Call for Papers

EIPBN Abstract Submission
Manuscript Submission Email Registration

EIPBN 2012 Program

 

To see the conference at a glance with links to all of the session information click here.

 

The conference runs 4 days: May 29 – Jun 1, 2012.  Activities begin on Tuesday afternoon with a special Commercial Session, which features exhibits by companies and organizations that provide tools and services of interest to the technology of the conference.  The Welcome Reception will be on Tuesday evening at the Hilton Waikoloa Lagoon Lanai.

TECHNICAL PROGRAM

The Technical Program runs Wednesday, May 30 through Friday, June 1.  The opening Plenary Session is on Wednesday morning with outstanding speakers presenting on major themes in advanced nanofabrication.  The Plenary Speakers this year are Mark Pinto (Applied Materials), Burn Lin (TSMC) and Matt Nowak (Qualcomm).

The oral session topics include:

Session1A 3DIC Session 1B EUV I Session1C Metrology & Imaging
Session 2A Optical Litho Session 2B EUV II – Masks Session 2C TIP-Based Nanofabrication
Session 3A Graphene I Session 3B Nanoimprint I Session 3C Resists
Session 4A Graphene II Session 4B Nanoimprint II Session 4C Emerging Technologies
Session 5A Maskless Lithography Session 5B Ebeam I Session 5C Bit Patterned Media & Nanostructures
Session 6A  Grating Based Lithography Session 6B Ebeam II Session 6C Nanostructures & Processing II
Session 7A NanoPhotonics I Session 7B Nanobiology Session 7C Nanoelectronics
Session 8A NanoPhotonics II Session 8B Self-Assembly I Session 8C Electron or Ion Sources & Systems
Session 9A Nanostructured Solar Cells Session 9B Self Assembly II Session 9C MEMs/NEMs
Session 10A Nonconventional Electron & Ion Sources Session 10B Self Assembly III Session 10C Microfluidics

 For complete information about the EIPBN 2012 Poster Session click here.

 

Special Sessions

EIPBN 2012 will also feature a number of special sessions on topics of current interest. These include graphene RF Electronics, 3DIC fabrication challenges, grating lithography, and nanostructured organic solar cells.

Find Talks and Posters

You can search topics, authors, and sessions in the table below.  You can also browse the entire list. The schedule and locations of the talks can be found by clicking on the session link in the table above. To see the conference at a glance with links to all of the sessions click here.

Paper #TitleAuthors
1A-1Monolithic 3D Integration (Invited)Zhiping Zhang, Chien-Yu Chen, Filip Crnogorac, Peter Griffin, Fabian Pease, James Plummer, Simon Wong
1A-2Overcoming 3DIC Technology Hurdles (Invited)Vyshnavi Suntharalingam, Chenson K. Chen, Chang-Lee Chen, Jeffrey M. Knecht, Donna R. W. Yost, Keith Warner, Craig L. Keast
1A-3Heterogeneous 3D Integration (Invited)Robert Patti
1B-1EUV lithography in pre-production mode (Invited)Eric Hendrickx, Jan Hermans, Gian Lorusso, Philippe Foubert, Ivan Pollentier, Rik Jonckheere, Mieke Goethals, Geert Vandenberghe, Kurt Ronse
1B-2Fundamental Study of EUV Resist Line Edge Roughness: Characterization, Experiment, and ModelingRamakrishnan Ayothi, Lovejeet Singh, Yoshi Hishiro, Jed Pitera, Linda Sundberg, Martha Sanchez, Kumar Virwani, Karen Petrillo, Luisa Bozano, Gregory Wallraff, Yueming Hua
1B-3High-resolution patterning with EUV interference lithographyYasin Ekinci, Andreas Langner, Birgit Paivanranta, Bernd Terhalle, Mohamad Hojeij, Li Wang, Michaela Vockenhuber, Eugenie Kirk
1B-4Defect Tolerant Extreme Ultraviolet LithographyLukasz Urbanski, Jorge Rocca, Carmen Menoni, Mario Marconi, Artak Isoyan, Aaron Stein
1C-1Optimization of the Gun, Lenses and and Detectors for High-Vacuum SEM Studies of Non-Conductive SpecimensRoger Alvis, Brandon Van Leer, David Wall, Daniel Phifer, Laurent Roussel, Ingo Gestmann, Ozan Urgula
1C-2Towards Secondary Ion Mass Spectrometry on the Helium Ion MicroscopeTom Wirtz, Lex Pillatsch, Nico Vanhove, David Dowsett, Sybren Sijbrandij, John Notte
1C-3Design and fabrication of micro optical system for multi-optical probe confocal microscopy for large areal measurementJiseok Lim, Seoyeong Hwang, Myungki Jung, Shinill Kang
1C-4The contrast mechanisms of LL-BSE electrons from Hybridization & Band GapsHeiner Jaksch
1C-5SEM dimensional metrology on sub-15 nm bit-patterned media using model-based analysisSergey Babin, Justin Hwu, Peter Yushmanov
2A-1Deep-subwavelength patterning with photoswitchable moleculesPrecious Cantu, Nicole Brimhall, Trisha Andrews, Rossella Castagna, Chiara Bertarelli, Rajesh Menon
2A-2Large area optical lithography using cylindrical masksBoris Kobrin, Alfred Renaldo, Mukti Aryal, Ian McMackin
2A-3Phase shifting mask for high-throughput high-contrast patterning with Displacement Talbot Lithography (DTL)Christian Dais, Francis Clube, Harun Solak, Kimio Itoh, Yukio Taniguchi, Morihisa Hoga
2A-4Photodeactivatable photoresists for visbile-light nanolithography?Michael Stocker, Zulya Tomova, John Fourkas
2B-1EUV Mask Challenges, Status & Closing The Remaining Technology Gaps (Invited)Frank Goodwin, Vibhu Jindal, Patrick Kearney, Ranganath Teki, Jenah Harris-Jones, Andy Ma, Arun John Kadaksham, Stefan Wurm
2B-2Lithographic Performance of EUV Mask using Coherent Scattering MicroscopyJonggul Doh, Sangsul Lee, Jae Uk Lee, Seongchul Hong, Inhwan Lee, Jinho Ahn, Dong Gun Lee, Seong-Sue Kim
2B-3Development of Standalone Coherent EUV Scatterometry Microscope for EUV Mask ObservationTetsuo Harada, Masato Nakasuji, Takeo Watanabe, Hiroo Kinoshita, Yutaka Nagata
2B-4At-Wavelength EUV Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer MirrorsMitsunori Toyoda, Kenjiro Yamasoe, Tadashi Hatano, Mihiro Yanagihara, Akifumi Tokimasa, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita
2C-1Probe nanopatterning: Towards a smarter lithography technology (Invited)Michel Despont, Philip Paul, Felix Holzner, James Hedrick, Armin Knoll, Urs Duerig
2C-2Tip-Based Nanofabrication and Nanometrology of Functional Nanodevices using Heated Cantilever Arrays (Invited)William P. King
2C-3Determining Tip Position Tolerances for Atomically Precise STM lithography of Si(001):HJustin Alexander, Joshua Ballard, Ehud Fuchs, James Owen, John Randall, Jim Von Her
2C-4Improved single ion implantation with scanning probe alignmentMichael Ilg, Christoph Weis, Ivo Rangelow, Thomas SchenkelÊ
3A-1Graphene Nanoelectronics (Invited)CY Sung, IBM, Watson
3A-2Graphene for RF Applications: Opportunities & Challenges (Invited)J. S. Moon, M. Antcliffe, H.C. Seo, S.C. Lin, A. Schmitz, I. Milosavljevic, K. McCalla, D.K. Gaskill, P.M. Campbell, K.-M. Lee, P. Asbeck
3A-3Graphene-based & Graphene-derived Materials (Invited)Rod Ruoff
3A-4Scalable Graphene Field Effect Transistors with Boron Nitride Dielectrics (Invited)Nick Petrone, Inanc Meric, Cory Dean, Arend van der Zande, Lei Wang, James Hone, Ken Shepard
3B-1Nanoscale Manufacturing Using Jet and Flash Imprint Lithography (Invited)SV Sreenivasan
3B-2High aspect ratio lift-off process and silver optimization for negative index materials in the visibleIris Bergmair, Andreas Rank
3B-3Demonstration of sub-4 nm nanoimprint lithography using a template fabricated by helium ion beam lithographyWen-Di Li, Wei Wu, R. Stanley Williams
3B-4High-Resolution Non-Destructive Patterning of Isolated Organic SemiconductorsYi-Chen Lo, Zhenzhong Sun, Shoieb Shaik, Dawen Li, Xing Cheng
3B-5Sidewall-angle dependent pre-filling of three-dimensional microcavities in thermal nanoimprintMirco Altana, Arne Schleunitz, Helmut Schift
3C-1Low Diffusion EUV Resists using Bound PAG Technology (Invited)James Thackeray, James Cameron, Michael Wagner, Owendi Ongayi, Vipul Jain, Paul LaBeaume, Suzanne Coley
3C-2Effect of molecular weight distribution on e-beam resist polystyreneRipon Kumar Dey, Raafat Mansour, Bo Cui
3C-3Measurements of the Latent Image in Chemically-Amplified ResistsGinusha Perera, Yogendra Pandey, Manolis Doxastakis, Gila Stein
3C-4High Resolution Negative Tone Resists via Controlled PolymerizationRichard Lawson, Laren Tolbert, Clifford Henderson
3C-5Study of Line-Edge Roughness in ZEP Resist Nanopatterns from Electron Beam Lithography by Numerical ModelingKirill Koshelev, Steve Dew, Maria Stepanova
4A-1Graphene transistors with record mobilities on polyimide for high-performance flexible nanoelectronicsJongho Lee, Li Tao, Deji Akinwande
4A-21 nm Thick Chemically Functionalized Carbon Nanomembranes (CNMs): Two-dimensional Materials for NanoengineeringAndrey Turchanin, AndrŽ Beyer, Xianhui Zhang, Polina Angelova, Armin GšlzhŠuser
4A-3Nanofabrication of Graphene on SiC by Multi-Ion Beam Lithography and Low-Temperature ProcessingBill R. Appleton, Sefaattin Tongay, Maxime Lemaitre, Arthur F. Hebard, Brent Gila, Joel Fridmann, Fan Ren, Xiaotie Wang, Dinesh K. Venkatachalam, Robert G. Elliman
4A-4Fabricating Graphene-Silicon Nitride Heterostructures for High-Q Tunable Nanomechanical ResonatorsSunwoo Lee, Robert Barton, Arend van der Zande, Gwan-Hyoung Lee, Alexander Gondarenko, Jeevak Parpia, Harold Craighead, James Hone
4A-5Superconductivity of tungsten-containing carbon nanowires fabricated by focused-ion-beam chemical vapor depositionJun Dai, Reo Kometani, Shin'ichi Warisawa, Sunao Ishihara, Koji Onomitsu, Yoshiharu Krockenberger, Hiroshi Yamaguchi
4B-1Study of defect mechanisms in partly filled stamp cavities for thermal nano imprint controlAndre Mayer, Jyunji Sakamoto, Saskia Mšllenbeck, Khalid Dhima, Si Wang, Hella-Christin Scheer, Yoshihiko Hirai
4B-2Cleaning Induced Imprint Template ErosionZhaoning Yu, Nobuo Kurataka, Hieu Tran, Gene Gauzner, Hongying Wang, Henry Yang, Yautzong Hsu, Kim Lee, David Kuo
4B-33-D microfabrication based on a glass transition temperature selective thermal reflow - towards optical applicationsArne Schleunitz, Vitaliy Guzenko, Christian Spreu, Helmut Schift, Martin Messerschmidt, Hakan Atasoy, Marko Vogler
4B-4Single digit nanoimprint lithography achieved by template modification with atomic layer depositionScott Dhuey, Christophe Peroz, Deirdre Olynick, Marko Vogler, Marion Cornet, Stephano Cabrini
4B-5Sub-20 nm Metal Gratings by Nanoimprint LithographyLeo Varghese, Li Fan, Yi Xuan, Minghao Qi
4C-1Patterning of Sub-10 nm Optical Apertures on Single Crystal Metallic Films with the Helium Ion Microscope (Invited)Daniel Pickard, Vignesh Viswanathan, Michel Bosman, Jens DorfmŸller, Harald Giessen, Zhongkai Ai, Hanfang Hao, Masoud Mahmoudi, Yue Wang, Chao Fang
4C-2The Membrane-Alignment Stage in Fabricating 3-Dimensional NanostructuresShabnam Ghadarghadr, Corey Fucetola, Lin Lee Cheong, Euclid Moon, Henry I. Smith
4C-3Diamond nitrogen-vacancy centers created by scanning focused helium ion beam and annealingZhihong Huang, Wen-Di Li, Charles Santori, Victor M. Acosta, Andrei Faraon, Wei Wu, Toyofumi Ishikawa, R. Stanley Williams, Raymond. G. Beausoleil
4C-4Sub-10-nm Lithography with Light-Ion Beams: Exposure Efficiency and ApplicationsDonald Winston, John Paul Strachan, Brenton Knuffman, Adam V. Steele, Vitor R. Manfrinato, Samuel M. Nicaise, Lin Lee Cheong, John Notte, Jabez J. McClelland, R. Stanley Williams, Karl K. Berggren
4C-5First lithography results obtained with the 2nd generation MeV proton beam writing facilityJeroen Anton van Kan, Yong Yao, Pattabiraman Santhana Raman, Benjamin Teo
5A-1REBL: A Lithography Solution for High Volume Manufacturing at 16 nm (Invited)Paul Petric, Chris Bevis, Upendra Ummethala, Mark McCord, Allen Carroll, Jeff Sun, Francoise Kidwingira, Anthony Cheung, Joshua Clyne, Thomas Gubiotti
5A-2Sub-22nm High Throughput Maskless Nanolithography Using Quasi-3D Plasmonic Lensliang pan, Yi Xiong, Yongshik Park, Yuan Wang, Ziliang Ye, Xiaobo Yin, Erick Ulin-Avila, Shaomin Xiong, Junsuk Rho, Cheng Sun, David Bogy, Xiang ZhangÊ
5A-3Ultra-high-Numerical Aperture Interference Lithography at High Aspect Ratios using Surface States on Effective Gain MediaPrateek Mehrotra, Chris Mack, Richard Blaikie
5A-4An FPGA-based Pattern Generator for Massive Parallel High-Speed Nanolithography SystemErick Ulin-Avila, Liang Pan, Shaomin Xiong, Yongshik Park, Yi Xiong, Yuan Wang, Chen Sun, David Bogy, Xiang Zhang
5A-5Multi-axis and Multi-beam technology for high throughput maskless E-beam lithographyHiroshi Yasuda, Takeshi Haraguchi, Hidebumi Yabara, Kouji Takahata, Hidekazu Murata, Eiji Rokuta, Hiroshi Shimoyama
5B-1High Resolution Patterning on Non-Planar Substrates with Large Height Variation Using Electron-Beam LithographyVishva Ray, Yukinori Aida, Ryo Funakoshi, Stella Pang
5B-2Measurement of fogging electron current in scanning electron microscopeYasuhiro Ohara, Akira Osada, Masaru Otani, Masatoshi Kotera
5B-3Measurement of Surface Potential Distribution at an Insulating Film Produced by Fogging Electrons in a Scanning Electron MicroscopeMasaru Otani, Akira Osada, Yasuhiro Ohara, Masatoshi Kotera
5B-4Arbitrarily Shaped High-Coherence Electron and Ion Bunches from Laser-Cooled AtomsRobert Scholten, Andrew McCulloch, Daniel Thompson, Dene Murphy, Sebastian Saliba, Keith Nugent, Corey Putkunz, David Sheludko
5B-5High Aspect Ratio SML Resist Patterning using 30 keV Electron Beam LithographyMohammad Ali Mohammad, Steven K. Dew, Maria Stepanova
5C-1Progress and Challenges in Bit Patterned Media Nanofabrication (Invited)XiaoMin Yang, Shuaigang Xiao, Kim Lee, Gene Gauzner, Koichi Wago, Rene van de Veerdonk, David Kuo
5C-2Fabrication of 5 Tb/in2 Bit Patterned Media with Servo Pattern using Directed Self-AssemblyNaoko Kihara, Ryousuke Yamamoto, Norikatsu Sasao, Takuya Shimada, Akiko Yuzawa, Takeshi Okino, Yasuaki Ootera, Yoshiyuki Kamata, Akira Kikitsu
5C-3System to Measure the Shear Modulus of Iron at high temperature and pressure using Transverse Displacement Interferometry Fabricated by Electron Beam LithographyRichard TIberio, Arianna Gleason, Wendy Mao
5C-4Taming Nanostructures: From Sponge to Dot Pattern on Ge Controlled by Heavy-Ion-Deposited EnergyRoman Bšttger, Lothar Bischoff, Karl-Heinz Heinig, Bernd Schmidt
5C-5Nanofabrication of high aspect ratio (~50:1) sub-10 nm silicon nanowires using plasma etch technologiesMuhammad Mirza, Haiping Zhou, Xu Li, Philippe Velha, Kevin Docherty, Antonio Samarelli, Gary Ternent, Douglas Paul
6A-1Electron beam lithography-based grating customization strategies for gate level patterning in high density SRAM circuits (Invited)Michael Guillorn, Josephine Chang, Sebastian Engelmann, David Klaus, James Bucchignano, James Tornello, William Graham, Nicholas Fuller, Ernst Kratschmer
6A-2Sub-20nm Hybrid Lithography enabled by Highly Regular Layout, Pitch Divisionand e-Beam Exposure (Invited), Michael Smayling, David Lam
6A-3An all-optical process for extending GRATE to the 11nm (20nm hp) Technology Node (Invited)Rudi Hendel, John Petersen, David Markle, Alex Raub, Robert Greenway
6A-4Optical lithography method for generation of sub-35nm line/space patterns for use in complementary lithographyHarun Solak, Christian Dais, Francis Clube
6A-5Vibrational Indentation Patterning of Grating Structures with Real-time Period TunabilitySe Hyun Ahn, Jong G. Ok, Moon Kyu Kwak, L. Jay Guo
6B-1Liquid phase electron beam induced deposition of CdSM. Bresin, N. Reddy, V. Singh, J. T. Hastings
6B-2Cold Field, Thermal-Field, and Schottky Emission from HfC(310) SourcesWilliam Mackie, Josh Lovell, Gerald Magera
6B-3Focused Electron Beam Induced Deposition as novel nanofabrication approach for magnetic nanosensors and nanomagnet logicMarco Gavagnin, Heinz D. Wanzenboeck, Simon Waid, Emmerich Bertagnolli
6B-4Low-Energy Electron Diffraction Microscopy Based on a Single-Atom Electron SourceIng-Shouh Hwang, Mu-Tung Chang, Wei-Tse Chang, Wei-Hao Hsu, Hong-Shi Kuo, Che-Cheng Chang, Tien T. Tsong
6B-5New Technique of Three-Dimensional Nanofabrication in Semiconductors by Using Electron Beam LithographyKenji Yamazaki, Hiroshi Yamaguchi
6C-1Interferometrically Defined 3D Pyrolyzed-Carbon SensorsD. Bruce Burckel
6C-2Capped carbon hard mask an innovative route to nanoscale device fabricationSŽbastien Pauliac-Vaujour, Pierre Brianceau, Corinne Comboroure
6C-3Fabrication of Nano-scale, High Throughput, High Aspect Ratio Freestanding GratingsAlexander Bruccoleri, Pran Mukherjee, Ralf Heilmann, Jonathan Yam, Mark Schattenburg, Frank DiPiazza
6C-4Taming of Ga droplets on DLC layers Ð Size tuning and local arrangement with nm accuracyPeter Philipp, Lothar Bischoff, Bernd Schmidt
6C-5The three-dimensional nanostructure fabrication from HSQ by FIB/EB dual-beam lithographyReo Kometani, Kouhei Kuroda, Shin'ichi Warisawa, Sunao Ishihara
7A-1Plasmonics At The Single-Nanometer Scale (Invited)Joel Yang, Huigao Duan, Karthik Kumar, Michel Bosman, Antonio Fernandez-Dominguez, Stefan Maier
7A-2Hyperspectral NanoPhoto Luminescence Spectroscopy on InP Nanowires by Means of ÒCampanileÓ TipsMauro Melli, Wei Bao, Patrick Bennett, Jeff Bokor, D. Frank Ogletree, P. James Schuck, Stefano Cabrini, Francesca Intonti, Francesco Riboli, Diederik Wiersma, Alexander Weber-Bargioni
7A-3New Nanoplasmonic Devices and Fabrication for Large Enhancement and Tunability of Second Harmonic Light GenerationWei Ding, Liangcheng Zhou, Stephen Y. Chou
7A-4Towards the holy grail of near field optics via reproducibly fabricated optical nano antennae on Scanning Probe TipsWei Bao, Mauro Melli, Francesca Intonti, Francesco Riboli, Diederik Wiersma, Frank Ogletree, Jim Schuck, Stefano Cabrini, Alexander Weber-Bargioni
7A-530 nm nanochannels with plasmonic bowtie nanoantennaIrene Fernandez-Cuesta, Scott Dhuey, Deirdre Olynick, Daniel Gargas, P. James Schuck, Stefano Cabrini
7B-1Arrays of Topographically and Peptide-Functionalized Hydrogels for Analysis of Biomimetic Extracellular Matrix Properties (Invited)Michelle J. Wilson, Bernardo Yanez-Soto, Sara J. Liliensiek, Paul F. Nealey
7B-2Electron-beam Patterned PEG Microgels for DNA DetectionXiaoguang Dai, Wei Yang, Emre Firlar, Salvatore Marras, Matthew Libera
7B-3Sub-micron scale gold-tipped elastomeric pillar arrays for human T cell activation and cultureSaba Ghassemi, Roddy O'Connor, Alexander Gondarenko, Shalom Wind, James Hone, Michael Milone
7B-4H+-type and OH--type Polysaccharide Bioprotonic Field Effect TransistorsMarco Rolandi, Yingxin Deng, Chao Zhong, Brett Helms
7B-5Vacuum-packaged Resonant Thermal Sensor for Biological Cell in liquid (MNC Paper)Naoki Inomata, Masaya Toda, Takahito Ono
7C-1Strain Assisted Self Lift-Off Process for the Fabrication Ultra Low Capacitive Antenna Coupled MIM Tunnel Diodes for the Application of Infrared Detection and Energy HarvestingFiliz Yesilkoy, Neil Goldsman, Mario Dagenais, Martin Peckerar
7C-2Combining high depth resolution SIMS with GPA of aberration corrected HAADF STEM images for measurement of misfit strain in epitaxial SiGe layersJohn Bruley, Marinus Hopstaken, Hong He
7C-3Horizontal Growth of Silicon Nanowire Arrays for Large-Scale Circuit ApplicationsChookiat Tansarawiput, Sung Hwan Chung, Yi Xuan, Leo T. Varghese, Lin Zhao, Xianfan Xu, Chen Yang, Minghao Qi
7C-4Magneto-optical and X-ray microscopy of nanomagnetic logic components with shape-induced biaxial anisotropyBrian Lambson, Zheng Gu, David Carlton, Jeffrey Bokor, Scott Dhuey, Andreas Scholl, Andrew Doran, Anthony Young
7C-5Electron Beam Lithography of Antidot Arrays for the Fabrication of Nanogenerators and Detectors in 2DEG MaterialsTJ Beck, Raghu Murali, Isabelle Bisotto, Ethirajulu Kannan, Jean -Claude Portal
8A-1Potential modulation by plasmonic sub-micron structures for the manipulation of ultracold atomic gas cloudsMonika Fleischer, Dieter P. Kern, Christian Stehle, Helmar Bender, Claus Zimmermann, Sebastian Slama
8A-2Giant and Uniform Fluorescence Enhancement of Organic Dye by 3D Plasmonic NanoCavity ArrayWeihua Zhang, Fei Ding, Stephen Y. Chou
8A-3Fabrication of Photonic Devices on Flexible PlatformLi Fan, Leo Varghese, Yi Xuan, Ben Niu, Jian Wang, Minghao Qi
8A-4Significant Enhancement of Colloidal Quantum Dots Fluorescence by 3D Disk-dot Coupled Nanoantenna ArrayHao Chen, Weihua Zhang, Yuxuan Wang, Liangcheng Zhou, Stephen Chou
8A-5Fabrication of High Resolution Digital Spectrometers-on-ChipChristophe Peroz, Sergey Babin, Scott Dhuey, Stefano Cabrini, Alexander Goltsov, Igor Ivonin, Alexandr Koshelev, Vladimir Yankov
8B-1Directed Self-Assembly for the Semiconductor Industry (Invited)H.-S. Philip Wong, Christopher Bencher, He Yi, Xin-Yu Bao, Li-Wen Chang
8B-2Templating Three-Dimensional Self-Assembled Structures in Bilayer Block Copolymer FilmsAmir Tavakkoli K. G., Kevin W. Gotrik, Adam F. Hannon, Alfredo Alexander-Katz, Caroline A. Ross, Karl K. Berggren
8B-3Directed Assembly of Symmetric ABA Triblock Copolymers on Chemically Nanopatterned SubstratesShengxiang Ji, Umang Nagpal, Guoliang Liu, Sean Delcambre, Marcus MŸller, Juan de Pablo, Paul Nealey
8B-4Complex self-assembled patterns from a square grid template with restricted geometryJae-Byum Chang, Hong Kyoon Choi, Adam F. Hannon, Caroline A. Ross, Karl K. Berggren
8B-5Sub-20 nm fabrication on polyimide plastics enabled by directed self-assemblyLi Tao, Hsiao-Yu Chang, Kevin Gotrik, Jeong Gon Son, Caroline A. Ross, Deji Akinwande
8C-1X-rays and field-emission gun: an intrinsic quasi-monochromatic X-ray source (Invited)Vu Thien Binh, Babacar Diop
8C-2Stable Field Emission from Nanoporous Silicon Carbide Tips Patterned by a Focused Ion Beam(Invited)H.J. Lezec, R.L. Kallaher, Fred Sharifi , M.-G. Kang
8C-3Energy Spread Measurement of an Electron Impact Gas Ion Source Equipped with a Miniaturized Gas ChamberDavid Jun, Pieter Kruit
8C-4Reproducibility of Drift Tolerant Focused Ion Beam Lithography MethodR. M¿ller-Nilsen, D. H. Petersen, A. Savenko, P. B¿ggild
8C-5Patterning nitrogen-vacancy color centers in diamond using scanning focused helium ion beamWen-Di Li, Zhihong Huang, Charles Santori, Wei Wu, R. Stanley Williams
9A-1Nanowire device concepts for thin film photovoltaics (Invited)Silke Christiansen
9A-2Controlling Nanostructures in Organic Photovoltaic Cells (Invited)Hui Joon Park, L. Jay Guo
9A-3Nanoimprinted Polymer Solar CellWalter Hu
9A-4Solar Electron Source and Thermionic Solar CellParham Yaghoobi, Mehran Vahdani Moghaddam, Alireza Nojeh
9A-5Via-Hole Fabrication for III-V Triple-Junction Solar CellsYuning Zhao, Patrick Fay, Andree Wibowo, Jianhong Liu, Chris Youtsey
9B-1A Molecular View of Block Copolymer Directed Assembly and its Application to Sub-Lithographic Patterning (Invited)Juan de Pablo
9B-2Directed Self-Assembly of Perpendicularly Oriented Nano-Cylinders with Liquid Crystalline Block CopolymerHiroshi Yoshida, Yasuhiko Tada, Kouhei Aida, Motonori Komura, Tomokazu Iyoda
9B-33D Capillary Force Assembly : Fabrication of a white light emitterJulien CORDEIRO, Olivier LECARME, Guilherme OSVALDO DIAS, David PEYRADE
9B-4Templated Placement of Colloidal Quantum DotsVitor Manfrinato, Darcy Wanger, David Strasfeld, Francesco Marsili, Hee-Sun Han, Lihua Zhang, Dong Su, Jose Arrieta, Eric Stach, Moungi Bawendi, Karl Berggren
9B-5Directed assembly of one-dimensional functional nanostructuresErika Penzo, Matteo Palma, Risheng Wang, Shalom Wind
9C-1CMOS Compatible RF MEMs Technology (Invited)Stephen Luce, Anthony Stamper
9C-2Development of MEMS electron-optics bonded on electron emitter array for Massively Parallel EB Lithography SystemAkira Kojima, Hideyuki Ohyi, Naokatsu Ikegami, Toshiyuki Ohta, Nobuyoshi Koshida, Takashi Yoshida, Masayoshi Esashi
9C-3Piezoelectrically Transduced Silicon Carbide MEMS Double-Clamped Beam ResonatorsBoris Svili_i_, Enrico Mastropaolo, Tao Chen, Rebecca Cheung
9C-4Quality factor improvement of graphene resonator by SU-8 shrinkage-induced strainYuta Oshidari, Taiki Hatakeyama, Reo Kometani, Shin'ichi Warisawa, Sunao Ishihara
9C-5Combined SIMS-SPM instrument for high sensitivity and high resolution elemental 3D analysisTom Wirtz, Yves Fleming, Urs Gysin, Thilo Glatzel, Ernst Meyer, Urs Maier, Urs Wegmann
10A-1Electron emission from carbon nanotubesS. R. P. Silva
10A-2Nanoscale Photoelectron Emission Using C-shaped Nanoapertures with Cesium Bromide PhotocathodeYao-Te Cheng, Juan R. Maldonado, Yuzuru Takashima, Chuong Huynh, Larry Scipioni, Lambertus Hesselink, R. Fabian Pease
10A-3Progress Towards a Commercial Neon Gas Field Ion SourceFHM Rahman, Sybren Sijbrandij, Louis Farkas, Randal Percival, John Notte
10A-4Visualization of Ion Beams from IonicLiquid Ion Sources for Focused Ion Beam ApplicationsC. Perez-Martinez, P. Lozano
10B-1Sub-30 nm pitch circuit relevant patterning in Si, SiO2 and SiN using directed self assembly based pattern generation (Invited)Hsin-Yu Tsai, Sebastian Engelmann, Hiroyuki Miyazoe, Michael Guillorn, Chi-Chun Liu, Joy Cheng
10B-2Directed Patterning for Electronics Using Multiple Block Copolymers OrthogonallyWei Min Chan, Sandip Tiwari, Evan Schwartz, Christopher Ober
10B-3Sub-10 nm area-selective ALD using block copolymer lithographyDeirdre Olynick, Nobuya Hiroshiba, Zuwei Liu, Thomas Lehmann, Dominik Stenger, Scott Dhuey, Bruce Harteneck, Stefano Cabrini, Adam Schwartzberg
10B-4Electron Beam Lithography by Using Self-Assembled Block Copolymer Thin Films as Positive/Negative Tone Combined ResistHiroyuki Suzuki, Reo Kometani, Sunao Ishihara, Shin'ichi Warisawa
10B-5Design Space for One-hole Pattern using Block Copolymer Directed Self-AssemblyHe Yi, Xin-Yu Bao, Christopher Bencher, Huixiong Dai, Yongmei Chen, H.-S. Philip Wong
10C-1Microfluidics Beyond Basic Biology- From Fertility Monitoring to Artificial Respiration (Invited)Todd Thorsen
10C-2Fabrication and Characterization of Field Effect Reconfigurable Nanofluidic Ionic Diodes: Building Blocks Towards Digitally-Programmed Manipulation of BiomoleculesWeihua Guan, Rong Fan, Mark Reed
10C-3Electrically Controlled Switchable Adhesion of Dual Nanometer and Micrometer Structured SurfacesShaun Berry, Theodore Fedynyshyn, Lalitha Parameswaran, Alberto Cabral
10C-4High Aspect Ratio, Triangular Silicon Pillars for Bump Array Concentration of Pathogenic BacteriaKeith Morton, Maxence Mounier, Liviu Clime, Xuyen Hoa, Christian Luebbert, Nathalie Corneau, Teodor Veres, Sabah Bidawid, Jeff Farber
10C-5Fabrication of On-Chip Fluidic Ion Channels using Self-Aligned Double Layer Resist Processing TechniqueBongho Kim, Jihun Kwon, Daehong Kim, Sungwoo Chun, Hyungyu Lee, Seonjun Choi, Seung-Back Lee
P01-01Monolithic 3D Integration via Al-Ge Bonding of Single Crystal Islands (Invited)Filip Crnogorac, Ryan Birringer, Reinhold Dauskardt, Fabian Pease
P01-02Transfer Processes of Silicon Nanomembranes for Three Dimensional Integration of Photonics and ElectronicsJ Provine, Filip Crnogorac, David Kwong, Ray Chen, Fabian Pease
P01-03Fabrication of an 18-layer 3D Woodpile Photonic Crystal via Stacking of Pre-Patterned Free-Standing MembranesChunghun Lee, Yi Xuan, Leo Varghese, Li Fan, Minghao Qi
P02-01Bio-Fuel Cell Operational Enhancements using Nanoscale ElectrodesAlokik Kanwal, Shiunchin Wang, Ross Cohen, Shanmugamurthy Lakshmanan, Gordon Thomas, Zafar Iqbal, Reginald Farrow
P02-02Diameter Dependence of the Effect of Light Polarization on Interband Transitions in Zigzag Carbon NanotubesSaloome Motavas, Andre Ivanov, Alireza Nojeh
P02-03Two-photon Photoemission from Carbon Nanotube Arrays under Low-power Ultraviolet IlluminationMehran Vahdani Moghaddam, Parham Yaghoobi, Alireza Nojeh
P02-04The Effect of Field Frequency and Solution Conductivity on Dielectrophoretic Deposition of Carbon NanotubesAli Kashefian Naieni, Alireza Nojeh
P02-05Di-block Copolymer Guided Patterning of GrapheneDuyoung Choi, Cihan Kuru, Chulmin Choi, Kunbae Noh, Sungho Jin
P02-06Optimization the visibility of graphene on poly-Si film by thin-film optics engineeringTao Chen, Rebecca Cheung
P02-07Strain characteristics of free-standing graphene induced by low-energy electron beam irradiationTakuya Kadowaki, Ryuichi Ueki, Takuya Nishijima, Jun-ichi Fujita
P02-08Micro- and Nanostructuring of Graphene on various Substrates using UV-NILIris Bergmair, Wolfgang Hackl, Andreas Rank, Michael Muehlberger, Maria Losurdo, Maria Giangregorio, Giovanni Bruno, Christian Helgert, Thomas Pertsch, Ernst-Bernhard Kley, Thomas Mueller
P02-09High quality factors in graphene and ultra thin Silicon nitride nanomechanical drumsvivekananda adiga, Rob Barton, Chris Wallin, Harold Craighead, Rob Ilic, Jeevak Parpia
P02-10Molecular dynamics study on structural modifications of graphene by electron beam irradiationYoshiki Asayama, Yoshinori Chihara, Masaaki Yasuda, Hiroaki Kawata, Yoshihiko Hirai
P03-01Production of sub-20nm Pitch Features from Directed Self Assembly of High Chi Polymers via a Selective Block Removal Process Utilizing Atomic Layer Deposition (Invited)Nathan Jarnagin, Andrew Peters, Clifford Henderson
P03-02Electric Field Induced Patterning in Computational LithographySang-Kon Kim
P03-03Control of the PS-b-PDMS directed self-assembly by silsesquioxane-based graphoepitaxial substrate engineeringMathieu SalaŸn, Marc Zelsmann, Olivier Lorret, Bernt Diettert, Dipu Borah, Barbara Kosmala, Mick Morris
P03-04Image quality and pattern transfer in block copolymer directed assembly with block-selective atomic layer depositionRicardo Ruiz, Lei Wan, Jeffrey Lille, Kanaiyalal C. Patel, Elizabeth Dobisz, Danvers E. Johnston, Charles T. Black
P03-05Investigation of Templated Self-assembly of High-_ Diblock CopolymerSamuel Nicaise, Karl Berggren, Russell Goodman, Richard Kingsborough, Theodore Fedynyshyn, William Farnham, Hoang Tran, Michael Sheehan
P03-06Block Copolymer Self-Assembly Using Sacrificial TemplateAmir Tavakkoli K. G., Sam M. Nicaise, Kevin W. Gotrik, Adam F. Hannon, Caroline A. Ross, Karl K. Berggren
P03-07Molecular Transfer Printing Using Silicon Membrane for the Fabrication of Large Area Chemical Patterns on Highly Flexible SubstratesLei Wan, Paul Nealey, Hongyi Mi, Zhengqiang Ma
P03-08Directed Self-assembly with Density Multiplication of 6 tera-dot/in2 Pattern by POSS-Containing Block CopolymerYasuhiko Tada, Hiroshi Yoshida, Yoshihito Ishida, Haruka Mikami, Mizuki Sato, Ricardo Ruiz, Elizabeth Dobisz, Teruaki Hayakawa, Mikihito Takenaka, Hirokazu Hasegawa
P03-09Spin on Glass as an Orientation Control Layer for Block Copolymer Direct Self-AssemblyHiroko Nakamura, Satoshi Mikoshiba, Atsushi Hieno, Koji Asakawa
P03-10Defect Evolution in Thin Films of Self-Assembling Lamella Forming Block Copolymers on a Neutral SurfaceGurdaman Khaira, Marco Bedolla, Paul Nealey, Juan de Pablo, Prabu Ravindran, Nicola Ferrier
P03-11Super selective silicon cryo-etching for nanoscale pattern transfer with block copolymer lithogrpahyZuwei Liu, Scott Dhuey, Bruce Harteneck, Stefano Cabrini, Deirdre Olynick, Xiaodan Gu, Thomas Russell
P03-12Achieving Ordered Nanoholes and Other Non-bulk Morphologies by Directed Self-Assembly of a Block CopolymerAmir Tavakkoli K. G., Sam M. Nicaise, Adam F. Hannon, Kevin W. Gotrik, Caroline A. Ross, Karl K. Berggren
P03-13Fast random copolymers grafting for directed self-assembly of block copolymer integration in lithographics processes: new grafting rules for defectivity improvementXavier Chevalier, Raluca Tiron, Christophe Couderc, Stephanie Magnet, Guillaume Fleury, Georges Hadziiannou, Christophe Navarro
P03-14A chitin nanofiber ink for replica molding and microcontact printing of self-assembled biocompatible nanostructuresMarco Rolandi, Chao Zhong, Yingxin Deng, Adnan Kapetanovic
P03-15Probing Nanostructures of Aged Active Layer Materials for Organic Solar CellsMuruganathan Ramanathan, Michael S Kilbey II, Jose Alonzo Calderon
P03-16Directed Self-Assembled Porous Anodic Alumina by NanoImprinting LithographyTherese Gorisse, Ludovic DuprŽ, Pascal Gentile, Marc Zelsmann, Mickael Martin, Denis Buttard
P03-17Metal Nanoparticle Arrays by Controlled Decomposition of Polymer ParticlesDaniel Brodoceanu, Christina Huber, Anne Wonn, Philip Born, Elmar Kroner, Tobias Kraus, Cheng Fang, Nico Voelcker, Matthias Karg
P03-18Placement error study of cylindrical phase self-assembly guided by graphoepitaxySander Wuister, Tamara Druzhinina, Jo Finders, Eddy van der Heijden
P04-01Thermionic Electron Gun with Small Virtual Source Size for Electron Beam Lithography Applications (Invited)Paul Tesch, Noel Smith, Noel Martin, Bud Magera
P04-02Calculation of high order aberrations of practical multi-pole type electron optical aberration correctors using a differential algebraic methodYongfeng Kang, Jingyi Zhao, Tiantong Tang
P04-03Variation of Proximity Effect Correction Parameters with DensityDavid Czaplewski, Leonidas Ocola
P04-04Magnetic reversal of iron nanowires deposited by Focused Electron Beam Induced Deposition for nanomagnet logic applicationMarco Gavagnin, Heinz D. Wanzenboeck, Simon Waid, Emmerich Bertagnolli
P04-05Fabrication of high resolution computer-generated holograms using 3D electron beam lithography.Joanna Szymanska, Fay Hudson, Elfi Van Zeijl, Daniel Barry, Masa Takatsuka, Hiroshi Yoshikawa, Paula Dawson, Andrew Dzurak
P04-06A Mechanism for Dendritic Nano-Pillar Growth using EBIDJames Bishop, Richard Crendal, Jared Cullen, Charlene Lobo, Michael Ford, Matthew Phillips, Milos Toth
P04-07Electron Beam Etching Kinetics of Diamond and GraphiteAiden Martin, Matthew Phillips, Milos Toth
P04-08High aspect ratio (~25:1) sub-10 nm HSQ lines using electron beam lithographyMuhammad Mirza, Haiping Zhou, Kevin Docherty, Douglas Paul, Stephen Thoms, Douglas Macintyre
P04-09High Aspect Ratio Features in PMGI using Electron Beam Lithography and Solvent DevelopersGolnaz Karbasian, Alexei Orlov, Patrick Fay, Huili Xing, Debdeep Jena, Gregory Snider
P04-10High-Speed Patterning of Hexagonal Dot Arrays Using Electron-Beam LithographyBryan Cord, Hans Romijn, Marc Wijnands
P04-11Long Narrow Gaps for III-V Transistors Fabricated by Electron Beam LithographyStephen Thoms, Douglas Macintyre
P04-12An Enhanced E-beam Pattern Writing for Nano-Optics Based on Character ProjectionErnst - Bernhard Kley
P04-13Optimization of Spatial Dose Distribution for Vertical Sidewall of Resist Profile Minimizing Total Dose in Electron-beam LithographyQ. Dai, S.-Y. Lee, S.-H. Lee, B.-G. Kim, H.-K. Cho
P04-14Computer Modeling of the Schottky Electron SourceG.A. Schwind, L.W. Swanson, S. Kellogg
P04-15Electron Beam Direct Write of Chalcogenide Glass Integrated OpticsGalen Hoffman, Ronald Reano
P04-16Sculpting Electron Beam Profile and Phase with Nanofabricated Diffractive OpticsBenjamin McMorran, Tyler Harvey, Jonathan Perry-Houts, Stefano Cabrini, Amit Agrawal, Henri Lezec
P04-17Periodic tilted Au structure fabrication by electron beam exposureJian Zhang, Babak Shokouhi, Bo Cui
P04-18Electron beam lithography using dry thermal developmentCelal Con, Bo Cui
P04-19Dose to clear in EBL: comparison of Monte Carlo predictions with experimentBengt Nilsson
P04-20Electron beam lithography with evaporated resistJian Zhang, Bo Cui
P05-1Electron impact gas ion source development; evaluation of different electron injection sources (Invited)Nannan Liu, Jeroen Anton van Kan, David Jun, Cornelis W. Hagen, Pieter Kruit
P05-2Deposition and Characterization of Platinum Wires Deposited by a Neon Gas Field Ion SourceLewis Stern, David Ferranti, Humeng Wu, John Notte, Larry Scipioni, Thompson William, Philip Rack, Mike Phaneuf
P05-3Tip shaping of gas field ion sources for optimal ion beam generationJason Pitters, Radovan Urban, Robert Wolkow
P05-4Progress Towards An Aberration-Corrected Low Energy Electron Microscope for DNA Sequencing and Surface AnalysisMarian Mankos, Alpha NÕDiaye, Andreas Schmid, Henrik Persson, Khashadyar Shadman, Ron Davis
P05-5Continuous roller photolithography and application to large area IR metamaterial fabricationMoon Kyu Kwak, Jong G. Ok, L. Jay Guo
P05-6Stencil-nanopatterned back reflector increases efficiency of thin-film solar cellsVeronica Savu, CŽline Pahud, Mona Klein, Oscar Vazquez-Mena, Franz-Josef Haug, Christophe Ballif, Juergen Brugger
P05-7Stability and degradation of organic photovoltaic devices fabricated, aged, and characterized by the ISOS 3 inter-laboratory collaborationDavid Tanenbaum, Martin Hermenau, Eszter Voroshazi, Matthew Lloyd, Yulia Galagan, Birger Zimmermann, Markus Hšsel, Henrik Dam, Mikkel J¿rgensen, Suren Gevorgyan, Laurence Lutsen+, Dirk Vanderzande+, Agns Rivaton, GŸl_ah Uzuno_lu, Uli WŸrfel, Monica Lira-Cantu, Roland Ršsch, Harald Hoppe, Kion Norrman, Frederik Krebs
P05-8Imprint-Templated Nanocoaxial Array ArchitectureBinod Rizal, Michelle Archibald, Jeffrey R. Naughton, Michael J. Burns, Stephen Shepard, Gregory McMahon, Thomas C. Chiles, Michael J. Naughton
P06-1Optical Performance of Binary Mask with a Tantalum Telluride Absorber Layer for Extreme Ultraviolet Lithography (Invited)Hee Young Kang, Pazhanisami Peranantham, Chang Kwon Hwangbo, Hwan-Seok Seo, Seong-Su Kim
P06-2Residual-type mask defect printability for EUV lithographyTsuyoshi Amano, Susumu Iida, Ryoichi Hirano, Tsuneo Terasawa, Hidehiro Watanabe, Yuichi Inazuki
P06-3Dependence of Image Characteristics Dependece on Incident Electron Beam Energy for EUV Mask inspection using Monte Carlo simulationSusumu Iida, Tsuyoshi Amano, Ryoichi Hirano, Tsuneo Terasawa, Hidehiro Watanabe
P06-4Image Compensation of Mask Misalignment in Aerial Image Microscope SystemMin-Chul Park, Young Min Jhon, Yong Tae Kim
P06-5Modeling of defect transport in EUVL plasma chambersAlex Likhanskii, Chuandong Zhou, Peter Stoltz, Vibhu Jindal, Patrick Kearney, Arun John
P06-6Direct nano-structuring of solid surface by extreme ultraviolet Ar8+ laserKarel Kolacek, Jaroslav Straus, Jiri Schmidt, Olexandr Frolov, Vaclav Prukner, Radek Melich, Andrei Choukourov, Jaroslav Sobota, Tomas Fort
P06-7Understanding the sources of unwanted etch in ion beam sputter deposition production of EUV mask blanksPatrick Kearney, Vibhu Jindal, Alin Antohe, Frank Goodwin, Al Weaver, Pat Teora, John Sporre, David Ruzic, Peter Stoltz, Alex Likhanskii, Chuandong Zhou
P07-1Focused Ion Beam Implantation of Li+ in WO3 Using A Magneto-Optical Trap Ion Source (Invited)Brenton Knuffman, Adam Steele, J. Brent Allen, Dmitri Ruzmentov, Alec Talin, Jabez McClelland
P07-2Surface-Finishing of Focused Ion Beam Milled Features by Pulsed Electron IrradiationNikola Vladov, James Murray, Adam Clare, Joel Segal, Svetan Ratchev
P07-3Modeling for Multi-Beam Ion Imaging and AnalysisDavid Joy, Ranjan Ramachandra
P07-4A Mass Filtered Plasma FIBCharles Otis, Anthony Graupera
P07-5A Quantitative Probe Current Distribution Characterization Technique for Focused Ion BeamShida Tan, Richard Livengood, Yuval Greenzweig, Yariv Drezner, Darryl Shima
P07-6Fabrication of Sealed Nano-channels Based on Sacrificial Nanotemplates by Focused-ion-beam Induced Chemical Vapor DepositionAjuan Cui, Wuxia Li, Qiang Luo, Zhe Liu, Junjie Li, Changzhi Gu
P07-7Focused-Ion-Beam Introduced Bidirectional Bending for Complex Three-Dimensional StructuresCan Li, Zonggang Xu, Wengang Wu, Jun Xu
P07-8A LARGE-APERTURE ION-BEAM LENS CORRECTED FOR BOTH CHROMATIC AND SPHERICAL ABERRATIONFrederick Martin
P07-9Helium ion beam lithography of thick HSQ resistsPaul Alkemade, Anja van Langen-Suurling, Emile van der Drift, Emile van Veldhoven, Diederik Maas
P08-1Study of nanospheres lithography technology with super-lens for fabricating nano holesLi shuhong, Du jinglei, Houi yidong
P08-2Polymeric freestanding structures by direct write laser without sacrificial layersV’ctor J. Cadarso, Karl Pfeiffer, Ute Ostrzinski, Jean-Baptiste Bureau, Georges-Andre Racine, Anja Voigt, Gabi Gruetzner, JŸrgen Brugger
P08-3Thermal control extends heated stencil's life-timeShenqi Xie, Veronica Savu, Juergen Brugger
P08-4Scanning Probe Nanostructure Direct-Write: Serial and Parallel Patterning via High Field ChemistryStephanie Vasko, Hideki Sato, Haoyu Lai, Wenjun Jiang, Scott Dunham, Marco Rolandi
P9-1Electron scattering simulation for subsurface metrology in scanning electron microscopeNobuhiro Okai, Yasunari Sohda
P9-2On Clean Samples and High-Resolution Quantitative Charged Particle MicroscopyAndras Vladar, Kavuri Purushotham, Michael Postek
P9-3Multiple phase-formation in Ni-Ge system monitored by SEMAFM, PIXE analytical techniques, Rudzani Nemutudi, Carlos Pineda-Vargas, Daniel Chilukusha, Craig Comrie, Adriaan Habanyama
P9-4Nanoscale imaging, analysis and nano-fabrication using Helium Ion MicroscopeDavid Bell
P9-5Near-Field EUV Imaging for Spatial Frequency MultiplicationYijian Chen, Yashesh Shroff
P10-1Dry-Release Self-assembling of Microtube Arrays for Catalytic Micropump ApplicationJinxing Li, Zhaoqian Liu, Gaoshan Huang, Bing-Rui Lu, Yifang Chen, Yongfeng Mei, Ran Liu
P10-2Bonding of PMMA nanofluidic devices and its effect on DNA behavior in nanochannelsJiahao Wu, Alborz Amirsadeghi, Bahador Farshchian, Franklin Uba, Steven Soper, Jinsoo Kim, Sunggook Park
P10-3A superhydrophobic surface made from hydrophilic materials with micro-umbrella structuresQian Feng Xu, Bikash Mondal, Zhantong Mao, Alan M. Lyons, George Pat Watson
P10-4Electrophoretic and electroosmotic flow through carbon nanotube membranes as chemical pumpsJi Wu, Bruce Hinds
P11-1Molecular simulation of electron-irradiation damages in resist materials (Invited)Masaaki Yasuda, Kosei Araki, Hirofumi Sakai, Hiroaki Kawata, Yoshihiko Hirai
P11-2Modeling of Counter Streaming Charged Beams in MICHELLEÐeBEAMSerguei Ovtchinnikov, Simon Cooke, Masis Mkrtchyan, Roman Shtokhamer, John Petillo, Alexander Vlasov, Baruch Levush
P11-3Study of the Interaction of Polymethylmethacrylate Fragments with Methyl Isobutyl KetoneMohammad Ali Mohammad, Kolattukudy Poulose Santo, Steven K. Dew, Maria Stepanova
P11-4Charging process simulation of a resist film on Si substrate under electron beam irradiationMasatoshi Kotera, Akira Osada, Masaru Otani, Yasuhiro Ohara
P11-5Fast Simulation of Stochastic Exposure Distribution in Electron-beam LithographyX. Zhao, S.-Y. Lee, S.-H. Lee, B.-G. Kim, H.-K. Cho
P12-1Polymeric Substrates with Bioimprinted Micro- and Nanoscale Topography for Regulation of Chondrocyte Re-DifferentiationLynn M. Murray, Volker Nock, Maan M. Alkaisi, Joanne J. M. Lee, Tim B. F. Woodfield
P12-2The Blood-Brain-Barrier Crossing in vivo using Magnetic NanocapsulesSeong Deok Kong, Jisook Lee, Chulmin Choi, Jirapon Khamwannah, Brian Eliceiri, Sungho Jin
P12-3Nanometer Size Protein Patterning using nCP for the Investigation of Protein-Protein Interactions in Live CellsAndreas Rank, Iris Bergmair, Bernd Dittert, Michael Muehlberger, Stefan Sunzenauer, Gerhard Schuetz
P12-4Nanoimprinted Electrodes for Highly Efficient and Stable Bio-Fuel CellsRichard Sundberg, Dmitry Suyatin, Ivan Maximov, Lars Montelius, Dmitrii Pankratov, Vladimir Popov, Sergey Shleev
P12-5Screening T-Cell Activation with Nanostructured SubstratesAlexander Gondarenko, Junqiang Hu, James Hone, Erdem Tabdanov, Edward Judokusumo, Lance Kam, Anastasia Liapis, Michael Dustin
P12-6Microfluidic Axon-Isolation Device fabricated by Nanoimprint lithographyHeinz D. Wanzenboeck, Andreas Amon, Johann Mika, Emmerich Bertagnollo
P12-7Nanostructured and Active Electrostatic Trap for Confining Nanometric Objects in a Fluid: mimicking DNA-Protein interactions in a synthetic systemAshwin Panday, Brandon D. Lucas, Long Chen, L. Jay Guo
P12-8Micro-nanofabricated platform technology for cell seeding experiments in neuro-nanobiologyRegina Luttge
P13-1Experimental Investigation on the Short Channel Effect of Nano-Imprinted Organic Field Effect Transistors (Invited)Lichao Teng, Robert Kirchner, Matthias Plštner, Andreas Jahn, Alexander TŸrke, Jian He, Yang Ge, Falk Hagemann, Wolf-Joachim Fischer
P13-2Employing Nano Imprint to Fabricate Space-Charge-Limited Transistors (SCLTs)Lon Wang, Yang-Kai Wu, Hsiao-Wen Zan, Hsin-Fei Meng, Jian-Hao Huang, Wu-Wei Tsai
P14-1Curved cantilever design for a robust and scalable microelectromechanical switchDaniel Grogg, Ute Drechsler, Armin Knoll, Yu Pu, Christoph Hagleitner, Michel Despont
P14-2Nanomechanical Tuning Forks Fabricated by Focused-ion-beam Chemical Vapor DepositionHiroki Ashiba, Reo Kometani, Shin'ichi Warisawa, Sunao Ishihara
P14-3Bimaterial electro-mechanical systems for audio frequency applicationsEnrico Mastropaolo, Rhonira Latif, Thomas Koickal, Alister Hamilton, Rebecca Cheung, Michael Newton, Leslie Smith
P15-01Full area real time monitoring of filling process by dark field illumination in UV nanoimprint lithography (Invited)Qing Wang, Hiroshi Hiroshima, Kenta Suzuki, Sung-Won Youn
P15-02Large-Area Nanostructures by Laser-Scanning Imprinting (Invited)Toshimi Sato, Keisuke Nagato, Junho Choi, Tetsuya Hamaguchi, Masayuki Nakao
P15-03Sub-100 nm three dimensional diffractive optical elements fabricated by UV light assisted roll-to-roll nanoimprint lithographyNikolaos Kehagias, Achille Francone, Clivia Sotomayor Torres
P15-04A Tri-layer Method to Fabricate Wafer Scale Nanoimprint Mold by Copolymer LithographyYixing Liang, Shoham Bhadra, Stephen Chou
P15-05Control of Inclined Angle of Glass-like Carbon Mold by Defocus UV Exposure on Si Containing PhotoresistHarutaka Mekaru, Chieko Okuyama, Akihisa Ueno
P15-06Replacement of Trapped Air by Fluoride Liquid in Thermal NanoimprintHarutaka Mekaru, Hiroshi Hiroshima
P15-07Dual-Layer Thermal Nanoimprint Lithography without Dry EtchingYunbum Jung, Xing Cheng
P15-08Characteristics of mechanical vibration in imprinted nanostructuresYuji Kang, Yasuki Nakai, Makoto Okada, Yuichi Haruyama, Shinji MatsuiÊ
P15-09Pattern-size Effect of Reorientation of Photoinduced Liquid Crystalline Polymer by Thermal NanoimprintingMakoto Okada, Mami Kurita, Emi Nishioka, Mizuho Kondo, Yuichi Haruyama, Akira Emoto, Hiroshi Ono, Nobuhiro Kawatsuki, Shinji Matsui
P15-10High Volume Nanoimprint Lithography technology and applicationsTorbjšrn Eriksson, Johan Ring, Gang Luo, Prasanna Venkatesh Krishnan, Babak Heidari
P15-11Fast and Continuous Patterning on the Surface of Plastic Fiber by Using Thermal Roller ImprintAkihiro Ohtomo, Mitsunori Kokubo, Hiroshi Goto, Harutaka Mekaru, Hideki Takagi
P15-12Au Nanorods and Nanogap Split-Ring Structures Fabricated by Reactive-Monolayer-Assisted Thermal Nanoimprinting and ElectrodepositionTatsuya Tomioka, Shoichi Kubo, Koichi Nagase, Morihisa Hoga, Masaru Nakagawa
P15-13Release Layer Free Acrylate Resins for Ultraviolet Nanoimprinting Prepared by Adding Segregation Auxiliary AgentsShunya Ito, Cheol Min Yun, Kei Kobayashi, Masaru Nakagawa
P15-14Fluoroalkyl-Containing Surfactants to Reduce Release Energy of UV-Cured Acrylate ResinMasaru Nakagawa, Yoshitaka Tsukidate
P15-15High Density Pattern Transfer via Roll to Roll Ultraviolet Nanoimprint Lithograpy using Replica MoldJun Taniguchi, Noriyuki Unno, Hiroki Maruyama, Masashi Saito, Hiroshi Yoshikawa, Go Tazaki, Toshiyuki Zento
P15-16Development of continuous phase lithography and application to transparent conductor fabricationMoon Kyu Kwak, Jong G. Ok, L. Jay Guo
P15-17Model of Curing Shrinkage and Kinetics Parameters of Acrylate-based UV-embossing Resist Based on Free Volume TheoryPeng Jin, Nan Liu, Jie Lin, Philips Prewett
P15-18Cleaning Defects of Soft UV-Nanoimprint Molds for High Aspect-Ratio FeaturesAndreas Finn, Bo Lu, Robert Kirchner, Xaver Thrun, Karola Richter, Wolf-Joachim Fische
P15-19Flow behaviors of a polymer according to the imprint velocity during pressing step in NILJiHyeong Ryu, HyungJun Lim, Hyun-Ha Park, JaeJong Lee
P15-20Release Agent Properties in Ultraviolet Nanoimprint Lithography using High-Aspect-Ratio Nanoscale MoldsJun Taniguchi, Junki Takahashi
P15-21Impact of Mold-Resist Roughness on Friction and Adhesion Properties by Nano Tribological Inspection_ukasz Ocypa, Tomoki Nishino, Hiroaki Kawata, Yoshihiko Hirai, Zygmunt Rymuza
P15-22Reorientation Evaluation of Bidirectional Line Pattern on Photoinduced Liquid Crystalline Polymer Fabricated by Thermal NanoimprintingMakoto Okada, Mami Kurita, Emi Nishioka, Mizuho Kondo, Yuichi Haruyama, Akira Emoto, Hiroshi Ono, Nobuhiro Kawatsuki, Shinji Matsui
P15-23Position control of MOVPE grown GaN nanorods using nanoimprint lithographyTorbjšrn Eriksson, Ki Dong Lee, Babak Heidari, Patrick Rode, Werner Bergbauer, Martin Strassburg
P15-24Study on De-molding Kinetics of Peeling and Perpendicular Releasing in NIL processTomoki Nishino, Hiroaki Kawata, Yoshihiko Hirai
P15-25Release-Optimized UV-NIL ResistsHakan Atasoy, Marko Vogler, Freimut Reuther, Gabi Gruetzner
P15-26Filling Characteristics of Imprint Process for Concave Pattern MoldsHiroaki Kawata, Yuuta Watanabe, Masaaki Yasuda, Yoshihiko Hirai
P15-27Crosslinking control during imprint for hybrid lithography (T-NIL + UV-L)Khalid Dhima, Christian Steinberg, Andre Mayer, Saskia Mšllenbeck, Si Wang, Hella-Christin Scheer
P15-28Enhanced Transmission through Gold Nanohole Arrays Fabricated by Thermal Nanoimprint Lithography for Surface Plasmon Based Biological SensingJosu Martinez-Perdiguero, Aritz Retolaza, Deitze Otaduy, Aritz Juarros, Santos Merino
P15-29Injection compression molding of replica molds for nanoimprint lithographyKeisuke Nagato, Tetsuya Hamaguchi, Masayuki Nakao
P15-30Direct Nanoimprinting of Functional Inorganic Layers for Nanophotonic Chip DevicesCarlos Pina-Hernandez, Christophe Peroz, Stefano Cabrini, Cosimo Calo, Scott Dhuey, Sergey Babin
P15-31Directed self-assembly of PS-PEO using solvent vapors assisted nanoimprint lithographyClaudia Simao, Achille Francone, Nikolaos Kehagias, Clivia Sotomayor-Torres, Dipu Borah, Parvaneh Mokarian-Tabari, Michael Morris
P15-32Wire-Grid Polarizer by Nanoimprint Lithography Using EpoxysilsesquioxaneYoung Jae Shin, Carlos Pina-Hernandez, Hui Joon Park, L. Jay Guo, Moon Kyu Kwak, Jong G. Ok, Peng-Fei Fu
P15-33Study of demolding Characteristics in continuous UV nanoimprintingShuso Iyoshi, Makoto Okada, Yuichi Haruyama, Shinji Matsui, Kei Kobayashi, Shu Kaneko, Masaru Nakagawa, Hiroshi Hiroshima
P15-34Development of jet rollable nanoimprint process to fabricate bio-polymer nanostructuresLichuan Chen, Gyu Kim, Hongbing Lu, Jinming Gao, Walter Hu
P15-35Fabrication of Adhesion-free Transparent Roll Stamp for Large Area Patterning using UV-typed Roller Nanoimprint LithographyJaeJong Lee
P15-36Fabrication of 3-dimensional Nanoimprint Stamps - A comparison of 4 approaches using FIBHeinz D. Wanzenboeck, Simon Waid, Emmerich Bertagnolli
P15-373-D NanomoldingBahador Farshchian, Sooyeon Park, Jaejong Lee, Jinsoo Kim, Sunggook Park
P15-38Thermal Imprinting Process using ZnO Nanoparticles-Dispersed Resin for the Improvement of Light Extraction Efficiency of GaN-based LEDsKyeong-Jae Byeon, Han-Byeol Jo, Joong-Yeon Cho, Jin-Seung Kim, Moo-Hyun Kwon, Hyuk-Jin Cha, Heon Lee
P15-39Reduction of proximity effects using high-contrast developer in fabricating large-area nanoimprint moldsMinjun Yan, Jaesun Lee, Yujiao Sun, Ilesanmi Adesida, Debashis Chanda, John Rogers
P15-40Effect of offset temperature on replication of laser-assisted imprintingKeisuke Nagato, Toshimi Sato, Tetsuya Hamaguchi, Masayuki Nakao
P16-01Resonant Dielectric Nanostructures for biosensor applications (Invited)Mohamad Hojeij, Yasin Ekinci, Li Wang, Benedikt Oswald, Vitaliy Guzenko, Andreas Lieb, Jens Gobrecht
P16-02Surface Chemical Imaging at the Nanoscale (Invited)Francesco de Angelis
P16-03Tunable Plasmonic Light Trapping Metal StructuresAleksandr Polyakov, Kevin Thompson, Howard Padmore, Scott Dhuey, Deirdre Olynick, Stefano Cabrini, Peter Schuck
P16-04Plasmonic Nanostructures Fabricated using Helium and Gallium Ion Beam Instruments.N.J. Zaluzec, D.J. Miller, J.M. Hiller, C. Huynh, L. Scipioni, M. Ananth
P16-05Fabrication of nano metallic holes for color filter based on a controllable polystyrene spheres self-assembleLi shuhong, Du jinglei, Ren liangke
P16-06Putting Plasmonic Probes in Perspective: The Case for the Campanile TipWei Bao, Stefano Cabrini, Alex Weber-Bargioni, P. James Schuck
P16-07High aspect-ratio doped Si nanostructures for plasmonics induced light funneling applicationsAlex Kaplan, Haofei Shi, Lingjie Guo
P16-08Embedding and Combining Plasmonic Elements and Photonic Crystal StructuresJŸrgen Probst, Max Schoengen, Nils NŸsse, Janik Wolters, Bernd Lšchel, Oliver Benson
P16-09Lithium Niobate Nanowaveguides fabricated by Ion-Beam Enhanced EtchingReinhard Geiss, Holger Hartung, Frank Schrempel, Ernst-Bernhard Kley, Thomas Pertsch, Andreas TŸnnermann
P16-10Stitch-Error Free Electron Beam Lithography of Periodic StructuresJason Sanabia, Kevin Burcham, Michael Kahl, Ralf Jede
P16-11Lithographically-Defined Nanostructures for Color Plasmonic PrintingKarthik Kumar, Huigao Duan, Ravi S. Hegde, Samuel C.W. Koh, Jennifer Wei, Joel K.W. Yang
P16-12Surface plasmon resonance coupling assisted optical transmission through Ag/SiN /Ag photonic crystal slabsJia-Hong Shyu, Yu-chen Huang, Neil Ou, Huang-Ming Lee, Jong-Ching Wu
P16-13The Sensing Properties of IR Nanostructed Plasmonic Crystals Fabricatied by Electron Beam Lithography and Argon Ion MillingBaogang Quan, Weijie Sun, Zhe Liu, Xiaoxiang Xia, Junjie Li, Changzhi Gu
P16-14Non-periodic sub-wavelength gratings fabricated by helium ion beam lithographyZhen Peng, Wen-di Li, David Fattal, Ray Beausoleil
P16-15A Novel Grating-Apodization Technique in Equivalent-Chirped Sampled-Bragg GratingsJie Sun, Henry Smith
P16-16Breaking the diffusion limit of nanosensors through super hydrophobic and nano plasmonic structuresFrancesco De Angelis
P16-17Immersion Optics for Excitation of Surface Plasmons in a Transmission Mode Photoemission Electron MicroscopeVignesh Viswanathan, Zhongkai Ai, Daniel Pickard
P16-18Enhancement of Light-Emitting Efficiency for GaN-based Light-Emitting Diodes by Nanoscale Bump and Pit ITO SurfaceZhe Liu, Gang Wang, Haifang Yang, Xiaoxiang Xia, Baoli Liu, Changzhi Gu
P16-19Angle Independent Reflective Color Filters by Plasmonic-induced Light Funneling EffectYi-Kuei Wu, Cheng Zhang, Jay Guo
P17-01Lithographically Designed Porous Plasmonic Nanostructures (Invited)Jung-Sub Wi, Satoshi Tominaka, Kohei Uosaki, Tadaaki Nagao
P17-02Preparation of surfaces with patterned roughness for sensing applicationSi Wang, Khlid Dhima, Andre Meyer, Saskia Mšllenbeck, Hella-Christin Scheer
P17-03Template-Assisted Self-Assembly and Alignment of ZnO Nanowires with Post-Deposition GrowthTao-Hua Lee, Xing Cheng
P17-04Pyramid Array Substrates for Biomedical StudiesRonny Loeffler, Monika Fleischer, Dieter Kern, Claudia Matschegewski, Susanne Staehlke, Barbara Nebe
P17-05Etching Process for Patten Transfer from Sphere-type PMMA-b-PMAPOSS Block CopolymerTaku Iwase, Masaru Kurihara, Yoshiyuki Hirayama, Yasuhiko Tada, Hiroshi Yoshida
P17-06Continuous Electron Beam Lithography Writing Modes for Optical Waveguide NanofabricationFrank Nouvertne, Guido Piaszenski, Michael Kahl, Ruud Schmits, Pavol Bodis
P17-07Fabrication of Polymer Nanostructures via Maskless O2 Plasma EtchingKe Du, Yuyang Liu, Ishan Wathuthanthri, Wei Xu, Chang-Hwan Choi
P17-08Nanolithography and pattern transfer of dense sub-10 nm linesAju Jugessur, Mariya Yagnyukova, J. Stewart Aitchison
P17-09Fabrication of Hollow-Shell Nano-volcanoes from Mie Scattering of Colloidal NanospheresXu A. Zhang, Jonathan Elek, Chih-Hao Chang
P17-10Fabrication of omniphobic surfaces using deposited silicon dioxide layer and dry etching processChulmin Choi, Jirapon Khamwannah, Duyoung Choi, Chin-Hung Liu, Seong-Deok Kong, Sungho Jin
P17-11Optical and Electrical Sensing application of High-Aspect-Ratio Nanoholes Formed by Etching of Latent TracksMakoto Fujimaki, Ken-ichi Nomura, Koichi Awazu, Kouta Yamashita, Seigo Mizuno, Yoshimichi Ohki
P17-12Negative electron-beam resist hard mask ion-beam etching process for the fabrication of nanoscale magnetic tunnel junctionsSungwoo Chun, Daehong Kim, Jihun Kwon, Bongho Kim, Hyungyu Lee, Seonjun Choi, Seung-Beck Lee
P17-13Non-planar nano-arc-gap arrays fabricated via colloidal lithographyChongjun Jin, Yang Shen
P17-14Optimization of a Self-Closing Effect to Produce Bottle-Shaped Nanochannels in QuartzMariusz Graczyk, Martina Balaz, Heiner Linke, Ivan Maximov
P17-15E-Beam Patterning of Nanoparticle Filled Sucrose ResistKevin Roberts, Bryan Cord, Greg Cibuzar
P17-16Nanowires with controlled location and direction by surface-guided growth from patterned catalystMark Schvartzman, David Tsivion, Ernesto Joselevich
P17-17From Nanocone to Nanodisk: Structural Transformation of Nanoarrays via Mechanical StressesYuyang Liu, Ke Du, Ishan Wathuthanthri, Chang-Hwan Choi
P17-18Fresnel zone plates as X-ray lenses by electron beam lithography with HSQ resistYifang Chen, Yingtao Tian, Adnan Malik, Derek Jenkins, Graham Arthur
P17-19Withdrawn
P17-20Growth Characterization of Electron Beam Induced Silver Deposition from Liquid PrecursorLeonidas Ernesto Ocola, Cynthia Kessel, Brian Chen, Alexandra Joshi-Imre, Johnathan Park, Ralu Divan
P17-21Nanopatterning of ÒDisconnectedÓ Metal Nanostructures on Polydimethylsiloxane (PDMS) Substrate by Using Free-Standing Photoresist Film as Stencil Lithography MaskKe Du, Yuyang Liu, Ishan Wathuthanthri, Wei Xu, Chang-Hwan Choi
P17-22Nanofabrication with Si(311)Nicolaie Moldovan, Ralu Divan
P17-23Tunable silver nano-pillar arrays as a surface-enhanced Raman scattering sensor by a self-aligned nanofabrication processWenjun Zhang, Xin-Ping Qu, Bing-Rui Lu, Yifang Chen
P17-24Novel techniques for modifying microtube surface with various periodic structures ranging from nano to micro scaleZhaoqian Liu, Jinxing Li, Gaoshan Huang, Bingrui Lu, Yifang Chen, Yongfeng Mei, Ran Liu
P17-253D Patterning of Si Micro and Nano Structures by Focused Ion Beam Implantation, Si Deposition and Selective Si EtchingAndreas C. Fischer, Kristinn B. Gylfason, Lyubov M. Belova, B. Gunnar Malm, Mohammadreza Kolahdouz, Gšran Stemme, Yuri G.M. Rikers, Frank Niklaus
P17-26Fabrication of Nanostructured Hydrophobic Surfaces with Laser Interference LithographyHang Yu, Bing-Rui Lu, Hui Li, Jianying Li, Zhaoqian Liu, Ran Liu, Yifang Chen
P17-27Fabrication and magnetic properties of hundred-nanometer-scaled permalloy cylinders arraysY. C. Huang, C. Y. Kuo, Jia-Hong Shyu, C. M. Lee, Lance Horng, J. C. Wu
P17-28Patterning of porous silicon nitride membrane by CsCl self assemblyWenhan Liu, Mark Ferguson, Mustafa Yavuz, Bo Cui
P17-29Inductively Coupled Plasma Etching of Benzocyclobutene with SF6 ChemistryErica Douglas, Jeffrey Stevens, Randy Shul, Stephen Pearton
P17-30Engineering electrical properties of Silicon nanowires by focused electron beam induced processing with ChlorineHeinz D. Wanzenboeck, Bassem Ismail, Peter Roediger, Johannes Greil, Martin Hetzel, Alois Lugstein, Emmerich Bertagnolli
P18-01Fast Aerial Image Simulation for Partially Coherent Systems by TCC Decomposition with Analytical Kernels (Invited)Peng Gong, Wen Lv, Xinjiang Zhou, Shiyuan Liu
P18-02Talbot effect immersion lithography by self-imaging of very fine grating patternTakashi Sato
P18-03Fabrication of a Binary Phase Grating on a Fiber End by Utilizing Interference LithographyChing-Tung Tseng, Shih-Chieh Lin, Yung-Pin Chen, Yang-Kai Wu, Yi-Chuan Tseng, Lon A. Wang
P18-04Analysis on probe-sample interaction for scanning near-field photolithography (snp)zhuming liu, Clive Roberts, Yuan Zhang, John Weaver, Graham Leggett
P18-05Sensitivity Analysis for Lens Aberration Measurement in Lithographic Tools Using CTC-Based Quadratic Aberration ModelShuang Xu, Xiaofei Wu, Tielin Shi, Zirong Tang, Shiyuan Liu
P18-06Mask Aligner Process Simulation for Advanced Lithography and Resolution Enhancement TechniquesMichael Hornung, Ulrich Hofmann, Nezih †nal, Uwe Vogler, Arianna Bramati, Tina Weichelt, Reinhard Voelkel
P19-01Continuous fabrication of polymer waveguides with smooth sidewalls by Dynamic Nano-Inscribing (DNI) and NanoChannel-guided Lithography (NCL) processes (Invited)Jong G. Ok, Cheng Zhang, Tao Ling, L. Jay Guo
P19-02Vibrant color transmission under cross-polarization through gold-coated gratings nanoimprinted in polymer foilsKeith Morton, Teodor Veres
P19-03Fabrication of a band-limited mask for PHAROIvan Kravchenko, Justin Crepp
P19-04Continuous fabrication of large-area flexible metamaterial via Roll-to-Roll nanopatterning for IR filter applicationsJong G. Ok, Hong Seok Youn, Moon Kyu Kwak, Myung-Gyu Kang, L. Jay Guo, Anton Greenwald, Y Liu, S Radhakrishnan
P20-1Multi-domain storage in graded bit patterned media (Invited)Long Chang, Paul Ruchhoeft, Sakhrat Khizroev, Dmitri Litvinov
P20-2Fabrication of dense non-circular nanomagnetic device arrarys using self-limiting low-energy glow-discharge processingZHEN ZHENG, LONG CHANG, PAUL RUCHHOEFT, SAKHRAT KHIZROEV, DMITRI LITVINOV
P20-3Fabrication of CoCrPt Alloy Bit Patterned Media at 1 Td/in2 for Recording MeasurementElizabeth Dobisz, Dan Kercher, Michael Grobis, Jordan Katine, Olav Hellwig, Ernesto Marinero, Dieter Weller, Neil Robertson, Thomas Albrecht
P20-4Development of a large areal metallic nano stamp fabrication process using UV nanoimprinting and pulse reverse current electroforming for discrete track media with pattern width of 35nmJiseok Lim, Jungjin Han, Eikhyun Cho, Young-joo Kim, Shinill Kang, Jinbeyung Lee, Hiroshi Hatano, Norikazu Arai
P21-1High resolution dry photo-ablation development (Invited)Adam Schwartzberg, Pradeep Perera, Dimas Garcia de Oteyza, Martin Schmidt, Scott Dhuey, Bruce Harteneck, Rolf Falch, James Schuck, Stefano Cabrini, Deirdre Olynick
P21-2An In situ Analysis of EUV Resist Film Inhomogeneity during the Dissolution ProcessToshiro Itani, Julius Joseph Santillan
P21-3Relationship between Film Thickness Loss and Polymer Deprotection for EUV and ArF PhotoresistsGustaf Winroth, Roel Gronheid
P21-4Point spread function analysis of dense high resolution nanodots in hydrogen silsesquioxaneDevin Brown, Caitlin Chapin, Ezra Kim, Gerald Lopez, Nezih Unal, Ulrich Hoffman
P21-5Determination of Base Dose and Scattering Coefficients for Proximity Effect Correction in Electron Beam LithographyGuy DeRose, Bophan Chhim, Axel Scherer, Scott Lewis, Damien Jeanmaire, Lucio Piccirillo
P21-6High resolution patterning of Hafnium oxide based resist by EUV and Electron beam lithographyMohamad Hojeij, Michaela Vockenhubera, Wang lI, Vitaliy Guezenko, Jens Gobrecht, Yasin Ekinci
P21-7Resolution improvement for positive tone poly(methyl methacrylate) resistJose P. Arrieta, Vitor R. Manfrinato, Karl K. Berggren
P21-8Enhancing the Etch Resistance of PMMA-Based Photoresist to Meet ITRS Target from Year 2022Yu-Chih Tseng, Anil Mane, Junling Lu, Jeffrey Elam, Seth Darling
P22-1Patterning Silver Using an Atomic Force Microscope and Laser-induced Deposition from Liquids (Invited)Carlos Andres Jarro, Eugene U. Donev, Greg Schardein, J. Todd Hastings
P22-2Additional and correction patterning of resist layer using scanning probe lithographyJun Taniguchi, Takao Inoue, Toshihiko Ochi
P22-3Automated position corrections for Atomically Precise STM lithography of Si(001):HJustin Alexander, Joshua Ballard, Ehud Fuchs, James H. G. Owen, John N. Randall, James R. Von Ehr
P22-4SPM Local Oxidation and In-situ Characterization Using AFM Probes in Multiple ModesWeihua Hu, James Bain, David Ricketts
P22-5Fabrication of nano structures for Dimensional Metrology and Device ApplicationsPradeep Namboodiri, Kai Li, Joseph Fu, Gheorghe Stan, Richard Silver

 

The EIPBN conference abstracts from the most recent years are available by clicking here

PROGRAM CHAIR

Dr. Michael Fritze
Director, Disruptive Electronics
Information Sciences Institute &
Research Professor
Ming Hsieh Dept. of Electrical Engineering
University of Southern California
3811 North Fairfax Drive, Suite 200
Arlington, Virginia 22203
(703) 812-3702 (Office)
Email: mfritze@isi.edu 

Please contact him should you have more questions on the details of the program.

TECHNICAL SECTIONS

The various technology sections and the Section heads that are contributing to the Program organization can be found by clicking here.


Committee Login