Anuja De Silva
Technical Director at Lam Research
Patterning Solutions for Accelerated Scaling: Enabling High NA EUV Lithography
About Anuja De Silva
Anuja De Silva is a technical director within dry resist group at Lam Research. Her expertise is in development of new materials and processes for advanced patterning. She is a co-author of ~50 publications and ~75 patents. She is a senior member of SPIE and a member of the IRDS patterning roadmap committee. She is a keen advocate of technical leadership among women in Semiconductor research and a mentor within SPIE’s Women in Optics and Semi org. Previous to joining Lam, Anuja was part of the advanced patterning group at IBM research. She obtained her PhD in Chemistry from Cornell University and BA in Chemistry from Mount Holyoke College.
Katja Höflich
Head of the Joint Lab for Photonic Quantum Technologies, Ferdinand-Braun-Institut (FBH) in Berlin, Germany
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Julia W.P. Hsu
Texas Instruments Distinguished Chair in Nanoelectronics, Department of Materials Science and Engineering, University of Texas at Dallas
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Elena Pinilla Cienfuegos
Researcher, Nanophotonics Technology Center, Universitat Politècnica de València
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