J. Alexander Liddle
National Institute of Standards and Technology
Panel Discussion | The Future of NanoLithography in the Age of Quantum Computing and AI
As computing advances into the AI and quantum age, the demands on nanolithography are becoming increasingly complex. This panel explores the tradeoffs among emerging nanofabrication techniques – including EUV and its corresponding advanced resist systems, Nanoimprint Lithography (NIL), STM-based atomic precision patterning, and other novel approaches – as they relate to fabricating devices with extreme requirements for coherence, conductivity, and CMOS compatibility.
We will examine how lithographic innovations are enabling next-generation quantum devices (e.g., quantum dots, topological qubits, superconducting circuits) and AI accelerators with ultra-high density and bandwidth. The discussion will highlight the challenges of transferring lab-scale breakthroughs into scalable, manufacturable processes, and address the urgent need for integration across materials, patterning, and device architecture.
About J. Alexander Liddle
J. Alexander Liddle is the Chief of the Microsystems and Nanotechnology Division at NIST. He holds a D.Phil. and B.A. in Materials Science from the University of Oxford. His division’s research runs the gamut from quantum nanophotonics to biology. His personal research focus is on nanofabrication and self-assembly for nanomanufacturing. He has published over 275 papers, in areas ranging from electron-beam lithography to DNA-controlled nanoparticle assembly to super-resolution optical microscopy. He is a fellow of the American Physical Society and the Washington Academy of Sciences.
