Centre for Nanotechnology at University College London
Discussion Moderator
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Discussion Moderator
Martin Wegener
Professor at Institute of Applied Physics of Karlsruhe Institute of Technology (KIT), Department Head at Institute of Nanotechnology (INT)
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Scott Lewis
California Institute of Technology
From Electrons to Photons: Decoding the Secrets of Tomorrow’s Photoresist Design
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From Electrons to Photons: Decoding the Secrets of Tomorrow’s Photoresist Design
J. Alexander LiddleÂ
Vice President, Research and Development, Canon Nanotechnologies
Inkjet Nanoimprint Lithography: Technology and Applications
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Inkjet Nanoimprint Lithography: Technology and Applications
Ralph Nyffenegger
Vice President of Engineering, Electron Beam Products, KLA
Hybrid Inspection and Electron-Beam Massive Metrology for Advanced Semiconductor Manufacturing Technology and Nanofabrication
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Hybrid Inspection and Electron-Beam Massive Metrology for Advanced Semiconductor Manufacturing Technology and Nanofabrication
Robert Wolkow
Physics Professor and iCORE Chair, University of Alberta
Making and Characterizing Error-Free Atom-Defined Silicon Devices
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Making and Characterizing Error-Free Atom-Defined Silicon Devices